| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/26/2010 | US7652751 Lithographic apparatus and device manufacturing method |
| 01/26/2010 | US7652284 Process monitor mark and the method for using the same |
| 01/26/2010 | US7651826 Semiconductor device, fabricating method thereof, and photomask |
| 01/26/2010 | US7651825 Method and system for overlay control using dual metrology sampling |
| 01/26/2010 | US7651824 Via opaque shading element disposed within auxiliary transparent substrate |
| 01/26/2010 | US7651745 Includes first plastic substrate including composite layer having resin-impregnated fiber fabric, an inorganic barrier layer formed on composite layer, a planarizing resin layer formed on inorganic barrier layer, and display medium layer formed on planarizing resin layer-side of first plastic substrate |
| 01/21/2010 | WO2010006935A2 Alignment system, lithographic system and method |
| 01/21/2010 | US20100012903 Display Device Particles, Process for Producing the Same, Image-Display Medium, and Image-Forming Device |
| 01/20/2010 | CN100582947C Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/20/2010 | CN100582934C Exposure method and exposure processing unit |
| 01/20/2010 | CN100582933C Warm-up flash two-purpose nano impression device |
| 01/19/2010 | US7649635 Method for determining a map, device manufacturing method, and lithographic apparatus |
| 01/19/2010 | US7648809 Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product |
| 01/19/2010 | US7648807 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface, respectively; avoiding defective portion |
| 01/19/2010 | US7647868 Method for feeding a printing forme to a forme cylinder of a printing press |
| 01/14/2010 | WO2010005081A1 Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method |
| 01/14/2010 | WO2010004900A1 Position measuring method, and exposure method and device |
| 01/14/2010 | US20100006443 Electrochemical Fabrication Method for Producing Compliant Beam-Like Structures |
| 01/13/2010 | CN100580563C Lithographic apparatus and method for calibrating the same |
| 01/13/2010 | CN100580559C Method for maximizing output capacity in scanning system |
| 01/12/2010 | US7646477 Method and apparatus for inspecting a pattern formed on a substrate |
| 01/12/2010 | US7646471 Lithographic apparatus, level sensor, method of inspection, device manufacturing method, and device manufactured thereby |
| 01/12/2010 | US7645546 Method for determining an overlay correlation set |
| 01/06/2010 | CN100578370C Method for producing aligning mark |
| 01/06/2010 | CN100578369C Automatic position aligning device and method for projection exposure device |
| 01/05/2010 | US7643961 Position detecting device and position detecting method |
| 01/05/2010 | US7642041 Using mask having an aperture that creates a servo pattern in a master for magnetic-contact printing; arc-shaped slit; using a wavelength of laser beam to determine a trackpitch; reducing the time required for recording a master; high-density magnetic recording applications |
| 01/05/2010 | US7642038 irradiating TiO2 photocatalyst and a silicone coupler having fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a 2nd region; patterning a conductive material to form pattern to 2nd region |
| 01/05/2010 | US7642022 Parameter determination method, exposure method, device fabrication method, and storage medium |
| 01/05/2010 | US7642021 forming a photoresist pattern on the substrate, performing a device manufacturing process using the photoresist pattern as a mask to form sensor windows on the substrate, onne or more focus error sensors are formed in the sensor windows, focus errors are determined using the focus error sensors |
| 01/05/2010 | US7642020 Method for separating optical and resist effects in process models |
| 12/30/2009 | WO2009157576A1 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method |
| 12/30/2009 | CN100576093C Optical proximity correction using chamfers and rounding at corners |
| 12/30/2009 | CN100576081C Lithographic apparatus and device manufacturing method with feed-forward focus control |
| 12/29/2009 | US7640530 Method for inspecting mask |
| 12/24/2009 | US20090317751 Optical arrangement of autofocus elements for use with immersion lithography |
| 12/24/2009 | US20090317732 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program |
| 12/24/2009 | DE102007033619B4 Verfahren zur Ermittlung von Korrekturwerten für Messwerte der Position von Strukturen auf einem Substrat Method for determining correction values for the measurement values of the position of structures on a substrate |
| 12/23/2009 | EP2135137A1 Exposure method and electronic device manufacturing method |
| 12/22/2009 | US7635547 Preparing a composite layer; forming a trench by etching the composite layer in the non-pattern areas from the second side of the membrane forming thin layer; forming an auxiliary strut by filling a support layer inside the trench; forming a main strut by removing sections of the substrate |
| 12/22/2009 | US7635545 Photomask features with interior nonprinting window using alternating phase shifting |
| 12/17/2009 | WO2009150901A1 Exposure apparatus and exposure method |
| 12/16/2009 | CN101604124A Mold, pattern forming method, and pattern forming apparatus |
| 12/16/2009 | CN100570497C Production of automatic optical approximate correcting regulation |
| 12/16/2009 | CN100570480C Method for mask design |
| 12/15/2009 | US7633619 Calibrating a lithographic apparatus |
| 12/15/2009 | US7633618 Method and apparatus for measuring the relative position of a first and a second alignment mark |
| 12/15/2009 | US7633061 Method and apparatus for measuring pattern dimensions |
| 12/15/2009 | US7632627 Photomask apparatus, photomask manufacturing method, and mask pattern forming method |
| 12/15/2009 | US7632616 Photoresists, photolithography; spectroscopy |
| 12/10/2009 | WO2009148185A1 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method |
| 12/09/2009 | EP2131245A2 Lithographic apparatus and its focus determination method |
| 12/09/2009 | EP2131244A2 Lithographic apparatus and method for measuring a pattern property |
| 12/09/2009 | EP2131243A2 Lithographic apparatus and method for calibrating a stage position |
| 12/09/2009 | CN101600993A Imprint method and imprint apparatus |
| 12/09/2009 | CN100568102C Position controlling of mass in lithographic apparatus |
| 12/09/2009 | CN100568100C Checking method and element manufacture method |
| 12/08/2009 | US7630054 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 12/08/2009 | US7630052 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 12/08/2009 | US7629093 forming a self-aligning conductive high polypyrrole layer over the frame pattern by electrochemical polymerization, then etching to remove the conductive high polymer layer by providing oxygen plasma; forming a phase shift layer and an light shielding layer over a substrate; prevent defects in wafers |
| 12/03/2009 | US20090297959 large working accuracy tolerance margin of the correction portion of a clear defect in half tone mask; shading portion having a transmissivity of 0 to 2% or 2 to 6% in the removed opaque defect portion; semitransparent portion having a transmissivity larger than shading portion at the peripheral portion |
| 12/03/2009 | US20090297958 Exposure mask and exposure method using the same |
| 12/03/2009 | US20090296061 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| 12/02/2009 | CN101593744A Alignment mark and manufacture method thereof |
| 12/02/2009 | CN100565355C Manufacturing system in electronic devices |
| 12/02/2009 | CN100565354C Lithographic apparatus and method of measurement |
| 12/01/2009 | US7627179 Image processing apparatus, image processing method, exposure apparatus, and device manufacturing method |
| 12/01/2009 | US7626680 Exposure apparatus and device fabrication method using the same |
| 12/01/2009 | US7626185 Patterning compositions, masks, and methods |
| 12/01/2009 | US7625679 Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate |
| 12/01/2009 | US7625675 Method for producing masks for photolithography and the use of such masks |
| 11/25/2009 | CN101587824A Registration mark and manufacturing method thereof |
| 11/25/2009 | CN101587307A Exposure aligning method and exposure apparatus |
| 11/25/2009 | CN101587306A Alignment signal processing method in photoetching technology |
| 11/25/2009 | CN100562805C Lightscribing device and mfg. method of such device |
| 11/24/2009 | CA2388387C Method for synchronizing positioning and exposure processes |
| 11/19/2009 | WO2002073310A3 Binary and phase-shift photomasks |
| 11/19/2009 | US20090284744 Apparatus and methods for detecting overlay errors using scatterometry |
| 11/19/2009 | US20090284720 Lithographic Apparatus and Device Manufacturing Method |
| 11/18/2009 | EP2118706A2 Imprint method and imprint apparatus |
| 11/18/2009 | CN101581889A Alignment mark, alignment system and alignment method for photomask processor |
| 11/17/2009 | US7619738 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus |
| 11/17/2009 | US7618755 performing an exposure process for substrates in lithography tools using an automated focus adjustment process on the basis of focus tilt parameter; using a fault detection module; determining a current focus fault status on the basis of current value and a statistical value; wafers; cost efficiency |
| 11/17/2009 | US7618754 Multilayer; radiation transparent substrate; shielded zones; exposure to light |
| 11/11/2009 | CN101576715A Calibration method for microscopic imaging systems |
| 11/11/2009 | CN101576714A Alignment datum plate of photoetching device and manufacturing method thereof |
| 11/11/2009 | CN100559285C Projection exposure apparatus and method for producing a printed circuit board |
| 11/11/2009 | CN100559283C Method for measuring Cube-Prism non-orthogonality angle and scale factor correct value |
| 11/11/2009 | CN100559282C Method for improving alignment signal processing precision based on self-adapting correction treatment |
| 11/11/2009 | CN100559278C Optical system of focusing and leveling sensor |
| 11/11/2009 | CN100559274C Projection exposure device |
| 11/11/2009 | CN100559273C Photoetching device and measuring system |
| 11/10/2009 | US7616373 Display device particles, process for producing the same, image-display medium, and image-forming device |
| 11/10/2009 | US7615320 Method for fabricating color filler substrate |
| 11/10/2009 | US7615319 Quick and accurate modeling of transmitted field |
| 11/05/2009 | US20090274974 Spin-on graded k silicon antireflective coating |
| 11/04/2009 | EP1634122B1 Method for evaluating the effects of multiple exposure processes in lithography |
| 11/03/2009 | US7611810 Multi-charged beam optical system includes lens array and pattern forming plate configured to select portion of lens array to be used to form structures; apparatus includes controller configured to control exchange of pattern forming plate in accordance with arrangement pattern of structures to be formed |
| 10/29/2009 | WO2009129974A1 Apparatus and method of measuring a property of a substrate |
| 10/29/2009 | WO2009129771A1 Process for the aligned joining of the surfaces of two workpieces |