Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/2005
11/24/2005DE102004021415A1 Verfahren zur Strukturbelichtung einer photoreaktiven Schicht und zugehörige Belichtungsvorrichtung A method for structure exposure of a photoreactive layer and associated exposure apparatus
11/23/2005CN1700097A System and method for calculating aerial image of a spatial light modulator
11/23/2005CN1699914A Heterodyne laser interferometer for measuring wafer stage translation
11/23/2005CN1228829C Identifying method of mark on semiconductor device
11/23/2005CN1228691C Multiply light shield putting flatwise device and method for improving superimposed micro-image
11/23/2005CN1228690C Graphic writer
11/22/2005US6968528 Photo reticles using channel assist features
11/17/2005US20050256687 Generation of a library of periodic grating diffraction signals
11/17/2005US20050255390 Photomask for the manufacturing of reflective bumps
11/17/2005US20050255389 Phase shift mask and method of producing the same
11/17/2005US20050255387 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask
11/17/2005US20050255386 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a chemical reaction interface that provides enhanced etch selectivity, especially a tunable, etch-resistant anti-reflective coating material.
11/17/2005US20050254032 Exposure device
11/17/2005DE10307523B4 Verfahren zur Herstellung einer Resistmaske für die Strukturierung von Halbleitersubstraten A method for preparing a resist mask for the patterning of semiconductor substrates
11/16/2005EP1149328B1 Method and assembly for producing printing plates
11/16/2005CN1698196A In-print method and in-print device
11/16/2005CN1698181A Method for forming pattern and method for manufacturing semiconductor device
11/16/2005CN1698011A Lithographic printing with polarized light
11/16/2005CN1696826A Method for forming pattern on substrate by mould board transparent to exciting light and semiconductor apparatus therefor
11/16/2005CN1227546C Method of making patterned passive delay and thus made delay
11/15/2005US6965427 System to increase throughput in a dual substrate stage double exposure lithography system
11/15/2005US6964831 Method of fabricating polysilicon film by excimer laser crystallization process
11/10/2005WO2005106932A1 Analysis method, exposing equipment and exposing equipment system
11/10/2005WO2005106597A2 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/10/2005WO2005106596A1 Exposure apparatus
11/10/2005WO2005106595A1 Exposure apparatus and pattern forming method
11/10/2005WO2005106591A1 Exposure pattern forming method
11/10/2005WO2005106590A1 Exposure apparatus
11/10/2005WO2005104756A2 Composite patterning devices for soft lithography
11/10/2005US20050251781 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program
11/10/2005US20050250330 integrated circuit; diffusion barrier layer is covalently attached to the silicon substrate
11/10/2005US20050250292 Methods for forming backside alignment markers useable in semiconductor lithography
11/10/2005US20050250291 Methods for clearing alignment markers useable in semiconductor lithography
11/10/2005US20050250225 Method and apparatus for forming patterned photoresist layer
11/10/2005US20050250026 Overlay box structure for measuring process induced line shortening effect
11/10/2005US20050250024 Negative dye-containing curable composition, color filter and method of producing the same
11/10/2005US20050250023 Apparatus used in reshaping a surface of a photoresist
11/10/2005US20050250022 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
11/10/2005US20050250021 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects
11/10/2005US20050250020 Mask, layout thereon and method therefor
11/10/2005US20050250019 Mask device for photolithography and application thereof
11/10/2005US20050250017 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank
11/10/2005US20050248754 Wafer aligner with WEE (water edge exposure) function
11/10/2005US20050248747 System to increase throughput in a dual substrate stage double exposure lithography system
11/10/2005US20050248740 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
11/10/2005US20050248659 Exposure apparatus, and method, device manufacturing method, pattern generator and maintenance method
11/10/2005US20050248650 Image recording apparatus
11/10/2005US20050248219 Alignment apparatus and exposure apparatus using the same
11/10/2005US20050247669 Method for repairing a phase shift mask
11/09/2005CN1695222A Particle-optical device and detection means
11/09/2005CN1695096A Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same
11/08/2005US6963434 System and method for calculating aerial image of a spatial light modulator
11/08/2005US6963391 Lithographic apparatus and device manufacturing method
11/08/2005US6963389 Alignment method, exposure apparatus and device fabrication method
11/08/2005US6963075 Scanning exposure apparatus and device manufacturing method
11/08/2005US6962854 Marks and method for multi-layer alignment
11/08/2005US6962825 Exposure apparatus
11/03/2005WO2005104196A1 Measuring method, measuring equipment, exposing method and exposing equipment
11/03/2005US20050246049 Automated manufacturing system and method for processing photomasks
11/03/2005US20050244729 Method of measuring the overlay accuracy of a multi-exposure process
11/03/2005US20050244728 Quick mask design
11/03/2005US20050244726 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
11/03/2005US20050244725 Apparatus and method for structure exposure of a photoreactive layer
11/03/2005US20050244724 Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
11/03/2005US20050244723 Lithography mask for the fabrication of semiconductor components
11/03/2005US20050244721 Composite layer method for minimizing PED effect
11/03/2005US20050243398 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243397 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243296 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/03/2005US20050243292 Lithographic apparatus and device manufacturing method
11/03/2005US20050242448 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same
11/03/2005US20050242285 Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate
11/03/2005US20050241512 Image recording apparatus, notch forming apparatus, and method for use therewith
11/02/2005EP1591241A2 Image recording apparatus
11/02/2005CN1692311A Mask correcting method
11/02/2005CN1690863A Device manufacturing method
11/02/2005CN1690848A Image recording apparatus
11/02/2005CN1225678C Optical approaching correcting method
11/01/2005US6961116 Alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers.
11/01/2005US6960775 first illumination system for beam of ultraviolet radiation, support structure for patterning device, projection system and second illumination system for a compensating beam; critical dimension profile correction; integrated circuit maufacture
11/01/2005US6960414 Determining overlay parameters for a plurality of sub-layouts; inputting the overlay parameters into an exposure system; exposing each sub-layout to photoresist on a wafer by using the exposure system; correction; development
11/01/2005US6960413 Multi-step process for etching photomasks
10/2005
10/27/2005US20050238970 Device manufacturing method
10/27/2005US20050238969 Methods for producing pattern-forming body
10/27/2005US20050238967 Composite patterning devices for soft lithography
10/27/2005US20050238966 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors
10/27/2005US20050238964 Photomask
10/27/2005US20050236721 Method of reducing film stress on overlay mark
10/27/2005US20050236567 Lithography tool image quality evaluating and correcting
10/27/2005DE102005013532A1 EUV-Lithographiesystem und Chuck zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and Chuck for solving reticles in a vacuum-insulated environment
10/27/2005DE102004044785A1 Vorrichtung und Verfahren zur Bestimmung von Positionierkoordinaten für Halbleitersubstrate Apparatus and method for determination of semiconductor substrates for Positionierkoordinaten
10/27/2005DE102004017131A1 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices
10/26/2005EP1588221A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
10/26/2005CN1688934A Method for fabricating photomask and semiconductor device
10/26/2005CN1688933A Photomask and its production method, and pattern forming method
10/25/2005US6958281 Method for forming alignment pattern of semiconductor device
10/25/2005US6958201 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
10/20/2005US20050233262 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
10/20/2005US20050233227 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
10/20/2005US20050233225 Ultraviolet exposure irradiates from excimer laser or an fluorine gas laser; contains evaluation section with growable substance
1 ... 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 ... 109