| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/11/2007 | US7268877 Method and apparatus for orienting semiconductor wafers in semiconductor fabrication |
| 09/11/2007 | US7268360 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 09/11/2007 | US7267911 Stencil mask and its manufacturing method |
| 09/07/2007 | WO2007034379A3 System for detecting motion of a body |
| 09/05/2007 | EP1830395A1 Method for measuring position of mask surface in height direction, exposure apparatus and exposure method |
| 09/05/2007 | EP1829092A2 A method for forming a semiconductor device with gate sidewall spacers of specific dimensions |
| 09/05/2007 | CN101030048A Method for improving semiconductor alignment precision and its opening forming method |
| 09/05/2007 | CN100335974C Photoetching projection mask and method for producing device using same and the device obtained therefrom |
| 09/04/2007 | US7265841 Position detecting method |
| 09/04/2007 | US7265364 Level sensor for lithographic apparatus |
| 09/04/2007 | US7264909 Exposure parameters for all of the selected exposure patterns to be corrected include position, focal point, astigmatism, rotation, and magnification |
| 09/04/2007 | US7264908 Photo mask blank and photo mask |
| 09/04/2007 | US7264906 OPC based illumination optimization with mask error constraints |
| 09/04/2007 | US7264905 Shading area at center of a clear defect in a wiring pattern of a half tone mask; accuracy, lithography |
| 09/04/2007 | US7264853 Attaching a pellicle frame to a reticle |
| 09/04/2007 | US7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance |
| 08/30/2007 | WO2007097380A1 Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
| 08/30/2007 | WO2007097379A1 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| 08/29/2007 | EP1826813A1 Stage device and exposure apparatus |
| 08/29/2007 | EP1601931A4 Apparatus and method for detecting overlay errors using scatterometry |
| 08/29/2007 | EP1570232A4 Apparatus and methods for detecting overlay errors using scatterometry |
| 08/29/2007 | CN101027612A 图像记录装置和图像记录方法 The image recording apparatus and an image recording method |
| 08/29/2007 | CN101025580A Semiconductor exposure method and method for operating semiconductor exposure device |
| 08/29/2007 | CN101025574A Batch silicon wafer exposure method |
| 08/28/2007 | US7262398 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 08/28/2007 | US7261985 Large feature-shift coma sensitivity is simulated for a range of illumination conditions, resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified |
| 08/28/2007 | US7261984 Exposure pattern or mask and inspection method and manufacture method for the same |
| 08/28/2007 | US7261983 Reference wafer and process for manufacturing same |
| 08/28/2007 | US7261982 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 08/28/2007 | US7261981 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 08/28/2007 | US7261980 X-ray mask blank and x-ray mask |
| 08/23/2007 | WO2007030528A3 Photomask and method for forming a non-orthogonal feature on the same |
| 08/23/2007 | WO2005022600A3 Method and systems for processing overlay data |
| 08/23/2007 | US20070196746 Methods and apparatuses for applying wafer-alignment marks |
| 08/23/2007 | US20070195326 Image processing alignment method and method of manufacturing semiconductor device |
| 08/23/2007 | US20070195325 Method and apparatus for measuring optical overlay deviation |
| 08/23/2007 | DE10340611B4 Lithografiemaske zur Abbildung von konvexen Strukturen Lithography mask for imaging of convex structures |
| 08/22/2007 | EP1819986A1 Optical system for detecting motion of a body |
| 08/22/2007 | EP1532484A4 Lithographic printing with polarized light |
| 08/22/2007 | CN2938172Y Exposure precision positioning system of changed by two-device |
| 08/22/2007 | CN1333453C Method for positioning substratge relatively to supporting table and its equipment |
| 08/22/2007 | CN1333306C Light shield for contacting window making process and making process thereof |
| 08/22/2007 | CN101021694A Aligning system and aligning method based on image technique |
| 08/21/2007 | US7259836 Stage device for positioning an object, in which a static pressure bearing and a pressurizing magnet suspend a slider |
| 08/21/2007 | US7259777 Scanner system |
| 08/21/2007 | US7258957 Using hologram masks on which alignment marks are formed; reduces needed area on a object to be exposed for alignment marks while keeping minimum permissible intervals among alignment marks on a same exposure mask |
| 08/21/2007 | US7258954 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 08/21/2007 | US7258953 Evaluating layer properties by simultaneously measuring critical dimension and registration of semiconductors with a single scatterometry tool |
| 08/21/2007 | US7257890 Exposure mask device and method for orienting a plurality of substrates on an exposure mask |
| 08/16/2007 | US20070188758 Position detecting method |
| 08/16/2007 | US20070188728 Exposure apparatus |
| 08/15/2007 | CN1332423C Method to predict and identify defocus wafers and system thereof |
