Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
10/2005
10/20/2005US20050233224 Method of improving polysilicon film crystallinity
10/20/2005US20050233223 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
10/20/2005US20050232479 Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects
10/20/2005US20050231732 Method of measuring overlay
10/20/2005US20050231721 Wafer pre-alignment apparatus and method
10/20/2005US20050231698 Method of measuring alignment of a substrate with respect to a reference alignment mark
10/20/2005US20050231696 Exposure device
10/19/2005EP1586106A1 An extractor for an microcoloum, an alignment method for an extractor aperture to an electon emitter, and a measuring method and an alignment method using thereof
10/19/2005EP1586008A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
10/19/2005EP1586007A2 Electron beam processing for mask repair
10/19/2005CN1684228A Optic micro distance correcting method
10/19/2005CN1223903C Explosure device for double side printed circuit board
10/18/2005US6957411 Gridless IC layout and method and apparatus for generating such a layout
10/18/2005US6955993 Mask and method for making the same, and method for making semiconductor device
10/18/2005US6955868 Method to control the relative position between a body and a surface
10/18/2005US6955767 Scanning probe based lithographic alignment
10/18/2005US6955074 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
10/13/2005WO2005096354A1 Exposure apparatus, exposure method, device manufacturing method, and surface shape detecting device
10/13/2005WO2005096353A1 Alignment condition decision method and device, and exposure method and device
10/13/2005WO2005081066A8 Rectangular contact lithography for circuit performance improvement
10/13/2005US20050227151 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
10/13/2005US20050227049 Process for fabrication of printed circuit boards
10/13/2005US20050225642 Apparatus and method for the determination of positioning coordinates for semiconductor substrates
10/13/2005US20050224724 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/13/2005US20050224561 Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device
10/13/2005US20050223973 EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
10/13/2005DE102004014482A1 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks
10/12/2005CN1681377A Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device
10/11/2005US6954275 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
10/11/2005US6954002 System and method of enhancing alignment marks
10/11/2005US6953733 Method of manufacturing alignment mark and aligning method using the same
10/11/2005US6953644 Method for compensating for scatter/reflection effects in particle beam lithography
10/06/2005WO2005093832A1 Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement
10/06/2005WO2005092043A2 Process for fabrication of printed circuit boards
10/06/2005WO2005092025A2 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005WO2005091887A2 Euv light source optical elements
10/06/2005WO2005064410A8 Lithographic apparatus and method of calibration
10/06/2005WO2005029193A3 Interferometric analysis of surfaces.
10/06/2005US20050221560 Method of forming a vertical memory device with a rectangular trench
10/06/2005US20050221229 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221207 Method and apparatus for monitoring exposure process
10/06/2005US20050221205 Method for fabricating color filter substrate
10/06/2005US20050221204 control the writing dimension of a pattern; correction of foggy effect; manufacturing a semiconductor device and a liquid crystal display with fine and complicated patterns
10/06/2005US20050221203 irradiating TiO2 photocatalyst and a silicone coupler having fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a 2nd region; patterning a conductive material to form pattern to 2nd region
10/06/2005US20050221202 Wavelength filtering in nanolithography
10/06/2005US20050221201 Creating at least one drawing layer that defines changes to the structures to be formed on the surface of a semiconductor substrate at one step in the processing , which involves the use of a mask; drawing layer will define a pattern region that will either result in removal of matter from semiconductor
10/06/2005US20050221200 Photomask features with chromeless nonprinting phase shifting window
10/06/2005US20050220334 Position detection apparatus and exposure apparatus
10/06/2005US20050219533 Exposure apparatus and aligning method
10/06/2005US20050219516 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
10/06/2005US20050219492 Alignment method, exposure apparatus and device fabrication method
10/06/2005US20050219491 Position measurement technique
10/06/2005US20050219489 Exposure apparatus and method for producing device
10/06/2005US20050219487 Scanning exposure apparatus and method
10/06/2005US20050219486 Exposure apparatus and device manufacturing method
10/06/2005US20050219483 Lithographic apparatus and device manufacturing method
10/06/2005US20050219482 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/05/2005EP1583361A2 Image processing system, projector, information storage medium, and image processing method
10/05/2005EP1582933A2 Exposure apparatus and device manufacturing method
10/05/2005CN1678050A Image processing system, projector, image processing method
10/05/2005CN1677641A Position measurement technique
10/05/2005CN1677242A Exposure apparatus and device manufacturing method
10/05/2005CN1221858C Methods for deciding gap between a transparent template and substrate
10/04/2005US6952262 Exposure apparatus and aligning method
10/04/2005US6952253 Immersion; a non-contact gas seal forms so that liquid is contained in the space between the projection system and the substrate
09/2005
09/29/2005WO2005090931A1 Embedded attenuated phase shift mask with tunable transmission
09/29/2005WO2005029192A3 Surface triangulation and profiling through a thin film coating
09/29/2005US20050216877 Method and system for context-specific mask writing
09/29/2005US20050214688 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency
09/29/2005US20050214679 Negative dye-containing curable composition, color filter and method of producing the same
09/29/2005US20050214660 Negative dye-containing curable composition, color filter and method of producing the same
09/29/2005US20050214658 Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks
09/29/2005US20050214657 Method of generating writing pattern data of mask and method of writing mask
09/29/2005US20050214656 Process for producing a mask
09/29/2005US20050214655 Made using perfluorinated polymers that have been irradiated with high energy electron beam and fluorinated to increase transparency of perfluorinated polymer; cross-linked perfluorinated polymer selected from FEP, PFA, and tetrafluororethylene-co-perfluoroisobutylene
09/29/2005US20050214654 ESD-resistant photomask and method of preventing mask ESD damage
09/29/2005US20050214653 Repair of photolithography masks by sub-wavelength artificial grating technology
09/29/2005US20050214652 Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
09/29/2005US20050214651 Aperture plate for optical lithography systems
09/29/2005US20050214471 Molecular templating of a surface
09/29/2005US20050213821 Image processing system, projector, program, information storage medium, and image processing method
09/29/2005US20050213806 System and method for manufacturing printed circuit boards employing non-uniformly modified images
09/29/2005US20050213098 Scan exposure apparatus and method, and device manufacturing method
09/29/2005US20050211918 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
09/29/2005DE102004009095A1 Mask layer structure superimposition accuracy determination, for semiconductor manufacture, involves scanning rear side of substrate and mask layer using radiation, and evaluating images to find positions of alignment marks
09/28/2005EP1579274A2 Method and system for context-specific mask inspection
09/28/2005CN1675591A Method for aligning a substrate on a stage
09/28/2005CN1675191A Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer
09/28/2005CN1674226A A method for performing transmission tuning of a mask pattern to improve process latitude
09/28/2005CN1673860A Exposure device and positioning method
09/27/2005US6950784 Semiconductor structures and manufacturing methods
09/27/2005US6950188 Wafer alignment system using parallel imaging detection
09/27/2005US6950187 Method for determining rotational error portion of total misalignment error in a stepper
09/27/2005US6950179 Shape measuring apparatus, shape measuring method, and aligning method
09/27/2005US6950174 Projection exposure system for microlithography and method for generating microlithographic images
09/27/2005US6949839 Aligned buried structures formed by surface transformation of empty spaces in solid state materials
09/27/2005US6949755 Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate
09/27/2005US6949462 Measuring an alignment target with multiple polarization states
09/27/2005US6949319 Method for determining depth of focus
09/22/2005WO2005088686A1 Step measuring method and apparatus, and exposure method and apparatus
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