| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/03/2008 | CN101258448A Exposure apparatus |
| 09/03/2008 | CN100416412C Silicon wafer platform height control system and method in projection type photoetching machine |
| 09/03/2008 | CN100416410C Method for manufacturing device, and affset print projecting device |
| 09/02/2008 | US7420676 Alignment method, method of measuring front to backside alignment error, method of detecting non-orthogonality, method of calibration, and lithographic apparatus |
| 09/02/2008 | US7420190 Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device |
| 09/02/2008 | US7419749 Halftone phase shift mask blank, halftone phase shift mask and their preparation |
| 08/28/2008 | US20080206657 Multilayer; substrate with light shielding film; measurement flatness; calibration |
| 08/28/2008 | US20080206656 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 08/28/2008 | US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment |
| 08/28/2008 | US20080203590 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 08/27/2008 | EP1960841A1 Hologram viewing arrangement and alignment device |
| 08/27/2008 | EP1034457B1 Method of fine feature edge tuning with optically-halftoned mask |
| 08/27/2008 | CN101251725A Aligning system, mark, method for lithographic device and lithographic device thereof |
| 08/27/2008 | CN101251724A Aligning system, method for lithographic device and lithographic device thereof |
| 08/27/2008 | CN100414438C Exposure device |
| 08/26/2008 | US7418125 Position detection technique |
| 08/26/2008 | US7416819 Test mask for optical and electron optical systems |
| 08/21/2008 | WO2008055054A3 Devices and methods for pattern generation by ink lithography |
| 08/21/2008 | US20080201686 Method and apparatus for performing target-image-based optical proximity correction |
| 08/21/2008 | US20080197862 Proportional Variable Resistor Structures to Electrically Measure Mask Misalignment |
| 08/20/2008 | EP1957249A2 Method and system for double-sided patterning of substrates |
| 08/20/2008 | EP1700169B1 Direct alignment in mask aligners |
| 08/20/2008 | CN101248392A Optical imaging arrangement |
| 08/20/2008 | CN101246314A Silicon slice alignment signal collecting and processing system and processing method using the same |
| 08/19/2008 | US7415402 Simulation based PSM clear defect repair method and system |
| 08/19/2008 | US7415318 Method and apparatus for manufacturing semiconductor device |
| 08/19/2008 | US7414794 Optical arrangement of autofocus elements for use with immersion lithography |
| 08/19/2008 | US7413834 Photomask with alignment marks for the current layer |
| 08/19/2008 | US7413833 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask |
| 08/19/2008 | US7413586 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles |
| 08/14/2008 | US20080193859 Dual metric opc |
| 08/14/2008 | US20080192219 Lithographic apparatus and device manufacturing method |
| 08/13/2008 | EP1956339A1 Plane position detecting apparatus, exposure apparatus and device manufacturing method |
| 08/13/2008 | EP0951054B1 Aligner and method for exposure |
| 08/13/2008 | CN101242954A Printing plate registration using a camera |
| 08/13/2008 | CN101241319A Machine vision aligning system possessing mask target hierarchy and its alignment method |
| 08/13/2008 | CN101241313A Lithographic equipment aligning system based on machine vision and alignment method |
| 08/13/2008 | CN101241311A Superimposed motor based material transmission system possessing mask station function and its method |
| 08/13/2008 | CN100410812C Image recording apparatus |
| 08/13/2008 | CN100410809C Method for evaluating the effects of multiple exposure processes in lithography |
| 08/12/2008 | US7411651 PSM alignment method and device |
| 08/12/2008 | US7410737 System and method for process variation monitor |
| 08/12/2008 | US7410735 Method of characterization, method of characterizing a process operation, and device manufacturing method |
| 08/12/2008 | US7410732 Process for producing a mask |
| 08/06/2008 | CN201097110Y A measuring device for accurate aligning of up and down drone |
| 08/06/2008 | CN201097107Y Vertical micro-adjustment and gravity compensation machine |
| 08/06/2008 | CN101238416A Exposure device and object to be exposed |
| 08/05/2008 | US7407730 Inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 07/31/2008 | WO2008016651A3 Method of performing lithography and lithography system |
| 07/31/2008 | US20080180668 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 07/31/2008 | DE102007038702A1 Verfahren und System zum Reduzieren der Überlagerungsfehler in Belichtungsfeldern mittels APC-Steuerungsstrategien A method and system for reducing the overlay error in exposure fields by means of APC control strategies |
| 07/30/2008 | EP1782456A4 Exposure apparatus, exposure method, and exposure mask |
| 07/30/2008 | CN101231479A Imbibition type micro-imaging method and system as well as aligning method for closing plate thereof |
| 07/30/2008 | CN100407054C 光刻装置和器件制造方法 Lithographic apparatus and device manufacturing method |
| 07/30/2008 | CN100407051C 用于制造半导体器件的标线片 For manufacturing a semiconductor device of a reticle |
| 07/29/2008 | US7405810 Method and apparatus for positioning a substrate on a substrate table |
| 07/29/2008 | US7405024 Lithographic mask, and method for covering a mask layer |
| 07/24/2008 | US20080174749 In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles |
| 07/23/2008 | EP1947511A1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 07/23/2008 | EP1947509A2 Pattern formation method |
| 07/23/2008 | EP0968458B1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 07/23/2008 | CN101228615A Para-position method |
| 07/23/2008 | CN101226340A A scatterometer, a lithographic apparatus and a focus analysis method |
| 07/23/2008 | CN101226339A FIFO data storage system containing multiple capture channels and and method thereof |
| 07/23/2008 | CN100405562C Method for producing wiring base board |
| 07/23/2008 | CN100405135C A device having a light-absorbing mask and a method for fabricating same |
| 07/22/2008 | US7404173 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 07/22/2008 | US7403263 Exposure apparatus |
| 07/22/2008 | US7402364 A mask for defining gate patterns on dynamic random access memory (DRAM) chips with open bit-line architecture; no unwanted images; only one exposure is needed to achieve high resolution |
| 07/22/2008 | US7402363 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 07/22/2008 | US7402362 Method and system for reducing and monitoring precipitated defects on masking reticles |
| 07/22/2008 | US7401549 Arrangement for transferring information/structures to wafers |
| 07/16/2008 | EP1944654A2 An exposure apparatus and an exposure method |
| 07/16/2008 | CN101221376A Color dynamic selection method based on multi-period mark |
| 07/16/2008 | CN101221365A Method for improving alignment signal processing precision based on self-adapting correction treatment |
| 07/15/2008 | US7401318 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 07/15/2008 | US7400375 Method for designing mask and fabricating panel |
| 07/15/2008 | US7399559 Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
| 07/15/2008 | US7399558 Mask and manufacturing method thereof and exposure method |
| 07/15/2008 | US7399557 Writing pattern; data processing; etching masking film; removal segments of photoresists |
| 07/15/2008 | US7399512 Optical device and production method therefor |
| 07/10/2008 | WO2008082983A1 Apparatus and method for reducing resist defects in wafer processing |
| 07/10/2008 | US20080164637 Release surfaces, particularly for use in nanoimprint lithography |
| 07/10/2008 | DE10350708B4 Verfahren zur Bestimmung eines Translationsfehlers eines Waferscanners bei der photolithographischen Strukturierung eines Halbleiterwafers A method for determining a translation error of a wafer scanner with the photolithographic patterning of a semiconductor wafer |
| 07/09/2008 | EP1942573A1 Alignment apparatus and exposure apparatus using the same |
| 07/09/2008 | CN101218482A Surface position detection apparatus, exposure apparatus, and exposure method |
| 07/09/2008 | CN101216686A Wafer pre-aligning platform and wafer pre-alignment method using the platform |
| 07/09/2008 | CN101216680A Method for measuring Cube-Prism non-orthogonality angle and scale factor correct value |
| 07/09/2008 | CN101216677A Method for detecting target position corresponding to designated lighting intensity value |
| 07/09/2008 | CN101216675A Single hole shape mark aligning signal processing method |
| 07/08/2008 | US7397940 Object positioning method for a lithographic projection apparatus |
| 07/08/2008 | US7397539 Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof |
| 07/08/2008 | US7396620 For photolithography; optimizing an exposure dose and focus in an exposure apparatus; controlling the optical constants (e.g. refractive index and/or the absorption coefficient) and/or coating thickness of the resist applied commonly to the test wafer and the mass-produced wafer |
| 07/02/2008 | CN101213494A Drawing device and drawing method |
| 07/02/2008 | CN101213492A Substrate manufacturing method and exposure apparatus |
| 07/02/2008 | CN101213488A System and method for critical dimension reduction and pitch reduction |
| 07/02/2008 | CN101211804A Detection system and method |
| 07/02/2008 | CN101211124A Coaxial aligning achromatic optical system |
| 07/01/2008 | US7394584 System and method for calculating aerial image of a spatial light modulator |
| 07/01/2008 | US7393619 Method and lithographic structure for measuring lengths of lines and spaces |