| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 08/12/2009 | CN101504510A Photoetching technology |
| 08/12/2009 | CN100527000C Aligning mark and aligning system |
| 08/12/2009 | CN100526999C Optical etching device aligning method and system |
| 08/12/2009 | CN100526997C Exposure apparatus inspection method |
| 08/12/2009 | CN100526996C Exposure apparatus and exposure method |
| 08/12/2009 | CN100526995C Marker for photo-etching machine aligning and aligning using the same |
| 08/12/2009 | CN100526994C Transmission aligning mark combination and alignment method of light scribing device |
| 08/12/2009 | CN100526988C Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped such an apparatus |
| 08/11/2009 | US7573574 Lithographic apparatus and device manufacturing method |
| 08/11/2009 | US7573225 Electromagnetic alignment and scanning apparatus |
| 08/11/2009 | US7572349 Optical device and production method therefor |
| 08/11/2009 | CA2345829C Process to manufacture tight tolerance embedded elements for printed circuit boards |
| 08/05/2009 | CN100524042C Optical measuring device using optical triangulation |
| 08/04/2009 | US7571417 Method and system for correcting a mask pattern design |
| 08/04/2009 | US7570431 Optical arrangement of autofocus elements for use with immersion lithography |
| 08/04/2009 | US7569312 Mask data creation method |
| 08/04/2009 | US7569308 Placing rectangular contacts on a grid in a first direction; placing rectangular contacts unrestrictedly in a second direction perpendicular to the first direction;a first exposure forms periodic dark lines and a second exposure on the period dark lines form the rectangular contacts |
| 08/04/2009 | US7569307 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved |
| 07/30/2009 | WO2009093594A1 Surface position detecting device, exposure apparatus, and device manufacturing method |
| 07/29/2009 | CN100521062C Particle-optical device and detection means |
| 07/29/2009 | CN100520600C Assembly comprising a sensor, a method therefor and a lithographic projection apparatus |
| 07/29/2009 | CN100520590C Exposure device, exposure method, and exposure treating programme |
| 07/29/2009 | CN100520585C Method and apparatus for generating assist features utilizing an image field map |
| 07/29/2009 | CN100520584C Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/29/2009 | CN100520581C Photoetching apparatus and devices producing method |
| 07/28/2009 | US7566893 Best focus detection method, exposure method, and exposure apparatus |
| 07/23/2009 | WO2009090389A1 Printing plates |
| 07/23/2009 | US20090186286 Method To Control Semiconductor Device Overlay Using Post Etch Image Metrology |
| 07/23/2009 | US20090184270 Lithographic apparatus and device manufacturing method |
| 07/22/2009 | EP2080570A1 Printing plates |
| 07/22/2009 | EP1424537B1 Recording device of information recording medium original disk |
| 07/21/2009 | US7565219 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
| 07/21/2009 | US7564557 Apparatus and methods for detecting overlay errors using scatterometry |
| 07/21/2009 | US7564556 Method and apparatus for lens contamination control |
| 07/21/2009 | US7564534 Alignment system and method |
| 07/21/2009 | US7563709 Pattern formation method and method for forming semiconductor device |
| 07/21/2009 | US7563547 Photomask and method of manufacturing the same |
| 07/21/2009 | US7563546 Process for creating phase edge structures in a phase shift mask |
| 07/15/2009 | CN101482706A Focusing leveling device based on confocal measuring technique |
| 07/14/2009 | US7560201 Patterning a single integrated circuit layer using multiple masks and multiple masking layers |
| 07/14/2009 | US7560197 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method |
| 07/14/2009 | US7560196 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 07/09/2009 | WO2009085004A1 Method of producing a microstructured product |
| 07/09/2009 | US20090176167 Alignment System and Alignment Marks for Use Therewith |
| 07/09/2009 | US20090175503 Surface Position Measuring Method and Apparatus |
| 07/09/2009 | US20090174868 Image processing system, projector, computer-readable storage medium, and image processing method |
| 07/08/2009 | CN101477319A Optical system used for focusing and leveling |
| 07/08/2009 | CN101477318A Photomask contraposition exposure method and photomask component |
| 07/08/2009 | CN100510962C Photoetching device with aligning subsystem, manufacturng method for device with alignment and aligning structure |
| 07/07/2009 | US7558643 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
| 07/07/2009 | US7556900 Measuring the effect of flare on line width |
| 07/07/2009 | US7556899 System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device |
| 07/07/2009 | US7556898 Overlay target for polarized light lithography |
| 07/07/2009 | US7556896 Inspection method and photomask |
| 07/07/2009 | US7556893 reticle used to form alignment targets on a wafer; four fine alignment targets per stepper shot for compensating rotational error in the making of integrated circuits; saving time and reducing processing, increase precision |
