| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/06/2008 | WO2008027821A1 Use of squaraine dyes to visualize protein during separations |
| 03/06/2008 | WO2008025492A1 A method and a system for reducing overlay errors within exposure fields by apc control strategies |
| 03/06/2008 | US20080057408 Photomask and pattern forming method employing the same |
| 03/06/2008 | US20080054354 Photo mask, semiconductor integrated circuit device, and method of manufacturing the same |
| 03/06/2008 | CA2661663A1 Use of squaraine dyes to visualize protein during separations |
| 03/05/2008 | CN101135863A Drawing apparatus |
| 03/05/2008 | CN101135860A Light scribing device and Aligning system and aligning method used for light scribing device |
| 03/05/2008 | CN101135859A Transmission aligning mark combination and alignment method of light scribing device |
| 03/05/2008 | CN100373260C Fluoropolymer-coated photomasks for photolithography |
| 03/04/2008 | US7339662 Exposure apparatus and a device manufacturing method using the same |
| 03/04/2008 | US7339282 Topographically indexed support substrates |
| 03/04/2008 | US7338885 Alignment mark and method for manufacturing a semiconductor device having the same |
| 03/04/2008 | US7338736 Method of fabricating a phase shift mask |
| 03/04/2008 | US7338609 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 02/28/2008 | US20080050677 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/28/2008 | US20080049226 Apparatus and methods for detecting overlay errors using scatterometry |
| 02/28/2008 | US20080049203 Exposure apparatus |
| 02/26/2008 | US7337423 Mask pattern generating method and mask pattern generating apparatus |
| 02/26/2008 | US7336352 Position detection apparatus |
| 02/26/2008 | US7336341 Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator |
| 02/26/2008 | US7335449 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |
| 02/21/2008 | WO2008022178A2 Method for separating optical and resist effects in process models |
| 02/21/2008 | US20080046183 Method for determining a map, device manufacturing method, and lithographic apparatus |
| 02/21/2008 | US20080045005 Pattern formation method and method for forming semiconductor device |
| 02/21/2008 | US20080044768 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 02/21/2008 | US20080044748 separating out the adverse effects of the exposure tool from the effects of the photoresist; exposure tool is adjusted to compensate for the errors; methodology includes a determination of where the simulator best focus location is in comparison to the empirically derived best focus location |
| 02/21/2008 | US20080043909 X-Ray Alignment System For Fabricating Electronic Chips |
| 02/20/2008 | EP1889000A2 Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| 02/20/2008 | CN101126908A Multi-platform photolithographic machine silicon chip horizontal control and automatic focusing system and its implement method |
| 02/19/2008 | US7333200 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 02/19/2008 | US7332732 Alignment systems and methods for lithographic systems |
| 02/19/2008 | US7332255 enables the user to measure process line shortening on an overlay tool; means for determining the misalignment, means for determining total line shortening, means for determining the equipment line shortening, and means for determining process line shortening |
| 02/19/2008 | US7332252 Method of forming a mask layout and layout formed by the same |
| 02/19/2008 | US7332251 Pattern decomposition and optical proximity correction method for double exposure when forming photomasks |
| 02/19/2008 | US7331286 Method for fabricating color filter of liquid crystal display device |
| 02/14/2008 | US20080036988 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 02/14/2008 | US20080035851 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/13/2008 | EP1886191A2 Optical imaging arrangement |
| 02/13/2008 | EP1540665A4 Photolithography mask repair |
| 02/13/2008 | CN101122752A Centering device and exposure device |
| 02/13/2008 | CN101122737A Photomask registration errors of which have been corrected and method of correcting registration errors of photomask |
| 02/12/2008 | US7330261 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 02/12/2008 | US7329888 Alignment systems and methods for lithographic systems |
| 02/12/2008 | US7329883 Electron beam lithography device and drawing method using electron beams |
| 02/12/2008 | US7329479 Process for production of electroluminescent element and electroluminescent element |
| 02/12/2008 | US7329475 which are quadrangular; substrate in which the difference between the maximum and minimum values for the height among all the measurement points is less than 0.5 mu m is selected |
| 02/07/2008 | US20080032244 Method and apparatus for forming crystalline portions of semiconductor film |
| 02/07/2008 | US20080032205 Formed on photomask during integrated circuit processing |
| 02/07/2008 | US20080032204 Methods of optical proximity correction |
| 02/07/2008 | US20080032203 Lithographic method and patterning device |
| 02/07/2008 | US20080030733 Mark position measuring method and apparatus |
| 02/07/2008 | US20080030715 Best Focus Detection Method, Exposure Method, And Exposure Apparatus |
| 02/07/2008 | US20080029769 Provides two-block laser mask capable of preventing or minimizing a shot mark by sequential irradiation of each block with two different lasers; liquid crystal displays, light emitting diodes; Flat panel displays having a polycrystalline silicon thin film transistor as a switching device |
| 02/07/2008 | US20080028966 Method for Feeding a Printing Forme to a Forme Cylinder of a Printing Press, Method for Producing A Printing Forme and Device For Laterally Aligning And Guiding A Dressing To Be Fed To A Printing Press Cylinder |
| 02/06/2008 | CN101120620A Drawing device and calibrating method for drawing device |
| 02/06/2008 | CN101120286A Image forming device and method |
| 02/06/2008 | CN101118840A Manufacturing method of power semi-conductor discrete device first floor photolithography para-position making |
| 02/05/2008 | US7327449 Exposure apparatus inspection method and exposure apparatus |
| 02/05/2008 | US7327013 Stencil mask with charge-up prevention and method of manufacturing the same |
| 02/05/2008 | US7326502 Ion beam deposition and atomic layer deposition to form alternating stack of thin films; to smooth surface defects; form extreme ultraviolet reflective mask in semiconductor processing; optical ultraviolet system for making semiconductor wafer |
| 02/05/2008 | US7326501 Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) |
| 01/31/2008 | WO2008013886A2 Apparatus and method for alignment using multiple wavelengths of light |
| 01/31/2008 | US20080028360 Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features |
| 01/31/2008 | US20080028358 Quick and accurate modeling of transmitted field |
| 01/31/2008 | US20080026305 Apparatus and method for alignment using multiple wavelengths of light |
| 01/31/2008 | US20080024766 Apparatus and methods for detecting overlay errors using scatterometry |
| 01/30/2008 | EP0961954B1 Repetitively projecting a mask pattern using a time-saving height measurement |
| 01/30/2008 | CN101114135A Aligning system photolithography equipment |
| 01/30/2008 | CN101114134A Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine |
| 01/30/2008 | CN100365507C Template for room temperature, low pressure micro-and nano-imprint lithography |
| 01/29/2008 | US7323393 Method of reducing film stress on overlay mark |
| 01/29/2008 | US7323278 Method of adding fabrication monitors to integrated circuit chips |
| 01/29/2008 | US7323277 Photomask |
| 01/29/2008 | US7323276 Substrate for photomask, photomask blank and photomask |
| 01/29/2008 | US7323130 Magnification correction employing out-of-plane distortion of a substrate |
| 01/24/2008 | US20080020303 contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and a sensor disposed on the patterning tool for sensing a magnetic pattern disposed on the substrate to determine alignment between the patterning tool and the substrate. |
| 01/24/2008 | US20080020298 Shading area of transmissivity of 0-2% at the center of a clear defect in a wiring pattern of a half tone mask; forming semitransparent areas of transmissivity of 10-25% adjacent to shading extending from inside of the edge of an imaginary pattern with no defect to the outside of the edge; accuracy |
| 01/24/2008 | US20080019817 Alignment Apparatus |
| 01/22/2008 | US7320946 Method for generating dynamic mask pattern |
| 01/22/2008 | US7320847 locally etching first substrate as far as protective layer to form a trench around a reversed alignment marker; forming a patterned layer on a second surface of first substrate using a lithographic projector having a front-to-back alignment system |
| 01/17/2008 | WO2008007173A1 Wafer and method of forming alignment markers |
| 01/17/2008 | US20080014511 Photomask with overlay mark and method of fabricating semiconductor device |
| 01/17/2008 | US20080013091 Position detecting method and apparatus |
| 01/17/2008 | US20080013073 Measurement Method, Measurement Apparatus, Exposure Method, and Exposure Apparatus |
| 01/17/2008 | US20080013020 Display device |
| 01/16/2008 | EP1879217A1 Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method |
| 01/16/2008 | CN101105641A Correction of off-axis translation of optical elements in an optical zoom assembly |
| 01/16/2008 | CN101105637A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN101105636A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN100362628C Self-aligning method for outskirt state phase shifting light shade |
| 01/16/2008 | CN100362431C Photoetching device, device manufacturing method and manufactured device by it |
| 01/15/2008 | US7319506 Alignment system and method |
| 01/10/2008 | WO2008004777A1 Nanodevice structure and fabricating method thereof |
| 01/10/2008 | WO2007106241A3 Merging a mask and a printing plate |
| 01/09/2008 | EP1875311A1 A method for measuring the position of a mark in a micro lithographic deflector system |
| 01/09/2008 | CN101101458A Optical etching device aligning method and system |
| 01/08/2008 | US7317531 Apparatus and methods for detecting overlay errors using scatterometry |
| 01/08/2008 | US7316869 Mounting a pellicle to a frame |
| 01/08/2008 | CA2308757C Composite relief image printing plates |
| 01/03/2008 | WO2008001077A1 Registration system and method |