| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/05/2006 | WO2005045529A3 Characterization and compensation of errors in multi-axis interferometry system |
| 01/05/2006 | US20060004490 Registration correction amount calculating apparatus for calculating amount of correction for registration inspection apparatus from registration inspection data of pattern formed on wafer |
| 01/05/2006 | US20060003234 multiple exposure patterning to provide mark; photoresists; integrated circuits |
| 01/05/2006 | DE102004019861B3 Verfahren zum Herstellen einer Maske für eine lithographische Abbildung A method of manufacturing a mask for a lithographic imaging |
| 01/04/2006 | CN1716114A Image recorder and image recording method |
| 01/04/2006 | CN1716102A Aligning system and aligning method |
| 01/03/2006 | US6983444 Mask for reducing proximity effect |
| 01/03/2006 | US6982138 scanning electron microscope video signaling |
| 01/03/2006 | US6982136 for photoresist/photomask patterns; scanning electron microscopy; semiconductors; integrated circuits |
| 01/03/2006 | US6982135 Pattern compensation for stitching |
| 01/03/2006 | US6982134 Multiple stepped aperture repair of transparent photomask substrates |
| 01/03/2006 | US6982133 Damage-resistant coatings for EUV lithography components |
| 12/29/2005 | WO2005124834A1 Best focus detecting method, exposure method and exposure equipment |
| 12/29/2005 | WO2005124832A1 Exposure system |
| 12/29/2005 | WO2005091887A3 Euv light source optical elements |
| 12/29/2005 | WO2005041291A3 Mask and method for using the mask in lithographic processing |
| 12/29/2005 | US20050286052 Elongated features for improved alignment process integration |
| 12/29/2005 | US20050286042 Method of calibration, calibration substrate, and method of device manufacture |
| 12/29/2005 | US20050286036 Lithography apparatus and method for measuring alignment mark |
| 12/29/2005 | DE10392540T5 Verfahren zum Korrigieren einer Maske A method for correcting a mask |
| 12/29/2005 | DE10259322B4 Verfahren zum Bilden einer Justiermarke in einer lichtundurchlässigen Schicht auf einem Substrat A method of forming an alignment mark in an opaque layer on a substrate |
| 12/29/2005 | DE102004027277A1 Excess film emending method for e.g. dynamic RAM, involves providing simulation model with regulation algorithm, determining offset values for samples, and determining parameter of algorithm for illumination device on basis of offset values |
| 12/28/2005 | CN1234050C Marking graph for X-ray photoetching alignment |
| 12/27/2005 | US6979833 System for monitoring the topography of a wafer surface during lithographic processing |
| 12/27/2005 | US6979577 Method and apparatus for manufacturing semiconductor device |
| 12/27/2005 | US6979526 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs |
| 12/27/2005 | US6979522 Adjustment physical properties; using exposure tool; calibration pattern; accuracy |
| 12/22/2005 | WO2005122219A1 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate |
| 12/22/2005 | WO2005121903A2 System and method for improvement of alignment and overlay for microlithography |
| 12/22/2005 | US20050281454 Image processing apparatus, image processing method, exposure apparatus, and device manufacturing method |
| 12/22/2005 | US20050280795 Lithographic apparatus and device manufacturing method |
| 12/22/2005 | US20050280390 Electromagnetic alignment and scanning apparatus |
| 12/22/2005 | DE102005009062A1 Heterodynlaserinterferometer zum Messen einer Waferstufentranslation Heterodynlaserinterferometer for measuring a wafer stage translation |
| 12/21/2005 | CN1710491A Odd phase-difference in-situ detection method of photoetching machine porjection objective lens |
| 12/20/2005 | US6977986 Method and apparatus for aligning a crystalline substrate |
| 12/20/2005 | US6977128 Multi-layered semiconductor structure |
| 12/15/2005 | WO2005119395A2 Method and system to control movement of a body for nano-scale manufacturing |
| 12/15/2005 | WO2005119370A2 High speed lithography machine and method |
| 12/15/2005 | US20050277287 Contact etching utilizing multi-layer hard mask |
| 12/15/2005 | US20050275848 Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
| 12/15/2005 | US20050275841 Alignment marker and lithographic apparatus and device manufacturing method using the same |
| 12/15/2005 | US20050275840 Optical position assessment apparatus and method |
| 12/15/2005 | US20050275107 Contact etching utilizing multi-layer hard mask |
| 12/15/2005 | US20050274909 Level sensor for lithographic apparatus |
| 12/15/2005 | US20050274219 Method and system to control movement of a body for nano-scale manufacturing |
| 12/15/2005 | DE102004017131B4 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices |
| 12/15/2005 | CA2569097A1 High speed lithography machine and method |
| 12/14/2005 | EP1604247A2 A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 12/13/2005 | US6975407 Method of wafer height mapping |
| 12/13/2005 | US6975399 mark position detecting apparatus |
