| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/07/2008 | CN100386854C Wiring forming system and wiring forning method for wiring on wiring board |
| 05/06/2008 | US7369213 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/06/2008 | US7368229 Composite layer method for minimizing PED effect |
| 05/06/2008 | US7368225 Exposing isolated regions in photoresist layer through a second mask different from the first mask using second focus; etching the first layer using the patterned photoresist layer as a mask |
| 05/06/2008 | US7368209 Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device |
| 05/06/2008 | US7368208 Measuring phase errors on phase shift masks |
| 05/06/2008 | US7368207 Dynamic compensation system for maskless lithography |
| 05/06/2008 | US7368206 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern |
| 05/06/2008 | US7368204 Includes a transmissive portion defining a crystallization pattern and an alignment pattern, and a shielding portion surrounding the transmissive portion; use making an liquid crystal display (LCD) device where a driving circuit and a pixel thin film transistor are formed on a single substrate |
| 05/02/2008 | WO2007134000A3 Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns |
| 05/01/2008 | US20080102383 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 04/30/2008 | EP1915255A1 Printing plate registration using a camera |
| 04/30/2008 | CN101171826A Plotting point data acquisition method and device, and plotting method and device |
| 04/30/2008 | CN101169602A Focusing leveling measuring method and device |
| 04/30/2008 | CN101169601A Focusing leveling measuring system |
| 04/29/2008 | US7365456 Positioning apparatus and charged-particle-beam exposure apparatus |
| 04/29/2008 | US7365321 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 04/24/2008 | WO2008048595A2 Lithography alignment system and method using feedback control based on nanoscale displacemnt sensing and estimation |
| 04/24/2008 | WO2008047818A1 Near-field exposure apparatus and near-field exposure method |
| 04/24/2008 | US20080095878 Imprint Lithography Template Having a Feature Size Under 250 nm |
| 04/24/2008 | US20080094642 Alignment Condition Determination Method and Apparatus of the Same, and Exposure Method and Apparatus of the Same |
| 04/24/2008 | US20080094641 Position sensor |
| 04/24/2008 | US20080094630 Apparatus and methods for detecting overlay errors using scatterometry |
| 04/24/2008 | US20080094596 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/24/2008 | US20080094595 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/24/2008 | US20080094591 Mounting a Pellicle to a Frame |
| 04/23/2008 | EP1319191B1 Generation of a library of periodic grating diffraction signals |
| 04/23/2008 | CN101167019A Convey error measuring method, calibration method, plotting method, exposure plotting method, plotting device, and exposure plotting device |
| 04/23/2008 | CN101165597A Bi-directional beam divider, aligning system using same and lithography device using the system |
| 04/22/2008 | US7362436 Method and apparatus for measuring optical overlay deviation |
| 04/22/2008 | US7362347 Image recording apparatus having a recording drum rotatable with a recording medium mounted peripherally thereof |
| 04/22/2008 | US7361457 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 04/22/2008 | US7361434 for projection of patterns onto substrate such as semiconductor wafers |
| 04/22/2008 | US7361433 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 04/17/2008 | US20080088956 Alignment system and method |
| 04/17/2008 | DE102007047299A1 Image quality measuring device for extreme UV-wavelength range, has sensor support structure with bearing system for storing sensor carrier, where bearing system is partially arranged outside of vacuum container |
| 04/16/2008 | EP1912257A2 Method, an alignment mark and use of a hard mask material |
| 04/16/2008 | CN101162368A Method, an alignment mark and use of a hard mask material |
| 04/16/2008 | CN100382242C Method for manufacturing semiconductor device |
| 04/15/2008 | US7359054 Overlay target and measurement method using reference and sub-grids |
| 04/10/2008 | DE102005047162B4 Interferometersysteme zur Messung von Verlagerungen und diese Systeme benutzende Belichtungssysteme Interferometer for measuring displacements and these systems-use imaging systems |
| 04/09/2008 | EP1909062A1 Surface position detection apparatus, exposure apparatus, and exposure method |
| 04/09/2008 | EP1907788A2 Methods and systems for ultra-precise measurement and control of object motion in six degrees of freedom by projection and measurement of interference fringes |
| 04/09/2008 | EP1664936A4 Forming partial-depth features in polymer film |
| 04/09/2008 | CN101158821A Aligning mark, alignment method and aligning system |
| 04/09/2008 | CN101158818A Alignment apparatus, alignment method and imagery quality detecting method |
| 04/09/2008 | CN101158816A Time sharing alignment apparatus and alignment method |
| 04/09/2008 | CN101158814A Marker for photo-etching machine aligning and aligning using the same |
| 04/09/2008 | CN100380945C Image processing system, projector, image processing method |
| 04/09/2008 | CN100380235C Exosure method and device |
| 04/09/2008 | CN100380233C Method for raising processing range with eliminating auxiliary characteristic |
| 04/08/2008 | US7355681 Optical proximity correction using chamfers and rounding at corners |
| 04/08/2008 | US7355680 Method for adjusting lithographic mask flatness using thermally induced pellicle stress |
| 04/08/2008 | US7355187 Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate |
| 04/08/2008 | US7354699 Easily removal of marking without defect; patterning multilayer photoresist masking layer covering marking; etching |
| 04/08/2008 | US7354684 Test pattern and method of evaluating the transfer properties of a test pattern |
| 04/08/2008 | US7354683 Lithography mask for imaging of convex structures |
| 04/08/2008 | US7354681 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/03/2008 | WO2008038752A1 Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method |
| 04/03/2008 | WO2007098453A3 Method and apparatus for determining focus and source telecentricity |
| 04/01/2008 | US7353493 Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program |
| 04/01/2008 | US7352891 Position detecting method |
| 04/01/2008 | US7352453 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 04/01/2008 | US7351504 Photomask blank substrate, photomask blank and photomask |
| 03/27/2008 | WO2005114095A3 Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
| 03/27/2008 | US20080076255 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device |
| 03/27/2008 | US20080076037 Inter-scribe lane pattern, extra-scribe lane pattern, inter-scribe lane pattern is sited between the main patterns; extra-scribe lane pattern is sited on the tree edges of the photomask; improving the mask area use efficiency |
| 03/27/2008 | US20080074635 Supporting apparatus, exposure apparatus, and device manufacturing method |
| 03/26/2008 | CN101149565A Asymmetric transmission mark combination and its aligning method |
| 03/26/2008 | CN101149564A Alignment mark and its imaging optical system and imaging method |
| 03/26/2008 | CN101149563A Electron beam alignment mark manufacture method and its uses |
| 03/25/2008 | US7350182 Methods of forming patterned reticles |
| 03/25/2008 | US7350181 Set of masks, method of generating mask data and method for forming a pattern |
| 03/25/2008 | US7349101 Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby |
| 03/25/2008 | US7349065 Exposure apparatus and device fabrication method |
| 03/25/2008 | US7348111 Reduction of imaging artifacts in a platesetter having a diffractive modulator |
| 03/25/2008 | US7348109 increases the number of semiconductor dice obtained from one semiconductor; dicing line is not formed through the Test Element Group die pattern |
| 03/25/2008 | US7348107 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 03/25/2008 | US7348106 after forming a predetermined mask pattern through an energy beam resist layer, mask is inspected for at least one missing pattern; mask is repaired in defect area; missing pattern is reformed; mask pattern is transferred in the shift layer material |
| 03/20/2008 | WO2008013886A3 Apparatus and method for alignment using multiple wavelengths of light |
| 03/20/2008 | WO2008013798A3 Alignment for contact lithography |
| 03/20/2008 | US20080070416 Phase shift mask including a substrate with recess |
| 03/20/2008 | US20080070130 Phase shifting photomask and a method of fabricating thereof |
| 03/20/2008 | US20080068614 Methods and systems for interferometric analysis of surfaces and related applications |
| 03/19/2008 | CN101146408A Wiring forming system and wiring forming method for forming wiring on wiring board |
| 03/18/2008 | US7345739 Lithographic alignment system and device manufacturing method |
| 03/18/2008 | US7345737 Exposure method and apparatus having a projection optical system in which a projection gap is filled with liquid |
| 03/18/2008 | US7344824 Alternating aperture phase shift photomask having light absorption layer |
| 03/18/2008 | US7344807 connecting optics having a lithographic structure with frames and pellicles, using inorganic adhesive comprising a potassium silicate solution, to form exposure masks for structuring photoresist layers on substrate wafers |
| 03/18/2008 | US7344806 Sputtering layers of phase shifting mask on substrates; concurrent discharging various targets; reducing defects |
| 03/18/2008 | CA2482408C Positioning device, especially for offset plates |
| 03/13/2008 | WO2008030929A1 Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks |
| 03/13/2008 | DE102006040728A1 Verfahren und Vorrichtung zum Herstellen eines elektronischen Moduls Method and apparatus for producing an electronic module |
| 03/12/2008 | CN201035322Y Printed plate-making mechanism |
| 03/12/2008 | CN101142535A Optical measuring device using optical triangulation |
| 03/12/2008 | CN101140424A Subsection interleaving aligning mark combined and aligning thereof |
| 03/12/2008 | CN101140423A Transmission aligning mark combination used for mask alignment and mask alignment method thereof |
| 03/12/2008 | CN101140422A Mask alignment making and aligning used for light scribing device |
| 03/11/2008 | US7341809 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 03/11/2008 | US7341808 Method and system for contiguous proximity correction for semiconductor masks |