| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/11/2006 | US7075621 Alignment method |
| 07/11/2006 | US7075618 Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method |
| 07/11/2006 | US7075616 Lithographic apparatus and device manufacturing method |
| 07/11/2006 | US7075198 Alignment apparatus and exposure apparatus using the same |
| 07/11/2006 | US7074530 Continuous gray levels, the change in light intensity between each gray level is both finite and linear, produces a smoother and more linear profile on the object being made, meets the sub-resolution requirements of most optical tools |
| 07/11/2006 | US7074528 Photomasks having offset aperatures that mitigates anisotropic optical diffraction, improves illumination and focusing, photolithography |
| 07/11/2006 | US7074527 Method for fabricating a mask using a hardmask and method for making a semiconductor device using the same |
| 07/11/2006 | US7074526 Prevention damage; isolation patterns of light blocking and light transmission zones; photolithography |
| 07/11/2006 | US7074525 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping |
| 07/11/2006 | US7074524 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same |
| 07/11/2006 | US7073441 Image recording apparatus |
| 07/06/2006 | US20060147821 Lithographic apparatus and device manufacturing method |
| 07/06/2006 | US20060147820 Phase contrast alignment method and apparatus for nano imprint lithography |
| 07/05/2006 | EP1677158A2 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 07/05/2006 | EP1677157A2 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness |
| 07/05/2006 | EP1677152A1 Polarized radiation in lithographic apparatus and device manufacturing method |
| 07/05/2006 | EP1676174A2 Apparatus and method for aligning surfaces |
| 07/05/2006 | EP1025464B1 Composite relief image printing plates |
| 07/05/2006 | CN1799122A Method of measuring focus deviation in pattern exposure and pattern exposure method |
| 07/05/2006 | CN1799004A Applications of semiconductor nano-sized particles for photolithography |
| 07/05/2006 | CN1797204A Lithographic apparatus with multiple alignment arrangements and alignment measuring method |
| 07/05/2006 | CN1263357C Scanning method |
| 07/05/2006 | CN1262885C Parallel processing type optical range finder |
| 07/04/2006 | US7073161 Methods of forming patterned reticles |
| 07/04/2006 | US7072441 Alignment diffractometer |
| 07/04/2006 | US7072040 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus |
| 07/04/2006 | US7072027 Exposure apparatus, method of controlling same, and method of manufacturing devices |
| 07/04/2006 | US7072024 Lithographic projection method and apparatus |
| 07/04/2006 | US7072023 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 07/04/2006 | US7070891 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 07/04/2006 | US7070889 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 07/04/2006 | US7070888 Method of selecting photomask blank substrates |
| 07/04/2006 | US7070887 Photolithographic mask |
| 06/29/2006 | US20060141374 Lithographic apparatus with multiple alignment arrangements and alignment measuring method |
| 06/29/2006 | US20060141373 Lithographic apparatus and device manufacturing method |
| 06/29/2006 | US20060141371 Method for making a photomask assembly incorporating a porous frame |
| 06/29/2006 | US20060138682 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 06/29/2006 | US20060138410 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 06/28/2006 | EP1675165A2 Method and system for 3D alignment in wafer scale integration |
| 06/28/2006 | EP1674939A1 Level sensor, lithographic apparatus and device manufacturing method |
| 06/28/2006 | EP1674938A1 Lithographic Apparatus with multiple Alignment Arrangements and Alignment Measurement Method |
| 06/28/2006 | EP1674937A2 Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method |
| 06/28/2006 | EP1192410A4 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 06/28/2006 | CN2791702Y Exposuring machine structure of printed circuit board |
| 06/28/2006 | CN1261828C Optical mask with alignment measuring mark and its detecting method |
| 06/28/2006 | CN1261825C Exposure system and method with group compensation function |
| 06/28/2006 | CN1261824C Exposure system and method |
| 06/28/2006 | CN1261820C Photoetching equipment having vacuum mask plate store connected with vacuum chamber |
| 06/27/2006 | US7069114 Anti-vibration technique |
| 06/27/2006 | US7067931 Self-compensating mark design for stepper alignment |
| 06/27/2006 | US7067826 Position detection method and apparatus |
| 06/27/2006 | US7067764 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 06/27/2006 | US7067223 coating masking layers comprising inorganic phosphates having a nonlinear refractive index, to radiation transparent substrates, then applying photoresist, developing, etching to form miniature patterns and stripping the photoresists; integrated circuits; photolithography |
