| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 06/07/2006 | EP1664925A2 Imprint lithography templates having alignment marks |
| 06/07/2006 | EP1579274A4 Method and system for context-specific mask inspection |
| 06/07/2006 | CN1782880A Scanner system |
| 06/06/2006 | US7058474 Multi-layer printed circuit board fabrication system and method |
| 06/06/2006 | US7057715 Lithography tool test patterns and method |
| 06/06/2006 | US7057707 Method and device for adjusting an alignment microscope by means of a reflective alignment mask |
| 06/06/2006 | US7057706 Exposure device |
| 06/06/2006 | US7057261 Mixed LVR and HVR reticle set design for the processing of gate arrays, embedded arrays and rapid chip products |
| 06/06/2006 | US7057193 Exposure apparatus |
| 06/06/2006 | US7056805 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/06/2006 | US7056631 Exposure system and method with group compensation |
| 06/06/2006 | US7056627 forming stress correction film between reflection film for reflecting exposure light on substrates and absorber layers for absorbing exposure light; multilayers used for pattern transfer of semiconductors |
| 06/06/2006 | US7056626 Crystallization apparatus, crystallization method, thin film transistor and display apparatus |
| 06/06/2006 | US7056625 Focus detection structure |
| 06/06/2006 | US7056623 Depositing a first material on a substrate and applying a thermal treatment to the substrate at >300 degrees Celsius before completing the deposition of the first material; stress relieving; dimensional stability; flatness; semiconductors |
| 06/06/2006 | US7055432 Apparatus and method for conveying material to an imaging drum |
| 06/01/2006 | WO2006057263A1 Mobile body system, exposure apparatus, and method of producing device |
| 06/01/2006 | US20060117293 Method for designing an overlay mark |
| 06/01/2006 | US20060115753 Method and apparatus for performing target-image-based optical proximity correction |
| 06/01/2006 | US20060115751 Automated overlay metrology system |
| 06/01/2006 | US20060115748 Sidelobe suppression in radiated patterning |
| 06/01/2006 | US20060113280 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 06/01/2006 | DE10115888B4 Verfahren zur Einzelmaskenkalibrierung Process for individual calibration mask |
| 05/31/2006 | EP1662327A2 Substrate Table, Method of Measuring a Position of a Substrate and a Lithographic Apparatus |
| 05/31/2006 | EP1660948A2 Pattern recognition and metrology structure for an x-initiative layout design |
| 05/31/2006 | CN1781049A Method and apparatus for determining the focal position during imaging of a sample |
| 05/30/2006 | US7054007 Adjust pattern using optics; calibration adjustment substrate; forming semiconductors |
| 05/30/2006 | US7053990 System to increase throughput in a dual substrate stage double exposure lithography system |
| 05/30/2006 | US7053984 Method and systems for improving focus accuracy in a lithography system |
| 05/30/2006 | US7053980 Lithographic alignment system |
| 05/30/2006 | US7053394 Recording device of master disk for information recording medium |
| 05/30/2006 | US7053390 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| 05/30/2006 | US7052810 exposing and developing a testing photoresist layer using a test photo mask to form hole patterns corresponding to first hole patterns; measuring photoresist critical dimensions (pCDs) of the second hole patterns on the test photoresist layer; determining correction of mask critical dimention (mCDs) |
| 05/30/2006 | US7052808 Transmission mask with differential attenuation to improve ISO-dense proximity |
| 05/30/2006 | US7052806 Exposure controlling photomask and production method therefor |
| 05/30/2006 | US7052464 Alignment method for fabrication of integrated ultrasonic transducer array |
| 05/26/2006 | WO2006054255A1 Optical system for detecting motion of a body |
| 05/25/2006 | US20060110665 Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
| 05/25/2006 | US20060109435 Lithographic apparatus and device manufacturing method |
| 05/25/2006 | US20060108541 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 05/24/2006 | EP1659452A1 Latent overlay metrology |
| 05/24/2006 | DE102004055037A1 Semiconductor wafer`s alignment marks finding method for e.g. dynamic RAM, involves imaging marks and structures on photoresist of wafer by imaging device, and measuring real position of marks relative to reference system of device |
| 05/24/2006 | DE102004029722B4 Preparation machine for bending printing plates to be fastened to roller in printing machine has stepping motor and vertical and horizontal actuators for bending system |
| 05/24/2006 | CN1776526A Warm-up flash two-purpose nano impression device |
| 05/24/2006 | CN1257439C Punching device for printing original |
| 05/24/2006 | CN1257437C Exposure device and method for transfering photomask and workpiece |
| 05/23/2006 | US7050716 Exposure device |
