Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
08/2005
08/24/2005EP1566696A1 Lithographic apparatus and device manufacturing method with feed-forward focus control.
08/24/2005CN1659695A Wafer pre-alignment apparatus and method
08/24/2005CN1659478A Method and device for imaging a mask onto a substrate
08/24/2005CN1659417A A system and method for manufacturing printed circuit boards employing non-uniformly modified images
08/24/2005CN1658073A Lithographic apparatus and device manufacturing method with feed-forward focus control
08/24/2005CN1658068A Photolithographic process, photomask and manufacturing thereof
08/24/2005CN1216403C Exposure method
08/23/2005US6934008 Multiple mask step and scan aligner
08/23/2005US6934006 Exposure apparatus and exposure method for use in forming a pattern of a semiconductor device
08/23/2005US6934005 Reticle focus measurement method using multiple interferometric beams
08/23/2005US6933204 Method for improved alignment of magnetic tunnel junction elements
08/23/2005US6933084 Alternating aperture phase shift photomask having light absorption layer
08/18/2005US20050183056 Simulator of lithography tool, simulation method, and computer program product for simulator
08/18/2005US20050182593 Wafer target design and method for determining centroid of wafer target
08/18/2005US20050181575 Semiconductor structures and manufacturing methods
08/18/2005US20050181571 Method and apparatus for forming patterned photoresist layer
08/18/2005US20050179898 Position detection method and apparatus, and exposure method and apparatus
08/18/2005US20050179883 System for automated focus measuring of a lithography tool
08/18/2005US20050179880 Lithographic apparatus and device manufacturing method with feed-forward focus control
08/18/2005US20050179879 Lithographic apparatus, interferometer and device manufacturing method
08/18/2005US20050178983 Electron beam lithography device and drawing method using electron beams
08/18/2005US20050178944 Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate
08/18/2005US20050178230 Positioning device, especially for offset plates
08/18/2005DE102005002994A1 Koordinatenversatz-Einstellsystem und Koordinatenversatz-Einstellverfahren Coordinate offset adjustment system and coordinate offset adjustment
08/17/2005CN1656354A Position measurement method, exposure method, exposure device, and manufacturing method of device
08/17/2005CN1215383C Hoods for graduated exposure plate method and determining method thereof
08/16/2005US6931619 Apparatus for reshaping a patterned organic photoresist surface
08/16/2005US6931337 Lithography tool image quality evaluating and correcting
08/16/2005US6930758 Projection exposure system for microlithography and method for generating microlithographic images
08/16/2005US6930016 Position detection apparatus and method, exposure apparatus, and device manufacturing method
08/16/2005US6929892 Method of monitoring an exposure process
08/16/2005US6929888 Liquid crystal display; photolithography; radiation transparent substrate, adjustment of masking patterns
08/11/2005WO2005073764A1 Methods for imaging regular patterns
08/11/2005US20050175909 Methods for imaging regular patterns
08/11/2005US20050175907 Photo mask including scattering bars and method of manufacturing the same
08/11/2005US20050175906 can be automated to quickly and easily avoid phase shifting segment conflict;
08/11/2005US20050175905 Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask
08/11/2005US20050174574 Overlay alignment mark design
08/11/2005US20050174553 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
08/11/2005US20050173653 Exposure apparatus and method
08/11/2005US20050172847 Alignment elements for an apparatus for handling printing plates
08/11/2005DE10393131T5 Verfahren zum Herstellen von Maskenrohlingen, Verfahren zum Herstellen von Transfermasken, Sputtertarget zum Herstellen von Maskenrohlingen A method for producing mask blanks, A method for producing transfer masks, sputtering target for fabricating mask blanks
08/11/2005DE10392658T5 Verfahren zur Herstellung eines Transfermasken-Substrats, Transfermasken-Substrat und Transfermaske A method for producing a transfer mask substrate transfer mask substrate and transfer mask
08/11/2005DE102005000734A1 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns
08/10/2005CN1214291C Composite relief image printing elements
08/10/2005CN1214289C Composite relief image printing plates and preparing method
08/09/2005US6927854 Projection exposure device and position alignment device and position alignment method
08/09/2005US6927842 wafers are transported within a lithography system while being affixed and aligned to chucks, thereby maximizing production throughput
08/09/2005US6927005 Alternating phase shift mask design with optimized phase shapes
08/09/2005US6927003 Automatic maintenance of radiation transparent deformations on attenuated phase shifting masks(PSM), using computer programs for analysis, then plugging with carbon
08/04/2005WO2005043243A3 Methods and apparatuses for applying wafer-alignment marks
