| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/18/2006 | CN1280677C A method of substrate processing and photoresist exposure |
| 10/17/2006 | US7123362 Method for aligning wafer |
| 10/17/2006 | US7123345 Automatic focusing apparatus |
| 10/17/2006 | US7122282 Mask pattern forming method and patterning method using the mask pattern |
| 10/17/2006 | US7122281 Defining critical edge portions of the features with a full phase shifting mask (FPSM) includes a first set of cuts between adjacent phase shifters to resolve phase conflicts; a computer software |
| 10/17/2006 | US7121496 Method and system for correcting web deformation during a roll-to-roll process |
| 10/12/2006 | WO2006106746A1 Plotting point data acquisition method and device, plotting method and device |
| 10/12/2006 | US20060227313 Exposure apparatus |
| 10/12/2006 | US20060226118 Methods for forming backside alignment markers useable in semiconductor lithography |
| 10/11/2006 | EP1709490A1 Differential critical dimension and overlay metrology apparatus and measurement method |
| 10/11/2006 | CN1846174A Photomask and method for maintaining optical properties of the same |
| 10/11/2006 | CN1279404C Photoetching device, component manufacturing method and component therefrom |
| 10/11/2006 | CN1279403C Method for producing photoetching equipment and device |
| 10/10/2006 | US7119952 Optical instrument, exposure apparatus, and device manufacturing method |
| 10/10/2006 | US7119879 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 10/10/2006 | US7118833 Forming partial-depth features in polymer film |
| 10/10/2006 | US7117790 Microcontact printing |
| 10/05/2006 | WO2006105326A1 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 10/05/2006 | WO2005074606A3 Method of photolithography using a fluid and a system thereof |
| 10/05/2006 | US20060222962 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 10/04/2006 | EP1708028A2 Optical element, exposure apparatus, and device manufacturing method |
| 10/04/2006 | CN1841661A Semiconductor manufacture method |
| 10/04/2006 | CN1278190C Projection exposure device, position alignment device and position alignment method |
| 10/04/2006 | CN1278188C 曝光机构和曝光方法 Exposure institutions and exposure method |
| 10/04/2006 | CN1278182C Mask graphics producing method and mask graphics producing device |
| 10/03/2006 | US7116401 Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method |
| 10/03/2006 | US7116398 Lithographic apparatus and device manufacturing method |
| 10/03/2006 | US7115435 Manufacturing method for wiring substrates |
| 10/03/2006 | US7115343 Methods of designing photomasks and optimizing lithographic and etch processes used in microelectronics manufacturing; subresolution assist features |
| 10/03/2006 | US7114938 Lithographic apparatus for molding ultrafine features |
| 09/28/2006 | WO2006101024A1 Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method |
| 09/28/2006 | US20060214519 Alignment apparatus and exposure apparatus using the same |
| 09/28/2006 | US20060214518 Alignment stage apparatus |
| 09/28/2006 | US20060213053 Double layer patterning and technique for milling patterns for a servo recording head |
| 09/27/2006 | EP1194731A4 Interferometric apparatus and method that compensate refractive index fluctuations |
| 09/27/2006 | CN1838845A Apparatus for fabricating electroluminescent display device |
| 09/27/2006 | CN1838844A Apparatus for fabricating electroluminescent display device |
| 09/27/2006 | CN1277299C Substrate calibrating apparatus, its processing device and delivery apparatus |
| 09/27/2006 | CN1277152C Original negative, exposure method and original negative making method |
| 09/26/2006 | US7113260 Projection exposure system for microlithography and method for generating microlithographic images |
| 09/26/2006 | US7113258 Lithographic apparatus |
| 09/26/2006 | US7113257 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus |
| 09/26/2006 | US7113256 Lithographic apparatus and device manufacturing method with feed-forward focus control |
| 09/26/2006 | US7112890 Tunable alignment geometry |
| 09/26/2006 | US7112813 Device inspection method and apparatus using an asymmetric marker |
| 09/21/2006 | US20060210893 Method and system for overlay control using dual metrology sampling |
| 09/21/2006 | US20060210891 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 09/21/2006 | DE102005009554A1 Exposure device`s e.g. projector, focus correcting method for semiconductor manufacturing system, involves executing focus correction of illuminating devices based on focus values of devices for correcting dimensional accuracy of image |
