| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 08/30/2006 | EP1694506A1 Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed |
| 08/30/2006 | CN1272843C Method and system for phase/amplitude error detection of alternate phase shifting mask in photolithography |
| 08/30/2006 | CN1272840C Marked location detector |
| 08/30/2006 | CN1272673C An integrated circuit using a reflective mask |
| 08/29/2006 | US7100146 Design system of alignment marks for semiconductor manufacture |
| 08/29/2006 | US7099011 Method and apparatus for self-referenced projection lens distortion mapping |
| 08/29/2006 | US7099010 Due to the symmetry of the structure, the overlay accuracy in the first direction may be determined on the basis of the same reference data as used for the second, so that establishing libraries is simplified. |
| 08/29/2006 | US7098572 Apparatus to control displacement of a body spaced-apart from a surface |
| 08/29/2006 | US7098464 Electron beam writing equipment and electron beam writing method |
| 08/29/2006 | US7098046 Alignment method and exposure apparatus using the method |
| 08/29/2006 | US7097947 Method for correcting local loading effects in the etching of photomasks |
| 08/29/2006 | US7097946 For use insemiconductor manufacturing; lithography |
| 08/24/2006 | WO2006088098A1 Xy stage |
| 08/24/2006 | US20060188793 Adjustable Transmission Phase Shift Mask |
| 08/24/2006 | US20060187436 Method and system for improving focus accuracy in a lithography system |
| 08/24/2006 | US20060187432 Exposure apparatus, exposure method, and method for producing device |
| 08/24/2006 | DE10315086B4 Verfahren und Vorrichtung zum Ausrichten von Halbleiterwafern bei der Halbleiterherstellung Method and apparatus for aligning the semiconductor wafers in the semiconductor manufacturing |
| 08/23/2006 | CN1823294A Alignment of elements of a display apparatus |
| 08/22/2006 | US7095499 Method of measuring alignment of a substrate with respect to a reference alignment mark |
| 08/22/2006 | US7094507 Method for determining an optimal absorber stack geometry of a lithographic reflection mask |
| 08/22/2006 | US7094504 Faster, lower cost production of phase shift device |
| 08/22/2006 | US7094503 Nanopastes for use as patterning compositions |
| 08/17/2006 | WO2006085556A1 Image forming device and image forming method |
| 08/17/2006 | DE10330467B4 Verfahren zur Erstellung von alternierenden Phasenmasken Process for the preparation of alternating phase masks |
| 08/17/2006 | DE102005005896A1 Beleuchtungsvorrichtung Lighting device |
| 08/16/2006 | CN1819922A Method and device for accurately positioning a pattern on a substrate |
| 08/16/2006 | CN1818797A Light-intensity data bus system and method |
| 08/16/2006 | CN1818796A Light-intensity data bus system and bus controller |
| 08/16/2006 | CN1818794A Exposure apparatus |
| 08/15/2006 | US7093227 Methods of forming patterned reticles |
| 08/15/2006 | US7092069 Projection exposure method and projection exposure system |
| 08/15/2006 | US7092063 Method for designing mask and fabricating panel |
| 08/15/2006 | US7090964 custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided |
| 08/15/2006 | US7090949 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 08/15/2006 | US7090948 Reflection mask and method for fabricating the reflection mask |
| 08/10/2006 | WO2006082639A1 Mark image processing method, program and device |
| 08/10/2006 | WO2006022309A3 Substrate positioning mechanism, substrate positioning method, substrate conveying device, and image forming device |
| 08/10/2006 | US20060176459 Off-axis levelling in lithographic projection apparatus |
| 08/10/2006 | US20060176458 Lithographic apparatus and device manufacturing method |
| 08/10/2006 | DE10329865B4 Verfahren zur Steuerung einer Abfolge von Meßschritten für die Justage eines Halbleiterwafers in einem Belichtungsapparat A method of controlling a sequence of measurement steps for the adjustment of a semiconductor wafer in an exposure apparatus |
| 08/10/2006 | DE102005005124A1 Light exposure mask device, has adjustment frame with vacuum channel for aligning and fixing work piece carrier and frame together, and another vacuum channel for aligning and fixing mask and frame together |
| 08/09/2006 | CN1268981C Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 08/08/2006 | US7088429 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider |
| 08/08/2006 | US7088384 Image recorder for punching hole by movable punching element |
| 08/08/2006 | US7087947 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 08/08/2006 | US7087352 Measurement by adjustment lithography exposure of light; detection of interference pattern; spectral curves stored in library |
| 08/03/2006 | WO2006058192A3 Multiple layer alignment sensing |
