| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/29/2007 | US7224436 Lithographic apparatus and device manufacturing method |
| 05/29/2007 | US7223674 Methods for forming backside alignment markers useable in semiconductor lithography |
| 05/24/2007 | WO2007058151A1 Plane position detecting apparatus, exposure apparatus and device manufacturing method |
| 05/24/2007 | US20070117029 Exposure pattern or mask and inspection method and manufacture method for the same |
| 05/24/2007 | US20070115471 Wafer, exposure mask, method of detecting mark and method of exposure |
| 05/24/2007 | US20070114450 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/24/2007 | DE102006052015A1 Positionsmessvorrichtung und Positionsabweichungsmessverfahren Position measuring device and position deviation measurement method |
| 05/23/2007 | EP1788617A1 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate |
| 05/23/2007 | EP1788451A1 Binary sinusoidal sub-wavelength gratings as alignment marks |
| 05/23/2007 | CN1969370A Analysis method, exposing equipment and exposing equipment system |
| 05/23/2007 | CN1967386A Wafer platform mask platform synchronous control system of step-scan photoetching machine |
| 05/22/2007 | US7222327 Photo mask, method of manufacturing photo mask, and method of generating mask data |
| 05/22/2007 | US7222228 System and method for secure management or remote systems |
| 05/22/2007 | US7221431 Exposure apparatus |
| 05/22/2007 | US7221060 Composite alignment mark scheme for multi-layers in lithography |
| 05/22/2007 | US7220975 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/22/2007 | US7220521 Fabrication method of semiconductor device |
| 05/18/2007 | WO2005092025A3 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 05/17/2007 | US20070111465 Mask, mask blank, and methods of producing these |
| 05/17/2007 | US20070111116 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/17/2007 | US20070111114 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 05/17/2007 | US20070109515 Exposure apparatus and an exposure method |
| 05/16/2007 | EP1786024A1 Method of optical lithography using phase shift masking |
| 05/16/2007 | EP1785746A2 Wafer level manufacturing of optical elements |
| 05/16/2007 | EP1730477A4 Embedded attenuated phase shift mask with tunable transmission |
| 05/16/2007 | CN1965389A Substrate holding device, exposure device having the same, exposure method, method for producing device, and liquid repellent plate |
| 05/16/2007 | CN1963679A Alignment mark structure for aligning wafer |
| 05/16/2007 | CN1316616C Design of lithography alignment and overlay measurement marks on CMP finished damascene surface |
| 05/16/2007 | CN1315817C Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer |
| 05/15/2007 | US7218464 Aligning-assembling method for color wheel |
| 05/15/2007 | US7218400 In-situ overlay alignment |
| 05/15/2007 | US7218399 Method and apparatus for measuring optical overlay deviation |
| 05/15/2007 | US7218379 Scanning exposure apparatus and method |
| 05/15/2007 | US7218335 Image recording apparatus and image recording method |
| 05/15/2007 | US7217581 Misalignment test structure and method thereof |
| 05/10/2007 | WO2007030704A3 System and method for mask verification using an individual mask error model |
| 05/10/2007 | WO2007026174A3 Method of printing |
| 05/10/2007 | US20070105276 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105029 semiconductors; lithography; etching; microelectronics |
| 05/10/2007 | US20070105028 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/10/2007 | US20070105026 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105025 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070102819 Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement |
| 05/10/2007 | US20070102651 includes semiconductor substrate and bottom coupled die |
| 05/09/2007 | EP1784071A1 Apparatus to prepare a multilayer printed circuit board for contact hole drilling |
| 05/09/2007 | EP1782456A1 Exposure apparatus, exposure method, and exposure mask |
| 05/09/2007 | EP1614000A4 Optical arrangement of autofocus elements for use with immersion lithography |
| 05/09/2007 | CN1961407A Exposing equipment, exposing method, and manufacturing method for element |
| 05/09/2007 | CN1315174C Method for manufacturing liquid discharging head |
| 05/09/2007 | CN1315165C Method for manufacturing semiconductor, electro-optical device, integrated circuit and electronic device |
| 05/08/2007 | US7214452 Using perfluoropoly-ethers to form pellicles |
| 05/03/2007 | US20070099098 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched |
| 05/03/2007 | US20070099097 Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same |
| 05/03/2007 | US20070099091 Method of the adjustable matching map system in lithography |
| 05/03/2007 | US20070097314 Process for the fabrication of optical microstructures |
| 05/03/2007 | DE102004014482B4 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks |
| 05/02/2007 | CN1313886C Device manufacturing method |
| 05/01/2007 | US7212286 When a plurality of measurement marks exist related a shot, measurement marks to be used for alignment are selected therefrom independently of each other. |
| 05/01/2007 | US7212275 Exposure apparatus with laser device |
| 05/01/2007 | US7211815 Masking; printing a pattern using; determination, calibration, adjustment |
| 05/01/2007 | US7211369 VLSI-based system for durable high-density information storage |
| 05/01/2007 | US7211354 Mask substrate and its manufacturing method |
| 05/01/2007 | CA2228986C Material and process for covering the edges of photopolymerizable printing plates for flexographic printing |
| 04/26/2007 | WO2007046408A1 Plotting device and plotting method |
| 04/26/2007 | WO2007046407A1 Template data creating method and apparatus, template matching method and apparatus, and drawing method and apparatus |
| 04/26/2007 | US20070093079 Imprinting method and imprinting apparatus |
| 04/26/2007 | DE10255623B4 Verfahren zum Justieren eines Wafers in einem Photolithographieverfahren Method for adjusting a wafer in a photolithography process |
| 04/25/2007 | EP1777072A2 Process for producing a printing form |
| 04/25/2007 | CN1312782C Position mask part of combine mask provided for producing organic luminous diode |
| 04/25/2007 | CN1312530C Master mask, exposure monitor method, exposure method and semiconductordevice mfg method |
| 04/24/2007 | US7209235 Accurate positioning of components of a optical assembly |
| 04/24/2007 | US7209220 System for using a two part cover for and a box for protecting a reticle |
| 04/24/2007 | US7209219 System for controlling a position of a mass |
| 04/24/2007 | US7208249 Selecting a photoresist which provides a sufficiently dense structure to sterically hinder the movement of photoacid generator groups which have been written upon, and wherein photoresist includes photoacid-generator groups |
| 04/19/2007 | WO2007043324A1 Exposure apparatus |
| 04/19/2007 | WO2007043323A1 Photomask and exposure method using same |
| 04/19/2007 | WO2005047974A3 Measurement and compensation of errors in interferometers |
| 04/19/2007 | US20070087272 Method for preparing a phase-shifting mask and method for preparing a semiconductor device using the phase-shifting mask |
| 04/18/2007 | EP1774407A2 System and method for improvement of alignment and overlay for microlithography |
| 04/18/2007 | CN1949087A Aligning system of photoetching apparatus and steping combined system of said aligning system thereof |
| 04/17/2007 | US7206058 Off-axis levelling in lithographic projection apparatus |
| 04/17/2007 | US7205078 Determining the backscattering intensity by using the reflection coefficient (rn), the transmission coefficient (tn), and the scatter distribution. |
| 04/17/2007 | US7205075 Method of forming a vertical memory device with a rectangular trench |
| 04/17/2007 | US7205074 Venting of pellicle cavity for a mask |
| 04/17/2007 | US7204686 Parallelism adjustment device |
| 04/12/2007 | US20070082277 Process margin using discrete assist features |
| 04/12/2007 | US20070081161 Alignment method and apparatus and exposure apparatus |
| 04/11/2007 | CN1947069A Exposure apparatus |
| 04/11/2007 | CN1947064A 曝光图案形成方法 Exposure pattern forming method |
| 04/10/2007 | US7202938 Off-axis levelling in lithographic projection apparatus |
| 04/10/2007 | US7202148 Method utilizing compensation features in semiconductor processing |
| 04/05/2007 | WO2007038134A2 Method of aligning a particle-beam-generated pattern to a pattern on pre-patterned substrate |
| 04/05/2007 | WO2006072583A3 Method for beam calibration and usage of a calibration body |
| 04/05/2007 | US20070077503 Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key |
| 04/05/2007 | US20070076843 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 04/05/2007 | US20070076303 Optical arrangement of autofocus elements for use with immersion lithography |
| 04/04/2007 | CN1940734A Four-quadrant aligning device of mask transmission system |
| 04/04/2007 | CN1940727A Lithographic apparatus and device manufacturing method |
| 04/04/2007 | CN1309017C Exposure method and device |
| 04/03/2007 | US7199878 Scan exposure apparatus and method, and device manufacturing method |