| 05/23/2006 | US7050156 Method to increase throughput in a dual substrate stage double exposure lithography system |
| 05/23/2006 | US7050153 Exposure apparatus |
| 05/23/2006 | US7050151 Exposure apparatus, exposure method, and device manufacturing method |
| 05/23/2006 | US7050150 Exposure apparatus |
| 05/23/2006 | US7049618 Virtual gauging method for use in lithographic processing |
| 05/23/2006 | US7049617 Thickness measurement in an exposure device for exposure of a film with a hologram mask, exposure method and semiconductor device manufacturing method |
| 05/23/2006 | US7049611 Charged-particle beam lithographic system |
| 05/23/2006 | US7049608 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/23/2006 | US7049035 electrochemically depositing an additive material on exposed sidewalls of an etched first layer of the mask whose top remains covered by a hardmask used during the etching of the first layer; a second layer beneath the etched first layer is resistant to the electrochemical deposition of the additive |
| 05/23/2006 | US7049034 Photomask having an internal substantially transparent etch stop layer |
| 05/23/2006 | US7049033 direct modulation in complex-valued reflectance of the multilayer; a spatially localized energy source writes a reticle pattern onto the reflective multilayer coating; interdiffusion causes the multilayer period to contract in the exposed region |
| 05/18/2006 | WO2005059655A3 A process for the fabrication of optical microstructures |
| 05/18/2006 | US20060107248 Generating mask patterns for alternating phase-shift mask lithography |
| 05/18/2006 | US20060106566 Position detecting method and apparatus |
| 05/18/2006 | US20060105250 Test photomask and compensation method using the same |
| 05/18/2006 | US20060105249 Exposure mask and method of manufacturing the same |
| 05/18/2006 | US20060103845 Position detection apparatus and method |
| 05/17/2006 | CN1774674A Masking arrangement and method for producing integrated circuit arrangements |
| 05/17/2006 | CN1774667A Optical arrangement of autofocus elements for use with immersion lithography |
| 05/17/2006 | CN1256622C Active optical close correction method |
| 05/16/2006 | US7046408 Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment |
| 05/16/2006 | US7046333 Exposure method |
| 05/16/2006 | US7046332 Exposure system and method with group compensation |
| 05/16/2006 | US7046330 Exposure apparatus |
| 05/16/2006 | US7046266 Scanner system |
| 05/16/2006 | US7045909 Alignment mark structure |
| 05/16/2006 | US7045908 Semiconductor device and method for manufacturing the same |
| 05/16/2006 | US7045256 Invention uses a focused ion-beam exposure of the surface of the exposure mask to purposely "damage" this surface over the area where the opaque material is required to be present; accuracy, nonpeeling |
| 05/16/2006 | US7045255 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 05/16/2006 | US7045254 A photomask for making a semiconductor, photolithography, phase shifting, a quartz layer with grooves |
| 05/11/2006 | US20060099520 Method and resulting structure for mosaic of multi-transmission rate optical mask structures |
| 05/10/2006 | EP1655777A1 In-print method and in-print device |
| 05/10/2006 | CN1770010A Lithographic apparatus |
| 05/10/2006 | CN1255855C Mask base board and its producing method |
| 05/09/2006 | US7042576 Positioning stage device |
| 05/09/2006 | US7042554 Removable reticle window and support frame using magnetic force |
| 05/09/2006 | US7042550 Device manufacturing method and computer program |
| 05/09/2006 | US7041996 Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby |
| 05/09/2006 | US7041418 Window between pattern layout; projecting laser beams; determination, calibration reflection |
| 05/04/2006 | WO2006046682A1 Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method |
| 05/04/2006 | WO2006046428A1 Mark position detection device, design method, and evaluation method |
| 05/04/2006 | WO2005065303A3 Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use |
| 05/04/2006 | US20060095227 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 05/04/2006 | US20060093971 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 05/04/2006 | US20060091330 Alignment systems and methods for lithographic systems |
| 05/04/2006 | DE102004052155A1 Justiervorrichtung zur hochgenauen Positionierung eines Objekts Adjusting device for highly accurate positioning of an object |
| 05/03/2006 | EP1653288A1 Apparatus and method for optical position assessment |
| 05/03/2006 | EP1653280A1 Pattern exposing system and pattern exposing method |
| 05/03/2006 | EP1652006A1 Psm alignment method and device |
| 05/03/2006 | CN2777600Y Chromium-free film layer phase shift light shade |
| 05/03/2006 | CN1766740A Optical position assessment apparatus and method |
| 05/03/2006 | CN1766738A Method and apparatus for recording images on deformed image-recordable object |
| 05/03/2006 | CN1254848C Manufacturing method of photo mask and semiconductor device |