| 12/13/2005 | US6975387 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing micro device |
| 12/13/2005 | US6975384 Exposure apparatus and method |
| 12/13/2005 | US6975383 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 12/08/2005 | WO2005116577A1 Method of adjusting imaging optical system, imaging device, positional deviation detecting device, mark identifying device and edge position detectinc device |
| 12/08/2005 | US20050271955 System and method for improvement of alignment and overlay for microlithography |
| 12/08/2005 | US20050271954 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 12/08/2005 | US20050270509 Measuring apparatus, exposure apparatus having the same, and device manufacturing method |
| 12/07/2005 | EP1603153A1 Detection method of optimal position detection equation, positioning method, exposure method, device manufacturing method, and device |
| 12/07/2005 | EP1602007A2 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 12/07/2005 | EP1601931A2 Apparatus and method for detecting overlay errors using scatterometry |
| 12/07/2005 | CN1705915A Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 12/07/2005 | CN1230873C Regulating device and method of position deviation optical detecting device |
| 12/07/2005 | CN1230717C Photographic corrosion mfg method for mixing chromium-free film and phase transition mixed type photo mask, and photographic corrosion manufacturing method employing the mask |
| 12/07/2005 | CN1230713C Surfaces with release agent |
| 12/06/2005 | US6973397 Alignment method and parameter selection method |
| 12/06/2005 | US6972847 Position detecting system and exposure apparatus using the same |
| 12/06/2005 | US6972844 Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method |
| 12/06/2005 | US6972843 Lithography alignment |
| 12/06/2005 | US6972833 Plate positioning and processing method and plate positioning and processing apparatus |
| 12/06/2005 | US6972831 Projection exposure system for microlithography and method for generating microlithographic images |
| 12/01/2005 | WO2005114095A2 Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
| 12/01/2005 | US20050268272 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 12/01/2005 | US20050266357 Method for enhancing wafer alignment marks |
| 12/01/2005 | US20050264814 Alignment method and parameter selection method |
| 12/01/2005 | US20050264791 Wafer handling method for use in lithography patterning |
| 12/01/2005 | US20050264781 Position detection method and apparatus |
| 12/01/2005 | US20050264777 High speed lithography machine and method |
| 12/01/2005 | US20050264132 Apparatus to control displacement of a body spaced-apart from a surface |
| 12/01/2005 | DE102004022596A1 Process to detect positional errors in photolithographic projections in semiconductor wafers with circuit patterns uses overlay measuring apparatus and projection simulation |
| 12/01/2005 | DE102004022239A1 Processing device for aligning and punching printing plates of offset-printing machine, has moveable alignment unit formed and arranged in upper end region of installation surface, such that plate is fixed and aligned in hanging manner |
| 11/30/2005 | EP1373982B1 Method for adjusting the overlay of two masking levels in a photolithographic process |
| 11/30/2005 | CN1702837A Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
| 11/30/2005 | CN1702562A Image recording apparatus, notch forming apparatus, and method for use therewith |
| 11/30/2005 | CN1702557A Exposure device, exposure method, and exposure treating programme |
| 11/30/2005 | CN1229624C Position detection method and device, exposure method and equipment, control program, and device production method |
| 11/29/2005 | US6970244 Scan exposure apparatus and method, and device manufacturing method |
| 11/29/2005 | US6970231 Exposure apparatus and exposure method |
| 11/29/2005 | US6969966 Electromagnetic alignment and scanning apparatus |
| 11/29/2005 | US6969571 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 11/24/2005 | WO2005110755A1 Method for feeding a plate to an impression cylinder of a printing press, method for producing said plate and device for laterally aligning and guiding the tympan sheet of a cylinder that is to be fed to a printing press cylinder |
| 11/24/2005 | WO2005040932A3 Apparatus and method for aligning surfaces |
| 11/24/2005 | US20050260510 Method for determining the relative positional accuracy of two structure elements on a wafer |
| 11/24/2005 | US20050260506 Phase shift mask including a substrate with recess |
| 11/24/2005 | US20050260505 Preparation of photomask blank and photomask |
| 11/24/2005 | US20050260503 Reticle film stabilizing method |
| 11/24/2005 | US20050260502 Method and mask for forming a photo-induced pattern |
| 11/24/2005 | US20050259272 Method of wafer height mapping |
| 11/24/2005 | US20050259268 Heterodyne laser interferometer for measuring wafer stage translation |
| 11/24/2005 | US20050259257 Position detecting device and position detecting method |
| 11/24/2005 | US20050259235 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |