| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/13/2007 | US7175943 Multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking |
| 02/13/2007 | US7175942 can be automated to quickly and easily avoid phase shifting segment conflict; |
| 02/13/2007 | US7175941 alternate phase shift mask suitable for projecting images of isolated holes, densely packed holes, and arbitrary mixes of isolated and densely packed holes |
| 02/08/2007 | WO2007014451A1 Method and system for vertically aligning tile images of an area of interest of an integrated circuit |
| 02/08/2007 | WO2006097645A8 Optical measuring device using optical triangulation |
| 02/08/2007 | US20070031743 Alignment and alignment marks |
| 02/08/2007 | US20070031738 Method and system for printing lithographic images with multiple exposures |
| 02/08/2007 | US20070031736 Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination |
| 02/08/2007 | US20070030465 Exposure apparatus and a device manfacturing method using the same |
| 02/08/2007 | DE112005000660T5 Methoden und Systeme zum Messen einer Eigenschaften eines Substrats oder zur Vorbereitung eines Substrats zur Analyse Methods and systems for measuring properties of a substrate or the preparation of a substrate for analysis |
| 02/08/2007 | DE102006033450A1 Substrate for production of photomask, e.g. for integrated circuit production, has alignment markers formed from material of structured conductive layer and kept at specified potential by conductive connecting lines |
| 02/07/2007 | CN1908814A Method for mask design |
| 02/07/2007 | CN1299170C Scanning exposuring device |
| 02/07/2007 | CN1299169C Manufacturing method of photoetching apparatus and device |
| 02/07/2007 | CN1299164C Method for eliminating key size deviation of dense pattern and single pattern |
| 02/06/2007 | US7173716 Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices |
| 02/06/2007 | US7172840 Photomask features with interior nonprinting window using alternating phase shifting |
| 02/06/2007 | US7172839 Preventing surface damage; coarse focused ion etching followed by gas assisted electron beam removal of thin film contaminated with gallium |
| 02/06/2007 | US7172788 Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device |
| 02/01/2007 | WO2007013612A1 Plotting method and device |
| 02/01/2007 | WO2007013140A1 Aligning method |
| 02/01/2007 | WO2006113135A3 Method for determining and correcting reticle variations |
| 02/01/2007 | WO2005076935A3 Wavelength filtering in nanolithography |
| 01/31/2007 | EP1586008A4 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/31/2007 | CN1904737A Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/30/2007 | US7171034 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 01/30/2007 | US7170604 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 01/30/2007 | US7170603 Position detection apparatus and exposure apparatus |
| 01/30/2007 | US7170580 Lithographic apparatus, projection system, method of projecting and device manufacturing method |
| 01/30/2007 | US7169515 A data processing system containing a machine readable data storage medium with instructions for laying out a photolithographic mask, coupled to a processor; integrated circuits; electromagnetic waveform computer program for assigning phase shifting regions |
| 01/25/2007 | WO2007010971A1 Stage device |
| 01/25/2007 | US20070019197 Position detecting method and apparatus |
| 01/24/2007 | CN1902468A Phase shift photomask and method for improving printability of a structure on a wafer |
| 01/24/2007 | CN1296925C Displacement detecting method, displacement detecting device and recording device of information recording medium original disk |
| 01/24/2007 | CN1296774C Method for manufacturing photoetching device and component |
| 01/23/2007 | US7166855 Surface position detecting system and method |
| 01/23/2007 | US7166395 Pattern containing openings; flash exposure; sizing to align apertures with images |
| 01/18/2007 | WO2007007549A1 Surface position detection apparatus, exposure apparatus, and exposure method |
| 01/18/2007 | US20070014920 Micro-contact-printing engine |
| 01/17/2007 | EP1744217A1 Method of selecting a grid model for correcting grid deformations in a lithographic apparatus and lithographic assembly using the same |
| 01/17/2007 | EP1742893A2 Composite patterning devices for soft lithography |
| 01/16/2007 | US7164463 Lithographic tool with dual isolation system and method for configuring the same |
| 01/11/2007 | US20070011112 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 01/11/2007 | US20070009813 Method of manufacturing liquid crystal display device |
| 01/11/2007 | DE102004010902B4 Verfahren zum Übertragen eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat Method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 01/10/2007 | EP1742111A2 Imaging optical system and exposure apparatus |
| 01/10/2007 | CN1894602A A process for the fabrication of optical microstructures |
| 01/10/2007 | CN1294624C Manufacturing method of semiconductor device |
| 01/09/2007 | US7160657 Reference wafer and process for manufacturing same |
| 01/09/2007 | US7160656 Method for determining pattern misalignment over a substrate |
