| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/22/2005 | WO2005087969A1 Alignment equipment and film forming equipment |
| 09/22/2005 | US20050208685 Periodic patterns and technique to control misalignment |
| 09/22/2005 | US20050208395 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 09/22/2005 | US20050208394 Alkali-soluble resin, a phthalocyanine dye, and a photosensitive compound; heat resistance and light fastness |
| 09/22/2005 | US20050208393 Photomask and method for creating a protective layer on the same |
| 09/22/2005 | US20050208392 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes |
| 09/22/2005 | US20050208390 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 09/22/2005 | US20050208254 Image dividing film for photo or the like |
| 09/22/2005 | US20050207637 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 09/22/2005 | US20050206888 Method and apparatus for inspecting a pattern formed on a substrate |
| 09/22/2005 | US20050206877 Shape measuring apparatus, shape measuring method, and aligning method |
| 09/22/2005 | US20050206867 Scanning exposure apparatus and method |
| 09/22/2005 | US20050205805 Scratch repairing processing method and scanning probe microscope (SPM) used therefor |
| 09/22/2005 | DE102004010902A1 Verfahren zur Übertragung eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat A method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 09/21/2005 | EP1577887A2 Compound objective lens having two focal points and apparatus using the lens |
| 09/21/2005 | EP1576716A2 Apparatus for processing an object with high position accuracy |
| 09/21/2005 | EP1576422A2 Method and system for overlay measurement |
| 09/21/2005 | CN1220116C Device for measuring relative position error |
| 09/20/2005 | US6947123 Exposure device with laser device |
| 09/20/2005 | US6947122 Scanning exposure apparatus and method |
| 09/20/2005 | US6947119 Distortion measurement method and exposure apparatus |
| 09/20/2005 | US6946668 Electron beam lithography device and drawing method using electron beams |
| 09/20/2005 | US6946666 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
| 09/15/2005 | US20050202327 Method and arrangement for controlling focus parameters of an exposure tool |
| 09/15/2005 | US20050202324 Method for producing masks for photolithograpy and the use of such masks |
| 09/15/2005 | US20050202323 Phase shift mask and method of manufacturing phase shift mask |
| 09/15/2005 | US20050202322 Methods of forming alternating phase shift masks having improved phase-shift tolerance |
| 09/15/2005 | US20050202321 Pliant sraf for improved performance and manufacturability |
| 09/15/2005 | US20050199830 EUV light source optical elements |
| 09/15/2005 | DE19510449B4 Retikel Reticle |
| 09/15/2005 | DE102004009173A1 Verfahren zur Kompensation der Verkürzung von Linienenden bei der Bildung von Linien auf einem Wafer A method for compensating for the shortening of line ends in the formation of lines on a wafer |
| 09/15/2005 | DE102004007678B3 Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask |
| 09/14/2005 | EP1573395A2 Scatterometry alignment for imprint lithography |
| 09/13/2005 | US6944578 Measuring 3 dimensional profile changes in a photosensitive film and feeding back compensatory exposure tool focus corrections to maintain a stable lithographic process; measuring the relationship between line edge width and barometric pressure |
| 09/13/2005 | US6943900 Generation of a library of periodic grating diffraction signals |
| 09/13/2005 | US6943464 Lithographic apparatus and motor for use in the apparatus |
| 09/13/2005 | US6943458 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 09/13/2005 | US6942959 comprises angle redistributing prescreen, which minimizes/eliminates sensitivity to projector location, with conventional diffusion screen; high resolution; photoresists; photolithography; silver halide emulsions |
| 09/09/2005 | WO2005083756A1 Pre-measurement processing method, exposure system and substrate processing equipment |
| 09/08/2005 | US20050196689 Method for transferring a layout of an integrated circuit level to a semiconductor substrate |
| 09/08/2005 | US20050196688 Performing model-based optical proximity correction (OPC) on the repair solution; allowing repair decision for an attenuated phase shifing mask to be made at the same time that inspection is done |
| 09/08/2005 | US20050196686 Carrying out a rule-based correction of proximity effects for insertion or supplementation of one or more serifs in the circuit design onto the line end of a wafer |
| 09/08/2005 | US20050196685 Rectangular contact lithography for circuit performance improvement and manufacture cost reduction |
| 09/08/2005 | US20050196684 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method |
| 09/08/2005 | US20050196683 Forming a first semitransparent layer configured to add a first phase rotation to a light beam passing through; forming a second semitransparent layer configured to add a second phase rotation to a light beam passing through; semiconductors |
| 09/08/2005 | US20050196682 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern |
| 09/08/2005 | US20050196681 Changing the illumination conditions in order to attempt to maximize common depth of focus (DOF), wherein the mask error constraints and Optical Proximity Correction are taken into account in attempting to maximize common DOF. |
| 09/08/2005 | US20050195405 Position detecting system and exposure apparatus using the same |
| 09/08/2005 | US20050195397 In-situ overlay alignment |
| 09/08/2005 | US20050194427 X-ray alignment system for fabricating electronic chips |
| 09/08/2005 | US20050194352 Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same |
| 09/08/2005 | DE10356699A1 Lithographiemaske und Lithographiesystem für richtungsabhängige Belichtung Lithography mask lithography system for directional exposure |
| 09/08/2005 | DE102004005981A1 Ausrichtungselemente einer Vorrichtung zur Handhabung von Druckplatten Alignment elements of a device for handling printing plates |
| 09/07/2005 | EP1571696A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1570232A1 Apparatus and methods for detecting overlay errors using scatterometry |
| 09/07/2005 | CN1664702A Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
| 09/06/2005 | US6940586 Exposure apparatus and method |
| 09/06/2005 | US6940584 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 09/06/2005 | US6939650 making integrated circuits using absorbent transmission masks that can be repaired |
| 09/06/2005 | US6939475 Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same |
| 09/01/2005 | WO2005081290A1 Exposure apparatus and method of producing the device |
| 09/01/2005 | WO2005081066A1 Rectangular contact lithography for circuit performance improvement |
| 09/01/2005 | WO2005081059A1 Method for the production of masks used in photolithography, and use of such masks |
| 09/01/2005 | WO2004059699A3 System and method for on-the-fly eccentricity recognition |
| 09/01/2005 | US20050191566 Quick and accurate modeling of transmitted field |
| 09/01/2005 | US20050191565 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles |
| 09/01/2005 | US20050191564 Annealing amorphous liner layer to increase degree of crystallisation and generate semi-crystalline liner layer with higher etching rate; implantating extrinsic boron ions to improve etch selectivity |
| 09/01/2005 | US20050191563 Method and system for reducing and monitoring precipitated defects on masking reticles |
| 09/01/2005 | US20050190349 Method for determining rotational error portion of total misalignment error in a stepper |
| 09/01/2005 | US20050189502 Alignment systems and methods for lithographic systems |
| 08/31/2005 | EP1569037A2 Scanner system |
| 08/31/2005 | EP1348150B1 Lithographic manufacturing process comprising a method of measuring overlay |
| 08/31/2005 | EP1348149B1 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 08/31/2005 | CN1661771A Method for aligning wafer |
| 08/31/2005 | CN1661770A Method to predict and identify defocus wafers and system thereof |
| 08/31/2005 | CN1661476A Method of passive alignment by using photo mask plate |
| 08/31/2005 | CN1217237C Self-compensating mark arrangement for stepper alignment |
| 08/30/2005 | US6937344 Method of measuring overlay |
| 08/30/2005 | US6937334 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 08/30/2005 | US6936931 For use in semiconductor device |
| 08/30/2005 | US6936521 Alignment mark and alignment method using the same for photolithography to eliminating process bias error |
| 08/30/2005 | US6936386 for application to semiconductor wafers; comprises charge coupled camera; lithography |
| 08/30/2005 | US6936385 Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods |
| 08/25/2005 | WO2005076935A2 Wavelength filtering in nanolithography |
| 08/25/2005 | WO2004008245A3 Method and system for context-specific mask inspection |
| 08/25/2005 | US20050186753 FIB exposure of alignment marks in MIM technology |
| 08/25/2005 | US20050186517 Overlay correction by reducing wafer slipping after alignment |
| 08/25/2005 | US20050186509 Lithographic apparatus and device manufacturing method |
| 08/25/2005 | US20050186488 Spin coated photomasks; antistatic, electroconductive film of oligomeric or polymeric N,N-dimethyl-N-ethyl-(p-vinylbenzyl)ammonium chloride; integrated circuit microlithography |
| 08/25/2005 | US20050186487 Blank has a phase shift film sputtered onto a radiation transparent substrate comprising two or more silicides, nitrides or oxynitrides of molybdenum, zirconium, tantalum and tungsten; lithographic processing and etching the mask; improved high energy radiation resistance, especially to ArF or F2 lasers |
| 08/25/2005 | US20050186485 Forming layer of metal and silicon-containing compound film on transparent substrate by co-sputtering; photoresists; semiconductors; integrated circuits |
| 08/25/2005 | US20050186484 Method for forming mask pattern of semiconductor device |
| 08/25/2005 | US20050186483 Method for determining a map, device manufacturing method, and lithographic apparatus |
| 08/25/2005 | US20050186064 Positioning apparatus and exposure apparatus |
| 08/25/2005 | US20050185683 Exposure apparatus with laser device |
| 08/25/2005 | US20050185183 Method for aligning wafer |
| 08/25/2005 | US20050185170 Method to predict and identify defocus wafers |
| 08/25/2005 | US20050185166 Exposure apparatus and device manufacturing method |
| 08/25/2005 | US20050185164 Exposure apparatus and a device manufacturing method using the same |
| 08/25/2005 | US20050184618 Transfer apparatus |