| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 04/03/2007 | US7199493 Alignment stage apparatus |
| 04/03/2007 | US7198873 Lithographic processing optimization based on hypersampled correlations |
| 03/29/2007 | WO2007034379A2 System for detecting motion of a body |
| 03/29/2007 | US20070072099 used to correct for drift, or thermal expansion, or gravitational sag in fabrication of a semiconductor device or a photomask/reticle; using optical measurement to register the particle beam to the pre-existing pattern |
| 03/29/2007 | US20070072094 Photomask features with chromeless nonprinting phase shifting window |
| 03/29/2007 | US20070072093 Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light |
| 03/29/2007 | US20070072091 Reference wafer and process for manufacturing same |
| 03/29/2007 | US20070069666 Apparatus for processing an object with high position accurancy |
| 03/29/2007 | US20070069400 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 03/28/2007 | CN1938851A Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement |
| 03/28/2007 | CN1936711A Alignment system for photoetching device and stage jointing grating system |
| 03/28/2007 | CN1936710A Alignment mark and its producing method |
| 03/27/2007 | US7197176 Mark position detecting apparatus and mark position detecting method |
| 03/27/2007 | US7197108 Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask |
| 03/27/2007 | US7196429 Method of reducing film stress on overlay mark |
| 03/27/2007 | US7195846 Methods of manufacturing photomask blank and photomask |
| 03/27/2007 | US7195845 Spin-coating method, determination method for spin-coating condition and mask blank |
| 03/27/2007 | US7195733 Provides stamps, molds and photomasks used in soft lithography fabrication methods for generating high resolution patterns of structures on flat and contoured surfaces, including surfaces having a large radius of curvature on a wide variety of substrates |
| 03/22/2007 | WO2007031842A1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 03/22/2007 | WO2007031105A1 Alignment method with compensation of non linear errors |
| 03/22/2007 | WO2007031049A1 Device for determining the relative position of two substantially flat elements |
| 03/22/2007 | DE102006018139A1 Transskriptionseinrichtung Transskriptionseinrichtung |
| 03/22/2007 | DE102005044375A1 Automated positioning method for objects, involves carrying out of approximate adjustment on basis of existing coordinate information and fine adjustment on basis of coordinate information determined from additional information |
| 03/22/2007 | DE102004021415B4 Verfahren zum Strukturbelichten einer photoreaktiven Schicht und zugehörige Be lichtungsvorrichtung A method for exposing a photo-reactive layer structure and related Be clearing device |
| 03/22/2007 | CA2622359A1 Device for determining the relative position between two essentially flat elements |
| 03/21/2007 | EP1764655A2 Lithographic apparatus and device manufacturing method |
| 03/21/2007 | CN1932653A Stack type alignment mark and photoetching process aligning method |
| 03/21/2007 | CN1932647A Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus |
| 03/21/2007 | CN1306341C Digital photoetching system and method on object |
| 03/20/2007 | US7193722 Lithographic apparatus with disturbance correction system and device manufacturing method |
| 03/20/2007 | US7193715 Measurement of overlay using diffraction gratings when overlay exceeds the grating period |
| 03/20/2007 | US7193686 Lithography apparatus and method for measuring alignment mark |
| 03/20/2007 | US7193685 Exposure apparatus |
| 03/20/2007 | US7193684 Pattern mask and exposure for photoresists for patterns and reflection |
| 03/20/2007 | US7193339 Positioning apparatus and charged-particle-beam exposure apparatus |
| 03/20/2007 | US7193232 Lithographic apparatus and device manufacturing method with substrate measurement not through liquid |
| 03/20/2007 | US7193231 Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby |
| 03/20/2007 | US7193228 EUV light source optical elements |
| 03/20/2007 | US7191618 Large-sized substrate and method of producing the same |
| 03/13/2007 | US7190760 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 03/13/2007 | US7190456 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 03/13/2007 | US7190455 Alignment method and apparatus and exposure apparatus |
| 03/13/2007 | US7189495 Method of forming photoresist pattern free from side-lobe phenomenon |
| 03/13/2007 | US7189481 Characterizing flare of a projection lens |
| 03/13/2007 | US7189479 Phototool coating |
| 03/13/2007 | US7189014 Production process of light amount-adjusting member, light amount-adjusting member, light amount-adjusting device and photographing apparatus |
| 03/08/2007 | WO2005119395A3 Method and system to control movement of a body for nano-scale manufacturing |
| 03/08/2007 | US20070054205 Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment |
| 03/08/2007 | US20070052941 Exposure apparatus and device manufacturing method |
