| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/01/2008 | US7393617 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 07/01/2008 | US7393616 Line end spacing measurement |
| 06/26/2008 | WO2008074998A1 Phase constrast encoding |
| 06/26/2008 | US20080153301 Set of masks, method of generating mask data and method for forming a pattern |
| 06/26/2008 | US20080153012 Method of measuring the overlay accuracy of a multi-exposure process |
| 06/26/2008 | US20080153009 Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program |
| 06/26/2008 | US20080151246 Alignment routine for optically based tools |
| 06/26/2008 | US20080151208 Real-Time Configurable Masking |
| 06/25/2008 | CN101208635A Method for measuring mark position in minitype flat-bed printing derivation equipment system |
| 06/25/2008 | CN100397964C Positioning device for use in process for manufacturing multi-layer printed circuit board and its using method |
| 06/24/2008 | US7391023 Lithography tool image quality evaluating and correcting |
| 06/24/2008 | US7390614 Lithographic apparatus and device manufacturing method |
| 06/19/2008 | WO2008071296A1 Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier |
| 06/19/2008 | WO2008071269A1 Apparatus and method for mask metrology |
| 06/19/2008 | WO2008071268A1 Device and method for measuring lithography masks |
| 06/19/2008 | WO2008048595A3 Lithography alignment system and method using feedback control based on nanoscale displacemnt sensing and estimation |
| 06/19/2008 | WO2008047818A8 Near-field exposure apparatus and near-field exposure method |
| 06/19/2008 | US20080145774 Imprint lithography |
| 06/19/2008 | US20080145773 Substrate chuck located in template service station; motion stage moves imprint head from position adjacent to substrate chuck to position adjacent template service station; head seal mates with service station; analysis station, optical system identifies curable liquid residue; cleaning station |
| 06/19/2008 | DE102006059432A1 Device for measuring lithography masks, has adjustment module by which reticle carrier is moved in order to bring it into pre-determined position in relation to measuring objective |
| 06/18/2008 | EP1931947A2 System for detecting motion of a body |
| 06/18/2008 | CN101203810A Image position measuring apparatus and exposure apparatus |
| 06/18/2008 | CN101201559A System and method for controlling horizontally and focusing automatically silicon slice platform of photo-etching machine |
| 06/18/2008 | CN101201550A Focusing method for mask aligner |
| 06/18/2008 | CN101201549A Device and method for focusing and leveling based on microlens array |
| 06/18/2008 | CN101201548A Measuring system and method for focusing and leveling |
| 06/18/2008 | CN101201546A Device for automatically focusing and leveling |
| 06/18/2008 | CN101201538A Soft template with alignment mark |
| 06/18/2008 | CN100395661C Sucker, photoetching projective apparatus, method for producing sucker and component producing method |
| 06/17/2008 | US7388943 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 06/17/2008 | US7388648 Lithographic projection apparatus |
| 06/17/2008 | US7388216 Pattern writing and forming method |
| 06/17/2008 | US7387859 Method for measuring overlay shift |
| 06/17/2008 | US7387739 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument |
| 06/17/2008 | US7386934 Double layer patterning and technique for milling patterns for a servo recording head |
| 06/11/2008 | EP1930777A2 Exposure apparatus |
| 06/11/2008 | EP1930774A1 Scatterometer and focus analysis method |
| 06/11/2008 | CN101198909A Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 06/11/2008 | CN100394573C Position measurement technique |
| 06/10/2008 | US7386829 Method of fabricating a photomask |
| 06/10/2008 | US7385700 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 06/10/2008 | US7385699 Apparatus and methods for detecting overlay errors using scatterometry |
| 06/10/2008 | US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer |
| 06/10/2008 | US7385675 Lithographic apparatus and device manufacturing method |
| 06/10/2008 | US7385671 High speed lithography machine and method |
| 06/10/2008 | US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method |
| 06/10/2008 | US7384711 Stencil mask having main and auxiliary strut and method of forming the same |
| 06/10/2008 | US7384476 Method for crystallizing silicon |
| 06/05/2008 | US20080128303 Selectively couples reticle to adjustable first device retainer; retainer lock, actuator, an exposure apparatus for transferring an image to an object, a method for manufacturing an object, a method for storage; semiconductor processing |
| 06/04/2008 | CN101194214A Stage apparatus |
| 06/04/2008 | CN101194210A Exposing method and device |
| 06/03/2008 | US7382914 Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects |
| 06/03/2008 | US7382912 Method and apparatus for performing target-image-based optical proximity correction |
| 06/03/2008 | US7381508 Correcting errors using step difference between insulating pattern and adjoining trench |
| 06/03/2008 | US7381503 Reference wafer calibration reticle |
| 05/29/2008 | WO2007069222A3 Analysis device with an array of focusing microstructures |
| 05/29/2008 | US20080124658 Rotary apertured interferometric lithography (rail) |
| 05/29/2008 | US20080121819 Substrate with Marker, Manufacturing Method Thereof, Laser Irradiation Apparatus, Laser Irradiation Method, Light Exposure Apparatus, and Manufacturing Method of Semiconductor Device |
| 05/28/2008 | EP1924891A1 Device for determining the relative position of two substantially flat elements |
| 05/28/2008 | CN101187783A Focusing and leveling measuring system and its measuring method |
| 05/28/2008 | CN100390956C Alignment stage apparatus |
| 05/27/2008 | US7379190 Stage alignment in lithography tools |
| 05/27/2008 | US7379183 Apparatus and methods for detecting overlay errors using scatterometry |
| 05/27/2008 | US7379159 Lithographic apparatus and device manufacturing method |
| 05/27/2008 | US7379153 Lithographic apparatus and device manufacturing method |
| 05/27/2008 | US7378202 Grid-based resist simulation |
| 05/27/2008 | US7378201 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 05/27/2008 | US7378197 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 05/27/2008 | US7378137 Display device |
| 05/22/2008 | WO2007123249A3 Alignment method, imprint method, alignment apparatus, and position measurement method |
| 05/22/2008 | US20080118851 Measuring plurality of first patterns formed over substrate positions of alignment marks to give first positional information; computing first disalignments of plurality of first patterns with respect to the first coordinate system; subtraction; semiconductors |
| 05/21/2008 | EP1923744A2 Immersion exposure apparatus |
| 05/21/2008 | EP1454190B1 Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 05/21/2008 | CN101185035A Work position information acquisition method and device |
| 05/21/2008 | CN101183222A Measurement method of focusing levelling light spot horizontal position |
| 05/20/2008 | US7376930 Method, program product and apparatus for generating assist features utilizing an image field map |
| 05/20/2008 | US7376512 Method for determining an optimal absorber stack geometry of a lithographic reflection mask |
| 05/20/2008 | US7375831 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit |
| 05/20/2008 | US7375809 Alignment routine for optically based tools |
| 05/20/2008 | US7375796 Lithographic apparatus and device manufacturing method |
| 05/20/2008 | US7375479 Apparatus for processing an object with high position accurancy |
| 05/20/2008 | US7374415 Apparatus to control displacement of a body spaced-apart from a surface |
| 05/15/2008 | WO2008056735A1 Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method |
| 05/15/2008 | US20080113303 Multilayer Coatings For EUV Mask Substrates |
| 05/15/2008 | US20080113283 Deposit siloxane epoxy prepolymer film on substrate; pattern forms an imprint template/prepolymer stack, expose film stack to radiation; to form a redistribution layer having an inverse pattern of patterned soft mold |
| 05/14/2008 | EP1921506A2 Position Detecting Method and Device, Patterning Device, and Subject to be detected |
| 05/14/2008 | CN101178545A Position detecting method and device, patterning device, and subject to be detected |
| 05/14/2008 | CN101178544A Alignment unit and image recording apparatus using the same |
| 05/14/2008 | CN100388286C Method and device for designing alternant phase-shifting mask |
| 05/13/2008 | US7373213 Management system and apparatus, method therefor, and device manufacturing method |
| 05/13/2008 | US7371489 Scanning the photomask which has sub-patterns formed inside rectangular region including all the main patterns; scan target range is regulated by inspecting apparatus; every scan target range in the rectangular region includes a main pattern and a sub-pattern; preventing alignment mixup in target range |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/13/2008 | US7371484 Photomask blank and method of fabricating a photomask from the same |
| 05/13/2008 | US7371483 Monitoring apertures in radiation transparent substrate; masking; halftone film; stacks of radiation transparent materials and opacque film ; etching |
| 05/08/2008 | WO2008052600A1 Registration method and apparatus therefor |
| 05/08/2008 | WO2008052405A1 Alignment system used in lithography apparatus and diffraction orders-combining system used in alignment system |
| 05/08/2008 | US20080107998 Light blocking film with opening having width not greater than wavelength size of exposure light contacts object to be exposed where light from exposure light source is projected on light blocking film so that pattern based on opening is formed on object by use of near-field light produced at opening |
| 05/08/2008 | US20080107976 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 05/07/2008 | EP1918777A1 Lithographic apparatus and method |
| 05/07/2008 | EP1354358B1 Design of lithography alignment and overlay measurement marks on damascene surface |