| 08/03/2006 | DE102005004357A1 Vorrichtung zur Vorbereitung von Platten für eine Anordnung an einer Trageinrichtung Apparatus for preparing plates for an arrangement of a supporting device |
| 08/02/2006 | EP1686423A2 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system |
| 08/02/2006 | EP1614009B1 Masking arrangement and method for producing integrated circuit arrangements |
| 08/02/2006 | CN1811599A High resolution lithography system and method |
| 08/02/2006 | CN1267788C Exposure device detecting mask, exposure device detecting method and exposure device |
| 08/01/2006 | US7086031 Methods of forming patterned reticles |
| 08/01/2006 | US7084987 Method and system to interferometrically detect an alignment mark |
| 08/01/2006 | US7084962 Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer |
| 08/01/2006 | US7084955 Lithographic apparatus |
| 08/01/2006 | US7084534 Alignment stage apparatus |
| 08/01/2006 | US7083882 Coating method for a color filter and aligning-assembling method by using the same |
| 08/01/2006 | US7083881 Attenuation; phase shifting; multilayer; buffer thin film coupling to substrate; etching circuit pattern |
| 08/01/2006 | US7083879 Phase conflict resolution for photolithographic masks |
| 07/27/2006 | US20060166453 Method and apparatus for forming patterned photosensitive material layer |
| 07/26/2006 | CN1808625A Flat roof device |
| 07/26/2006 | CN1808287A Position aligning system for projection exposure apparatus and position aligning method thereof |
| 07/26/2006 | CN1808281A Projection exposure apparatus and method |
| 07/26/2006 | CN1808277A Control method for coaxial alignment signal acquisition and processing, and key subsystem thereof |
| 07/26/2006 | CN1808270A Exposure method and exposure processing unit |
| 07/26/2006 | CN1266551C Method for removing colour light resistance in exposure positioning producing technology |
| 07/26/2006 | CN1266546C Device for exposing printed circuit board |
| 07/25/2006 | US7081950 Stage device and control method therefor, exposure apparatus, and device manufacturing method |
| 07/25/2006 | US7081948 System for automated focus measuring of a lithography tool |
| 07/25/2006 | US7081945 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor |
| 07/25/2006 | US7081943 Lithographic apparatus and device manufacturing method |
| 07/25/2006 | US7081914 Image recorder |
| 07/25/2006 | US7081322 Nanopastes as ink-jet compositions for printing plates |
| 07/20/2006 | US20060158651 Scatterometry alignment for imprint lithography |
| 07/20/2006 | US20060158650 Substrate processing apparatus |
| 07/20/2006 | US20060158630 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 07/20/2006 | US20060158474 Method and device for accurately positioning a pattern on a substrate |
| 07/19/2006 | CN1804726A Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 07/19/2006 | CN1804725A Apparatus and method for supporting and thermally conditioning a substrate, a support table, a chuck and a lithographic apparatus comprising said support table |
| 07/19/2006 | CN1265248C Photoetching with micro trace photoresist detecting pattern and its detecting method |
| 07/19/2006 | CN1265215C Generation of library of periodic grating diffraction signals |
| 07/18/2006 | US7079222 Exposure apparatus |
| 07/18/2006 | US7079221 Exposure apparatus and exposure method |
| 07/18/2006 | US7078700 Optics for extreme ultraviolet lithography |
| 07/18/2006 | US7078136 Thermally-generated mask pattern |
| 07/18/2006 | US7078135 Mask can be used independently of its height tolerances and of the membrane holder to be mounted thereon for a distortion-free lithographic imaging |
| 07/18/2006 | US7078133 Photolithographic mask |
| 07/13/2006 | US20060152723 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 07/13/2006 | US20060152703 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
| 07/13/2006 | US20060152699 Exposure apparatus and method for producing device |
| 07/13/2006 | DE4107762B4 Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess A method for producing master and work pattern plates for the etching process |
| 07/13/2006 | DE10324866B4 Verfahren zum Herstellen eines magnetischen Direktzugriffsspeichers A method of manufacturing a magnetic random access memory |
| 07/13/2006 | DE102005056916A1 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 07/12/2006 | EP1550002B1 Photomask assembly incorporating a porous frame and method for making it |
| 07/12/2006 | CN1800991A Scanning exposure apparatus and method |
| 07/12/2006 | CN1800987A A method of generating a mask having optical proximity correction features and parts manufacturing method |
| 07/12/2006 | CN1264198C Optical masks, manufacture method thereof and manufacture method of electronic elements |
| 07/12/2006 | CN1264064C Method for managing photochemical light intensity transient change and its equipment |
| 07/12/2006 | CN1263997C Distortion measurement method and exposure equipment |