| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/26/2009 | US7539328 Surface position measuring method and apparatus |
| 05/26/2009 | US7538344 Overlay and CD process window structure |
| 05/26/2009 | US7537871 Method of manufacturing semiconductor device |
| 05/26/2009 | US7537870 Using multiple exposures on a wafer through a single photomask to pattern a photoresist for a single exposure by modulating the dosage of illumination from two different exposures at selected doses that optimize a patternr for a first and second pattern type; miniaturization; semiconductors; quality |
| 05/26/2009 | US7537869 Avoiding image macro-flare by determining the variations of lengths of parallel lines of transparency of two patterns adjacent or overlapping the photoresist film; the second has a larger transparent region than the first which has parallel lines of transparent regions of the same length |
| 05/26/2009 | US7537866 Patterning a single integrated circuit layer using multiple masks and multiple masking layers |
| 05/26/2009 | US7537864 Hole pattern design method and photomask |
| 05/22/2009 | WO2009064016A1 Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method |
| 05/22/2009 | WO2009063736A1 Exposure method and exposure apparatus |
| 05/20/2009 | EP2059853A2 Method for separating optical and resist effects in process models |
| 05/20/2009 | CN101436006A Double-surface position alignment apparatus and method |
| 05/20/2009 | CN101436005A Subsection making and aligning signal processing method |
| 05/20/2009 | CN101436004A Method for pre-aligning silicon chip |
| 05/20/2009 | CN100490066C Mobile body system, exposure apparatus, and method of producing device |
| 05/19/2009 | US7535552 Moving/guiding apparatus and exposure apparatus using the same |
| 05/19/2009 | US7535549 System and method for improvement of alignment and overlay for microlithography |
| 05/19/2009 | US7534637 Tunable alignment geometry |
| 05/19/2009 | US7534533 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 05/19/2009 | US7534532 thickness of the at least the pair of the correction layers is determined by a peak-to-valley distance of the non-flat region of the substrate; Heating changes thickness of portion of correction layers and removes the non-flat region from a top surface of correction layers without removing any materials |
| 05/14/2009 | WO2009060999A1 Movable body apparatus |
| 05/14/2009 | WO2009060998A1 Movable body apparatus |
| 05/14/2009 | DE102007000973A1 Mask for use in coordinate measuring machine, has mark for determining rotary position of mask and exhibiting rotary and non-rotary structural elements that represent non-rotary symmetrical figure |
| 05/14/2009 | DE102004014676B4 Verfahren zum Herstellen einer integrierten Schaltungsanordnung mit Hilfsvertiefung, insbesondere mit Ausrichtmarken, und integrierte Schaltungsanordnung A method of fabricating an integrated circuit arrangement with auxiliary recess, in particular with alignment marks, and integrated circuit arrangement |
| 05/13/2009 | EP2057506A1 A method and a system for reducing overlay errors within exposure fields by apc control strategies |
| 05/13/2009 | CN201237696Y Mask positioning affirmation apparatus |
| 05/13/2009 | CN100487577C Position correction in y of mask object shift due to Z offset and non-perpendicular illumination |
| 05/13/2009 | CN100487576C Transferring equipment used for transferring matter and its use method and photoetching projection equipment containing said transferring equipment |
| 05/12/2009 | US7532307 Focus determination method, device manufacturing method, and mask |
| 05/12/2009 | US7531294 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency |
| 05/07/2009 | DE102007049318B3 Meßsystem und Meßverfahren Measuring system and measurement |
| 05/06/2009 | CN101427185A Pattern transfer apparatus, imprint apparatus, and pattern transfer method |
| 05/06/2009 | CN101427182A Composite patterning devices for soft lithography |
| 05/06/2009 | CN101424885A Mask alignment system and method thereof |
| 05/06/2009 | CN101424881A Lithography protection apparatus |
| 04/30/2009 | WO2008146946A3 Exposure method and apparatus, and method for producing device |
| 04/30/2009 | US20090111036 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 04/30/2009 | US20090110895 polytetrafluoroethylene, FEP resins, PFA resins; semiconductor lithography; increased transparency |
| 04/30/2009 | US20090108483 Alignment method, imprint method, alignment apparatus, and position measurement method |
| 04/29/2009 | EP1023640A4 Data hierarchy layout correction and verification method and apparatus |
| 04/29/2009 | EP1023639A4 Method and apparatus for data hierarchy maintenance in a system for mask description |
| 04/29/2009 | CN101419407A Stacked photolithography alignment mark |
| 04/29/2009 | CN100483258C Exposure pattern forming method |
| 04/28/2009 | US7524620 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 04/28/2009 | US7524595 applies a fluid material onto a substrate and then conducts at least two curing steps; coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography |
| 04/23/2009 | WO2006110842A3 Systems and methods for measuring a like-color region of an object |
| 04/22/2009 | EP1548014B1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 04/22/2009 | EP1023641A4 Design rule checking system and method |
