| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/28/2009 | CN101567302A Alignment mark, forming method thereof and alignment method of semiconductor |
| 10/28/2009 | CN101566800A Aligning system and aligning method for lithography equipment |
| 10/28/2009 | CN100555086C Horizon sensor for photoetching device |
| 10/28/2009 | CN100553971C Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed |
| 10/27/2009 | US7608845 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect |
| 10/27/2009 | US7608368 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product |
| 10/22/2009 | WO2009127331A1 Diffraction elements for alignment targets |
| 10/22/2009 | WO2009127322A1 Focus sensor, inspection apparatus, lithographic apparatus and control system |
| 10/22/2009 | US20090265680 Method and system for correcting a mask pattern design |
| 10/22/2009 | US20090263978 Laser mask and crystallization method using the same |
| 10/22/2009 | US20090262322 Optical arrangement of autofocus elements for use with immersion lithography |
| 10/21/2009 | CN101561642A Positioning system, lithographic apparatus and device manufacturing method |
| 10/21/2009 | CN100552545C Patterned mask holding device and method using two holding systems |
| 10/21/2009 | CN100552544C Exposure device and positioning method |
| 10/20/2009 | US7605383 Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium |
| 10/20/2009 | US7604911 Coating an interpolymer hydrogen-bonded complex film of a proton donor polymer having a carboxylic or sulfonic acid group and a proton acceptor polymer having an amide group on the surface of a resist pattern to reduce the sizes of openings in the pattern |
| 10/20/2009 | US7604910 Exposure mask, method of forming resist pattern and method of forming thin film pattern |
| 10/20/2009 | US7604905 Photomasks |
| 10/20/2009 | US7604904 Pellicle for lithography |
| 10/15/2009 | WO2009124590A1 Optical aperture device |
| 10/15/2009 | DE112007001786T5 Verfahren und Systeme zum Durchführen von Lithographie, Verfahren zum Ausrichten von Objekten relativ zueinander, und Nanoaufdruckformen mit nicht markierenden Ausrichtungsmerkmalen Methods and systems for performing lithography method for aligning objects relative to one another, and nano-imprint forms with non-marking alignment features |
| 10/14/2009 | CN101556440A Alignment device |
| 10/14/2009 | CN100549832C Lithographic apparatus with multiple alignment arrangements and alignment measuring method |
| 10/13/2009 | US7603648 Mask design using library of corrections |
| 10/13/2009 | US7602091 Positioning apparatus and exposure apparatus |
| 10/13/2009 | US7601485 Negates effect of fine dust causing defects; locating an exposure mask at a predetermined position with respect to a wafer, exposing a resist film, then displacing the exposure mask relative to the wafer by a predetermined dimension, and further exposing the resist film; semiconductors |
| 10/13/2009 | US7601468 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate |
| 10/08/2009 | WO2009122529A1 Alignment device for planar element, manufacturing equipment for the same, alignment method for the same, and manufacturing method for the same |
| 10/08/2009 | WO2009121541A1 Device for microlithographic projection illumination and device for the inspection of a surface of a substrate |
| 10/08/2009 | DE102004005981B4 Ausrichtungselemente einer Vorrichtung zur Handhabung von Druckplatten Alignment elements of a device for handling printing plates |
| 10/07/2009 | EP1012779B1 Method and system for lithographic mask inspection |
| 10/07/2009 | CN101551597A A self-imaging double-sided overlay aligning method |
| 10/07/2009 | CN101551593A Alignment system for lithography equipment, lithography equipment and aligning method thereof |
| 10/07/2009 | CN101551523A Coherent imaging system |
| 10/07/2009 | CN100547490C Method for calibrating focus part of exposure member of lithography tool |
| 10/06/2009 | US7599063 Method for checking alignment accuracy using overlay mark |
| 10/06/2009 | US7598008 configuring a multiple channel imaging head; produce a color filter; reduce the visual banding occurring at swath boundaries; no boundary occur within a visible portion of an imaged feature |
| 10/06/2009 | US7598007 Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
| 10/06/2009 | US7598006 Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer |
| 10/06/2009 | US7598005 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes |
| 10/01/2009 | US20090246891 Mark forming method and method for manufacturing semiconductor device |
| 10/01/2009 | US20090246646 Lithographic pellicle |
| 10/01/2009 | DE102008002813A1 Test structure for determining position error with double patterning, has one unit and another unit, where former unit is provided on one mask and latter unit on another mask |
| 09/29/2009 | US7595496 Optimized correction of wafer thermal deformations in a lithographic process |
| 09/23/2009 | EP2103995A2 Method for coarse wafer alignment in a lithographic apparatus |
| 09/23/2009 | EP2102907A2 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
| 09/23/2009 | CN101539725A Method for coarse wafer alignment in a lithographic apparatus |
| 09/22/2009 | US7593119 Generation of a library of periodic grating diffraction signals |
| 09/22/2009 | US7592612 Method and apparatus for surface potential reflection electron mask lithography |