| 06/27/2006 | US7067220 Pattern compensation techniques for charged particle lithographic masks |
| 06/22/2006 | US20060134535 Lensed fiber array for sub-micron optical lithography patterning |
| 06/22/2006 | US20060134534 Photomask and method for maintaining optical properties of the same |
| 06/22/2006 | US20060132807 Periodic patterns and technique to control misalignment between two layers |
| 06/22/2006 | US20060132590 Scanner system |
| 06/22/2006 | US20060130969 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 06/21/2006 | EP1672680A1 Exposure apparatus, exposure method, and device producing method |
| 06/21/2006 | EP1137970B1 Method and device for aligning two photo masks with each other and an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 06/21/2006 | CN1260621C Method for removing shading defects of light mask and semiconductor device manufacturing method thereof |
| 06/20/2006 | US7065737 Multi-layer overlay measurement and correction technique for IC manufacturing |
| 06/20/2006 | US7064807 Lithographic apparatus |
| 06/20/2006 | US7064044 Contact etching utilizing multi-layer hard mask |
| 06/20/2006 | US7063923 Integrated circuit layout to transfer to a semiconductor wafer includes dense figures and a isolated figure surrounded by dummy patterns to reduce the difference in pattern density; transmitted light provides a phase difference of 0 or 180 degrees relative to a transmitted light of the layout; photomask |
| 06/20/2006 | US7063920 Configuring an array of micro-mirrors in a deep ultraviolet maskless photolithography system by generating an ideal mask layout representative of image characteristics associated with a desired image; next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout |
| 06/15/2006 | WO2005038523A3 Imprint lithography templates having alignment marks |
| 06/15/2006 | US20060128041 Misalignment test structure and method thereof |
| 06/15/2006 | US20060127824 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 06/15/2006 | US20060127522 Lithographic apparatus for molding ultrafine features |
| 06/15/2006 | US20060126916 Template generating method and apparatus of the same, pattern detecting method, position detecting method and apparatus of the same, exposure apparatus and method of the same, device manufacturing method and template generating program |
| 06/15/2006 | US20060126051 Exposure apparatus |
| 06/14/2006 | EP1669808A2 Substrate placement in immersion lithography |
| 06/14/2006 | EP1669802A2 Imprinting machine and device manufacturing method |
| 06/14/2006 | EP1668414A2 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 06/14/2006 | CN1788237A Method for evaluating the effects of multiple exposure processes in lithography |
| 06/14/2006 | CN1259597C Light cover combination and exposure method for forming threadlet pattern therewith |
| 06/13/2006 | US7062747 Method and apparatus for prepareing patterns used for manufacture of semiconductor device |
| 06/13/2006 | US7062354 Multi-layer printed circuit board fabrication system and method |
| 06/13/2006 | US7062010 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 06/13/2006 | US7060994 Exposure apparatus and method |
| 06/13/2006 | US7060519 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/13/2006 | US7060403 In-situ pellicle monitor |
| 06/13/2006 | US7060402 rotating a template about a first and a second axis to with respect to the substrate, maintaining the orientation in response to a force being exerted upon said template; photolithograghy for semiconductor wafers |
| 06/13/2006 | US7060400 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 06/13/2006 | US7060397 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 06/13/2006 | US7060395 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/13/2006 | US7060324 Moving a liquid between a substrate and a template, forming an oblique angle in a plane reducing the distance between substrate and plane and forming a dispersion |
| 06/08/2006 | WO2006060562A2 Method for designing an overlay mark |
| 06/08/2006 | WO2006060528A2 A method for forming a semiconductor device with gate sidewall apacers of specific dimensions |
| 06/08/2006 | WO2006059634A1 Stage device and exposure apparatus |
| 06/08/2006 | WO2006059457A1 Alignment device |
| 06/08/2006 | US20060121374 Method for determining pattern misalignment over a substrate |
| 06/08/2006 | US20060121373 Method and structure for manufacturing bonded substrates using multiple photolithography tools |
| 06/08/2006 | US20060121368 Photomask structure and method of reducing lens aberration and pattern displacement |
| 06/08/2006 | DE10233205B4 Verfahren zur Korrektur von lokalen Loading-Effekten beim Ätzen von Photomasken Method of correcting local loading effects during etching photomasks |
| 06/07/2006 | EP1664936A2 Forming partial-depth features in polymer film |
| 06/07/2006 | EP1664932A2 Interferometric analysis of surfaces |
| 06/07/2006 | EP1664931A2 Surface triangulation and profiling through a thin film coating |