| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 03/19/2009 | US20090075215 Photoplate for oled deposition screen |
| 03/19/2009 | US20090073406 Marker structure, mask pattern, alignment method, and lithographic method and apparatus |
| 03/18/2009 | EP1516228B1 Patterning method |
| 03/18/2009 | CN100470719C Substrate processing method, substrate processing system and substrate processing apparatus |
| 03/18/2009 | CN100470381C A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 03/18/2009 | CN100470380C Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same |
| 03/18/2009 | CN100470375C Lithographic apparatus and device manufacturing method |
| 03/18/2009 | CN100470372C System and method for calculating aerial image of a spatial light modulator |
| 03/18/2009 | CN100470371C Exposure apparatus and device manufacturing method |
| 03/18/2009 | CN100470367C Lithographic apparatus and device manufacturing method |
| 03/17/2009 | US7505116 Lithographic apparatus and device manufacturing method |
| 03/17/2009 | US7504192 Soft pellicle for 157 and 193 nm and method of making same |
| 03/17/2009 | US7504186 Photomask, method for producing the same, and method for forming pattern using the photomask |
| 03/17/2009 | US7504182 Scanning beam of metallic ions over defect to dope to reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 03/12/2009 | WO2008157588A3 Systems and methods for fabricating displacement scales |
| 03/11/2009 | CN101385122A Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| 03/11/2009 | CN101385121A Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
| 03/11/2009 | CN101382744A Positioning confirmation apparatus for mask plate and operation method of the apparatus |
| 03/11/2009 | CN101382743A Coaxial double face position aligning system and position aligning method |
| 03/11/2009 | CN101382738A Lithographic projection apparatus |
| 03/11/2009 | CN100468623C Aligning method, alignment checking method and photomask |
| 03/11/2009 | CN100468213C Alignment system for photoetching device and stage jointing grating system |
| 03/11/2009 | CN100468212C Two-sets location switching system |
| 03/11/2009 | CN100468200C Lithographic apparatus and device manufacturing method |
| 03/11/2009 | CN100468013C Phase shift photomask and method for improving printability of a structure on a wafer |
| 03/10/2009 | US7501215 Analyzing front side mark behavior on a substrate during an integrated circuit manufacturing process, without the need of etching global alignment marks; Chemical Mechanical Polishing |
| 03/10/2009 | US7501214 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 03/10/2009 | US7501212 Computing distance based and pattern density based design rules for the mask layout design of a Very Large Scale Integrated Circuit chip so that the design satisfying the above design rules when manufactured on a wafer do not violate the specified tolerance on the critical dimensions |
| 03/05/2009 | WO2009028698A1 Drive method and drive system for movably body |
| 03/05/2009 | WO2009028697A1 Drive method and drive system for a movable body |
| 03/05/2009 | WO2009028696A1 Movable body drive method and movable body drive system |
| 03/05/2009 | WO2009028695A1 Drive method and drive system for a movable body |
| 03/05/2009 | WO2009028694A1 Movable body drive system |
| 03/05/2009 | WO2009028693A1 Method and system for driving a movable body |
| 03/04/2009 | EP2029963A1 Gap measuring method, imprint method, and imprint apparatus |
| 03/04/2009 | CN101379435A System and method for improvement of alignment and overlay for microlithography |
| 03/04/2009 | CN101377624A Exposure device and exposure process |
| 03/04/2009 | CN100466151C An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/04/2009 | CN100465794C Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus |
| 03/04/2009 | CN100465789C A method and an apparatus thereof for performing placing models of phase-balanced scattering bars by sub-wavelength optical lithography |
| 03/03/2009 | US7499180 Alignment stage, exposure apparatus, and semiconductor device manufacturing method |
| 03/03/2009 | US7498105 Calibration curve of a characteristic value of lithography performance with respect to the phase shift angle of a type phase shift mask (PSM) of is acquired; patterns of PSM of type to be checked are transferred to a photoresist layer to form photoresist patterns, andcharacteristic value is measured |
| 03/03/2009 | US7497959 Methods and structures for protecting one area while processing another area on a chip |
| 02/26/2009 | WO2008157619A3 Total internal reflection displacement scale |
| 02/26/2009 | DE10349087B4 Verfahren zur Herstellung von Halbton-Phasenverschiebungsmasken-Rohlingen A process for the production of halftone phase shift mask blanks |
| 02/24/2009 | US7494765 plurality of transmitting nonprinting windows transmitting light in a first phase; a transmitting area transmitting light in a second phase, each transmitting window substantially entirely surrounded by and in contact with the transmitting area with no blocking material intervening |