| 01/09/2007 | US7160655 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 01/09/2007 | US7160654 Method of the adjustable matching map system in lithography |
| 01/09/2007 | US7160651 Enabling the pitch of features on the mask to be decreased by removing the chrome line between features, and thus remove the limit based on the size of the chrome line; may include primary features surrounded by a boundary region including sub resolution features; high precision lithography |
| 01/09/2007 | US7160650 Method of inspecting a mask |
| 01/04/2007 | WO2007001023A1 Substrate manufacturing method and exposure apparatus |
| 01/04/2007 | WO2007000921A1 Exposure apparatus and exposure method |
| 01/04/2007 | WO2007000890A1 Image position measuring apparatus and exposure apparatus |
| 01/04/2007 | US20070004053 Tunable alignment geometry |
| 01/04/2007 | US20070003874 Exposing a resist on a substrate to a rectangularly-shaped shot from an electron beam to form a non-angled feature; altering the rotational orientation by a predetermined angle; and forming a 2nd feature by exposing to a 2nd shot from the new angle to form an angled feature |
| 01/04/2007 | US20070003844 Method for adjusting dimensions of photomask features |
| 01/04/2007 | US20070003841 Forms first and second patterns on a cell region and a peripheral circuit region of a wafer; The double exposure method uses the single photomask together with different illuminating systems, exposure time so there is a decrease in exposure time and the exposure numbers; simplification |
| 01/04/2007 | US20070002323 Mark position detection apparatus |
| 01/03/2007 | CN1890100A Method and apparatus for printing a patterned layer on a flatsubstrate with a flat-type-bed |
| 01/03/2007 | CN1888979A Electronic beam exposure process sample wafer step-by-step positioning error dynamic compensating system |
| 01/03/2007 | CN1293639C Memory array with loop line pattern structure and fabricating method thereof |
| 01/03/2007 | CN1293427C Photoelectric device, its substrate and manufacture, and electronic apparatus |
| 01/02/2007 | US7158236 Heterodyne laser interferometer for measuring wafer stage translation |
| 01/02/2007 | US7158233 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 01/02/2007 | US7158232 Substrate processing apparatus |
| 01/02/2007 | US7158213 Lithographic tool with dual isolation system and method for configuring the same |
| 01/02/2007 | US7157194 Integrated circuits; data processing; electronics |
| 01/02/2007 | US7157191 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 01/02/2007 | US7157189 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer |
| 12/28/2006 | WO2006137396A1 Exposing method and device |
| 12/28/2006 | WO2006097645A3 Optical measuring device using optical triangulation |
| 12/28/2006 | WO2006078791A3 Systems, masks and methods for printing contact holes and other patterns |
| 12/28/2006 | US20060292463 Analyzing front side mark behavior on a substrate during an integrated circuit manufacturing process, without the need of etching global alignment marks; Chemical Mechanical Polishing |
| 12/28/2006 | US20060292455 Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask |
| 12/28/2006 | DE19817714B4 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 12/27/2006 | EP1736976A2 Compound objective lens having two focal points and apparatus using the lens |
| 12/27/2006 | CN1292496C Pattern formation of device |
| 12/27/2006 | CN1292311C Aligning method, aligning substrate, photoetching device and component manufacturing method |
| 12/26/2006 | US7154582 Exposure apparatus and method |
| 12/26/2006 | US7154537 Camera system, control method thereof, device manufacturing apparatus, exposure apparatus, and device manufacturing method |
| 12/26/2006 | US7154113 Techniques for wafer prealignment and sensing edge position |
| 12/26/2006 | US7153618 provides excellent color filters without defects; providing a transparent base film; arranging a light-to-heat conversion film on the transparent base film using one of an organic chemical compound and a metallic material |
| 12/21/2006 | WO2006091482A3 Autofocus methods and devices for lithography |
| 12/21/2006 | US20060286490 Methods of making templates for use in imprint lithography and related structures |
| 12/21/2006 | US20060285098 Method for determining focus deviation amount in pattern exposure and pattern exposure method |
| 12/20/2006 | EP1499474B1 Positioning device, especially for offset plates |
| 12/20/2006 | CN1881088A 扫描仪系统 The scanner system |
| 12/19/2006 | US7150949 Further method to pattern a substrate |
| 12/19/2006 | US7150948 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 12/19/2006 | US7150946 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
| 12/19/2006 | US7150811 Ion beam for target recovery |
| 12/14/2006 | WO2006036019A3 Image recording device and image recording method |
| 12/14/2006 | US20060281019 Photomask and method of manufacturing the same |
| 12/13/2006 | EP1731963A2 Mold, pattern forming method, and pattern forming apparatus |
| 12/13/2006 | EP1730595A2 Method involving a mask or a reticle |
| 12/13/2006 | EP1730477A1 Embedded attenuated phase shift mask with tunable transmission |