| 08/15/2007 | CN1332267C Manufacturing method of photo etching apparatus and device |
| 08/14/2007 | US7257785 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 08/14/2007 | US7256869 Exposure apparatus and an exposure method |
| 08/14/2007 | US7256865 Methods and apparatuses for applying wafer-alignment marks |
| 08/14/2007 | US7255968 Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 08/09/2007 | US20070185606 Exposure apparatus and device manufacturing method |
| 08/09/2007 | US20070184360 Photomask features with interior nonprinting window using alternating phase shifting |
| 08/09/2007 | US20070184359 Photomask, pattern formation method using photomask and mask data creation method |
| 08/08/2007 | EP1586106A4 An extractor for a micro-column, an alignment method for an extractor aperture to an electon emitter, and a measuring method and an alignment method using thereof |
| 08/08/2007 | CN101013274A Mask film formation method and mask film formation apparatus |
| 08/07/2007 | US7253885 Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method |
| 08/07/2007 | US7253884 Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method |
| 08/07/2007 | US7253077 Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium |
| 08/07/2007 | US7252923 Lithography; offset printing; using metal oxide photocatalyst |
| 08/07/2007 | US7252913 Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer |
| 08/07/2007 | US7252911 Implanting ions into a mask substrate with pattern-forming material with light-transmissive exposure regions; ions in the regions dissipate electrostatic charges, thus preventing the buildup of electrostatic charges which could otherwise attract image-distorting particles to the mask or damage the mask |
| 08/07/2007 | US7252910 Fabrication method of semiconductor integrated circuit device and mask fabrication method |
| 08/02/2007 | WO2007086316A1 Superposition management method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, device fabrication system and device fabrication method, and program, and information recording medium |
| 08/02/2007 | US20070178391 Mask having balance pattern and method of patterning photoresist using the same |
| 08/02/2007 | US20070178389 Universal photomask |
| 08/02/2007 | US20070178387 A core having a high refractive index and a cladding layer having a low refractive index and an increment of insertion loss of 0.1 dB or less upon subjecting the waveguide to a 360 degrees bending test at a radius of curvature of 2 mm; high flexing property;heat resistance; radiation transparent |
| 08/02/2007 | US20070177132 Method and Apparatus for Self-Referenced Dynamic Step and Scan Intra-Field Scanning Distortion |
| 08/02/2007 | US20070177125 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate |
| 08/02/2007 | US20070176128 Alignment systems and methods for lithographic systems |
| 08/01/2007 | CN1329951C Method for aligning wafer |
| 08/01/2007 | CN1329777C Clamping piece for clamping printed circuit board to explosure |
| 08/01/2007 | CN101009218A Pattern forming method and pattern forming system |
| 07/31/2007 | US7251042 Lithographic apparatus, interferometer and device manufacturing method |
| 07/31/2007 | US7250237 Exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing; determining corrective information based on the measured attributes |
| 07/31/2007 | US7250235 Focus monitor method and mask |
| 07/26/2007 | WO2007083758A1 Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method |
| 07/26/2007 | US20070171392 Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method |
| 07/26/2007 | US20070170378 EUV light source optical elements |
| 07/25/2007 | CN101006558A 校正方法及曝光装置 Correction method and exposure apparatus |
| 07/25/2007 | CN101006555A Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| 07/25/2007 | CN101006554A Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method |
| 07/25/2007 | CN101006329A Embedded attenuated phase shift mask with tunable transmission |
| 07/24/2007 | US7249342 Method and system for context-specific mask writing |
| 07/24/2007 | US7248349 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device |
| 07/24/2007 | US7248337 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 07/24/2007 | US7248336 Method and system for improving focus accuracy in a lithography system |
| 07/24/2007 | US7248335 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
| 07/24/2007 | US7247868 Position detection method and apparatus |
| 07/24/2007 | US7247412 Preparing a reflection photo mask having a reflection layer and absorption patterns that are formed on the reflection layer to define reflection regions; exposure is performed using the reflection photo mask, thereby forming the patterns on the wafe, critical dimensions, measuring dimensions |
| 07/24/2007 | US7247410 Complementary division mask, method of producing mask, and program |
| 07/19/2007 | WO2007079639A1 Ttl alignment system for projection exposure apparatus and alignment method |
| 07/19/2007 | US20070166946 Method of reducing film stress on overlay mark |
| 07/19/2007 | US20070165357 Overlay Correction By Reducing Wafer Slipping After Alignment |