| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/15/2009 | WO2008136666A3 Image sensor for lithography |
| 01/14/2009 | CN101344734A Silicon slice focusing and leveling measurement device |
| 01/14/2009 | CN101344728A On-line measurement apparatus and method for wave aberration of photo-etching machine projection objective |
| 01/14/2009 | CN100451839C Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 01/14/2009 | CN100451838C Aligning system and aligning method |
| 01/14/2009 | CN100451833C Device and method for wafer alignment with reduced tilt sensitivity |
| 01/14/2009 | CN100451832C Lithographic apparatus and device manufacturing method |
| 01/13/2009 | US7477403 Optical position assessment apparatus and method |
| 01/13/2009 | US7477390 Exposure method and apparatus, and device manufacturing method |
| 01/13/2009 | US7476474 Method for making a photomask assembly incorporating a porous frame |
| 01/13/2009 | US7476473 Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method |
| 01/13/2009 | US7476471 Based on extreme ultraviolet radiation energies; lithography; semiconductors |
| 01/08/2009 | US20090009775 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 01/07/2009 | EP2010965A1 Registration method and apparatus therefor |
| 01/07/2009 | EP1859321B1 Optical measuring device using optical triangulation |
| 01/07/2009 | CN100450330C Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device |
| 01/07/2009 | CN100449686C Manufacturing method of power semi-conductor discrete device first floor photolithography para-position making |
| 01/07/2009 | CN100449408C Substrate processing apparatus and substrate positioning device |
| 01/06/2009 | US7475380 Generating mask patterns for alternating phase-shift mask lithography |
| 01/06/2009 | US7474401 Multi-layer alignment and overlay target and measurement method |
| 01/06/2009 | US7474382 Method for determining focus deviation amount in pattern exposure and pattern exposure method |
| 01/06/2009 | US7473502 Imaging tool calibration artifact and method |
| 01/06/2009 | US7473500 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/06/2009 | US7473495 Computer program product configured to store program instructions for execution on a computer system enabling the computer system to perform: inputting a step and managing the step |
| 01/06/2009 | US7473494 Exposure mask and mask pattern production method |
| 01/01/2009 | US20090002652 Lithographic apparatus and device manufacturing method |
| 12/31/2008 | EP1556737B1 Methods for fabrication of nanometer-scale engineered structures for mask repair application |
| 12/31/2008 | CN100447673C Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 12/30/2008 | US7471372 Exposure apparatus and production method of device using the same |
| 12/30/2008 | US7470492 evaluating the variability of apertures for a segment of a pattern on an idealized photoresist masking,. used in semiconductor and microelectromechanical systems; computer programs; miniaturization |
| 12/24/2008 | WO2008157619A2 Total internal reflection displacement scale |
| 12/24/2008 | WO2008157588A2 Systems and methods for fabricating displacement scales |
| 12/24/2008 | EP2006740A1 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product |
| 12/24/2008 | EP2004405A1 Imaging and punching thermal control system |
| 12/24/2008 | CN101329515A Device and method for measuring and checking step photoetching machine aligning system |
| 12/24/2008 | CN101329514A System and method for aligning photolithography apparatus |
| 12/24/2008 | CN100445870C System and method for processing masks with oblique features |
| 12/23/2008 | US7468227 Method of reducing the average process bias during production of a reticle |
| 12/18/2008 | US20080309950 Calibrating A Lithographic Apparatus |
| 12/17/2008 | EP2003680A1 Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
| 12/17/2008 | EP2003679A2 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| 12/17/2008 | CN101326617A Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method |
| 12/17/2008 | CN101326465A Analysis device with an array of focusing microstructures |
| 12/16/2008 | US7466414 Position detection apparatus and method |
| 12/16/2008 | US7466413 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 12/16/2008 | US7465525 Reticle alignment and overlay for multiple reticle process |
| 12/16/2008 | US7465524 Photomask and method of controlling transmittance and phase of light using the photomask |
| 12/16/2008 | US7465523 stress control layer that suppress stress and cancels a stress change of the thin film layer generated in production processes of a mask; producing photoresists with high position accuracy; lithography for producing a semiconductor |
| 12/11/2008 | WO2008151107A2 High-resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment |
| 12/10/2008 | CN101320215A Photo-etching mark on semiconductor material and its production method |
| 12/10/2008 | CN100442436C Method for forming pattern and method for manufacturing semiconductor device |
| 12/10/2008 | CN100442435C Electron beam writing equipment and electron beam writing method |
| 12/10/2008 | CN100442144C Differential critical dimension and overlay metrology device and measurement method |
| 12/09/2008 | US7463333 Multi-exposure lithography system providing increased overlay accuracy |
| 12/09/2008 | US7462548 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 12/09/2008 | US7462430 Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
| 12/09/2008 | US7462429 Pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model; pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified |
| 12/09/2008 | US7462428 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 12/09/2008 | US7462426 Method for producing a phase mask |
| 12/09/2008 | US7461472 Half-tone phase shift mask and patterning method using thereof |
| 12/04/2008 | WO2008146946A2 Exposure method and apparatus, and method for producing device |
| 12/04/2008 | WO2008146933A1 Exposure method and electronic device manufacturing method |
| 12/03/2008 | EP1998361A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium |
| 12/03/2008 | EP1829092B1 A method for forming a semiconductor device with gate sidewall spacers of specific dimensions |
| 12/03/2008 | EP1250630B1 Photolithography system with mountable and removable sensor |
| 12/03/2008 | CN101315514A Mask plate and matching method of photo-etching machine nesting precision using mask plate |
| 12/03/2008 | CN100440434C Semiconductor manufacture method |
| 12/02/2008 | US7459705 Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device |
| 12/02/2008 | US7459248 Associating virtual edge segments with non-phase shifting regions of a layout description for a mask; estimating an edge position error of a feature to be printed on a wafer; applying a resolution enhancement technique to an edge segment to reduce the edge position error |
| 12/02/2008 | US7459247 Lithographic apparatus and device manufacturing method |
| 12/02/2008 | US7459246 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/02/2008 | US7459243 A before-correction pattern edge defining step, a deviated position setting step, an edge selecting step, a correcting step, after-correction pattern edge defining step |
| 12/02/2008 | US7459242 Method and system for repairing defected photomasks |
| 12/02/2008 | US7459241 Rotary apertured interferometric lithography (RAIL) |
| 11/27/2008 | WO2008142916A1 Measuring system, measuring method and program |
| 11/27/2008 | US20080292992 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 11/27/2008 | US20080291415 Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method |
| 11/27/2008 | DE102007033815A1 Verfahren und Vorrichtung zum Bestimmen der relativen Overlay-Verschiebung von übereinander liegenden Schichten Method and apparatus for determining the relative displacement of overlay superimposed layers |
| 11/27/2008 | DE102007024121A1 Laminar substrate e.g. mask, aligning method for mask aligner, involves aligning substrates to each other by shifting, preferably parallely shifting one substrate such that positions of determined centers are agreed |
| 11/26/2008 | CN101312180A Superposed marker and method for forming same as well as uses |
| 11/26/2008 | CN100437903C Photomask, pattern formation method using photomask and mask data creation method |
| 11/26/2008 | CN100437366C Image recorder and image recording method |
| 11/26/2008 | CN100437357C Exposure apparatus extendible corresponding to substrate for printed circuitboard |
| 11/25/2008 | US7458057 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
| 11/25/2008 | US7456975 Methods and systems for interferometric analysis of surfaces and related applications |
| 11/25/2008 | US7456967 Mark position detection apparatus |
| 11/25/2008 | US7456966 Alignment mark system and method to improve wafer alignment search range |
| 11/25/2008 | US7455939 Method of improving grating test pattern for lithography monitoring and controlling |
| 11/20/2008 | WO2008139910A2 Method for processing pattern data and method for manufacturing electronic device |
| 11/20/2008 | US20080286667 improved accuracy; electronics; semiconductors |
| 11/20/2008 | US20080286662 Photomask producing method and photomask blank |
| 11/20/2008 | DE10345238B4 Justiermarke zur Ausrichtung eines Halbleiterwafers in einem Belichtungsgerät und deren Verwendung Alignment mark for aligning a semiconductor wafer in an exposure apparatus and their use |
| 11/19/2008 | CN201153119Y Light emitting auxiliary alignment positioning apparatus |
| 11/18/2008 | US7453570 Mark position measuring method and apparatus |
| 11/18/2008 | US7452639 Photomask with photoresist test patterns and pattern inspection method |
| 11/13/2008 | WO2008136666A2 Image sensor for lithography |
| 11/13/2008 | US20080276813 Method and Apparatus for Printing a Patterned Layer on a Flatsubstate with a Flat-Type-Bed |
| 11/12/2008 | CN101305320A System and method for mask verification using an individual mask error model |
| 11/12/2008 | CN101305319A Photomask and method for forming a non-orthogonal feature on the same |
| 11/12/2008 | CN101305259A Plane position detection device, exposure device and method for manufacturing elements |