| 04/22/2009 | CN100480867C Aligning system and aligning method based on image technique |
| 04/22/2009 | CN100480862C Method of measurement, method for providing alignment marks, and device manufacturing method |
| 04/22/2009 | CN100480860C Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/22/2009 | CN100480859C A method of calibrating a lithographic apparatus |
| 04/22/2009 | CN100480620C System and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 04/21/2009 | US7522263 Lithographic apparatus and method |
| 04/21/2009 | US7521156 Photo mask and method of correcting the transmissivity of a photo mask |
| 04/16/2009 | WO2005036264A3 Photomask having an internal substantially transparent etch stop layer |
| 04/16/2009 | US20090098473 Photomask, method of lithography, and method for manufacturing the photomask |
| 04/16/2009 | US20090096980 Methods and systems for interferometric analysis of surfaces and related applications |
| 04/16/2009 | US20090096090 Photolithography Process and Photomask Structure Implemented in a Photolithography Process |
| 04/15/2009 | EP2048543A2 An optical focus sensor, an inspection apparatus and a lithographic apparatus |
| 04/15/2009 | EP2048542A2 Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method |
| 04/15/2009 | EP2003679A9 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| 04/15/2009 | CN101410897A Disc master exposure device and method for adjusting same |
| 04/15/2009 | CN101408732A Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system |
| 04/15/2009 | CN100479097C Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device |
| 04/15/2009 | CN100478790C Method for improving semiconductor alignment precision and its opening forming method |
| 04/15/2009 | CN100478789C Four-quadrant aligning device of mask transmission system |
| 04/14/2009 | US7518717 Exposure apparatus and a device manufacturing method using the same |
| 04/14/2009 | US7517618 Mask, exposure method and production method of semiconductor device |
| 04/14/2009 | US7517617 Mask blank for use in EUV lithography and method for its production |
| 04/14/2009 | US7517089 Image processing system, projector, information storage medium, and image processing method |
| 04/09/2009 | US20090092932 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 04/09/2009 | DE10356699B4 Lithographiesystem für richtungsabhängige Belichtung Lithography system for directional exposure |
| 04/09/2009 | DE102007046850A1 Struktur und Verfahren zum Bestimmen einer Überlagerungsgenauigkeit Structure and method for determining an overlay accuracy |
| 04/09/2009 | DE102005000734B4 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 04/08/2009 | EP1285223B1 Data age adjustments |
| 04/08/2009 | CN101403865A Pre-aligning system for mask of photo-etching machine |
| 04/08/2009 | CN100476599C Photoetching mark structure, photoetching projection device comprising the photoetching mark structure, and method for aligning with the photoetching mark structure |
| 04/07/2009 | US7514185 Forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp; flatness |
| 04/07/2009 | US7514184 Reticle with antistatic coating |
| 04/07/2009 | US7514183 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern |
| 04/02/2009 | WO2009040241A2 Method and apparatus for measurement and control of photomask to substrate alignment |
| 04/02/2009 | WO2005104756A3 Composite patterning devices for soft lithography |
| 04/02/2009 | DE102007046927A1 Kalibrierung einer Positionsmesseinrichtung einer optischen Einrichtung Calibrating a position measuring device of an optical device |
| 04/01/2009 | CN101399171A Method of forming alignment mark |
| 04/01/2009 | CN101398630A Aligning and stacking marker, mask structure and using method thereof |
| 04/01/2009 | CN100474124C Multi-platform photolithographic machine silicon chip horizontal control and automatic focusing system and implement method thereof |
| 04/01/2009 | CN100474111C Method for designing phase grating pattern, and method for producing photomask system |
| 04/01/2009 | CN100474108C Critical dimension control using full phase and trim masks |
| 04/01/2009 | CN100474004C A process for the fabrication of optical microstructures |
| 03/26/2009 | US20090081567 Soft pellicle and method of making same |
| 03/25/2009 | EP2038208A1 Nanodevice structure and fabricating method thereof |
| 03/24/2009 | US7508646 Substrate holding technique |
| 03/24/2009 | US7508515 System and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 03/24/2009 | US7508220 Detection assembly and lithographic projection apparatus provided with such a detection assembly |
| 03/24/2009 | US7508098 Transfer apparatus |
| 03/24/2009 | US7507508 Variation in the amount of exposure and focal position is quantitatively assessed by forming predetermined assessment pattern including a first pattern having a remaining pattern, and a second pattern which includes a remaining pattern formed in a position lower than the first |
| 03/19/2009 | US20090077530 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077529 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077528 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
| 03/19/2009 | US20090075452 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |