| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/18/2007 | EP1602007A4 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 07/17/2007 | US7245351 Alignment mark for coarse alignment and fine alignment of a semiconductor wafer in an exposure tool |
| 07/17/2007 | US7245349 Exposure apparatus |
| 07/17/2007 | US7244623 Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern |
| 07/17/2007 | US7244534 Device manufacturing method |
| 07/17/2007 | US7244533 Accurately aligning a second layer pattern formed in a photoresist layer on a first layer pattern formed in a substrate |
| 07/17/2007 | US7244334 Apparatus used in reshaping a surface of a photoresist |
| 07/12/2007 | WO2007077926A1 Pattern forming method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method |
| 07/12/2007 | WO2007077925A1 Pattern formation method, pattern formation device, and device fabrication method |
| 07/12/2007 | WO2007077920A1 Exposure device and fabrication method thereof |
| 07/12/2007 | US20070160918 irradiating illumination light onto a mask to transfer (offset) mask patterns to a semiconductor substrate; narrow spacing; reduce the dimensional variation of the outmost pattern |
| 07/12/2007 | US20070160915 Phase shifting mask having a calibration feature and method therefor |
| 07/12/2007 | DE10335816B4 Verfahren zur Justage eines Substrates vor der Durchführung eines Projektionsschrittes in einem Belichtungsgerät A process for the adjustment of a substrate prior to performing a step in a projection exposure apparatus |
| 07/11/2007 | EP1806774A1 Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method |
| 07/11/2007 | EP1036415B1 Wafer level integration of multiple optical elements |
| 07/11/2007 | CN1997869A Application of scatterometry alignment in imprint lithography |
| 07/11/2007 | CN1997491A Method and system to control movement of a body for nano-scale manufacturing |
| 07/11/2007 | CN1326204C Grating alignment procedure |
| 07/11/2007 | CN1325996C Exposure method, exposure device and manufacture method of device |
| 07/11/2007 | CN1325994C Phase shifting mask without Cr film layer, its mfg. method, and fabricating method for semiconductor |
| 07/11/2007 | CN1325993C Mask correcting method |
| 07/10/2007 | US7242477 Apparatus and methods for detecting overlay errors using scatterometry |
| 07/10/2007 | US7242476 Alignment measuring system and method of determining alignment in a photolithography process |
| 07/10/2007 | US7242455 Exposure apparatus and method for producing device |
| 07/10/2007 | US7241664 Alignment mark forming method, substrate in which devices are formed, and liquid discharging head using substrate |
| 07/10/2007 | US7241542 Process for controlling the proximity effect correction |
| 07/10/2007 | US7241541 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched |
| 07/05/2007 | WO2007044827A8 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 07/05/2007 | US20070154824 calculating an offset of focus position based on information of the shape of the pattern, calculating the offset of the exposure dose based on the shift amount and the offset of the focus position; less likely to be affected by the extrinsic factor or a fluctuation of the lithography environment |
| 07/05/2007 | DE4342123B4 Farbfilter, insbesondere für eine Flüssigkristallanzeigeeinrichtung, und Verfahren zu seiner Herstellung Color filters, especially for a liquid crystal display device, and process for its preparation |
| 07/05/2007 | DE10307527B4 Verfahren und System zum Verbessern der Effizienz einer mechanischen Justieranlage A method and system for improving the efficiency of a mechanical Justieranlage |
| 07/04/2007 | EP1804278A1 Correction method and exposure device |
| 07/04/2007 | EP1804126A1 An optical metrology system and metrology mark characterization method |
| 07/04/2007 | CN1993820A Systems and methods for forming integrated circuit components having precise characteristics |
| 07/04/2007 | CN1993803A Mobile body system, exposure apparatus, and method of producing device |
| 07/04/2007 | CN1993652A Method of calibrating alignment section, image-drawing device with calibrated alignment section, and conveying device |
| 07/04/2007 | CN1992161A Substrate processing method, substrate processing system and substrate processing apparatus |
| 07/04/2007 | CN1324512C Extraction method of dangerous patterns, program and mfg. method of semiconductor |
| 07/04/2007 | CN1324407C Substrate treatment device and method |
| 07/04/2007 | CN1324405C Lighographic apparatus, alignment method and device mfg method |
| 07/04/2007 | CN1324400C Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 07/03/2007 | US7239393 Calibration method for a lithographic apparatus and device manufacturing method |
| 06/28/2007 | US20070148562 Method of achieving CD linearity control for full-chip CPL manufacturing |
| 06/28/2007 | US20070148558 Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto |
| 06/28/2007 | US20070146672 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 06/27/2007 | EP1801653A1 Lithographic apparatus and method for manufacturing a device |
| 06/27/2007 | CN1988127A Silicon sheet pre-positioning system based on multiple sensor data fusing |
| 06/27/2007 | CN1323325C System and method for protecting templates by two-piece cover |
| 06/26/2007 | US7236245 Overlay key with a plurality of crossings and method of measuring overlay accuracy using the same |
| 06/26/2007 | US7236244 Alignment target to be measured with multiple polarization states |
| 06/26/2007 | US7235464 Patterning method |
| 06/26/2007 | US7235411 Method for aligning a wafer and apparatus for performing the same |