| 03/08/2007 | DE102004009095B4 Verfahren zum Bestimmen der Überlagerungsgenauigkeit einer Maskenstruktur auf einer Halbleiterschicht anhand von Justiermarken A method for determining the overlay accuracy of a mask pattern on a semiconductor layer based on alignment marks |
| 03/07/2007 | EP1760525A1 Device manufacturing method, mask and device |
| 03/07/2007 | CN1924712A Two-sets location switching system |
| 03/07/2007 | CN1924711A Method for producing absolute zero-position alignment marks by semi-reflective zero-position grating |
| 03/07/2007 | CN1303649C Exposure device, exposure method and element making method |
| 03/07/2007 | CN1303474C Optical proximity correction for phase shifting photolithographic masks |
| 03/06/2007 | US7187429 Alignment method, exposure apparatus and device fabrication method |
| 03/06/2007 | US7186488 Semiconductor device manufacturing method and semiconductor device manufacturing system |
| 03/06/2007 | US7186486 Method to pattern a substrate |
| 03/06/2007 | US7186485 Inspection method and a photomask |
| 03/06/2007 | US7186484 Method for determining the relative positional accuracy of two structure elements on a wafer |
| 03/06/2007 | US7186483 Method of determining alignment of a template and a substrate having a liquid disposed therebetween |
| 03/06/2007 | US7186481 Flare measuring mask and flare measuring method of semiconductor aligner |
| 03/06/2007 | US7186480 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 03/06/2007 | US7186350 Providing a substrate with an alignment mark;forming a color resist layer over the substrate and the alignment mark;injecting a solvent to contact the color resist over the alignment mark and dissolve the color resist; removal of the dissolved color resist by vacuum suction to expose alignment mark |
| 02/28/2007 | EP1393127A4 Backside alignment system and method |
| 02/28/2007 | CN1920674A Manufacturing system in electronic devices |
| 02/28/2007 | CN1920668A Silicon wafer platform height control system and method in projection type photoetching machine |
| 02/28/2007 | CN1302337C Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method |
| 02/27/2007 | US7184594 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| 02/27/2007 | US7184129 Positioning method, and positioning apparatus |
| 02/27/2007 | US7183025 Phase difference specifying method |
| 02/22/2007 | WO2007019677A1 Printing plate registration using a camera |
| 02/22/2007 | US20070040133 Lithographic apparatus and device manufacturing method |
| 02/22/2007 | DE102005056916A9 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 02/21/2007 | EP1755152A1 Measuring method, measuring equipment, exposing method and exposing equipment |
| 02/21/2007 | EP1754122A2 Method and system to control movement of a body for nano-scale manufacturing |
| 02/21/2007 | EP1753622A1 Method for feeding a plate to an impression cylinder of a printing press, method for producing said plate and device for laterally aligning and guiding the tympan sheet of a cylinder that is to be fed to a printing press cylinder |
| 02/21/2007 | CN1918518A Lithographic apparatus and method of measurement |
| 02/21/2007 | CN1918516A Lithographic apparatus, method of calibration |
| 02/21/2007 | CN1917982A Photomask and method for conveying information associated with a photomask substrate |
| 02/21/2007 | CN1916758A Method for photo mask, and correcting exposure machine |
| 02/21/2007 | CN1916718A Substrate alignment apparatus, substrate processing apparatus, and substrate transfer apparatus |
| 02/21/2007 | CN1916561A Interferometer for measuring perpendicular translations |
| 02/21/2007 | CN1301443C Background exposure method and equipment using said method |
| 02/20/2007 | US7179571 Apparatus for characterization of photoresist resolution, and method of use |
| 02/20/2007 | US7179569 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 02/20/2007 | US7179568 Microelectronics; coating mask with photoresist containing fluorescent dye; exposure to radiation; development |
| 02/15/2007 | WO2007018029A1 Exposure device and object to be exposed |
| 02/15/2007 | US20070037077 Substrate holder and device manufacturing method |
| 02/15/2007 | US20070037073 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate |
| 02/15/2007 | US20070035731 Direct alignment in mask aligners |
| 02/15/2007 | US20070035711 Exposure apparatus and method for producing device |
| 02/15/2007 | DE102006021507A1 Übertragungsvorrichtung Transfer device |
| 02/14/2007 | EP1753017A1 Analysis method, exposing equipment and exposing equipment system |
| 02/14/2007 | EP1751623A2 High speed lithography machine and method |
| 02/14/2007 | CN1912747A Implementing method of alignment process in electron beam exposure |
| 02/13/2007 | US7177008 Exposure apparatus and method |
| 02/13/2007 | US7175952 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 02/13/2007 | US7175951 Two mask in-situ overlay checking method |
| 02/13/2007 | US7175945 Phase shifting zones for separation of light source used to determine the quality of photolithographic prints |