| 02/24/2009 | US7494753 using a resist calibration model including Gaussian kernels with different diffusion lengths in different directions |
| 02/24/2009 | US7494752 Method and systems for utilizing simplified resist process models to perform optical and process corrections |
| 02/24/2009 | US7494751 high spatial-frequency component degrades as the optical lithography process drifts out of focus; degradation causes the mask layout to allow more light into the pattern, which helps maintain the critical dimension, thereby improving depth of focus |
| 02/24/2009 | US7494749 Photolithography using interdependent binary masks |
| 02/19/2009 | WO2009023518A1 Method and system for automated inspection system characterization and monitoring |
| 02/18/2009 | EP2025514A2 Method and device for applying functional elements |
| 02/18/2009 | CN101369101A Control method for overlay accuracy in photo-etching process |
| 02/18/2009 | CN100463108C Measuring method, measuring device, exposing method and exposing device |
| 02/18/2009 | CN100462667C 原版 Original edition |
| 02/17/2009 | US7492443 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 02/17/2009 | US7491479 Optical lithography to compute aerial image and comparing with computer intensity threshold; semiconductors; integrated circuits |
| 02/17/2009 | US7491478 Control of exposures is based on relative contrast loss for source spectrum and pattern to be projected; lithography |
| 02/17/2009 | US7491474 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors |
| 02/17/2009 | US7491473 Photo mask and method for controlling the same |
| 02/12/2009 | WO2008099795A3 Imprint method and imprint apparatus |
| 02/12/2009 | US20090042115 Exposure apparatus, exposure method, and electronic device manufacturing method |
| 02/12/2009 | US20090042106 Photomask, and method and apparatus for producing the same |
| 02/12/2009 | US20090040489 Position sensor |
| 02/12/2009 | US20090039275 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/11/2009 | EP1634122A4 Method for evaluating the effects of multiple exposure processes in lithography |
| 02/11/2009 | CN101364043A Template design of nanostructure registration photoetching and implementing method |
| 02/11/2009 | CN100460805C Application of scatterometry alignment in imprint lithography |
| 02/05/2009 | US20090035880 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 02/05/2009 | US20090035669 Work position information obtaining method and apparatus |
| 02/05/2009 | US20090035667 Method for correcting mask |
| 02/04/2009 | CN101359188A Exposure apparatus of belt type workpiece and focusing regulation method thereof |
| 02/04/2009 | CN100459095C Silicon sheet pre-positioning system based on multiple sensor data fusing |
| 02/04/2009 | CN100459052C Method for forming a semiconductor arrangement with gate sidewall spacers of specific dimensions |
| 02/03/2009 | US7485396 Optical proximity correction; modifying mask layout to include scattering bars |
| 02/03/2009 | US7485238 Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same |
| 01/29/2009 | WO2008139910A3 Method for processing pattern data and method for manufacturing electronic device |
| 01/29/2009 | US20090029268 Pellicle stress relief |
| 01/28/2009 | CN101356623A Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method |
| 01/28/2009 | CN100456901C Apparatus for fabricating electroluminescent display device |
| 01/28/2009 | CN100456423C Correction method and exposure device |
| 01/28/2009 | CN100456142C Alignment mark and its producing method |
| 01/28/2009 | CN100456141C Batch silicon wafer exposure method |
| 01/27/2009 | US7483764 Exposure apparatus and device manufacturing method |
| 01/27/2009 | US7482611 Lithographic apparatus and device manufacturing method |
| 01/27/2009 | US7482110 Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer |
| 01/27/2009 | US7482102 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 01/21/2009 | EP1664931B1 Surface triangulation and profiling |
| 01/21/2009 | CN101349876A Immersion lithographic apparatus and device manufacturing method |
| 01/21/2009 | CN101349869A System and method for aligning silicon chip by signal processing method |
| 01/21/2009 | CN100454146C Exposure apparatus |
| 01/21/2009 | CN100454141C Device for transferring a pattern to an object |
| 01/21/2009 | CN100454138C Image recorder |
| 01/20/2009 | US7480539 Automated manufacturing system and method for processing photomasks |
| 01/20/2009 | US7480404 Method and system for positioning articles with respect to a processing tool |
| 01/20/2009 | US7480028 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program |
| 01/20/2009 | US7479366 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 01/20/2009 | US7479365 Semiconductor device manufacturing method |
| 01/20/2009 | US7479356 Measuring plurality of first patterns formed over substrate positions of alignment marks to give first positional information; computing first disalignments of plurality of first patterns with respect to the first coordinate system; subtraction; semiconductors |
| 01/15/2009 | WO2009008090A1 Method for manufacturing substrate structure for plasma display panel |