| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 01/18/2011 | US7871744 Near-field exposure apparatus and near-field exposure method |
| 01/13/2011 | WO2011003736A1 Lithographic apparatus and device manufacturing method |
| 01/13/2011 | US20110006401 Method and system for combining photomasks to form semiconductor devices |
| 01/13/2011 | DE102005005896B4 Verwendung einer Beleuchtungsvorrichtung in einem Bestückautomaten Using a lighting apparatus in a placement |
| 01/12/2011 | CN101946305A Method for making structures with improved edge definition |
| 01/12/2011 | CN101943865A Alignment marks for photoetching equipment and alignment method |
| 01/12/2011 | CN101382738B Lithographic projection apparatus |
| 01/11/2011 | US7868629 Proportional variable resistor structures to electrically measure mask misalignment |
| 01/11/2011 | US7868473 Wafer target design and method for determining centroid of wafer target |
| 01/06/2011 | WO2011001816A1 Alignment method, alignment device, and exposure device |
| 01/06/2011 | WO2011000870A1 Processing system |
| 01/06/2011 | US20110001974 Alignment apparatus and fabrication apparatus for planar member and alignment method and fabrication method for planar member |
| 01/06/2011 | US20110001955 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle |
| 01/05/2011 | CN101938884A Explosion positioning method of manually made PCB (Printed Circuit Board) |
| 01/05/2011 | CN101655673B Automatic synchronous lifting system |
| 01/04/2011 | US7865328 Position detecting method and apparatus |
| 01/04/2011 | US7864406 Display device particles, process for producing the same, image-display medium, and image-forming device |
| 01/04/2011 | US7862965 photoresists; Scanning Electron Microscope, Charge-Coupled Device camera, image analysis device |
| 01/04/2011 | US7862962 Integrated circuit layout design |
| 12/29/2010 | CN101932976A Method of producing a microstructured product |
| 12/29/2010 | CN101587306B Alignment signal processing method in photoetching technology |
| 12/29/2010 | CN101551595B Temperature control method for projection objective of photoetching machine |
| 12/29/2010 | CN101487991B Silicon slice alignment system |
| 12/29/2010 | CN101477319B Optical system used for focusing and leveling |
| 12/28/2010 | US7859665 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 12/28/2010 | US7859645 Masks and methods of manufacture thereof |
| 12/28/2010 | US7858404 Measurement of overlay offset in semiconductor processing |
| 12/28/2010 | US7858276 lithography; printed circuits; scatterometry; dies; post exposure bake |
| 12/28/2010 | US7858275 Photosensitive resin composition and color filter |
| 12/23/2010 | WO2010147019A1 Alignment method, alignment device, and exposure device |
| 12/23/2010 | US20100321656 Transmission mask with differential attenuation to improve iso-dense proximity |
| 12/23/2010 | US20100320613 Integrated circuit arrangement with an auxiliary indentation, particularly with aligning marks |
| 12/23/2010 | DE10393131B4 Verfahren zum Herstellen von Maskenrohlingen A method for producing mask blanks |
| 12/22/2010 | EP2264524A2 High-resolution overlay alignement methods and systems for imprint lithography |
| 12/22/2010 | EP2264523A2 A method of forming a pattern on a substrate in imprint lithographic processes |
| 12/22/2010 | EP2264522A2 Method of forming a pattern on a substrate |
| 12/22/2010 | CN101923296A Making method of photoetching fiducial mark in process of making NVM (Non-Volatile Memory) device |
| 12/22/2010 | CN101923295A Rotary label and method for monitoring photolithographic quality using same |
| 12/21/2010 | US7855047 multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking; improved accuracy |
| 12/21/2010 | US7855038 Mask patterns for semiconductor device fabrication and related methods and structures |
| 12/21/2010 | US7855035 in the second exposure, an exposure light is incident on a region where the inspection mark is projected in the first exposure |
| 12/15/2010 | CN101918898A Lithographic apparatus, method for levelling an object, and lithographic projection method |
| 12/15/2010 | CN101916040A Focal plane detection system and focal plane detection method suitable for projection lithography system |
| 12/15/2010 | CN101281378B Nanometer photolithography aligning system |
| 12/08/2010 | CN201667001U Alignment marking part |
| 12/08/2010 | CN1488998B Optical etching device and manufacturing method |
| 12/08/2010 | CN101908526A Alignment mark arrangement and alignment mark structure |
| 12/08/2010 | CN101544150B Precision compensation method for pen type graph plotter based on error field |
| 12/08/2010 | CN101526748B Memory device, method and aligning control system for photoetching aligning data detection |
| 12/08/2010 | CN101465310B Alignment method between different platform during silicon wafer making process |
| 12/08/2010 | CN101385122B Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| 12/07/2010 | US7848832 Alignment apparatus |
| 12/07/2010 | US7846624 simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners; reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using aperture plate is exposed onto resist coated wafer |
| 12/07/2010 | US7846521 Printable and splittable medium |
| 12/01/2010 | EP2255249A1 Plate pallet alignment system |
| 12/01/2010 | CN101900938A Apparatus and method for providing resist alignment marks in a double patterning lithographic process |
| 12/01/2010 | CN101900933A Base plate based on mask plate exposure process and aligning method thereof |
| 12/01/2010 | CN101349876B Immersion lithographic apparatus and device manufacturing method |
| 12/01/2010 | CN101063829B Overlay measuring method and overlay measuring apparatus using the same |
| 11/30/2010 | US7842933 System and method for measuring overlay errors |
| 11/30/2010 | US7842442 Method and system for reducing overlay errors within exposure fields by APC control strategies |
| 11/30/2010 | US7842437 High-resolution, patterned-media master mask |
| 11/24/2010 | EP2252916A1 Method of producing a microstructured product |
| 11/24/2010 | CN101893825A Tunable wavelength illumination system |
| 11/23/2010 | US7838310 Tunable alignment geometry |
| 11/23/2010 | US7838185 Focus measurement method and method of manufacturing a semiconductor device |
| 11/23/2010 | CA2387427C Composite relief image printing elements |
| 11/18/2010 | WO2009085004A8 Method of producing a microstructured product |
| 11/17/2010 | EP2250533A2 Array and cantilever array leveling |
| 11/17/2010 | CN201638003U Laser direct-write device for manufacturing of panel circuit |
| 11/17/2010 | CN101452228B Automatic aligner |
| 11/16/2010 | US7834977 Lithographic apparatus and device manufacturing method |
| 11/16/2010 | US7834976 Exposure apparatus and method for producing device |
| 11/16/2010 | US7833387 Thin film patterning; metal film is formed on side wall of sputtering target to prevent bonding agent from being exposed |
| 11/10/2010 | CN1981244B Exposure equipment |
| 11/10/2010 | CN1818796B Light-intensity data bus system and bus controller |
| 11/09/2010 | US7830497 System and method for using a two part cover and a box for protecting a reticle |
| 11/09/2010 | US7829249 Device manufacturing method, computer program and lithographic apparatus |
| 11/04/2010 | WO2010125813A1 Exposure method, method for manufacturing device, and method for measuring superposition error |
| 11/04/2010 | WO2010124791A1 Method and calibration mask for calibrating a position measuring apparatus |
| 11/04/2010 | DE102009019140A1 Verfahren und Kalibriermaske zum Kalibrieren einer Positionsmessvorrichtung Procedures and calibration mask for calibrating a position measuring device |
| 11/03/2010 | CN101178545B Position detecting method and device, patterning device |
| 11/03/2010 | CN101051185B Light etching positioning self assembling filling method |
| 11/02/2010 | US7826038 Method for adjusting lithographic mask flatness using thermally induced pellicle stress |
| 11/02/2010 | US7826033 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 11/02/2010 | US7824829 Method of monitoring focus in lithographic processes |
| 11/02/2010 | US7824828 Method and system for improvement of dose correction for particle beam writers |
| 10/27/2010 | EP2242595A1 Printing plates |
| 10/26/2010 | US7820362 Writing a pattern by irradiating photosensitive material with a charged-particle beam; dividing pattern into X and Y segments; overlapping and writing with a half of the dose normally used; positional and dimensional accuracy; lithography, data processing |
| 10/26/2010 | US7820346 Method for collecting optical proximity correction parameter |
| 10/20/2010 | EP2242085A1 Flat panel display manufacturing method |
| 10/20/2010 | CN201611424U 一种偏置平板的调整装置 Biasing plate adjusting device |
| 10/20/2010 | CN101866119A Formation method of zero object |
| 10/20/2010 | CN101551523B Coherent imaging system |
| 10/20/2010 | CN101487992B Silicon slice mark capturing system and method |
| 10/20/2010 | CN101286010B Aligning system for photolithography equipment and its alignment method and photolithography equipment |
| 10/20/2010 | CN101241313B Lithographic equipment aligning system based on machine vision and alignment method |
| 10/20/2010 | CN101183222B Measurement method of focusing levelling light spot horizontal position |
| 10/19/2010 | US7817244 Exposure apparatus and method for producing device |
| 10/19/2010 | US7816196 Laser mask and crystallization method using the same |