| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/03/2008 | WO2003019272A3 Exposure mask |
| 01/03/2008 | US20080003705 Overlay vernier key and method for fabricating the same |
| 01/03/2008 | US20080003508 A transparent substrate, a peripheral pattern formed on the transparent substrate along a contour of a target pattern to be transferred onto a wafer, and an assist pattern disposed inside the peripheral pattern thereby preventing the assist pattern from being undesirably on the target pattern |
| 01/02/2008 | CN101097410A Method of detecting displacement of exposure position marks |
| 01/02/2008 | CN101097302A Flexible display and method for forming alignment key of the same |
| 01/02/2008 | CN100359343C Method for designing phase raster graphics and method for making photomask system containing it |
| 01/01/2008 | US7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device |
| 01/01/2008 | US7314690 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
| 01/01/2008 | US7314689 After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed is determined; substrate is rotated in a predetermined direction by the offset angle; and the feature is processed using the predetermined reference system |
| 12/27/2007 | WO2007121300A3 Infrared interferometric-spatial-phase imaging using backside wafer marks |
| 12/27/2007 | US20070298330 Recticle pattern applied to mix-and-match lithography process and alignment method of thereof |
| 12/27/2007 | US20070298329 Photomask and method for using the same |
| 12/26/2007 | CN101093366A Conveyer |
| 12/26/2007 | CN100357829C Component manufacturing method, component therefrom and computer programm |
| 12/25/2007 | US7312873 Alignment method and parameter selection method |
| 12/25/2007 | US7312849 Substrate alignment apparatus and method, and exposure apparatus |
| 12/25/2007 | US7312846 Lithographic apparatus and device manufacturing method |
| 12/25/2007 | US7312020 Lithography method |
| 12/25/2007 | US7312004 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 12/25/2007 | US7311771 Method and apparatus for forming crystalline portions of semiconductor film |
| 12/21/2007 | WO2007145038A1 Proximity aligner and proximity exposure method |
| 12/21/2007 | WO2007144452A1 Hybrid inorganic-organic polymer compositions for anti-reflective coatings |
| 12/20/2007 | US20070292776 Overlay vernier key and method for forming contact holes of semiconductor device using the same |
| 12/20/2007 | US20070291242 Exposure apparatus |
| 12/20/2007 | DE10345496B4 Verfahren zum Bestimmen einer lateralen Position eines Substrats in einer lithographischen Belichtungseinrichtung A method for determining a lateral position of a substrate in a lithographic exposure means |
| 12/19/2007 | EP1866701A1 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 12/18/2007 | US7310146 Mark position measuring method and apparatus |
| 12/13/2007 | WO2007142250A1 Gap measuring method, imprint method, and imprint apparatus |
| 12/13/2007 | US20070288113 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |
| 12/13/2007 | US20070287081 Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
| 12/13/2007 | US20070287078 Reticle, semiconductor die and method of manufacturing semiconductor device |
| 12/12/2007 | CN100355061C In-print method and in-print device |
| 12/11/2007 | US7307698 Exposure apparatus and device manufacturing method |
| 12/11/2007 | US7307695 Method and device for alignment of a substrate |
| 12/11/2007 | US7307692 Exposure apparatus and device manufacturing method |
| 12/11/2007 | US7306882 Quartz substrate with a partially dug main surface covered with a Cr film; dug portion has an undercut so that Cr film partially serves as an eaves; a subopening exposes an end of the dug portion; allows an eaves to be directly, accurately measured |
| 12/06/2007 | WO2007139017A1 Liquid recovery member, substrate holding member, exposure apparatus and device manufacturing method |
| 12/06/2007 | WO2007121208A3 Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography |
| 12/06/2007 | US20070281219 Masking techniques and contact imprint reticles for dense semiconductor fabrication |
| 12/05/2007 | CN100353204C Method and apparatus for determining the focal position during imaging of a sample |
| 12/04/2007 | US7304720 System for using a two part cover for protecting a reticle |
| 12/04/2007 | US7303845 Generating mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction tofirst mask pattern data, generating second mask pattern data from design data under second condition, generating second corrected pattern, comparing |
| 12/04/2007 | US7303844 Marking system for a semiconductor wafer to identify problems in mask layers |
| 12/04/2007 | US7303843 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 12/04/2007 | US7303842 Systems and methods for modifying a reticle's optical properties |
| 12/04/2007 | US7303841 Repair of photolithography masks by sub-wavelength artificial grating technology |