| 06/21/2007 | WO2007069480A1 Aligner and aligning method |
| 06/21/2007 | WO2007068978A1 Hologram viewing arrangement and alignment device |
| 06/21/2007 | US20070141479 mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure; can improve contrast in forming a pattern in an arbitrary shape |
| 06/20/2007 | EP1797480A1 Lithographic mask alignment |
| 06/20/2007 | EP1664925A4 Imprint lithography templates having alignment marks |
| 06/20/2007 | CN1983037A Exposure method, exposure device, and method of manufacturing device |
| 06/20/2007 | CN1983028A Mask blank and method for manufacturing transfer mask |
| 06/20/2007 | CN1322546C Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 06/19/2007 | US7233836 Exposure apparatus and device manufacturing method |
| 06/19/2007 | US7232631 Silicon oxide on silicon substrate; controlling thickness; doping with boron, phorphosus |
| 06/19/2007 | US7232630 Increasing intensity in an aerial image from openings on the complementary mask that are below threshold so that opening meets or exceeds threshold; improving effectiveness of critical openings that are otherwise too small to print |
| 06/14/2007 | WO2007066758A1 Substrate holding device, exposure device, exposure method, and device fabrication method |
| 06/14/2007 | US20070134831 Programmable mask for fabricating biomolecule array or polymer array, apparatus for fabricating biomolecule array or polymer array including the programmable mask, and method of fabricating biomolecule array or polymer array using the programmable mask |
| 06/14/2007 | US20070134564 Method of manufacturing semiconductor device, mask and semiconductor device |
| 06/14/2007 | US20070132971 Lithographic apparatus and device manufacturing method |
| 06/14/2007 | US20070132320 Positioning apparatus and charged-particle-beam exposure apparatus |
| 06/13/2007 | EP1796136A1 Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| 06/13/2007 | EP1795965A2 Programmable mask for fabricating biomolecule array or polymer array |
| 06/13/2007 | CN1981244A Exposure equipment |
| 06/12/2007 | US7231628 Method and system for context-specific mask inspection |
| 06/12/2007 | US7230706 Position detection method and apparatus, and exposure method and apparatus |
| 06/12/2007 | US7229742 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system |
| 06/12/2007 | US7229725 Heating the photomask blank to dehydrate the resist, cooling the blank in a nitrogen-purged environment to room temperature, such that the resist has a level of exposure sensitivity approximate to the resist as when initially applied onto the blank; and patterning an image into the photoresist |
| 06/12/2007 | US7229723 Method for forming an opening in a light-absorbing layer on a mask |
| 06/12/2007 | US7229721 comprises preparing a photo mask including a unit drawing pattern, finding a dimensional variation relating to the photo mask; judging quality of the photo mask by comparing the actual and allowable deteriorated amount of the exposure latitude |
| 06/12/2007 | US7229566 Position detecting method and apparatus |
| 06/12/2007 | US7229273 Imprint lithography template having a feature size under 250 nm |
| 06/07/2007 | US20070127037 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment |
| 06/07/2007 | US20070127026 Substrate alignment apparatus and method, and exposure apparatus |
| 06/07/2007 | US20070127025 Periodic Patterns and Technique to Control Misalignment Between Two Layers |
| 06/06/2007 | CN1320404C Modular optical proximate correction configuration and method thereof applicable for integrated circuit |
| 06/05/2007 | US7227284 Alignment apparatus and exposure apparatus using the same |
| 06/05/2007 | US7226723 Providing a substrate having a resist thereon;exposing the resist to at least one generally rectangular-shaped shot from an electron beam, rotating at least one of the substrate and a path of the generally rectangular-shaped shot; andexposing the resist with rectangular-shaped shot from electron beam |
| 06/05/2007 | US7226707 Methods of printing structures |
| 06/05/2007 | US7226706 using a blocker to prevent electron beams from hitting the outer region for an area more than 90 percent of the outer region when patterning a predetermined feature on the substrate; comprising: a non-conductive substrate; and a layer of conductive material on substrate |
| 05/31/2007 | WO2007061025A1 Mark structure, mark measuring apparatus, pattern forming apparatus, pattern detecting apparatus, detecting method and device manufacturing method |
| 05/31/2007 | WO2007031842B1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 05/31/2007 | WO2006128713A3 Optical imaging arrangement |
| 05/31/2007 | DE19503985B4 Verfahren zur Bildung eines Fotolackmusters für eine Halbleitervorrichtung A method of forming a resist pattern for a semiconductor device |
| 05/30/2007 | EP1789853A1 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article. |
| 05/30/2007 | CN1973371A Elongated features for improved alignment process integration |
| 05/30/2007 | CN1971426A Optical system of focusing and leveling sensor |
| 05/30/2007 | CN1319143C Wafer pre-alignment apparatus and method |
| 05/30/2007 | CN1319121C Method for forming alignment pattern of semiconductor device |
| 05/30/2007 | CN1318914C Method of manufacturing wafer and method of evaluating overlapping alignment between light shade patterns |
| 05/29/2007 | US7225045 System and method for three dimensional model printing |
| 05/29/2007 | US7224505 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument |
| 05/29/2007 | US7224459 Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program |