| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/01/2012 | CN202133860U 光刻对准标记 Lithography alignment marks |
| 02/01/2012 | CN102338995A ITO (indium tin oxide) membrane photoetching automatic recognition positioning method |
| 02/01/2012 | CN102338991A Prealignment method for laser displacement sensor control |
| 02/01/2012 | CN101963766B 一种用于光刻机的掩模预对准装置及方法 A lithography mask device and a method for pre-alignment |
| 02/01/2012 | CN101359188B 带状工件的曝光装置及带状工件的曝光装置的聚焦调整方法 The focus adjustment method for the belt-like work of the exposure apparatus and exposure apparatus |
| 02/01/2012 | CN101344728B 一种光刻机投影物镜波像差在线测量装置及方法 A lithographic projector lens apparatus and method for the wavefront aberration measurement line |
| 02/01/2012 | CN101273302B 光掩模和使用该光掩模的曝光方法 Use of the photomask and a photomask exposure method |
| 01/31/2012 | US8107085 Methods and systems for interferometric analysis of surfaces and related applications |
| 01/31/2012 | US8107079 Multi layer alignment and overlay target and measurement method |
| 01/31/2012 | US8105737 Method of correcting patterns for semiconductor device |
| 01/31/2012 | US8105736 Method and system for overlay correction during photolithography |
| 01/26/2012 | DE10085131B3 Strahlpositionierung beim mikrolithographischen Schreiben Beam positioning in microlithography letter |
| 01/25/2012 | CN102334070A Exposure apparatus |
| 01/25/2012 | CN101673058B Lithographic apparatus and device manufacturing method |
| 01/24/2012 | US8102507 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120015289 Alignment method and method for manufacturing flat panel display |
| 01/19/2012 | DE102010034875A1 Planar position indicator for recognizing spatial position and/or orientation of workpieces in CNC milling cutter, has saddle point formation elements formed by chain, where workpiece assigned to indicator is uniquely identified |
| 01/18/2012 | EP1614000B1 Immersion lithographic apparatus |
| 01/18/2012 | EP1340126B1 Method of aligning a photolithographic mask to a crystal plane |
| 01/18/2012 | CN101535898B A method and a system for reducing overlay errors within exposure fields by apc control strategies |
| 01/12/2012 | DE102010015884A1 Verfahren zur reproduzierbaren Bestimmung der Position von Strukturen auf einer Maske mit Pellicle-Rahmen Reproducible method for determining the position of structures on a mask with pellicle frame |
| 01/11/2012 | CN102315198A Structure with alignment mark and manufacture method for stacking device |
| 01/11/2012 | CN102314097A Method of calibrating spatial position between spatial light modulator center and camera center |
| 01/10/2012 | US8094379 Optical arrangement of autofocus elements for use with immersion lithography |
| 01/10/2012 | US8092961 Position aligning apparatus, position aligning method, and semiconductor device manufacturing method |
| 01/03/2012 | US8091046 Set of masks, method of generating mask data and method for forming a pattern |
| 01/03/2012 | US8088539 Exposure aligning method and exposure apparatus |
| 12/29/2011 | US20110317143 Lithographic apparatus and device manufacturing method |
| 12/28/2011 | CN202093317U 基于机器视觉对准的高精度对准标记结构 Based on high-precision alignment of machine vision alignment mark structure |
| 12/28/2011 | CN102301280A 卷到卷数字光刻法 Roll-to-roll digital photolithography |
| 12/28/2011 | CN102298278A 一种调焦调平检测装置及方法 One kind of focus leveling detection device and method |
| 12/28/2011 | CN102298266A 制造标准晶圆的方法 Methods wafer manufacturing standards |
| 12/28/2011 | CN102298260A 使用间隔物和自对准辅助图案的多重图案化光刻 And using self-aligned spacer multiple patterning auxiliary pattern lithography |
| 12/21/2011 | EP2397906A2 Lithography apparatus and device manufacturing method |
| 12/21/2011 | EP2397327A2 Non-printing registration marks on a printing plate |
| 12/21/2011 | CN102290365A 基板保持装置、具备其之曝光装置及方法、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus and method, device manufacturing method |
| 12/21/2011 | CN102290364A 基板保持装置、具备其之曝光装置、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus, device manufacturing method |
| 12/21/2011 | CN101788769B 曝光形成半导体器件当层的方法 The method of the semiconductor device when the layer is exposed to form |
| 12/21/2011 | CN101436005B 分段形标记对准信号处理方法 Segment-shaped mark on the signal processing method |
| 12/21/2011 | CN101436004B 硅片预对准的方法 Method wafer prealignment |
| 12/21/2011 | CN101382743B 同轴双面位置对准系统及位置对准方法 Coaxial sided position and alignment system alignment method |
| 12/20/2011 | US8080886 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 12/14/2011 | CN102280437A 校准标记及制造方法 And a method of manufacturing the alignment marks |
| 12/14/2011 | CN102279530A 基于双相锁相放大原理的检焦装置的检焦方法 Coke inspection method based on the principle of two-phase lock-in amplifier device detection coke |
| 12/14/2011 | CN102279516A 校准标准片的制备方法及用该标准片进行校准的方法 Tablets prepared calibration standards and method of calibration of the standard sheet |
| 12/14/2011 | CN101923296B Nvm器件制备中光刻对准记号的制备方法 Preparation Nvm devices prepared lithographic alignment mark |
| 12/14/2011 | CN101231479B 浸润式微影方法、浸润式微影系统及其封闭板的对准方法 Immersion lithography method, immersion lithography system and its closure plate alignment method |
| 12/13/2011 | US8078996 Method and system for correcting a mask pattern design |
| 12/13/2011 | US8076227 Electroactive polymers for lithography |
| 12/07/2011 | CN1637594B 曝光掩模和使用该曝光掩模的曝光方法 Exposure mask and using the exposure mask exposure method |
| 12/07/2011 | CN102269935A 位移装置、光刻设备以及定位方法 Displacement means, lithographic apparatus and a positioning method |
| 12/07/2011 | CN101510059B 曝光装置和曝光方法以及器件制造方法 Exposure apparatus and exposure method, and device manufacturing method |
| 12/01/2011 | WO2011147775A1 Apparatus and method for electrostatic discharge (esd) reduction |
| 12/01/2011 | US20110294048 Mounting a pellicle to a frame |
| 11/30/2011 | EP2390906A1 Apparatus and method for electrostatic discharge (ESD) reduction |
| 11/30/2011 | CN102262358A 一种内层板双面对位装置和方法 One kind of inner panel double face positioning device and method |
| 11/30/2011 | CN101520613B 一种校准标记位置的装置及方法 An apparatus and method for calibrating marker position |
| 11/30/2011 | CN101424881B 光刻投射装置 Lithographic projection apparatus |
| 11/29/2011 | US8068213 Photomask, method of lithography, and method for manufacturing the photomask |
| 11/29/2011 | US8067135 Metrology systems and methods for lithography processes |
| 11/29/2011 | US8067134 Method of iterative compensation for non-linear effects in three-dimensional exposure of resist |
| 11/24/2011 | WO2011097234A3 Improved printing plate registration |
| 11/23/2011 | CN102257437A Pre-alignment apparatus and pre-alignment method |
| 11/23/2011 | CN102253612A Aligning method for dry films |
| 11/23/2011 | CN102253611A Method of detecting alignment mark and method of manufacturing printed circuit board |
| 11/23/2011 | CN102253610A Installation method and frameworks for photomask protective film |
| 11/23/2011 | CN102253609A Method for processing alignment mark measuring signals |
| 11/23/2011 | CN102253603A Alignment detection device for photoetching equipment |
| 11/22/2011 | US8065637 Semiconductor device |
| 11/22/2011 | US8064730 Device manufacturing method, orientation determination method and lithographic apparatus |
| 11/22/2011 | US8062813 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography |
| 11/16/2011 | CN102245348A A positioning system and method |
| 11/16/2011 | CN102243138A Focal plane detection device for projection lithography |
| 11/16/2011 | CN101655668B Micro-image device and chip-balancing method for micro-image device |
| 11/15/2011 | US8057972 Constant current multi-beam patterning |
| 11/15/2011 | US8057971 Method of compensation for bleaching of resist during three-dimensional exposure of resist |
| 11/15/2011 | US8057970 Method and system for forming circular patterns on a surface |
| 11/15/2011 | US8057967 Process window signature patterns for lithography process control |
| 11/09/2011 | EP2385426A2 Maskless exposure apparatus and method of alignment for overlay in maskless exposure |
| 11/09/2011 | CN1625456B Device for positioning at least one offset plates on positing platform of preprinting device |
| 11/09/2011 | CN102236273A Method of aligning photomask with base material and method of manufacturing printed circuit board |
| 11/09/2011 | CN102236270A Focus detection device applicable to double workpiece table projection lithography machine |
| 11/09/2011 | CN102236261A Method, device and system for processing off-axis signals based on orthogonalization model |
| 11/03/2011 | WO2011136848A1 Force curve analysis method for planar object leveling |
| 11/03/2011 | WO2011097144A3 Improved detection of a misregistered printing plate |
| 11/03/2011 | CA2794720A1 Force curve analysis method for planar object leveling |
| 11/02/2011 | CN102231049A Large-area projection lithography system and alignment method thereof |
| 11/02/2011 | CN101676805B Lithographic apparatus and device manufacturing method |
| 11/01/2011 | US8048600 Parameter extracting method |
| 11/01/2011 | US8048596 Photomask producing method and photomask blank |
| 10/27/2011 | US20110262848 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 10/25/2011 | US8043797 Lithographic apparatus and device manufacturing method |
| 10/25/2011 | US8043772 Manufacturing method and manufacturing system of semiconductor device |
| 10/19/2011 | EP2376983A1 Roll-to-roll digital photolithography |
| 10/19/2011 | EP1340123B1 Systems and methods for exposing substrate periphery |
| 10/19/2011 | CN102222661A Electrical alignment mark set and method for aligning wafer stack |
| 10/19/2011 | CN102221792A Alignment method performed in semiconductor lithography process |
| 10/19/2011 | CN101427182B Composite patterning devices for soft lithography |
| 10/18/2011 | US8042067 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 10/18/2011 | US8040497 monitoring the quality of a lithography process by determining respective lateral dimensions of respective test features, such as photoresist features, lines or apertures, patterned on the basis of the lithography process |