| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/31/2007 | CN101063828A Exposure apparatus |
| 10/31/2007 | CN101063827A Exposure apparatus inspection method |
| 10/31/2007 | CN101063824A 曝光装置及曝光方法 Exposure apparatus and exposure method |
| 10/30/2007 | US7289226 Characterization and compensation of errors in multi-axis interferometry systems |
| 10/30/2007 | US7289225 Surface profiling using an interference pattern matching template |
| 10/30/2007 | US7289224 Low coherence grazing incidence interferometry for profiling and tilt sensing |
| 10/30/2007 | US7289213 Apparatus and methods for detecting overlay errors using scatterometry |
| 10/30/2007 | US7289212 Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| 10/30/2007 | US7289198 Process compensation for step and scan lithography |
| 10/30/2007 | US7289192 Projection exposure device |
| 10/30/2007 | US7288779 Method for position determination, method for overlay optimization, and lithographic projection apparatus |
| 10/30/2007 | US7288466 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 10/30/2007 | US7288366 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings |
| 10/30/2007 | US7288300 Fullerenes to increase radiation resistance in polymer-based pellicles |
| 10/30/2007 | US7288299 Fullerenes to increase radiation resistance in polymer-based pellicles |
| 10/25/2007 | WO2007121300A2 Infrared interferometric-spatial-phase imaging using backside wafer marks |
| 10/25/2007 | WO2007121208A2 Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography |
| 10/25/2007 | WO2007119475A1 Disc master exposure device and method for adjusting same |
| 10/25/2007 | WO2006090870A3 Image forming device and method |
| 10/25/2007 | US20070250290 Scanning exposure technique |
| 10/25/2007 | US20070248898 Targets for alignment of semiconductor masks |
| 10/25/2007 | US20070247640 Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit |
| 10/25/2007 | DE112005002970T5 Ausrichtungsvorrichtung Alignment device |
| 10/24/2007 | EP1847875A2 Pattern transfer apparatus, imprint apparatus, and pattern transfer method |
| 10/24/2007 | CN200965622Y Exposure machine exposure frame positioning structure |
| 10/24/2007 | CN101061371A Optical system for detecting motion of a body |
| 10/24/2007 | CN101059661A Lithographic apparatus and device manufacturing method |
| 10/24/2007 | CN101059660A Method for producing aligning mark |
| 10/24/2007 | CN100345253C Optic micro distance correcting method |
| 10/23/2007 | US7286220 Test piece for optoelectronic image analysis systems |
| 10/23/2007 | US7286219 Exposure system, semiconductor device, and method for fabricating the semiconductor device |
| 10/23/2007 | US7286216 Exposure apparatus inspection method and exposure apparatus |
| 10/23/2007 | US7285792 Scratch repairing processing method and scanning probe microscope (SPM) used therefor |
| 10/23/2007 | US7284485 Alignment elements for an apparatus for handling printing plates |
| 10/18/2007 | WO2007117519A2 Method for determining deformation parameters for a patterned device in a lithography system |
| 10/18/2007 | WO2007117452A1 Imaging and punching thermal control system |
| 10/18/2007 | WO2007117319A2 Phase shifting mask having a calibration feature and method therefor |
| 10/17/2007 | CN100343760C Exposure device and method |
| 10/16/2007 | US7283660 Multi-layer printed circuit board fabrication system and method |
| 10/16/2007 | US7283236 Alignment system and lithographic apparatus equipped with such an alignment system |
| 10/16/2007 | US7282422 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same |
| 10/16/2007 | US7282311 Method of forming an integrated optical circuit |
| 10/16/2007 | US7282309 Photomask, method for producing the same, and method for forming pattern using the photomask |
| 10/16/2007 | US7282306 May eliminate the need for a second exposure with a trim mask; accordingly, alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 10/16/2007 | US7281921 Scatterometry alignment for imprint lithography |
| 10/16/2007 | US7281871 Image forming apparatus and image forming method |
| 10/11/2007 | WO2007113933A1 Exposure method and exposure device |
| 10/11/2007 | US20070238037 Imprint lithography |
| 10/11/2007 | US20070238027 Method for generating alignment marks and related masks thereof |
| 10/11/2007 | US20070236691 Exposure apparatus inspection method and exposure apparatus |
| 10/10/2007 | EP1843210A2 Method of aligning and exposing a substrate |
| 10/10/2007 | EP1843209A2 Exposure apparatus and device manufacturing method |
| 10/10/2007 | EP1843205A1 Local treatment device, lithographic apparatus and device manufacturing method |
| 10/10/2007 | CN101051185A Light etching positioning self assembling filling method |
