| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/22/2006 | CN1749862A Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped such an apparatus |
| 03/21/2006 | US7016387 Windows, electrode masking segments; measurement adjustment pattern segments |
| 03/21/2006 | US7016051 Reticle focus measurement system using multiple interferometric beams |
| 03/21/2006 | US7016049 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 03/21/2006 | US7016012 Exposure apparatus |
| 03/21/2006 | US7015050 Misalignment test structure and method thereof |
| 03/21/2006 | US7014965 The short sides of the rectangular patterns of two separate reticles are parallel to the scanning direction in each photolithography; rotating the wafer to form two transferred patterns with orthogonal overlay structures; overlap errors improved |
| 03/21/2006 | US7014963 Photolithography mask with reduced thermally induced distortion; dielectric lands having alternating layers of higher and lower refractive index |
| 03/21/2006 | US7014962 Half tone alternating phase shift masks |
| 03/21/2006 | US7014961 Comprising a photomask substrate, a porous frame, and a pellicle; the porous frame is permeable to oxygen or nitrogen gas, specified pore size and coefficient of thermal expansion; allows the pellicle space to be purged with an inert gas to clean |
| 03/21/2006 | US7014960 Chelation cleaning process for repairing photomasks |
| 03/21/2006 | US7014959 CD uniformity of chrome etch to photomask process |
| 03/21/2006 | US7014958 Method for dry etching photomask material |
| 03/21/2006 | US7014957 Interconnect routing using parallel lines and method of manufacture |
| 03/21/2006 | US7014956 Masking to reduce pattern deformation; semiconductors |
| 03/21/2006 | US7014955 System and method for indentifying dummy features on a mask layer |
| 03/21/2006 | CA2345517C Method and assembly for producing printing plates |
| 03/16/2006 | WO2005119370A3 High speed lithography machine and method |
| 03/16/2006 | US20060057476 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 03/16/2006 | US20060057475 Binary optical proximity correction; forming a photolithographic mask layout with Sub-Resolution Assist Feature; computer programs; process control |
| 03/15/2006 | EP1634122A1 Method for evaluating the effects of multiple exposure processes in lithography |
| 03/15/2006 | CN1746776A Substrate processing apparatus and substrate positioning device |
| 03/15/2006 | CN1746775A Lithographic apparatus and device manufacturing method |
| 03/15/2006 | CN1245669C Micro imaging method capable of reducing influence of lens aberration |
| 03/15/2006 | CN1245662C Optical hood for reducing lens aberration and pattern shifting and method |
| 03/14/2006 | US7013453 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 03/14/2006 | US7012690 Substrate processing apparatus |
| 03/14/2006 | US7012672 Lithographic apparatus, system, method, computer program, and apparatus for height map analysis |
| 03/14/2006 | US7012398 Electromagnetic alignment and scanning apparatus |
| 03/14/2006 | US7012265 Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby |
| 03/14/2006 | US7012012 Method of etching substrates |
| 03/14/2006 | US7011926 Gap forming pattern fracturing method for forming optical proximity corrected masking layer |
| 03/14/2006 | US7011915 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
| 03/14/2006 | US7011911 Mask for polycrystallization and method of manufacturing thin film transistor using polycrystallization mask |
| 03/14/2006 | US7011909 Radiation phase shifting partially transparent layer; producing semiconductors |
| 03/09/2006 | US20060050274 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 03/09/2006 | US20060049137 Multi-step process for etching photomasks |
| 03/09/2006 | DE10215193B4 Verfahren zur Kompensation von Streu-/Reflexionseffekten in der Teilchenstrahllithographie A method for compensating for scattering / reflection effects in the Teilchenstrahllithographie |
| 03/08/2006 | CN1743961A Projection exposure apparatus and method for producing a printed circuit board |
| 03/08/2006 | CN1244954C Method for producing thin film semiconductor and method for forming resist pattern thereof |
| 03/07/2006 | US7010380 Management system, management method and apparatus, and management apparatus control method |
| 03/07/2006 | US7009683 Exposure apparatus |
| 03/07/2006 | US7009197 Apparatus for measuring gap between mask and substrate using laser displacement sensor, and method thereof |
| 03/07/2006 | US7008829 Alignment marks and manufacturing method for the same |
| 03/07/2006 | US7008738 photomask for forming regular and asymmetric arrays of high aspect ratio contact holes in integrated circuits; transparent layer, attenuating phase shifting layer, and light-obstructing layer patterned to form transparent holes; reduced side lobe effect; improved depth of focus |
| 03/07/2006 | US7008737 Gray scale x-ray mask |
| 03/07/2006 | US7008736 exposure light flux is transmitted and inverted through the shifter edge region contacted with the border of the opening region; destructive interference between exposure light fluxes improves resolution; microminiaturization, increased integration; photolithography |
| 03/07/2006 | US7008735 Mask for improving lithography performance by using multi-transmittance photomask |
| 03/07/2006 | US7008734 Phase shift mask |
| 03/07/2006 | US7008733 Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle |
| 03/07/2006 | US7008732 substrate with main patterns and sub-resolution assistant features, with 180 degree phase differences between assistant features and main pattern; high resolution |
| 03/07/2006 | US7008731 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask |
| 03/07/2006 | US7008730 Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography |
| 03/07/2006 | US7008729 Method for fabricating phase mask of photolithography process |
| 03/02/2006 | WO2006022309A2 Substrate positioning mechanism, substrate positioning method, substrate conveying device, and image forming device |
| 03/02/2006 | WO2005064410A3 Lithographic apparatus and method of calibration |
| 03/02/2006 | US20060046168 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/02/2006 | US20060044537 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 03/01/2006 | EP1630857A1 Position information measuring method and device, and exposure method and system |
| 03/01/2006 | CN1740914A Exposure apparatus |
| 03/01/2006 | CN1740910A Patterned mask holding device and method using two holding systems |
| 03/01/2006 | CN1244022C 曝光装置 Exposure device |
| 03/01/2006 | CN1244021C Photoetching device and exposure method |
| 03/01/2006 | CN1244020C Exposure device |
| 03/01/2006 | CN1244019C Exposure apparatus and exposure method |
| 03/01/2006 | CN1244018C Exposure method and equipment |
| 02/28/2006 | US7006226 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 02/28/2006 | US7006225 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 02/28/2006 | US7006208 Defect compensation of lithography on non-planar surface |
| 02/28/2006 | US7006200 Substrate exposure system |
| 02/28/2006 | US7005823 Positioning system and positioning method |
| 02/28/2006 | US7005364 Method for manufacturing semiconductor device |
| 02/28/2006 | US7005220 Method for structuring a lithography mask |
| 02/28/2006 | US7005219 Defect repair method employing non-defective pattern overlay and photoexposure |
| 02/28/2006 | US7005218 computers and/or software used for adjustment photomasks during fabrication integrated circuits |
| 02/28/2006 | US7005217 Chromeless phase shift mask |
| 02/28/2006 | US7005216 Krypton fluoride laser lithography; photoresist pattern |
| 02/28/2006 | US7005215 Mask repair using multiple exposures |
| 02/23/2006 | WO2006020194A2 Imprint alignment method, system, and template |
| 02/23/2006 | WO2006019617A1 Alignment using latent images |
| 02/23/2006 | WO2006019166A1 Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| 02/23/2006 | WO2005110755B1 Method for feeding a plate to an impression cylinder of a printing press, method for producing said plate and device for laterally aligning and guiding the tympan sheet of a cylinder that is to be fed to a printing press cylinder |
| 02/23/2006 | WO2005092043A3 Process for fabrication of printed circuit boards |
| 02/23/2006 | WO2005029181A3 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 02/23/2006 | US20060040191 Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus |
| 02/23/2006 | US20060040190 Providing a substrate with a photoresist coating;selecting a first mask image, selecting a plurality of second mask images, aligning, imaging and thereafter printing the first mask image onto the photoresist coating; sequentially aligning, imaging and printing |
| 02/23/2006 | US20060039011 Method and apparatus for manufacturing semiconductor device |
| 02/23/2006 | US20060038143 Virtual gauging method for use in lithographic processing |
| 02/23/2006 | US20060038142 Wafer prealignment apparatus, its method for judging wafer presence, method for sensing wafer edge position, computer-readable record medium with recorded program for executing this position sensing method, apparatus for sensing wafer edge position, and prealignment sensor |
| 02/23/2006 | DE10320135B4 Verfahren zum Positionieren von Bumpmasken Method for positioning Bumpmasken |
| 02/22/2006 | EP1628164A2 Method and apparatus for angular-resolved spectroscopic lithography characterisation |
| 02/22/2006 | CN1739066A Electron beam processing technology for mask repair |
| 02/22/2006 | CN1739065A Method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 02/22/2006 | CN1737694A Optical proximity correction using chamfers and rounding at corners |
| 02/22/2006 | CN1243285C Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/21/2006 | US7002667 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 02/21/2006 | US7002663 Both side projection exposure apparatus |
| 02/21/2006 | US7001835 Crystallographic modification of hard mask properties |
| 02/21/2006 | US7001830 System and method of pattern recognition and metrology structure for an X-initiative layout design |
| 02/21/2006 | US7001695 Multiple alternating phase shift technology for amplifying resolution |