08/04/2005US20050172256 Mask set for measuring an overlapping error and method of measuring an overlapping error using the same
08/04/2005US20050170631 Manufacturing method for wiring substrates
08/04/2005US20050170293 Exposure apparatus
08/04/2005US20050170288 Optical lithography; radiation transparent phase shifting masks used in manufacture of semiconductors/integrated circuits
08/04/2005US20050170269 Solidifying flowable film onto which concave and convex portions have been transferred, annealing film with press, then patterning of solidified film burnt by annealing
08/04/2005US20050170268 Circuit patterning substrate, providing mask, collimating incident direction of particles, irradiating
08/04/2005US20050170267 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
08/04/2005US20050170264 Projects images of grating pattern and test pattern; photoresists
08/04/2005US20050170263 Mask blank manufacturing method and sputtering target for manufacturing the same
08/04/2005US20050170262 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
08/04/2005US20050170261 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched
08/04/2005US20050169515 Surface position measuring method and apparatus
08/04/2005US20050168740 Method of evaluating reticle pattern overlay registration
08/04/2005DE10240085B4 Verfahren zum Strukturieren einer Maskenschicht A method of patterning a mask layer
08/04/2005DE102004063140A1 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same
08/03/2005CN1649121A Alignment stage apparatus
08/03/2005CN1649114A Method for producing wiring base board
08/03/2005CN1648775A System and method for processing masks with oblique features
08/03/2005CN1213344C Hoods with exposure meter for graduated exposion plate method and determining method thereof
08/02/2005US6925203 Position detection apparatus and exposure apparatus
08/02/2005US6924884 Off-axis leveling in lithographic projection apparatus
08/02/2005US6924883 Exposure device
08/02/2005US6924882 Balanced positioning system for use in lithographic apparatus
08/02/2005US6924880 Large-area mask and exposure system having the same
08/02/2005US6924071 Moving a selected feature located in a cell between a first boundary and a second boundary from a first pattern file to a second pattern file and exposing a resist layer of a photomask blank with the first pattern file by using step/repeat;
08/02/2005US6924070 Composite patterning integration
08/02/2005US6924069 Depositing a negative photoresist over the light blocking layer to include filling a portion of the opening exposing the negative photoresist layer through the quartz substrate; developing and dry etching; accuracy
08/02/2005US6922906 Apparatus to orientate a body with respect to a surface
07/2005
07/28/2005WO2005069082A1 Differential critical dimension and overlay metrology apparatus and measurement method
07/28/2005WO2005067815A1 Stage alignment in lithography tools
07/28/2005WO2005050316A3 Method involving a mask or a reticle
07/28/2005WO2005001898A3 Method of designing a reticle and forming a semiconductor device therewith
07/28/2005US20050166172 Critical pattern extracting method, critical pattern extracting program, and method of manufacturing semiconductor device
07/28/2005US20050164129 Photomask and manufacturing method of semiconductor device
07/28/2005US20050164099 Improved yield and device reliability; uses current manufacturing machines
07/28/2005US20050164098 Pattern dimension accuracy; aligning mask or reticle with reference system and determining offset angle; rotating and processing in horizontal or vertical direction
07/28/2005US20050164097 Simplifying design of alternating phase shift photomask; forming opaque layer on transparent substrate then patterning and etching and repeating on adjacent region
07/28/2005US20050164096 Simple, low cost; utilizing test pattern within step distance of patterned layer
07/28/2005US20050164095 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor
07/28/2005US20050163022 Coordinate offset adjustment system and coordinate offset adjustment method
07/28/2005US20050162636 System to increase throughput in a dual substrate stage double exposure lithography system
07/28/2005US20050162626 Lithographic alignment system
07/28/2005US20050161615 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same
07/28/2005DE102004063455A1 Fotomaske Photomask
07/28/2005DE102004052952A1 Ausrichtungsverfahren zur Herstellung eines integrierten Ultraschalltransducerfeldes Alignment method for manufacturing an integrated Ultraschalltransducerfeldes
07/28/2005DE10044199B9 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles
07/28/2005DE10017836B4 Druckplattenverarbeitungsvorrichtung und Verfahren zum Ermitteln der Position einer Paßmarkierung auf einer Druckplatte Printing plate processing apparatus and method for determining the position of a registration mark on a printing plate
07/27/2005EP1557723A2 Alignment stage apparatus
07/27/2005EP1556737A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication
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