| 07/07/2009 | US7556891 positioning phase-shifting region substantially surrounds the contact hole region and is transparent to light; flexible using an identical unit cell to randomly scattered and neatly layouts; photolithography in integrated circuits, on silicon wafer |
| 07/02/2009 | WO2009082226A1 Lithographic apparatus, method for levelling an object, and lithographic projection method |
| 07/01/2009 | CN101470360A Immersion lithographic apparatus and device manufacturing method |
| 07/01/2009 | CN100507718C Projection system and method of use thereof |
| 07/01/2009 | CN100507713C Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 06/24/2009 | EP1754122A4 Method and system to control movement of a body for nano-scale manufacturing |
| 06/24/2009 | CN101464638A Optical grating test system and method |
| 06/24/2009 | CN100504608C Optimized calibration method of thermal deformation of a wafer in a lithographic process |
| 06/24/2009 | CN100504603C Detecting assembly and photoetching projector, detection, calibration, determination and retaining method |
| 06/23/2009 | USRE40774 Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device |
| 06/23/2009 | US7551281 Position sensor |
| 06/23/2009 | US7551264 Exposure apparatus |
| 06/23/2009 | US7551262 Exposure apparatus having a position detecting system and a wavelength detector |
| 06/23/2009 | US7550237 Systems for determining width/space limits for product mask layouts; mask writer generates first pattern on a test mask, a lithography tool generates a second pattern on a wafer like the first pattern by a lithography process using a preset exposure dose; measures widths; controls according to difference |
| 06/23/2009 | US7550235 Applying optical proximity correction features to mask layouts using an interference map; computer software; applying the phase-balanced scattering bar (SB) features to a mask design based on the interference map associated with the given mask design utilizing a model-based approach |
| 06/18/2009 | WO2009075970A1 Method for making structures with improved edge definition |
| 06/18/2009 | US20090158236 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 06/18/2009 | DE112007001740T5 Ausrichtung für Kontaktlithographie Orientation for contact lithography |
| 06/17/2009 | EP2071402A2 Alignment method, alignment system and product with alignment mark |
| 06/17/2009 | CN101458464A Alignment method, alignment system and product with alignment mark |
| 06/17/2009 | CN100501929C Method of adjusting deviation of critical dimension of patterns |
| 06/16/2009 | US7547589 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |
| 06/16/2009 | US7547495 Device manufacturing method and computer program product |
| 06/11/2009 | WO2009072881A1 Marker structure and method of forming the same |
| 06/10/2009 | EP2068112A1 Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method |
| 06/10/2009 | EP1586007A4 Electron beam processing for mask repair |
| 06/10/2009 | DE102005007280B4 Verfahren zum Bestimmen einer kritischen Dimension einer lateral strukturierten Schicht A method for determining a critical dimension of a laterally structured layer |
| 06/10/2009 | CN101452228A Automatic aligner |
| 06/09/2009 | US7546178 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |
| 06/09/2009 | US7545497 Alignment routine for optically based tools |
| 06/09/2009 | US7544449 Method and apparatus for measurement of crossfield chromatic response of projection imaging systems |
| 06/09/2009 | US7544447 Method of forming a mask pattern for a semiconductor device |
| 06/09/2009 | US7543945 Integrator module with a collimator and a compact light source and projection display having the same |
| 06/04/2009 | WO2009040241A3 Method and apparatus for measurement and control of photomask to substrate alignment |
| 06/04/2009 | US20090139449 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 06/03/2009 | CN101446761A Pattern formation method |
| 06/03/2009 | CN100495218C Method for producing absolute zero-position alignment marks by semi-reflective zero-position grating |
| 06/03/2009 | CN100495212C Method of determining characteristic a process step and device manufacturing method |
| 06/02/2009 | US7542263 Overlay correction by reducing wafer slipping after alignment |
| 06/02/2009 | US7541136 Transparent film configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area; focus monitor masks; photolithography; efficiency |
| 06/02/2009 | US7541120 Manufacturing method of semiconductor device |
| 06/02/2009 | US7541118 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 06/02/2009 | US7541117 Shifter pattern image transferred to the photoresist film in the shifter pattern image light exposure step does not overlap the trim pattern image transferred to the film in the trim pattern image light exposure step; photoresist film is patterned with a photoresist material remaining in the dark part |
| 05/28/2009 | WO2009067149A1 Method of creating a template employing a lift-off process |
| 05/27/2009 | CN100492636C Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement |