| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 10/19/2010 | US7816062 obtaining scanning electron microscopy image of target pattern |
| 10/19/2010 | US7816060 photosensitive resin films with selective opening patterns; photoresists |
| 10/14/2010 | WO2010073226A3 Production of high alignment marks and such alignment marks on a semiconductor wafer |
| 10/14/2010 | WO2010053536A3 Substrate alignment |
| 10/14/2010 | DE102009015594A1 Verfahren und Vorrichtung zur subpixelgenauen Positionsbestimmung einer Kante einer Markerstruktur in einer Vielzahl von Aufnahmepixeln aufweisenden Aufnahme der Markerstruktur Method and apparatus for subpixel positioning an edge of a marker structure in a variety of recording pixels comprising receiving the marker structure |
| 10/13/2010 | EP2239632A1 Method and apparatus for angular-resolved spectroscopic lithography characterization |
| 10/13/2010 | CN201607610U 一种新型对位标记 A new alignment mark |
| 10/13/2010 | CN101861636A Flat panel display manufacturing method |
| 10/13/2010 | CN101398630B Aligning and stacking marker, mask structure and using method thereof |
| 10/13/2010 | CN101093366B Conveyer |
| 10/12/2010 | US7812972 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 10/12/2010 | US7812927 Scanning exposure technique |
| 10/12/2010 | US7811727 Method for determining an exposure dose and exposure apparatus |
| 10/12/2010 | US7811720 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects |
| 10/07/2010 | WO2010113525A1 Exposure apparatus, exposure method and device manufacturing method |
| 10/06/2010 | CN101852992A Apparatus and method for optical position assessment |
| 10/05/2010 | US7807342 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 10/05/2010 | US7807323 light emitted from excimer laser applied to photomask pattern, diffracted light is projected onto substrate via projection lens; dimensional stability |
| 10/05/2010 | US7807322 comprises mask substrate divided into first and second regions equally arranged to upper and lower sides on different sides, respectively, first mask pattern formed on first region of mask substrate,and second mask pattern formed on second region of mask substrate; minimizes yield reduction, cycle time |
| 10/05/2010 | US7807320 mask for forming bullet portion of overlay target, comprising first structure on mask formed from first plurality of sub-structures, all oriented along first orientation and second structure on mask, second structure formed from second plurality of sub-structures, oriented along second orientation |
| 09/30/2010 | US20100248098 Image forming apparatus, image forming method, and storage medium in which abnormality judging program is stored |
| 09/29/2010 | EP2232538A1 Spatial phase feature location |
| 09/29/2010 | EP2232531A1 Method for making structures with improved edge definition |
| 09/29/2010 | CN1947069B Exposure apparatus |
| 09/29/2010 | CN101846889A Exposure apparatus |
| 09/29/2010 | CN101458454B Method for simultaneously monitoring photolithography exposure condition and registration photoetching precision |
| 09/29/2010 | CN101194214B Stage apparatus |
| 09/29/2010 | CN101059661B Lithographic apparatus and device manufacturing method |
| 09/28/2010 | US7804994 Overlay metrology and control method |
| 09/28/2010 | US7804584 Integrated circuit manufacturing methods with patterning device position determination |
| 09/28/2010 | US7803506 Methods of measuring critical dimensions and related devices |
| 09/28/2010 | US7803501 photoresists; liquid crystal display panels |
| 09/22/2010 | CN1808625B Flat roof device |
| 09/22/2010 | CN101840166A Level sensor arrangement for lithographic apparatus and device manufacturing method |
| 09/22/2010 | CN101840159A Lithographic apparatus and device manufacturing method |
| 09/22/2010 | CN101587824B Registration mark and manufacturing method thereof |
| 09/21/2010 | US7799489 Method for design and manufacture of a reticle using variable shaped beam lithography |
| 09/16/2010 | US20100233309 Release surfaces, particularly for use in nanoimprint lithography |
| 09/15/2010 | EP2228685A2 Level sensor arrangement for lithographic apparatus and device manufacturing method |
| 09/15/2010 | CN1758140B Lithographic apparatus and position measuring method |
| 09/15/2010 | CN101276160B Focusing and leveling device for photo-etching machine as well as measuring method |
| 09/15/2010 | CN101251725B Aligning system, mark, method for lithographic device and lithographic device thereof |
| 09/15/2010 | CN101251724B Aligning system, method and lithographic device thereof |
| 09/15/2010 | CN101169601B Focusing leveling measuring system |
| 09/14/2010 | US7795603 Lithographic apparatus and device manufacturing method |
| 09/14/2010 | US7795105 Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement |
| 09/14/2010 | US7794903 making a semiconductor device, by using a lithography mask having a plurality of corner rounding test patterns formed thereon; improved methods of measuring corner rounding of lithography; prevent human errors and variations |
| 09/14/2010 | US7794901 formed with resist pattern by electron beam writing and having laminated film including a first film and a second film; first film is not charged up during patterning, second film is charged up during the patterning by the electron beam writing; prevent mask film from being formed at the side surface |
| 09/14/2010 | US7794900 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface; avoiding defective portion; semiconductors |
| 09/14/2010 | US7794897 forming a desired pattern on a wafer by changing design pattern based on the allowable dimensional change quantity defined for the each design pattern; photomasking |
| 09/07/2010 | US7793252 Mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 09/07/2010 | US7790335 Photomask and manufacturing method of semiconductor device |
| 09/02/2010 | WO2010098371A1 Exposure apparatus |
| 09/02/2010 | WO2010053519A3 Alignment for edge field nano-imprinting |
| 09/02/2010 | DE102009060277A1 Verfahren zur Herstellung von Justiermarken für licht-undurchlässige bzw. licht-absorbierende Schichten (Light-Shield-Resistmasken) Process for the preparation of alignment marks for light-impervious or light-absorbing layers (light-shield resist masks) |
| 09/01/2010 | CN1756992B Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 08/31/2010 | US7787102 Real-time configurable masking |
| 08/31/2010 | US7786607 Overlay correction by reducing wafer slipping after alignment |
| 08/31/2010 | US7785755 forming a photoresist layer on a substrate, then forming of test patterns by scanning and projecting an image of a photomask pattern onto the layer at varied intensities, calculating a target value intensity and using that on a second photoresist layer |
| 08/25/2010 | EP1728106B1 Method for imaging regular patterns |
| 08/25/2010 | CN1690848B Image recording apparatus |
| 08/25/2010 | CN1542551B Focus spot monitoring in a lithographic projection apparatus |
| 08/25/2010 | CN101241319B Machine vision aligning system possessing mask target hierarchy and its alignment method |
| 08/25/2010 | CN101226340B A scatterometer, a lithographic apparatus and a focus analysis method |
| 08/25/2010 | CN101226339B FIFO data storage system containing multiple capture channels and method thereof |
| 08/25/2010 | CN101216686B Wafer pre-aligning platform and wafer pre-alignment method using the platform |
| 08/24/2010 | US7784016 Method and system for context-specific mask writing |
| 08/24/2010 | US7781237 Alignment marker and lithographic apparatus and device manufacturing method using the same |
| 08/19/2010 | US20100209680 Methods for producing pattern-forming body |
| 08/18/2010 | CN1918516B Lithographic apparatus, method of calibration |
| 08/18/2010 | CN1823294B Alignment of elements of a display apparatus |
| 08/18/2010 | CN101807014A Method for measuring alignment accuracy of machine vision system |
| 08/18/2010 | CN101238416B Exposure device and object to be exposed |
| 08/17/2010 | US7776151 Method and apparatus for forming crystalline portions of semiconductor film |
| 08/11/2010 | CN1871555B Forming partial-depth features in polymer film |
| 08/11/2010 | CN1495540B Alignment system of photoetching system utilizing at least two wavelengths and its method |
| 08/11/2010 | CN101802719A Method and apparatus for measurement and control of photomask to substrate alignment |
| 08/11/2010 | CN101799640A Device and method for determining optimal focal plane position of lithography machine |
| 08/11/2010 | CN101799634A Multichannel collecting and correcting device of alignment signal of photoetching machine |
| 08/11/2010 | CN101408732B Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system |
| 08/10/2010 | US7773199 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 08/10/2010 | US7771906 Exposure method |
| 08/10/2010 | US7771905 calculating an offset of focus position based on information of the shape of the pattern, calculating the offset of the exposure dose based on the shift amount and the offset of the focus position; less likely to be affected by the extrinsic factor or a fluctuation of the lithography environment |
| 08/10/2010 | US7771904 Photomask, and method and apparatus for producing the same |
| 08/10/2010 | US7771897 Resist-pattern forming method capable of improving the positional accuracy of a resist pattern by performing multiple-exposure through use of a mask pattern in a cellular form; pattern can beformed changing in film thickness on the overlying layer by performing development |
| 08/05/2010 | WO2010087352A1 Alignment method, exposure method, electronic device fabrication method, alignment device, and exposure device |
| 08/04/2010 | EP1709490B1 Differential critical dimension and overlay metrology |
| 08/03/2010 | US7768624 Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
| 07/29/2010 | DE102007010223B4 Verfahren zur Bestimmung geometrischer Parameter eines Wafers und Verwendung des Verfahren bei der optischen Inspektion von Wafern A method for determining geometric parameters of a wafer and use of the method for the optical inspection of wafers |
| 07/28/2010 | CN101788770A Method and apparatus for assembling pellicle on optical mask and its assembly |
| 07/28/2010 | CN101788769A Method for forming semiconductor device layer by exposure |
| 07/28/2010 | CN101788768A Exposure method |
| 07/27/2010 | USRE41455 Objective lens for optical disks having different thicknesses |
| 07/27/2010 | US7763404 Modifiable resist layer for providing a first set of optical properties before exposure and a second set of optical properties after exposure; improving the accuracy of measurements made using optical metrology; electronic devices, integrated circuits |
| 07/27/2010 | US7763403 Method and system for overlay control using dual metrology sampling |
| 07/27/2010 | US7763396 Method and apparatus for fabricating semiconductor chips using varying areas of precision |
| 07/21/2010 | CN201532522U Alignment target pattern for negative exposure |
| 07/21/2010 | CN101782720A Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine |
| 07/20/2010 | US7760360 Monitoring a photolithographic process using a scatterometry target |
| 07/20/2010 | US7760274 Programmable mask for fabricating biomolecule array or polymer array, apparatus for fabricating biomolecule array or polymer array including the programmable mask, and method of fabricating biomolecule array or polymer array using the programmable mask |