| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/20/2010 | US7759660 Electron beam lithography system |
| 07/20/2010 | US7759051 Laser mask and method of crystallization using the same |
| 07/20/2010 | US7759029 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation |
| 07/20/2010 | US7759027 inputting patterns to be formed on surface, subset of patterns being slightly different variations of each other and selecting set of characters some of which are complex characters to be used to form number of patterns, and reducing shot count or total write time by use of character varying technique |
| 07/20/2010 | US7759026 Method and system for manufacturing a reticle using character projection particle beam lithography |
| 07/15/2010 | DE102004063140B4 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same |
| 07/13/2010 | US7754401 plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface; shots within plurality of shots are allowed to overlap each other; dosages of the shots may also be allowed to vary; method may be used in manufacturing an integrated circuit using direct write |
| 07/13/2010 | US7754400 photolithographic methods employed in manufacture of integrated circuits such as very large-scale integrated circuits and more specifically, improved methods for generating patterns of masks or reticles; variance in critical dimension (CD) of feature size is tightly controlled |
| 07/08/2010 | US20100173234 Photomask producing method and photomask blank |
| 07/08/2010 | US20100173033 Device for Holding a Template for Use in Imprint Lithography |
| 07/07/2010 | EP2204697A2 Marker structure, lithographic projection apparatus, method for substrate alignment using such a structure, and substrate comprising such marker structure |
| 07/07/2010 | CN1746775B Lithographic apparatus and device manufacturing method |
| 07/06/2010 | US7751047 Alignment and alignment marks |
| 07/06/2010 | US7750295 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof |
| 07/06/2010 | US7749665 photoresists, photomasks; immersion lithography; latent images |
| 07/06/2010 | US7749663 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 07/01/2010 | WO2010075158A1 Roll-to-roll digital photolithography |
| 07/01/2010 | WO2010073226A2 Production of high alignment marks and such alignment marks on a semiconductor wafer |
| 07/01/2010 | US20100169042 System for measuring a shape, method for measuring a shape, and computer program product |
| 07/01/2010 | DE102008064504A1 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie The projection exposure method and projection exposure system for microlithography |
| 06/29/2010 | US7746446 Alignment condition determination method and apparatus of the same, and exposure method and apparatus of the same |
| 06/29/2010 | US7745842 Graytone mask and method thereof |
| 06/29/2010 | US7745078 Method and system for manufacturing a reticle using character projection lithography |
| 06/29/2010 | US7745073 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 06/24/2010 | US20100159709 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method |
| 06/23/2010 | EP2199860A1 Method and system for measuring a position of an object. |
| 06/23/2010 | CN1751378B Detection method for optimum position detection formula, alignment method, exposure method, device production method, and device |
| 06/23/2010 | CN101349869B System and method for aligning silicon chip by signal processing method |
| 06/16/2010 | CN101738882A Alignment mark detecting method and apparatus |
| 06/16/2010 | CN101738881A Two-stage image precise contraposition method for upper plate and lower plate and device thereof |
| 06/16/2010 | CN101194210B Exposing method and device |
| 06/10/2010 | WO2010042141A3 Energy sources for curing in an imprint lithography system |
| 06/10/2010 | WO2010042140A3 Template having alignment marks formed of contrast material |
| 06/10/2010 | DE102008060293A1 Verfahren und Vorrichtung zur Messung des relativen lokalen Lagefehlers eines der Abschnitte eines abschnittsweise belichteten Objektes Method and device for measuring the relative local position error of the portions of a partially exposed object |
| 06/09/2010 | CN1800991B Scanning exposure method and scanning exposure apparatus manufacture method |
| 06/09/2010 | CN1519955B Thin film transistor array panel, its manufacture method and mask for such panel |
| 06/09/2010 | CN101727026A Device and method for improving screen printing precise alignment by using contact photoetching machine |
| 06/09/2010 | CN101727011A Alignment method of lithography machine |
| 06/09/2010 | CN101452912B Device for forming alignment mark on back surface, and method for forming alignment mark |
| 06/09/2010 | CN101329515B Device and method for measuring and checking step photoetching machine aligning system |
| 06/09/2010 | CN101241311B Superimposed motor based material transmission system possessing mask station function and its method |
| 06/08/2010 | US7732120 Method for making soft pellicles |
| 06/08/2010 | US7732110 Method for exposing a substrate and lithographic projection apparatus |
| 06/08/2010 | US7732109 Through active compensation by an exposure tool such as the system 600, based on an effective focus and exposure dose determined from a critical dimension and a side-wide angle measured by scatterometry-based optical critical dimension technology; for semiconductor manufacture |
| 06/08/2010 | US7732108 Method for OPC model generation |
| 06/08/2010 | US7732105 photomask substrate including chip region and scribe lane region, with overlay mark formed in scribe lane region; overlay mark includes sub-overlay marks; each includes plurality of unit regions sequentially connected to each other and having different widths, where width of given unit region is constant |
| 06/02/2010 | EP2191333A1 Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method |
| 06/02/2010 | CN1739066B Electron beam processing technology for mask repair |
| 06/02/2010 | CN101720449A Image sensor for lithography |
| 06/02/2010 | CN101718956A Exposure method and alignment device thereof for substrate manufacturing |
| 06/02/2010 | CN101303533B Aligning system, aligning method for photolithography equipment and enhancement type aligning mark |
| 06/02/2010 | CN101299132B Aligning mark used for photolithography equipment aligning system and its use method |
| 06/02/2010 | CN101276150B Stepping repeat exposure device |
| 06/02/2010 | CN101261450B Zero position automatically adjustable focusing and leveling measuring device and its usage method |
| 06/02/2010 | CN101246314B Silicon slice alignment signal processing method |
| 06/02/2010 | CN101211124B Coaxial aligning achromatic optical system |
| 06/02/2010 | CN101146408B Wiring forming system and wiring forming method for forming wiring on wiring board |
| 06/01/2010 | US7727853 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 06/01/2010 | US7727687 Method and apparatus for determining whether a sub-resolution assist feature will print |
| 06/01/2010 | US7727681 regeneration transmission to quartz substrate doped with gallium; using etching gas; radiation transparent; controlling thickness; photolithography |
| 05/27/2010 | DE102008024104A1 Materialmarkensensor und Verfahren zum Erfassen einer Markierung auf oder in einem Material Material mark sensor and method for detecting a mark on or in a material |
| 05/26/2010 | EP2189843A2 Imprinting machine and device manufacturing method |
| 05/26/2010 | CN1688934B Method for fabricating semiconductor device |
| 05/26/2010 | CN1637620B Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 05/26/2010 | CN1577722B Image correcting method ,system and mask, semiconductor producing method and semiconductor device |
| 05/26/2010 | CN1577096B Calibration method for a lithographic apparatus and device manufacturing method |
| 05/26/2010 | CN101713929A Lithographic apparatus and device manufacturing method |
| 05/26/2010 | CN101713920A 半导体器件 Semiconductor devices |
| 05/26/2010 | CN101713912A Alignment mark of mask |
| 05/26/2010 | CN101122752B Centering device and exposure device |
| 05/25/2010 | US7724370 Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell |
| 05/20/2010 | WO2010055660A1 Flat panel display manufacturing method |
| 05/20/2010 | DE102009020320A1 Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen Method and apparatus for increasing the resolution and / or the speed of exposure systems |
| 05/19/2010 | CN101419407B Stacked photolithography alignment mark |
| 05/19/2010 | CN101158816B Time sharing alignment apparatus and alignment method |
| 05/19/2010 | CN101149564B Alignment mark and its imaging optical system and imaging method |
| 05/19/2010 | CN101135860B Light scribing device and Aligning system and aligning method used for light scribing device |
| 05/19/2010 | CN101114134B Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine |
| 05/18/2010 | US7718348 integrated circuits; photoresists |
| 05/18/2010 | US7718327 Overlay management method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, device manufacturing system and device manufacturing method, and program and information recording medium |
| 05/18/2010 | US7718326 Seamless stitching of patterns formed by interference lithography |
| 05/14/2010 | WO2010053536A2 Substrate alignment |
| 05/14/2010 | WO2010053519A2 Alignment for edge field nano-imprinting |
| 05/12/2010 | EP2184643A2 Exposure device |
| 05/12/2010 | DE102008020645A1 Verfahren zum justierten Fügen der Flächen von zwei Werkstücken Method for joining the aligned surfaces of two workpieces |
| 05/12/2010 | CN1949087B Aligning system of photoetching apparatus and steping combined system of said aligning system thereof |
| 05/11/2010 | US7713667 producing a pattern with pattern generator using modified pattern data set, patterning the beam of radiation with the pattern generator having the pattern based on the production, and projecting the patterned beam onto a target portion of an object |
| 05/11/2010 | US7713664 Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate |
| 05/11/2010 | US7713578 includes bank forming step of forming banks in predetermined pattern on substrate, disposing first liquid droplets made of a function liquid between banks to form pattern, disposing second liquid droplets made of function liquid on said first pattern, and drying step |
| 05/06/2010 | WO2010051015A1 Optical system for use in stage control |
| 05/06/2010 | US20100112485 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/05/2010 | CN1811599B System and method for forming patterns on basis material |
| 05/05/2010 | CN1766740B Optical position assessment apparatus and method |
| 05/05/2010 | CN1702562B Image recording apparatus and method for use therewith |
| 05/05/2010 | CN101702079A Method for accurately determining height of space image |
| 05/04/2010 | US7709304 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 05/04/2010 | US7709180 A pellicle for use in semiconductor lithography, comprising a radiation transparent, cross-linked polytetrefluoroethylene film; cost efficient |
| 05/04/2010 | US7709166 Measuring the effect of flare on line width |
| 05/04/2010 | US7709165 Image enhancement for multiple exposure beams |
| 05/04/2010 | US7709161 Photomask producing method and photomask blank |