| 09/20/2006 | EP1454112A4 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 09/20/2006 | CN1276306C Processing method, and mfg. method for semiconductor |
| 09/19/2006 | US7110116 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 09/19/2006 | US7110082 Optical system for maskless lithography |
| 09/19/2006 | US7110081 Lithographic apparatus and device manufacturing method |
| 09/19/2006 | US7109511 Techniques for wafer prealignment and sensing edge positions |
| 09/19/2006 | US7109510 Method and apparatus for aligning a substrate on a stage |
| 09/19/2006 | US7109508 Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| 09/19/2006 | US7109500 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask |
| 09/19/2006 | US7108946 Integrated circuit manufacturing; improved alignment and resolution |
| 09/19/2006 | US7108945 Photomask having a focus monitor pattern |
| 09/14/2006 | WO2006095605A1 Light source unit for alignment, alignment apparatus, exposure apparatus, digital exposure apparatus, alignment method, exposure method and method for setting lighting apparatus condition |
| 09/14/2006 | US20060206237 Anti-vibration technique |
| 09/14/2006 | US20060204863 photoresists; liquid crystal display panels |
| 09/14/2006 | US20060203223 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider |
| 09/14/2006 | US20060203219 Exposure method |
| 09/13/2006 | EP1700170A1 Lithographic apparatus and method of measurement |
| 09/13/2006 | EP1700169A1 Direct alignment in mask aligners |
| 09/13/2006 | EP1700165A2 Lithographic apparatus and method of calibration |
| 09/13/2006 | EP1483628A4 Full phase shifting mask in damascene process |
| 09/13/2006 | CN1831652A Projection exposure apparatus |
| 09/13/2006 | CN1275097C Projection exposure equipment |
| 09/13/2006 | CN1275092C Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 09/12/2006 | US7107573 Method for setting mask pattern and illumination condition |
| 09/12/2006 | US7107572 Methods of forming patterned reticles |
| 09/12/2006 | US7106444 Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method |
| 09/12/2006 | US7105278 Exposing a photosensitive surface to light through a mask with a transmissivity to light and a plurality of features in a dense nonuniform repetitive pattern for forming structures in a semiconductor pattern; symmetry is broken without altering the semiconductor features that are formed |
| 09/12/2006 | US7105255 EUV reflection mask and lithographic process using the same |
| 09/12/2006 | US7104535 Methods and apparatus for positioning a substrate relative to a support stage |
| 09/07/2006 | US20060199088 Laser etched fiducials in roll-roll display |
| 09/07/2006 | US20060199086 System and method for creating a color filter for a display panel |
| 09/07/2006 | US20060199085 Method and device for adjusting an alignment microscope by means of a reflective alignment mask |
| 09/07/2006 | US20060199083 Method and apparatus for identifying and correcting phase conflicts |
| 09/06/2006 | EP1697771A2 A process for the fabrication of optical microstructures |
| 09/06/2006 | CN1828431A Automatic position aligning device and method for projection exposure device |
| 09/06/2006 | CN1828427A Step scan photo-etching machine double-platform exchanging and positioning system |
| 09/06/2006 | CN1274083C Etching method, etched product, piezoelectric vibration device and making method thereof |
| 09/06/2006 | CN1273873C Multi-tone photomask and method for manufacturing the same |
| 09/05/2006 | US7103497 Position detecting device and position detecting method |
| 09/05/2006 | US7103210 Position detection apparatus and exposure apparatus |
| 09/05/2006 | US7102749 Overlay alignment mark design |
| 09/05/2006 | US7102736 Method of calibration, calibration substrate, and method of device manufacture |
| 09/05/2006 | US7102243 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 09/05/2006 | US7101645 Reflective mask for short wavelength lithography |
| 08/31/2006 | WO2006091482A2 Autofocus methods and devices for lithography |
| 08/31/2006 | WO2006090914A1 Calibration method for image rendering device and image rendering device |
| 08/31/2006 | WO2006090823A1 Method for correcting alignment function |
| 08/31/2006 | WO2006090580A1 Method and mechanism for positioning and holding sheet body and drawing device using the method and the mechanism |
| 08/31/2006 | US20060194123 Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus |
| 08/31/2006 | US20060193432 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 08/31/2006 | US20060192302 Self-compensating mark design for stepper alignment |
| 08/31/2006 | DE10345476B4 Lithographische Maske und Verfahren zum Bedecken einer Maskenschicht Lithographic mask and method for covering a mask layer |