| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 11/12/2008 | CN101303534A Aligning mark structure for aligning system of photolithography equipment |
| 11/12/2008 | CN101303533A Aligning system, aligning method for photolithography equipment and enhancement type aligning mark |
| 11/11/2008 | US7450249 Position sensor |
| 11/11/2008 | US7449265 Processing a wafer in real-time using multi-dimensional targets that can be used in Double-Patterning procedures and libraries to control transistor structures. |
| 11/06/2008 | WO2008132529A1 Imaging features with a plurality of scans |
| 11/06/2008 | US20080276216 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 11/06/2008 | DE19806579B4 Verfahren und Vorrichtung zur lagegerechten Positionierung und Stanzung einer belichteten Druckplatte Method and device for correct positioning and punching an exposed printing plate |
| 11/05/2008 | EP1987399A2 Merging a mask and a printing plate |
| 11/05/2008 | CN101300662A Pattern forming method, pattern forming apparatus, and device manufacturing method |
| 11/05/2008 | CN101299132A Aligning mark used for photolithography equipment aligning system and its use method |
| 11/04/2008 | US7446873 Reflective alignment grating |
| 11/04/2008 | US7445883 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 11/04/2008 | US7445874 Method to resolve line end distortion for alternating phase shift mask |
| 10/30/2008 | WO2006060562A3 Method for designing an overlay mark |
| 10/30/2008 | US20080268554 lithography step of connecting a plurality of mask patterns to each other to form a pattern image of an area greater than the size of the mask patterns |
| 10/30/2008 | US20080268353 Stencil mask having main and auxiliary strut and method of forming the same |
| 10/30/2008 | US20080264905 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 10/30/2008 | US20080263877 Laser scribing system and method of use |
| 10/30/2008 | DE102007010223A1 Verfahren zur Bestimmung geometrischer Parameter eines Wafers und Verwendung des Verfahren bei der optischen Inspektion von Wafern A method for determining geometric parameters of a wafer and use of the method for the optical inspection of wafers |
| 10/29/2008 | EP1986224A1 Exposure apparatus, exposing method, and device manufacturing method |
| 10/29/2008 | EP1984862A2 Plasmon tomography |
| 10/29/2008 | EP1694506B1 Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed |
| 10/29/2008 | CN100429758C Substrate alignment apparatus, substrate processing apparatus, and substrate transfer apparatus |
| 10/29/2008 | CN100429748C Exposure apparatus and method for producing device |
| 10/28/2008 | US7442951 Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attribute |
| 10/28/2008 | US7442908 Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate |
| 10/28/2008 | US7442815 Homo- or copolymerizing 2,2,3,3,4,5-hexafluoro-2,3-dihydrofuran derivative or fluorinated 1,2-didehydrooxetane, or dihydropyran derivative; transmittance and durability against short wavelength light; photolithography using KrF excimer lasers; clarity, radiation transparent |
| 10/28/2008 | US7442477 Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted |
| 10/28/2008 | US7442476 Method and system for 3D alignment in wafer scale integration |
| 10/28/2008 | US7442474 Reticle for determining rotational error |
| 10/28/2008 | US7442473 Method for forming mask pattern of semiconductor device |
| 10/23/2008 | WO2008126926A1 Exposure method and electronic device manufacturing method |
| 10/23/2008 | WO2008126925A1 Exposure apparatus, exposure method, and electronic device manufacturing method |
| 10/23/2008 | WO2005121903A3 System and method for improvement of alignment and overlay for microlithography |
| 10/23/2008 | US20080261128 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a grain interface or a a material interface that provides enhanced etch selectivity, especially a tunable, etch resistant anti-reflective coating material and increased resistance to semiconductor manufacturing processes |
| 10/22/2008 | CN201138424Y Aligning mark mechanism for wafer aligning of projecting lens conversion |
| 10/22/2008 | CN100428058C Odd phase-difference in-situ detection method of photoetching machine porjection objective lens |
| 10/22/2008 | CN100428055C Photolithographic process, photomask and manufacturing thereof |
| 10/21/2008 | US7439531 Alignment systems and methods for lithographic systems |
| 10/21/2008 | US7439001 Focus blur measurement and control method |
| 10/21/2008 | US7438998 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 10/21/2008 | US7438996 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 10/16/2008 | WO2008022178A3 Method for separating optical and resist effects in process models |
| 10/16/2008 | WO2008020965A3 Euv optics |
| 10/16/2008 | US20080252869 Exposure apparatus and device fabrication method using the same |
| 10/16/2008 | DE102007034942A1 Vorrichtung zur Vermessung von Substraten Device for measurement of substrates |
| 10/16/2008 | DE102007017649A1 Verfahren zum Bestimmen der Fokuslage von mindestens zwei Kanten von Strukturen auf einem Substrat A method for determining the focal position of at least two edges of structures on a substrate |
| 10/15/2008 | CN101286012A Projection exposure apparatus |
