| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/21/2006 | US7001694 Photomask and method for producing the same |
| 02/21/2006 | US7001693 forming a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements on a mask to improve a pattern image |
| 02/21/2006 | US7001692 Method of forming a mask having nitride film |
| 02/21/2006 | US7001674 Polishing semiconductors, integrated circuits; multistage process; transferring pattern, masking |
| 02/16/2006 | US20060036352 Anti-vibration technique |
| 02/16/2006 | US20060035159 Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device |
| 02/16/2006 | US20060035158 Flowing a reference pattern and an inspection pattern with a first line and a number of parallel second lines and a reference pattern in the orthogonal direction to that in which the first line extends by heating the resist; measuring the distance between the centers of the patterns; checking variations |
| 02/16/2006 | US20060033916 Selection method, exposure method, selection unit, exposure apparatus, and device manufacturing method |
| 02/16/2006 | US20060033055 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus |
| 02/15/2006 | CN1242304C A photolithography mask having a subresolution alignment mark window |
| 02/14/2006 | US6999893 Position detecting device and position detecting method |
| 02/14/2006 | US6999160 Optimization method of aperture type of projection aligner |
| 02/14/2006 | US6998217 Gray scale lithography; accurate, uniform reticle writing smaller features |
| 02/14/2006 | US6998206 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate |
| 02/14/2006 | US6998204 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |
| 02/14/2006 | US6998203 Proximity correcting lithography mask blanks |
| 02/14/2006 | US6998201 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 02/14/2006 | US6998198 Contact hole printing by packing and unpacking |
| 02/09/2006 | US20060029447 Image forming apparatus and image forming method |
| 02/09/2006 | US20060028631 Exposure apparatus and exposure method |
| 02/09/2006 | DE112004000591T5 Herstellungsverfahren für Photomaske und Photomaskenrohling Manufacturing process for photomask and photomask blank |
| 02/08/2006 | CN1731288A Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method |
| 02/08/2006 | CN1731281A Method for manufacturing special purpose ultrahigh smoothness flexible mold for large-area micro-imprinting |
| 02/08/2006 | CN1241069C Pattern writing apparatus, pattern writing method and substrate |
| 02/07/2006 | US6996450 Automated manufacturing system and method for processing photomasks |
| 02/07/2006 | US6995831 Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure |
| 02/07/2006 | US6994940 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 02/07/2006 | US6994939 making a photolithographic mask with a radiation transparent substrate; one step processing |
| 02/02/2006 | WO2006012388A2 Test structures and methods for monitoring or controlling a semiconductor fabrication process |
| 02/02/2006 | US20060024589 Passivation of multi-layer mirror for extreme ultraviolet lithography |
| 02/02/2006 | US20060023193 Projection exposure system for microlithography and method for generating microlithographic images |
| 02/02/2006 | US20060023189 Lithographic apparatus and device manufacturing method |
| 02/01/2006 | CN1728002A Lithographic apparatus and method for calibrating the same |
| 02/01/2006 | CN1240120C Desk rack positioning and its control and exposure device and method for producing semiconductor device |
| 02/01/2006 | CN1239958C Image recorder |
| 01/31/2006 | US6993741 Generating mask patterns for alternating phase-shift mask lithography |
| 01/31/2006 | US6992780 Position detecting method and apparatus, exposure apparatus and device manufacturing method |
| 01/31/2006 | US6992767 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 01/31/2006 | US6992766 Position detection apparatus and method |
| 01/31/2006 | US6992752 Lithographic projection apparatus, computer program for control thereof, and device manufacturing method |
| 01/31/2006 | US6992751 Scanning exposure apparatus |
| 01/31/2006 | US6991878 Photomask repair method and apparatus |
| 01/31/2006 | US6991877 Projection lens exposes pattern to illumination; for fabrication of semiconductor chips, integrated circuits |
| 01/31/2006 | US6991386 Image forming apparatus and image forming method |
| 01/28/2006 | CA2513779A1 Method for placing openings in a substrate |
| 01/26/2006 | US20060019202 at least one sub-resolution feature connecting the first and second main features; greater flexibility and optimization of proximity correction performance without mask inspection problems |
| 01/26/2006 | US20060019184 Multi-exposure lithography method and system providing increased overlay accuracy |
| 01/26/2006 | US20060019183 Imprint alignment method, system, and template |