| 10/09/2007 | US7280228 System and method of measurement, system and method of alignment, lithographic apparatus and method |
| 10/09/2007 | US7280212 Apparatus and methods for detecting overlay errors using scatterometry |
| 10/09/2007 | US7280183 Image forming device |
| 10/09/2007 | US7279259 Method for correcting pattern data and method for manufacturing semiconductor device using same |
| 10/09/2007 | US7279258 Method and arrangement for controlling focus parameters of an exposure tool |
| 10/09/2007 | US7279253 Near-field light generating structure, near-field exposure mask, and near-field generating method |
| 10/09/2007 | US7279252 Substrate for the micro-lithography and process of manufacturing thereof |
| 10/04/2007 | WO2006110841A3 Systems and methods for measuring a colored flexible material during a manufacturing process |
| 10/04/2007 | US20070233419 Method and System for Context-Specific Mask Inspection |
| 10/04/2007 | US20070231717 Dynamic compensation system for maskless lithography |
| 10/04/2007 | US20070229791 Step Measuring Device and Apparatus, and Exposure Method and Apparatus |
| 10/04/2007 | US20070228844 Alignment apparatus and exposure apparatus using the same |
| 10/03/2007 | EP1840649A2 Device for holding an imprint lithography template |
| 10/02/2007 | US7277189 Generation of a library of periodic grating diffraction signals |
| 10/02/2007 | US7277185 Method of measuring overlay |
| 10/02/2007 | US7276317 Polycrystalline silicon thin film having uniform crystallization characteristics |
| 10/02/2007 | US7276316 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched |
| 10/02/2007 | US7276315 Masking; radiation patterning tool |
| 09/27/2007 | US20070224525 Lithographic apparatus and device manufacturing method with double exposure overlay control |
| 09/27/2007 | US20070224521 Photomask for forming a resist pattern and manufacturing method thereof, and resist-pattern forming method using the photomask |
| 09/27/2007 | US20070224519 The sub-resolution assist features improve corner rounding and allow optical proximity correction end features, such as hammerheads and serifs to be reduced in size or eliminated; reducing corner pullback, reticle mask-making critical dimension; microelectronic; micromechanical photolithography |
| 09/27/2007 | US20070222088 Overlay Metrology Mark |
| 09/26/2007 | CN100339765C Light cover for decreasing optical approaching effect |
| 09/25/2007 | US7275226 Method of performing latch up check on an integrated circuit design |
| 09/25/2007 | US7273761 Box-in-box field-to-field alignment structure |
| 09/25/2007 | US7273685 Method for controlling semiconductor device production process and a method for producing semiconductor devices |
| 09/25/2007 | US7273684 Using ultraviolet radiation; masking; forming profiles; interference zones; semiconductor wafers |
| 09/19/2007 | CN100338730C Crystallizer, crystalline method, film transitior and display device |
| 09/19/2007 | CN100338528C Method and apparatus for porforming rule-based gate shrink utilizing dipole illumination |
| 09/18/2007 | US7271906 Image processing alignment method and method of manufacturing semiconductor device |
| 09/18/2007 | US7271882 Shape measuring apparatus, shape measuring method, and aligning method |
| 09/18/2007 | US7271877 Method and apparatus for maskless photolithography |
| 09/18/2007 | US7270921 Energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process; resist on the target is developed to form a resist pattern; target is etched with the resist pattern as a mask, thus forming patterns |
| 09/18/2007 | US7270920 Fabrication method of a semiconductor device |
| 09/18/2007 | US7270478 X-ray alignment system for fabricating electronic chips |
| 09/13/2007 | WO2007102987A1 Method und apparatus for rapid printing of near-field and imprint lithographic features |
| 09/13/2007 | WO2007044827A3 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 09/13/2007 | US20070212652 Method and system for enhanced lithographic alignment |
| 09/13/2007 | US20070212617 For exposure of semiconductor wafer with dipole illumination light; photoresists |
| 09/13/2007 | DE102005013532B4 EUV-Lithographiesystem und Retikelhalter zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and reticle for solving reticles in a vacuum-insulated environment |
| 09/12/2007 | EP1832933A1 Substrate processing and alignment |
| 09/12/2007 | EP1390692A4 Periodic patterns and technique to control misalignment |
| 09/12/2007 | CN101034263A Method and system for enhanced lithographic alignment |
| 09/12/2007 | CN100337239C Analyzing system of exposuring device, analyzing method, and program, and semiconductor element mfg. method |
| 09/12/2007 | CN100337089C Device detection |
| 09/11/2007 | US7269470 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |