Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
05/2010
05/04/2010US7708542 Device for holding a template for use in imprint lithography
04/2010
04/29/2010US20100104986 Method for forming pattern
04/29/2010US20100104173 Method And Apparatus For Inspecting A Pattern Formed On A Substrate
04/29/2010US20100103433 Differential critical dimension and overlay metrology apparatus and measurement method
04/28/2010EP1334330B1 Position measuring device and method for determining a position
04/28/2010CN1646994B Attenuated embedded phase shift photomask blanks
04/27/2010US7707542 Creating a situation repository
04/27/2010US7704653 Method of data encoding, compression, and transmission enabling maskless lithography
04/27/2010US7704652 Exposure operation evaluation method for exposure apparatus and manufacturing method for semiconductor device
04/27/2010US7704645 Method of generating writing pattern data of mask and method of writing mask
04/20/2010USRE41232 Wafer positioner with planar motor and mag-lev fine stage
04/20/2010US7700247 Differential critical dimension and overlay metrology apparatus and measurement method
04/15/2010WO2010042230A1 Complementary alignment marks for imprint lithography
04/15/2010WO2010042141A2 Energy sources for curing in an imprint lithography system
04/15/2010WO2010042140A2 Template having alignment marks formed of contrast material
04/15/2010WO2010040185A1 A positioning system and method
04/15/2010US20100091284 Apparatus and methods for detecting overlay errors using scatterometry
04/15/2010CA2776784A1 A positioning system and method
04/14/2010CN201438258U Exposure para-position lighting platform for para-position of base plate of printed circuit board and photo-plotting plate
04/14/2010CN101165597B Aligning system and lightscribing device using the system
04/13/2010US7695887 Method for producing pattern-forming body
04/13/2010US7695876 Method for identifying and using process window signature patterns for lithography process control
04/13/2010US7695872 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing
04/08/2010WO2010038368A1 Method for measuring sample and measurement device
04/07/2010CN1514306B Manufacturing method of photoetching equipment and device, and device obtained therefrom
04/06/2010US7691549 high resolution; photomasks; photoresists
04/06/2010US7691548 photomasks; photoresists; etching; semiconductors
04/06/2010US7691542 Projects images of grating pattern and test pattern; photoresists
04/06/2010US7691541 Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height
04/06/2010US7691279 Method of producing a glass substrate for a mask blank and method of producing a mask blank
04/01/2010DE102009041260A1 System und Prozess zum Herstellen von Halbleiter-Packages System and process for manufacturing semiconductor packages
04/01/2010DE102005009554B4 Verfahren zur Fokuskorrektur eines Belichtungsgeräts bei der lithographischen Projektion und Verfahren zur Auswertung von Messergebnissen eines Messgeräts für die Fokuskorrektur eines Belichtungsgeräts in einer Halbleiterfertigungsanlage Method of focus correction of an exposure apparatus for the lithographic projection and methods for evaluation of measurement results of a measuring instrument for the focus correction of an exposure apparatus in a semiconductor fabrication facility
03/2010
03/31/2010CN101689028A Method for processing pattern data and method for manufacturing electronic device
03/31/2010CN101689025A Movable body apparatus
03/31/2010CN101689024A Movable body apparatus
03/31/2010CN101688794A systems and methods for fabricating displacement scales
03/31/2010CN101685275A Alignment mark, making method and detection device thereof
03/30/2010US7687211 photomasks, photoresists
03/30/2010US7687210 Space tolerance with stitching
03/30/2010US7687209 Lithographic apparatus and device manufacturing method with double exposure overlay control
03/25/2010US20100073688 Periodic patterns and technique to control misalignment between two layers
03/24/2010EP2165162A2 Total internal reflection displacement scale
03/24/2010CN101681118A Exposure method and electronic device manufacturing method
03/24/2010CN101680780A Total internal reflection displacement scale
03/24/2010CN101676805A Lithographic apparatus and device manufacturing method
03/24/2010CN100595681C Full phase shifting mask in damascene process
03/23/2010US7685560 Method and apparatus for monitoring exposure process
03/23/2010US7684040 Overlay mark and application thereof
03/23/2010US7682755 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
03/18/2010WO2010029860A1 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
03/17/2010EP2162705A2 Systems and methods for fabricating displacement scales
03/17/2010CN101673059A Lithographic apparatus and device manufacturing method
03/17/2010CN101673058A Lithographic apparatus and device manufacturing method
03/17/2010CN100594127C Method and equipment for providing registration image on printing plate
03/11/2010WO2010006935A3 Alignment system, lithographic system and method
03/11/2010US20100060898 Methods and systems for interferometric analysis of surfaces and related applications
03/09/2010US7674561 Mask blanks and method of producing the same
03/04/2010WO2010025198A1 Method of patterning a substrate using dual tone development
03/04/2010US20100055584 Exposure device and exposure method
03/04/2010US20100055583 Method for fabicating color filter substrate
03/04/2010US20100051943 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
03/02/2010US7672000 Position detecting method and apparatus
03/02/2010US7670755 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern
03/02/2010US7670731 Method for exposing a substrate and lithographic projection apparatus
03/02/2010US7670730 Lithographic apparatus and device manufacturing method
02/2010
02/25/2010US20100044594 Apparatus for aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
02/24/2010EP1573403B1 Resistor structures to electrically measure unidirectional misalignment of stitched masks
02/24/2010CN101655673A Automatic synchronous lifting system
02/23/2010US7668343 Surface position measuring method and apparatus
02/23/2010US7667216 Method of achieving CD linearity control for full-chip CPL manufacturing
02/23/2010US7666577 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching
02/23/2010US7666559 Structure and method for determining an overlay accuracy
02/23/2010US7665983 Microcontact printing
02/17/2010CN101652720A Exposure apparatus, exposure method, and electronic device manufacturing method
02/17/2010CN101652719A Exposure method and electronic device manufacturing method
02/17/2010CN100590523C Photomask and its production method, and pattern forming method
02/16/2010US7663753 Apparatus and methods for detecting overlay errors using scatterometry
02/16/2010US7662524 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched
02/16/2010US7662522 Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
02/16/2010US7661827 Image processing system, projector, computer-readable storage medium, and image processing method
02/11/2010WO2010016550A1 A substrate treating method, a substrate treating apparatus, an exposure method, and a device manufacturing method
02/10/2010CN100589030C Method for implementing key size linear control in whole-chip chrome-less photoetching technique production
02/09/2010US7658601 Pattern forming apparatus
02/04/2010WO2010012589A1 Alignment of collector device in lithographic apparatus
02/03/2010EP2149972A1 Alignment apparatus and exposure apparatus using the same
02/03/2010CN100587608C Aligning system used for photolithography equipment
02/03/2010CN100587549C Compact device for printing-plate imaging
02/02/2010US7656528 Periodic patterns and technique to control misalignment between two layers
02/02/2010US7656504 Projection exposure apparatus with luminous flux distribution
02/02/2010US7655390 Has interface structure between negative dielectrics and dielectric; is provided with configuration in which plasmon intensity with respect to microstructure in surface or in vicinity thereof is detected by interface structure and positional relationship between interface and microstructure is detected
02/02/2010US7655388 Mask and method to pattern chromeless phase lithography contact hole
02/02/2010US7655369 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
02/02/2010US7655368 Method for exposing a substrate and lithographic projection apparatus
02/02/2010US7655367 Lithographic apparatus and device manufacturing method
02/02/2010US7655364 formed with resist pattern by electron beam writing and having light-shielding film and etching mask film of inorganic-based material resistant to etching, on transparent substrate
02/02/2010US7655362 Masks of semiconductor devices and methods of forming mask patterns
01/2010
01/28/2010WO2010010224A1 System for aligning patterns on a substrate using stencil lithography
01/28/2010WO2010009948A1 Laser interferometer systems and methods with suppressed error and pattern generators having the same
01/28/2010WO2010009930A1 Sub-wavelength segmentation in measurement targets on substrates
01/28/2010US20100021045 Manufacturing method of printed circuit board and manufacturing apparatus for the same
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