| 11/29/2007 | US20070273854 Exposure apparatus, exposure method, and method for producing device |
| 11/28/2007 | EP1859321A2 Optical measuring device using optical triangulation |
| 11/28/2007 | CN101079150A Outline definition apparatus and outline definition method, and image processing apparatus |
| 11/28/2007 | CN100352147C Reacting force treating system of operation table device |
| 11/28/2007 | CN100351704C Attaching a pellicle frame to a reticle |
| 11/28/2007 | CN100351703C Method for mfg. photoetching device and component |
| 11/27/2007 | US7302672 Method and system for context-specific mask writing |
| 11/27/2007 | US7301634 Apparatus and methods for detecting overlay errors using scatterometry |
| 11/27/2007 | US7301604 Method to predict and identify defocus wafers |
| 11/27/2007 | US7301603 Exposure system and method |
| 11/27/2007 | US7300729 Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography |
| 11/27/2007 | US7300728 Imaging lithographic printing plates, then transferring data to controllers for adjustment; data processing |
| 11/27/2007 | US7300725 reticle regions with higher deviation levels benefit from higher levels of dose correction; determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters |
| 11/22/2007 | US20070269723 Near-zero phase shift |
| 11/22/2007 | US20070267579 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 11/20/2007 | US7298500 Position sensor |
| 11/20/2007 | US7298496 Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
| 11/20/2007 | US7298494 Methods and systems for interferometric analysis of surfaces and related applications |
| 11/20/2007 | US7298482 Exposure apparatus and aligning method |
| 11/20/2007 | US7298481 Apparatus and methods for detecting overlay errors using scatterometry |
| 11/20/2007 | US7298459 Wafer handling method for use in lithography patterning |
| 11/20/2007 | US7297971 Alignment systems and methods for lithographic systems |
| 11/20/2007 | US7297453 femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions |
| 11/20/2007 | US7297450 Optical proximity correction method |
| 11/15/2007 | WO2007129688A1 Projection exposure device and projection exposure method |
| 11/15/2007 | US20070266364 Method and System for Context-Specific Mask Writing |
| 11/15/2007 | US20070264585 Photomask having half-tone phase shift portion |
| 11/15/2007 | US20070261574 Microcontact printing |
| 11/14/2007 | EP0496891B2 Method and device for optical exposure |
| 11/14/2007 | CN101073143A Method for forming a semiconductor arragement with gate sidewall spacers of specific dimensions |
| 11/14/2007 | CN101071279A Lithographic apparatus, calibration method, device manufacturing method and computer program product |
| 11/14/2007 | CN101071263A Apparatus for manufacturing display panel and method for manufacturing the same |
| 11/14/2007 | CN100349260C Laser mask and method of crystallization using the same |
| 11/13/2007 | US7295315 Focus and alignment sensors and methods for use with scanning microlens-array printer |
| 11/13/2007 | US7295291 Apparatus and process for the determination of static lens field curvature |
| 11/13/2007 | US7294571 Concave pattern formation method and method for forming semiconductor device |
| 11/13/2007 | US7294437 Systems for modeling a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections |
| 11/08/2007 | US20070259289 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 11/08/2007 | US20070258637 Overlay Mark Arrangement for Reducing Overlay Shift |
| 11/08/2007 | US20070258061 System and method for using a two part cover and a box for protecting a reticle |
| 11/08/2007 | US20070257209 Optimized correction of water thermal deformations in a lithographic process |
| 11/07/2007 | EP1852763A1 Xy stage |
| 11/07/2007 | CN200972571Y Alignment positioning device for exposure machine |
| 11/06/2007 | USRE39913 Providing a reticle that includes a pattern of lines having a line width greater than target width; coating wiht photoresist; exposing photoresist layer to an image projected from reticle; developing photoresist layer, trimming pattern, etching |
| 11/06/2007 | US7292351 Method for determining a map, device manufacturing method, and lithographic apparatus |
| 11/06/2007 | US7292346 Triangulation methods and systems for profiling surfaces through a thin film coating |
| 11/06/2007 | US7292311 Scanning exposure technique |
| 11/01/2007 | WO2007123249A2 Alignment method, imprint method, alignment apparatus, and position measurement method |
| 11/01/2007 | WO2007005204A3 System and method for critical dimension reduction and pitch reduction |
| 11/01/2007 | US20070252993 Wafer alignment apparatus |
| 10/31/2007 | DE10327613B4 Verfahren zur Bildung einer Öffnung auf einer alternierenden Phasenmaske A method for forming an opening on an alternating phase mask |
| 10/31/2007 | CN101065647A Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask |
| 10/31/2007 | CN101063831A Conveying device |
| 10/31/2007 | CN101063829A Overlay measuring method and overlay measuring apparatus using the same |