| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/02/2006 | USRE39083 Projection exposure apparatus |
| 05/02/2006 | US7038777 Semiconductor wafer bearing alignment mark for use in aligning the wafer with exposure equipment, alignment system for producing alignment signals from the alignment mark, and method of determining the aligned state of a wafer from the alignment mark |
| 05/02/2006 | US7038760 Lithographic apparatus and device manufacturing method |
| 05/02/2006 | US7037628 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 04/27/2006 | US20060088773 Optical element with an opaque chrome coating having an aperture and method of making same |
| 04/27/2006 | US20060088770 Method and apparatus for contact hole unit cell formation |
| 04/27/2006 | US20060087639 System and method for using a two part cover for and a box for protecting a reticle |
| 04/27/2006 | US20060086910 Alignment systems and methods for lithographic systems |
| 04/25/2006 | US7036108 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 04/25/2006 | US7035759 Position detecting method and apparatus |
| 04/25/2006 | US7034921 Light receiving apparatus, mark detecting apparatus using light receiving apparatus, exposing apparatus, maintenance method of exposing apparatus, manufacturing method of semiconductor device using exposing apparatus and semiconductor manufacturing plant |
| 04/25/2006 | US7034917 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 04/25/2006 | US7033903 Method and apparatus for forming patterned photoresist layer |
| 04/25/2006 | US7033709 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 04/25/2006 | US7033450 Flexographic printing method |
| 04/25/2006 | US7032512 Reduce or eliminate ridges at the edges of printing plate, by reducing UV exposure to the edges, spraying masking material, automatic control the spray movement by computer, materials handling |
| 04/20/2006 | WO2006041777A1 Lithographic mask alignment |
| 04/20/2006 | US20060083997 Photomask with wavelength reduction material and pellicle |
| 04/20/2006 | US20060082775 Mark position detecting apparatus |
| 04/20/2006 | US20060081792 Alignment systems and methods for lithographic systems |
| 04/20/2006 | US20060081791 Alignment systems and methods for lithographic systems |
| 04/20/2006 | US20060081790 Alignment systems and methods for lithographic systems |
| 04/20/2006 | DE102004047661A1 Samples projecting method for use during integrated circuit manufacturing, involves structuring wafer layers with samples, and transferring correction parameters that are calculated as function of overlap values to wafer scanner and stepper |
| 04/20/2006 | DE102004047624A1 Semiconductor wafer overlapping accuracy correction method for production of integrated circuit, involves computing deflection of wafer from measuring values determined from alignment marks and correcting parameters based on deflection |
| 04/19/2006 | EP1647861A1 Lithographic apparatus and device manufacturing method |
| 04/19/2006 | EP1646502A1 Method and device for accurately positioning a pattern on a substrate |
| 04/19/2006 | EP1341676B1 Donor element for adjusting the focus of an imaging laser |
| 04/19/2006 | CN1760762A Lithographic apparatus and device manufacturing method |
| 04/19/2006 | CN1760754A Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices |
| 04/19/2006 | CN1252544C Proximity effect correction method of electronic beam exposure and use thereof |
| 04/19/2006 | CN1252543C Monitoring and etching method |
| 04/18/2006 | US7030962 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 04/18/2006 | US7030961 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/18/2006 | US7030506 Mask and method for using the mask in lithographic processing |
| 04/18/2006 | US7029804 Masking for projecting circuit pattern; radiation transparent substrate, dielectric layer; blocking layer over reflective layer; etching pattern; photolithography |
| 04/18/2006 | US7029802 Embedded bi-layer structure for attenuated phase shifting mask |
| 04/18/2006 | US7029801 Method of manufacturing mask for electron beam lithography and mask blank for electron beam lithography |
| 04/18/2006 | US7029800 Reticle with antistatic coating |
| 04/13/2006 | US20060078808 Method for measuring overlay and overlay mark used therefor |
| 04/13/2006 | US20060078807 Lithographic mask alignment |
| 04/12/2006 | EP1645910A1 Lithographic apparatus and position measuring method |
| 04/12/2006 | EP1285221B1 In-situ mirror characterization |
| 04/12/2006 | CN1758140A Lithographic apparatus and position measuring method |
| 04/12/2006 | CN1251305C Offset printing equipment, device producing method and produced device thereby |
| 04/12/2006 | CN1251020C Light mask and making method thereof |
| 04/11/2006 | US7027226 Diffractive optical element for extreme ultraviolet wavefront control |
| 04/11/2006 | US7027156 patterned layer is formed by curing an activating light curable liquid disposed on a substrate in the presence of a patterned template; particularly useful for micro- and nano-imprint lithography processes |
| 04/11/2006 | US7027128 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 04/11/2006 | US7027127 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 04/11/2006 | US7026102 Plasma deposited selective wetting material |
| 04/11/2006 | US7026082 Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby |
| 04/11/2006 | US7026081 Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
| 04/11/2006 | US7026078 Method of manufacturing photomask |
| 04/11/2006 | US7026076 Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 04/06/2006 | WO2006037027A1 Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask |
| 04/06/2006 | WO2006036019A2 Image recording device and image recording method |
| 04/06/2006 | WO2006036017A1 Method of calibrating alignment section, image-drawing device with calibrated alignment section, and conveying device |
| 04/06/2006 | US20060073425 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method |
| 04/06/2006 | US20060073417 Photopolymer plate and method for imaging the surface of a photopolymer plate |
| 04/06/2006 | US20060073397 Masking arrangement and method for producing integrated circuit arrangements |
| 04/06/2006 | US20060073273 Method for manufacturing optical elements |
| 04/06/2006 | US20060072096 Lithography alignment |
| 04/06/2006 | US20060071175 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof |
| 04/05/2006 | CN1756996A A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 04/05/2006 | CN1756992A Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 04/05/2006 | CN1755528A Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 04/05/2006 | CN1755527A Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 04/05/2006 | CN1249521C Mask and method for mfg. same, and method for manufacturing electric light emitting apparatus |
| 04/04/2006 | US7024284 Anti-vibration technique |
| 04/04/2006 | US7023521 Exposure apparatus, exposure method and process for producing device |
| 04/04/2006 | US7022439 Receiving the mask layout, and examining the polygon to determine if the polygon includes a hole exit route next to a notch; and if so, moving an exit route from the hole so that a resulting fracturing of the polygon does not create a sliver with a width less than a pre-specified minimum size |
| 04/04/2006 | US7022438 Fine contact aperture; overcoating transparent substrate with opaque pattern; phase shifting; photolithography |
| 04/04/2006 | US7022437 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface |
| 03/30/2006 | US20060068305 Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 03/30/2006 | US20060068304 Reduces an area necessary for alignment marks of an object while maintaining the minimum allowable gap among alignment marks on the same exposure mask |
| 03/30/2006 | US20060068299 Multi wavelength multi layer printing |
| 03/30/2006 | US20060065625 Periodic patterns and technique to control misalignment between two layers |
| 03/30/2006 | DE10345471B4 Justiermarke zur Grobjustage und Feinjustage eines Halbleiterwafers in einem Belichtungsgerät Alignment marks for coarse adjustment and fine tuning of a semiconductor wafer in an exposure apparatus |
| 03/30/2006 | DE102004044083A1 Verfahren zur Strukturierung eines Substrats und Vorrichtung hierzu A process for patterning a substrate and device for this purpose |
| 03/29/2006 | CN1754245A An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/29/2006 | CN1248058C Position measuring device |
| 03/29/2006 | CN1248050C Base board for optical mask and its mfg. method, optical mask blank and optical mask |
| 03/29/2006 | CN1248049C Mask mfg. method |
| 03/28/2006 | US7020348 Device for exposure of a strip-shaped workpiece with a meander correction device |
| 03/28/2006 | US7019836 Position detection method and apparatus, and exposure method and apparatus |
| 03/28/2006 | US7019815 Off-axis leveling in lithographic projection apparatus |
| 03/28/2006 | US7019814 Lithographic projection mask, device manufacturing method, and device manufactured thereby |
| 03/28/2006 | US7018932 Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device |
| 03/28/2006 | US7018788 Phase shifting lithographic process |
| 03/28/2006 | US7018753 Variable mask field exposure |
| 03/28/2006 | US7018748 Process for producing hard masks |
| 03/28/2006 | US7018747 Photomask having line end phase anchors |
| 03/28/2006 | US7018746 Defining a unique image property linked to the accurate placement of the assist features, and combines that with in-situ image simulation of the individual layout; individual device on the photomask layout are marked with error marker shapes to be subsequently corrected; computer readable media |
| 03/23/2006 | WO2006030727A1 Correction method and exposure device |
| 03/23/2006 | US20060063076 Pseudo low volume reticle (PLVR) design for asic manufacturing |
| 03/23/2006 | DE10342775B4 Verfahren zur Ausrichtung eines Halbleiterwafers und Justiermarke A method of aligning a semiconductor wafer alignment mark and |
| 03/23/2006 | DE102004063522A1 Verfahren zur Korrektur von strukturgrößenabhängigen Platzierungsfehlern bei der photolithographischen Projektion mittels eines Belichtungsapparats und dessen Verwendung A process for correction of feature size dependent placement errors in the projection by means of a photolithographic exposure apparatus and the use thereof |
| 03/22/2006 | EP1636655A2 Method of designing a reticle and forming a semiconductor device therewith |
| 03/22/2006 | EP1240557A4 Imaging method using phase boundary masking with modified illumination |
| 03/22/2006 | CN1751378A Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus |