G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
12/2006
12/13/2006	CN1879064A Pattern recognition and metrology structure for an X-initiative layout design
12/13/2006	CN1879063A Differential critical dimension and overlay metrology device and measurement method
12/13/2006	CN1877457A Processing method, manufacturing method of semiconductor device, and processing apparatus
12/13/2006	CN1290155C Exposure device, surface position regulating unit and method for making mask and device
12/13/2006	CN1289968C Photoetching mask, its making method and making appts.
12/13/2006	CN1289967C Photoetching projection device and method for fabricating same
12/13/2006	CN1289963C Pellicle for lithography
12/12/2006	US7149998 Lithography process modeling of asymmetric patterns
12/12/2006	US7148973 Position detecting method and apparatus, exposure apparatus and device manufacturing method
12/12/2006	US7148959 Test pattern, inspection method, and device manufacturing method
12/12/2006	US7148956 Exposure method
12/12/2006	US7147976 Binary OPC for assist feature layout optimization
12/12/2006	US7147975 For forming a fine pattern in fabrication of semiconductor integrated circuit devices
12/12/2006	US7147973 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
12/07/2006	WO2006129711A1 Evaluation system and evaluation method
12/07/2006	WO2005067815A8 Stage alignment in lithography tools
12/07/2006	US20060275708 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer
12/06/2006	EP1728106A1 Method for imaging regular patterns
12/06/2006	CN1288508C Inspecting method of functions of projection optical system of exposure device and photomask for inspection
12/06/2006	CN1288506C Method for manufacturing photoetching equipment and device
12/06/2006	CN1288505C System and method for improving line width control in photoetching apparatus
12/06/2006	CN1288504C Method for producing photoetching device and equipment
12/05/2006	US7146599 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
12/05/2006	US7145666 Position detecting method and apparatus
11/2006
11/30/2006	WO2005106597A3 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/30/2006	US20060269848 photomasks; photoresists; lithography; quartz (transparent) substrate with film formed thereon
11/30/2006	US20060269122 Position detection apparatus and exposure apparatus
11/30/2006	US20060268250 Lithographic apparatus and device manufacturing method
11/30/2006	DE102006024390A1 Übertragungsvorrichtung Transfer device
11/29/2006	EP1726991A2 Micro-contact-printing engine
11/29/2006	CN1871556A Imprint lithography templates having alignment marks
11/29/2006	CN1871555A Forming partial-depth features in polymer film
11/28/2006	US7143390 Method for creating alternating phase masks
11/28/2006	US7142314 Wafer stage position calibration method and system
11/28/2006	US7142284 Position detector, position detecting method, and exposure apparatus having the same
11/28/2006	US7141813 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus
11/28/2006	US7141339 Process for manufacturing half-tone phase shifting mask blanks
11/28/2006	US7141338 Reducing corner rounding and image shortening
11/28/2006	US7141337 Can improve the disadvantage of transmission imbalance occurred in the phase shift region and the non-phase shift region of the alternating phase shift mask and simultaneously solve the problem of the selective chromeless phase shift mask failing to transfer a sense pattern
11/28/2006	US7140298 Method for evaluating planographic printing plates and quality-control method thereof
11/27/2006	CA2546194A1 Micro-contact-printing engine
11/23/2006	US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same
11/23/2006	US20060263699 Methods for forming arrays of a small, closely spaced features
11/23/2006	US20060262326 Periodic patterns and technique to control misalignment between two layers
11/22/2006	EP1723472A2 Euv light source optical elements
11/22/2006	EP1723467A2 Method of photolithography using a fluid and a system thereof
11/22/2006	CN1286146C System for making electronic apparatus
11/21/2006	US7139064 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same
11/16/2006	US20060257790 A semiconductor device structure and methods of manufacturing thereof
11/16/2006	US20060257750 Reticle alignment and overlay for multiple reticle process
11/15/2006	EP1721215A1 Method for the production of masks used in photolithography, and use of such masks
11/15/2006	EP1285222A4 Interferometric apparatus and method
11/15/2006	CN1285012C Optical proximity correcting method
11/15/2006	CN1285009C Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
11/14/2006	US7136166 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment
11/14/2006	US7136165 Substrate alignment apparatus and method, and exposure apparatus
11/14/2006	US7136152 Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle
11/14/2006	US7136151 Reticle gripper barrier system for lithography use
11/14/2006	US7136150 Imprint lithography template having opaque alignment marks
11/14/2006	US7136146 Exposure device and exposure method
11/14/2006	US7135257 Multi-step phase shift mask and methods for fabrication thereof
11/14/2006	US7135256 Forming a layer of a chemically amplified photoresist over a substrate;baking the photoresist, then forming a non-conductive, DUV transmissive, environmental barrier layer; shelf life of one week or greater
11/14/2006	US7135255 Layout impact reduction with angled phase shapes
11/09/2006	WO2006118134A1 Drawing apparatus and drawing method
11/09/2006	WO2006118133A1 Work position information acquisition method and device
11/09/2006	US20060250596 Exposure apparatus and method for producing device
11/08/2006	CN1284049C Exposure method for exposure device
11/07/2006	US7133121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
11/07/2006	US7133117 Dual sided lithographic substrate imaging
11/07/2006	US7132671 Substrate testing device and substrate testing method
11/07/2006	US7132206 Heating through a filter, controlling the ultraviolet radiation wavelength, applying a consistent heat flux
11/07/2006	US7132203 Masking for layers of integrated circuits; automatic detection phase shift zones patterns; controlling; mdel for fitting between exposure pattern and targets; photolithography
11/02/2006	WO2006115438A1 A method for measuring the position of a mark in a micro lithographic deflector system
11/02/2006	EP1717845A1 Exposure apparatus and exposure method, and device producing method
11/02/2006	EP1512112A4 Use of overlay diagnostics for enhanced automatic process control
11/02/2006	DE102005007280A1 Critical dimension determination for laterally structured layer on substrate of microelectronic or micromechanical semiconductor chip, involves using formed test mark to determine critical dimension of laterally structured layer
11/01/2006	CN1856739A Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination
11/01/2006	CN1854909A Method and apparatus for positioning a mask
11/01/2006	CN1854901A Lithogaphic apparatus and positioning apparatus
10/2006
10/31/2006	US7131102 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
10/31/2006	US7130049 Method of measurement, method for providing alignment marks, and device manufacturing method
10/26/2006	WO2006112484A1 Convey error measuring method, calibration method, plotting method, exposure plotting method, plotting device, and exposure plotting device
10/26/2006	WO2006060528A3 A method for forming a semiconductor device with gate sidewall apacers of specific dimensions
10/26/2006	US20060241894 Position detecting device and position detecting method
10/26/2006	US20060240344 Method of manufacture of polymer arrays
10/26/2006	US20060240341 Mask, manufacturing method for mask, and manufacturing method for semiconductor device
10/26/2006	US20060237338 Substrate containing case
10/26/2006	DE102005018743A1 Verfahren zum Erkennen einer Lackkante auf einem Wafer A method for recognizing a paint edge on a wafer
10/25/2006	CN1282040C Exposure method and exposure device
10/24/2006	US7127319 Reducing asymmetrically deposited film induced registration error
10/24/2006	US7126689 Exposure method, exposure apparatus, and method for producing device
10/24/2006	US7126670 Position measurement technique
10/24/2006	US7126231 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
10/24/2006	US7125651 Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
10/24/2006	US7125521 Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area
10/24/2006	US7124687 Positioning device, especially for offset plates
10/19/2006	US20060236295 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
10/19/2006	US20060234142 Covering with a photoresist mask most but not all of a quartz base coated with a phase shifting material coated with chromium; thinning exposed chromium; removing the first mask; forming second thinner photomask patterned over thinned Cr area; transferring pattern from the second mask to main-field area
10/19/2006	US20060234141 Single trench repair method with etched quartz for attenuated phase shifting mask
10/18/2006	CN2828877Y Exposure device

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