| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 07/12/2011 | US7977653 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 07/12/2011 | US7977019 Semiconductor device manufacturing method, semiconductor device manufacturing equipment, and computer readable medium |
| 07/12/2011 | US7977018 Exposure data preparation method and exposure method |
| 07/12/2011 | US7977017 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 07/07/2011 | WO2011080311A1 Exposure method |
| 07/07/2011 | WO2011080310A1 Integrated sensor system |
| 07/06/2011 | CN102117027A Method for positioning pellicle mounted for photomask |
| 07/06/2011 | CN102117026A Method for detecting and correcting period of alignment signal of lithography tool |
| 07/06/2011 | CN102117017A Photoetching equipment with vacuum silicon chip box |
| 07/06/2011 | CN101593744B Alignment mark and manufacture method thereof |
| 07/06/2011 | CN101452217B Exposure method |
| 07/05/2011 | US7974457 Method and program for correcting and testing mask pattern for optical proximity effect |
| 07/05/2011 | US7972932 Mark forming method and method for manufacturing semiconductor device |
| 07/05/2011 | US7972755 Substrate processing method and substrate processing system |
| 06/30/2011 | DE19817714C5 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 06/30/2011 | DE102010044139A1 Vorrichtung und Verfahren zum Justieren der Rückseite eines Wafers mit der Vorderseite eines Wafers Device and method for adjusting the backside of a wafer with the front face of a wafer |
| 06/29/2011 | CN1577083B Stencil mask having main and auxiliary strut and method of forming the same |
| 06/29/2011 | CN102109779A Counterpoint jig |
| 06/29/2011 | CN102109778A Adjusting mechanism |
| 06/29/2011 | CN102109774A Design method for CCD (charge coupled device) counterpoint read point on exposure film |
| 06/29/2011 | CN102109773A Exposure method, exposure apparatus, and maintenance method |
| 06/29/2011 | CN102109768A Rotary silicon wafer carrying platform and method using same for precise alignment of silicon wafer |
| 06/29/2011 | CN101634815B Alignment method based on a plurality of different wavelengths |
| 06/29/2011 | CN101533226B Leveling and focusing mechanism and microstage and workpiece stage using same |
| 06/29/2011 | CN101526750B Alignment system for photolithographic device and photolithographic device applying same |
| 06/29/2011 | CN101487985B Alignment mark search system used for photo-etching equipment and its alignment mark search method |
| 06/29/2011 | CN101329514B System and method for aligning photolithography apparatus |
| 06/28/2011 | US7968260 Substrate processing method, computer-readable storage medium, and substrate processing system |
| 06/28/2011 | US7968259 Semiconductor device, method for manufacturing semiconductor device, and computer readable medium |
| 06/28/2011 | US7968258 System and method for photolithography in semiconductor manufacturing |
| 06/23/2011 | WO2011072897A1 Imprint lithography |
| 06/22/2011 | CN102103336A High-accuracy alignment mark structure based on machine vision alignment |
| 06/22/2011 | CN102103335A Method for inspecting wafer alignment |
| 06/22/2011 | CN101750899B Lithography layout and method for measuring lithography deformation thereof |
| 06/22/2011 | CN101738881B Two-stage image precise contraposition method for upper plate and lower plate, and device thereof |
| 06/21/2011 | US7964326 Exposure mask for divided exposure |
| 06/16/2011 | US20110143268 Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning |
| 06/15/2011 | CN1695150B Methods and systems for process control of corner feature embellishment |
| 06/15/2011 | CN1490671B Method for designing mask and manufacturing face plate |
| 06/15/2011 | CN102099744A Alignment of collector device in lithographic apparatus |
| 06/15/2011 | CN102096349A System for automatic dual-grating alignment in proximity nanometer lithography |
| 06/15/2011 | CN102096348A Digital Moire fringe method for improving quality of Moire fringe images in imprinting alignment process |
| 06/15/2011 | CN102096347A Alignment scanning method for alignment mark |
| 06/15/2011 | CN102096337A Device for detecting eccentricity and focal surface position of spherical surface or curved surface in projection photoetching |
| 06/08/2011 | CN102087488A Apparatus including an overlay mark and method of producing semiconductor assembly |
| 06/08/2011 | CN102087483A Optical system for focal plane detection in projection lithography |
| 06/08/2011 | CN102087479A Optical alignment methods for forming LEDs having a rough surface |
