| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 04/20/2011 | CN102023494A Actuator, positioning system and lithographic apparatus |
| 04/20/2011 | CN101639630B Coaxial alignment system in projection lithography |
| 04/20/2011 | CN101385121B Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
| 04/19/2011 | US7928409 Real-time, active picometer-scale alignment, stabilization, and registration in one or more dimensions |
| 04/19/2011 | US7927773 Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method |
| 04/19/2011 | US7927768 Alignment mark of mask |
| 04/13/2011 | CN201797669U Household electric appliance with novel mark |
| 04/13/2011 | CN1983037B Exposure method, exposure device, and method of manufacturing device |
| 04/13/2011 | CN1804726B Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 04/13/2011 | CN102012646A Leveling system of photoetching machine |
| 04/13/2011 | CN101539725B Method for coarse wafer alignment in a lithographic apparatus |
| 04/12/2011 | US7923182 Multi-focus method of enhanced three-dimensional exposure of resist |
| 04/12/2011 | US7923062 Producing ultraflat, uniform fiber filled plastic substrate including inorganic barrier layer |
| 04/07/2011 | DE102008064504B4 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie The projection exposure method and projection exposure system for microlithography |
| 04/06/2011 | EP2306242A2 Method of forming a pattern on a substrate |
| 04/06/2011 | EP1601931B1 Method for detecting overlay errors using scatterometry |
| 04/06/2011 | CN102007456A Diffraction elements for alignment targets |
| 04/06/2011 | CN102004393A Composite patterning devices for soft lithography |
| 04/06/2011 | CN101625529B Circuit board exposure alignment device and circuit board exposure alignment method |
| 03/30/2011 | CN101995776A Lithographic apparatus and device manufacturing method |
| 03/30/2011 | CN101609264B Method for improving focusing and leveling measurement accuracy |
| 03/30/2011 | CN101571679B Aligning system based on dual light sources and multilevel and aligning method thereof |
| 03/30/2011 | CN101493657B Mask plate positioning device |
| 03/30/2011 | CN101446775B Alignment light source apparatus |
| 03/30/2011 | CN101403865B Pre-aligning system for mask of photo-etching machine |
| 03/29/2011 | US7916284 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 03/29/2011 | US7914958 Semiconductor device manufacturing method |
| 03/29/2011 | US7914954 Stencil, stencil design system and method for cell projection particle beam lithography |
| 03/23/2011 | CN201773263U contraposition exposure |
| 03/23/2011 | CN101989050A Positioning system, lithographic apparatus and method |
| 03/23/2011 | CN101315514B Mask plate and matching method of photo-etching machine nesting precision using mask plate |
| 03/23/2011 | CN101106871B A marking apparatus used in a process for producing multi-layered printed circuit board |
| 03/22/2011 | US7911612 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 03/16/2011 | CN101986209A Exposure apparatus, exposure method and device manufacturing method |
| 03/16/2011 | CN101986207A Exposure apparatus and exposure method |
| 03/15/2011 | US7907255 Lithographic apparatus and device manufacturing method |
| 03/10/2011 | US20110058148 Lithographic apparatus and device manufacturing method |
| 03/09/2011 | EP1669802B1 Imprinting machine and device manufacturing method using the same |
| 03/08/2011 | US7902494 System for detecting motion of a body |
| 03/08/2011 | US7901854 Wafer edge exposure unit |
| 03/08/2011 | US7901853 Pattern prediction method, pattern correction method, semiconductor device, and recording medium |
| 03/08/2011 | US7901852 Metrology of bilayer photoresist processes |
| 03/08/2011 | US7901850 Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
| 03/08/2011 | US7901845 Method for optical proximity correction of a reticle to be manufactured using character projection lithography |
| 03/03/2011 | WO2011024866A1 Exposure apparatus, exposure method, and device manufacturing method |
| 03/03/2011 | US20110048160 Method and System to Control Movement of a Body for Nano-Scale Manufacturing |
| 03/02/2011 | EP1618426B1 Method and array for determining the focal position during imaging of a sample |
| 03/01/2011 | US7897308 Method for transferring a predetermined pattern reducing proximity effects |
| 02/24/2011 | WO2010145951A3 Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell |
| 02/23/2011 | CN101981512A Alignment device for planar element, manufacturing equipment for the same, alignment method for the same, and manufacturing method for the same |
| 02/23/2011 | CN101980085A Exposure apparatus, exposure method, and device manufacturing method |
| 02/23/2011 | CN101980084A Exposure apparatus, exposure method, and device manufacturing method |
| 02/22/2011 | US7894660 Image processing alignment method and method of manufacturing semiconductor device |
| 02/22/2011 | US7892712 Exposure method |
| 02/22/2011 | US7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/17/2011 | DE10297564B4 Verfahren und Vorrichtung zum Steuern der Photolithographie-Überlagerungsjustierung mit vorwärtsgekoppelter Überlagerungsinformation Method and apparatus for controlling the photolithography overlay adjustment with feedforward overlay information |
| 02/17/2011 | DE102004026206B4 Belichtungsmaskensubstrat-Herstellungsverfahren und Belichtungsmasken-Herstellungsverfahren Exposure mask substrate manufacturing method, and exposure mask manufacturing method |
| 02/16/2011 | EP2284614A2 Exposure apparatus, exposure method and device producing method |
| 02/16/2011 | EP2283310A1 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 02/16/2011 | CN101976021A Installation and adjustment device and method for alignment system reference board and detection optical fiber |
| 02/15/2011 | US7890203 Wiring forming system and wiring forming method for forming wiring on wiring board |
| 02/15/2011 | US7889411 System and method for calculating aerial image of a spatial light modulator |
| 02/15/2011 | US7887978 generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects; improving the efficiency in estimating the printability of photolithography masks such as reticles |
| 02/15/2011 | CA2434752C Compact device for imaging a printing form |
| 02/09/2011 | CN201740972U Measurement structure for measuring registering precision |
| 02/09/2011 | CN101969747A Hinge clamp positioning method for printed board processing |
| 02/09/2011 | CN101968611A Phase distribution-based single point mask silicon wafer leveling method |
| 02/08/2011 | US7883834 Method for forming pattern |
| 02/08/2011 | US7883824 obtain a dimensional difference between the first and second resist evaluation patterns; estimating an exposure dose and estimating an effective heating temperature of the resist |
| 02/08/2011 | US7883823 Photomask and method for manufacturing a semiconductor device using the photomask |
| 02/03/2011 | US20110027721 Lithographic apparatus and device manufacturing method |
| 02/03/2011 | US20110026806 Detecting Chip Alterations with Light Emission |
| 02/03/2011 | DE102009035290A1 Verfahren und Vorrichtung zur Bestimmung der relativen Lage einer ersten Struktur zu einer zweiten Struktur oder eines Teiles davon Method and apparatus for determining the relative position of a first structure to a second structure, or a part thereof |
| 02/02/2011 | CN1698011B Lithographic printing with polarized light |
| 02/02/2011 | CN101963766A Mask pre-aligning device and method for photoetching machine |
| 02/02/2011 | CN101963763A Double-driving double-bridge table changing station-based double-workpiece table high-accuracy exchange device |
| 02/02/2011 | CN101510057B Multiple imaging photoetching device and method |
| 02/02/2011 | CN101399171B Method of forming alignment mark |
| 02/02/2011 | CN101105637B System and method for using a two part cover for protecting a reticle |
| 02/01/2011 | US7880880 Alignment systems and methods for lithographic systems |
| 02/01/2011 | US7879515 determining positioning error between lithographically produced integrated circuit patterns on different levels of semiconductor wafer comprising exposing, developing and etching to create groups of marks comprising target at wafer locations; cost efficiency |
| 02/01/2011 | US7879514 Lithographic method and patterning device |
| 02/01/2011 | US7879513 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 01/26/2011 | CN1506768B Alignment system and method for photoetching system |
| 01/26/2011 | CN101957567A Position calibration of alignment heads in a multi-head alignment system |
| 01/26/2011 | CN101957566A Integrated alignment and overlay mark |
| 01/26/2011 | CN101551597B A self-imaging double-sided overlay aligning method |
| 01/25/2011 | US7876440 Apparatus and methods for detecting overlay errors using scatterometry |
| 01/25/2011 | US7876439 Multi layer alignment and overlay target and measurement method |
| 01/25/2011 | US7875409 Method of manufacturing semiconductor device, mask and semiconductor device |
| 01/20/2011 | WO2011009094A2 Leveling devices and methods |
| 01/20/2011 | WO2011008246A1 System for collision detection between objects |
| 01/20/2011 | WO2011007901A1 Pattern forming device, pattern forming method, and device manufacturing method |
| 01/20/2011 | CA2763640A1 Leveling devices and methods |
| 01/19/2011 | EP2275871A2 Position Calibration of Alignment Heads in a Multi-Head Alignment System |
| 01/19/2011 | EP2275868A1 Interferometric analysis of surfaces |
| 01/19/2011 | EP2274743A1 Process for the aligned joining of the surfaces of two workpieces |
| 01/19/2011 | CN1818797B Light-intensity data bus system and method |
| 01/19/2011 | CN101950132A Device for measuring clearance between mask and silicon chip and leveling mask and silicon chip in nanolithography |
| 01/18/2011 | US7871745 Exposure method |