| 09/22/2009 | US7592108 preparing a photomask for near-field exposure, having a light blocking film; position detection; producing a fine metal pattern having a small positional deviation with respect to the Si pattern on the insulating film; high yield |
| 09/22/2009 | US7592103 Electron beam writing method and lithography mask manufacturing method |
| 09/17/2009 | WO2009114058A1 Plate pallet alignment system |
| 09/17/2009 | US20090233186 Scattering bar opc application method for sub-half wavelength lithography patterning field of the invention |
| 09/17/2009 | US20090231584 Periodic patterns and technique to control misaligment between two layers |
| 09/16/2009 | EP2100192A2 Devices and methods for pattern generation by ink lithography |
| 09/16/2009 | CN101533231A Off-axis alignment system and alignment method |
| 09/16/2009 | CN101533229A Reticle for projection exposure apparatus and exposure method using the same |
| 09/16/2009 | CN101533226A Leveling and focusing mechanism and microstage and workpiece stage using same |
| 09/16/2009 | CN101533225A Glass mask and position alignment apparatus of mask retainer |
| 09/15/2009 | US7590280 Position detection apparatus and exposure apparatus |
| 09/15/2009 | US7589819 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
| 09/15/2009 | US7589818 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| 09/15/2009 | US7588884 Enhancing the shallow alignment marks in a relatively thin layer such as the sensor layer so that subsequent layers such as write head layers can align directly to alignment marks created during the fabrication of the relatively thin layer; forming an oversized trench in the target area; photolithography |
| 09/15/2009 | US7588870 Dual layer workpiece masking and manufacturing process |
| 09/15/2009 | US7588869 Divided exposure method for making a liquid crystal display |
| 09/15/2009 | US7588868 Method and system for reducing the impact of across-wafer variations on critical dimension measurements |
| 09/09/2009 | CN101526750A Alignment system for photolithographic device and photolithographic device applying same |
| 09/09/2009 | CN101526748A Memory device, method and aligning control system for photoetching aligning data detection |
| 09/09/2009 | CN101526744A Positioning access mechanism of mask |
| 09/09/2009 | CN100538532C Pattern recognition and metrology structure for an X-initiative layout design |
| 09/09/2009 | CN100537053C Mask blanks and method of producing the same |
| 09/08/2009 | US7586620 Methods and systems for interferometric analysis of surfaces and related applications |
| 09/08/2009 | US7586202 Alignment sensing method for semiconductor device |
| 09/08/2009 | US7585601 Determining minimum resolvable pitch of spaced, adjacent line elements, wherein each of the line elements are separately resolvable when projected by the lithographic imaging system, and selecting a process monitor grating period; designing a process monitor grating pattern; sensitivity to dose and focus |
| 09/08/2009 | US7585600 using computers and/or software for adjustment photomasks during fabrication integrated circuits |
| 09/08/2009 | US7585599 Photomask, and method and apparatus for producing the same |
| 09/03/2009 | DE102008054581A1 Projection system for projection exposure system for manufacturing micro-and/or nanostructure semiconductor components, has carrier structure provided for supporting projection lens in floor and implemented for holding projection lens |
| 09/02/2009 | CN101520613A Device and method for calibrating mark position |
| 09/02/2009 | CN100535767C Focusing leveling measuring method and device |
| 09/01/2009 | US7582397 Photomask, and method and apparatus for producing the same |
| 09/01/2009 | US7582395 Overlay mark |
| 08/27/2009 | US20090214689 Imprint Lithography Templates Having Alignment Marks |
| 08/26/2009 | EP2093617A2 Mark structure for coarse wafer alignment and method for manufacturing such a mark structure |
| 08/26/2009 | CN101515116A Mark structure for coarse wafer alignment and method for manufacturing such a mark structure |
| 08/26/2009 | CN100533277C Lithogaphic apparatus and positioning apparatus |
| 08/19/2009 | EP2090929A2 Mold, pattern forming method, and pattern forming apparatus |
| 08/19/2009 | CN101510059A Exposure apparatus, exposure method, and method for producing device |
| 08/19/2009 | CN101510057A Multiple imaging mask-alignment and method |
| 08/19/2009 | CN101510055A Alignment system and alignment method for photolithography equipment |
| 08/19/2009 | CN100530547C Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
| 08/19/2009 | CN100529832C Mark position detection equipment |
| 08/18/2009 | US7576858 Position detecting method |
| 08/18/2009 | US7576834 Lithographic apparatus and device manufacturing method |
| 08/13/2009 | WO2009099627A1 Controlling template surface composition in nano-imprint lithography |
| 08/13/2009 | WO2009099619A2 Array and cantilever array leveling |
| 08/13/2009 | US20090202925 Photomask defect correction method, photomask manufacturing method, phase shift mask manufacturing method, photomask, phase shift mask, photomask set, and pattern transfer method |
| 08/13/2009 | US20090202136 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 08/13/2009 | US20090201505 Tunable Alignment Geometry |
| 08/13/2009 | CA2714005A1 Array and cantilever array leveling |
| 08/12/2009 | CN101504511A Photo-etching apparatus and calibration method |