| 06/07/2011 | US7955767 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system |
| 06/07/2011 | US7955766 Software-controlled maskless optical lithography using fluorescence feedback |
| 06/07/2011 | US7955765 Adjustment method, exposure method, device manufacturing method, and exposure apparatus |
| 06/03/2011 | WO2011065380A1 Pre-alignment apparatus and pre-alignment method |
| 06/03/2011 | WO2011064020A1 Alignment and imprint lithography |
| 06/02/2011 | US20110128520 Alignment systems and methods for lithographic systems |
| 06/01/2011 | CN1469193B Objective table apparatus and exposure apparatus |
| 06/01/2011 | CN102081312A Double-sided alignment apparatus and alignment method thereof |
| 06/01/2011 | CN102081309A Method for improving alignment scanning success rate |
| 06/01/2011 | CN101727026B Device and method for improving screen printing precise alignment by using contact photoetching machine |
| 06/01/2011 | CN101162368B Method, an alignment mark and use of a hard mask material |
| 05/31/2011 | US7952696 Exposure measurement method and apparatus, and semiconductor device manufacturing method |
| 05/31/2011 | US7951512 Reticle for projection exposure apparatus and exposure method using the same |
| 05/26/2011 | US20110122376 Lithographic apparatus and device manufacturing method |
| 05/25/2011 | EP1502283B1 Method of etching substrates |
| 05/25/2011 | CN201846533U Exposure positioning device |
| 05/25/2011 | CN1641485B Exposure system method for evaluating lithography process |
| 05/25/2011 | CN102073222A Method for improving alignment signals of step projection photoetching machine |
| 05/25/2011 | CN102073220A Phase extracting method of single closed fringes |
| 05/24/2011 | US7949967 Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method |
| 05/24/2011 | US7947413 Pattern evaluation method |
| 05/18/2011 | CN102063025A Measurement method of two-faced registration error and lithographic equipment applying measurement method |
| 05/18/2011 | CN102063020A Exposure device and exposure method |
| 05/18/2011 | CN102063016A Aligning mark detecting method |
| 05/12/2011 | WO2011055826A1 Mask holding mechanism |
| 05/11/2011 | CN201828772U OVL mark capable of amplifying spatial deviation |
| 05/11/2011 | CN201828771U Film semi-automatic alignment device |
| 05/11/2011 | CN102057331A Exposure apparatus and exposure method |
| 05/11/2011 | CN102053509A Method for manufacturing raised grating alignment mark in imprinting lithography |
| 05/11/2011 | CN102053490A Impression equipment |
| 05/11/2011 | CN101702079B Method for accurately determining height of space image |
| 05/11/2011 | CN101566800B Aligning system and aligning method for lithography equipment |
| 05/11/2011 | CN101510055B Alignment system and alignment method for photolithography equipment |
| 05/11/2011 | CN101424885B Mask alignment system and method thereof |
| 05/11/2011 | CN101271281B Normalization alignment mark combination and its alignment method and alignment system |
| 05/11/2011 | CN101266411B Two-dimensional coding normalization mask target combination and its alignment method and aligning system |
| 05/11/2011 | CN101201548B Measuring system and method for focusing and leveling |
| 05/10/2011 | US7941232 Control method, control system, and program |
| 05/05/2011 | US20110106287 Wiring forming system and wiring forming method for forming wiring on wiring board |
| 05/04/2011 | CN102043348A Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate |
| 05/04/2011 | CN102043341A Alignment signal acquisition system for photo-etching equipment and alignment method |
| 05/04/2011 | CN101576715B Calibration method for microscopic imaging systems |
| 05/03/2011 | US7935464 System and method for self-aligned dual patterning |
| 04/27/2011 | EP2315289A2 Laser patterning of devices |
| 04/27/2011 | EP2315077A1 An orientation stage for achieving fine movement and alignment of a template in an imprint lithography process |
| 04/27/2011 | EP2315076A1 A process and a system for orienting a template in imprint lithography |
| 04/27/2011 | CN102033438A Focusing and levelling device with expandable measuring range and focusing and levelling method |
| 04/27/2011 | CN102033379A 液晶显示器与其制造方法 LCD monitors its manufacturing method |
| 04/26/2011 | US7933016 Apparatus and methods for detecting overlay errors using scatterometry |
| 04/26/2011 | US7933015 Mark for alignment and overlay, mask having the same, and method of using the same |
| 04/26/2011 | US7932999 Lithographic apparatus and device manufacturing method |
| 04/26/2011 | US7932004 Feature identification for metrological analysis |
| 04/21/2011 | US20110091819 Method for forming pattern |