| 10/15/2008 | CN101286010A Aligning system for photolithography equipment and its alignment method and photolithography equipment |
| 10/15/2008 | CN100426461C Method of measuring focus deviation in pattern exposure and pattern exposure method |
| 10/14/2008 | US7436513 Wafer pre-alignment apparatus and method |
| 10/14/2008 | US7435609 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 10/14/2008 | US7435512 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern |
| 10/14/2008 | US7434511 Image recording apparatus including a plurality of notch forming sections |
| 10/09/2008 | US20080249754 Generation of a library of periodic grating diffraction signals |
| 10/09/2008 | US20080245473 Optical device and production method therefor |
| 10/09/2008 | DE102008017623A1 Verfahren und Vorrichtung zum Abbilden einer programmierbaren Maske auf einem Substrat Method and apparatus for imaging a mask on a substrate programmable |
| 10/09/2008 | DE102007033814A1 Vorrichtung und Verfahren zum Messen der Position von Marken auf einer Maske Apparatus and method for measuring the position of marks on a mask |
| 10/08/2008 | CN101281378A Nanometer photolithography aligning system |
| 10/07/2008 | US7433040 Apparatus and methods for detecting overlay errors using scatterometry |
| 10/07/2008 | US7432022 Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same |
| 10/07/2008 | US7432021 a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies |
| 10/02/2008 | WO2008117444A1 Method for aligning exposure position for lithography processing |
| 10/02/2008 | US20080237037 Mask and method of manufacturing the same |
| 10/01/2008 | EP1975982A1 Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method |
| 10/01/2008 | EP1975981A1 Pattern formation method, pattern formation device, and device fabrication method |
| 10/01/2008 | EP1975980A1 Exposure device and fabrication method thereof |
| 10/01/2008 | CN101276160A Focusing and leveling device for photo-etching machine as well as measuring method |
| 10/01/2008 | CN101276150A Stepping repeat exposure device |
| 09/25/2008 | DE10352740B4 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Größe Auxiliary structural features with a sub-resolution size |
| 09/24/2008 | CN101273302A Photomask and exposure method using same |
| 09/24/2008 | CN101271281A Normalization alignment mark combination and its alignment method and alignment system |
| 09/23/2008 | US7427459 Recticle pattern applied to mix-and-match lithography process and alignment method of thereof |
| 09/23/2008 | US7427457 photoresist erosion, pattern collapse or pattern bending; grating structure may be designed with a pitch or critical dimensional smaller than the one used for the semiconductor device |
| 09/17/2008 | EP1041608B1 Method and system for detecting a mark |
| 09/17/2008 | CN101268337A System for detecting motion of a body |
| 09/17/2008 | CN101266411A Two-dimensional coding normalization mask target combination and its alignment method and aligning system |
| 09/17/2008 | CN100419576C Equipment management system and method, semiconductor exposure apparatus and management method, method for mfg. semiconductor |
| 09/16/2008 | US7426712 Lithography simulation method and recording medium |
| 09/16/2008 | US7425713 Synchronous raster scanning lithographic system |
| 09/16/2008 | US7425396 Photolithography and transfer of circuits for optical images for semiconductors and patterns |
| 09/16/2008 | US7425390 Preparation of halftone phase shift mask blank |
| 09/16/2008 | US7425389 Line photo masks and methods of forming semiconductor devices using the same |
| 09/12/2008 | WO2008071269A8 Apparatus and method for mask metrology |
| 09/11/2008 | US20080220344 Drawing Method and Apparatus |
| 09/11/2008 | US20080219562 System and Method for Calculating Aerial Image of a Spatial Light Modulator |
| 09/11/2008 | US20080218726 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218718 Lithographic apparatus and device manufacturing method |
| 09/11/2008 | US20080218711 Lithographic apparatus and device manufacturing method |
| 09/10/2008 | CN101263433A Device for determining the relative position of two substantially flat elements |
| 09/10/2008 | CN101261450A Zero position automatically adjustable focusing and leveling measuring device and its usage method |
| 09/09/2008 | US7424144 Method for checking periodic structures on lithography masks |
| 09/09/2008 | US7422974 Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device |
| 09/04/2008 | WO2008083114A3 Hybrid mask and method of forming same |
| 09/04/2008 | US20080215295 Method Of Analysis, Exposure Apparatus, And Exposure Apparatus System |
| 09/04/2008 | US20080213474 Producing ultraflat, uniform fiber filled plastic substrate including inorganic barrier layer |
| 09/04/2008 | DE10342776B4 Verfahren zur Bestimmung von Korrekturwerten für die Justage eines Halbleiterwafers in einem Projektionsapparat zur photolithographischen Strukturierung einer Metallschicht A method for determining correction values for the adjustment of a semiconductor wafer in a projection apparatus for the photolithographic patterning of a metal layer |
| 09/04/2008 | DE102005056916B4 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 09/03/2008 | EP1963923A2 Analysis device with an array of focusing microstructures |
| 09/03/2008 | EP1483627B1 Scanning exposure apparatus and device manufacturing method using the same |