| 01/26/2006 | US20060019180 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device |
| 01/26/2006 | US20060019179 Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith |
| 01/26/2006 | US20060017900 Optical arrangement of autofocus elements for use with immersion lithography |
| 01/26/2006 | US20060017897 Exposure apparatus |
| 01/26/2006 | DE102005025474A1 Verfahren zum Bestimmen der Position eines Bezugspunktes A method for determining the position of a reference point |
| 01/25/2006 | EP1144973B1 Method of producing calibration structures in semiconductor substrates |
| 01/25/2006 | CN1726630A Apparatus for processing an object with high position accurancy |
| 01/25/2006 | CN1726431A Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
| 01/25/2006 | CN1725112A Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool |
| 01/25/2006 | CN1238763C Image recorder |
| 01/24/2006 | USRE38943 Compound objective lens for optical disks having different thicknesses |
| 01/24/2006 | US6990430 System and method for on-the-fly eccentricity recognition |
| 01/24/2006 | US6989885 Scanning exposure apparatus and method |
| 01/24/2006 | US6989219 transparent substrate, opaque layer, tungsten/tantalum layer, and photoresist layer; comprises chromium oxynitrides; improved minimum resolution/image quality |
| 01/19/2006 | WO2006007297A1 Elongated features for improved alignment process integration |
| 01/19/2006 | US20060012893 Objective, in particular a projection objective in microlithography |
| 01/18/2006 | EP1617293A1 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article |
| 01/18/2006 | CN1723540A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723419A Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 01/18/2006 | CN1237396C Light mark, focusing monitoring method, light exposure monitoring method, and manufacturing method of semiconductor device |
| 01/17/2006 | US6988260 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 01/17/2006 | US6988060 Alignment simulation |
| 01/17/2006 | US6987556 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 01/17/2006 | US6987555 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/17/2006 | US6987335 Alignment apparatus and exposure apparatus using the same |
| 01/17/2006 | US6987322 Contact etching utilizing multi-layer hard mask |
| 01/17/2006 | US6987053 Method of evaluating reticle pattern overlay registration |
| 01/17/2006 | US6986975 sensing the first and the second pattern, with the distance being established such that the first and the second pattern form a desired moire pattern when the template and the substrate are in a desired spatial relationship |
| 01/17/2006 | US6986974 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 01/17/2006 | US6986973 Test photomask, flare evaluation method, and flare compensation method |
| 01/17/2006 | US6986971 Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same |
| 01/17/2006 | US6986850 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 01/12/2006 | US20060008716 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus |
| 01/12/2006 | US20060008715 Exposure system and method |
| 01/12/2006 | US20060008714 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method |
| 01/12/2006 | US20060008712 Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus |
| 01/12/2006 | US20060007446 Alignment system and method |
| 01/12/2006 | US20060007442 Alignment marker and lithographic apparatus and device manufacturing method using the same |
| 01/12/2006 | US20060007431 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 01/12/2006 | US20060007416 Exposure apparatus |
| 01/12/2006 | DE102004029722A1 Preparation machine for bending printing plates to be fastened to roller in printing machine has stepping motor and vertical and horizontal actuators for bending system |
| 01/11/2006 | EP1615077A2 Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool |
| 01/11/2006 | EP1614154A2 Overlay metrology mark |
| 01/11/2006 | EP1614009A2 Masking arrangement and method for producing integrated circuit arrangements |
| 01/11/2006 | EP1614000A2 Optical arrangement of autofocus elements for use with immersion lithography |
| 01/11/2006 | CN1719339A Exposure device and exposure method |
| 01/10/2006 | US6985209 Position detecting method, position detecting apparatus, exposure method, exposure apparatus, making method thereof, and device and device manufacturing method |
| 01/10/2006 | US6984838 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus |
| 01/10/2006 | US6984836 System and method for monitoring the topography of a wafer surface during lithographic processing |
| 01/10/2006 | US6984477 Resist pattern forming apparatus and method thereof |
| 01/10/2006 | US6984474 Reticle barrier system for extreme ultra-violet lithography |
| 01/10/2006 | US6984472 Exposure method and apparatus |