Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
05/2012
05/23/2012EP2454635A2 Leveling devices and methods
05/23/2012CN102472987A 曝光装置、曝光方法以及元件制造方法 Exposure apparatus, exposure method and device manufacturing method
05/23/2012CN102472986A Processing system
05/23/2012CN102472977A 图案形成装置、图案形成方法以及装置制造方法 A patterning device, the patterning method, and device manufacturing method
05/23/2012CN102466983A Lighting device for alignment and exposure device having the same
05/23/2012CN101477318B Photomask contraposition exposure method and photomask component
05/23/2012CN101201538B Soft template with alignment mark and its manufacture method
05/22/2012US8183545 Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
05/22/2012US8183123 Method of forming mark in IC-fabricating process
05/22/2012US8182969 Lithographic processing method, and device manufactured thereby
05/18/2012WO2012063632A1 Film exposure method
05/18/2012WO2012063631A1 Exposure apparatus
05/17/2012US20120120381 Exposure apparatus, exposure method, and method for producing device
05/16/2012EP2189843B1 Imprinting machine and device manufacturing method
05/16/2012DE102011075371A1 Assembly for projection lens of projection illumination system for microlithography for imaging semiconductor wafer structures, has evaluation device that determines adjusting parameter in degrees of freedom of movement of mask and sensor
05/16/2012CN102460310A Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
05/16/2012CN102460309A Alignment method, alignment device, and exposure device
05/16/2012CN102455603A 接触曝光方法及装置 Contact exposure method and apparatus
05/16/2012CN102455600A 检测晶片表面形貌的方法 Detection methods wafer surface topography
05/16/2012CN102455247A Device and method for detecting optimal focal plane of projection objective
05/16/2012CN101326465B Analysis device with an array of focusing microstructures
05/16/2012CN101211804B Detection system and method
05/10/2012WO2012059912A1 Method and device for characterizing an optical system
05/09/2012EP2255249B1 Plate pallet alignment system
05/09/2012EP1463096B1 Exposure device, exposure method, and method of producing semiconductor device
05/09/2012CN102445865A Photo-etching graphic alignment marking method capable of reducing alignment bias of photo-etching machine
05/09/2012CN102445864A Method for reducing lithography alignment failure rate
05/09/2012CN102445863A Focusing and leveling system capable of timely compensating wave-front distortion and compensation method thereof
05/09/2012CN101846889B Exposure apparatus
05/09/2012CN101356623B Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method
05/09/2012CN101300662B Pattern forming method, pattern forming apparatus, and device manufacturing method
05/02/2012CN101140423B Transmission aligning mark combination used for mask alignment and mask alignment method thereof
04/2012
04/24/2012US8163448 Determination method, exposure method, device fabrication method, and storage medium
04/18/2012CN102420214A 形成强化对准标记的方法以及半导体器件 The method of strengthening the alignment mark is formed and a semiconductor device
04/18/2012CN102419520A Alignment signal simulating generator
04/18/2012CN101968611B 一种基于相位分布的单点掩模硅片调平方法 A single point of mask phase distribution method based on silicon leveling
04/17/2012US8158306 Method and system for combining photomasks to form semiconductor devices
04/12/2012WO2011009094A3 Leveling devices and methods
04/11/2012EP1586007B1 Electron beam processing for mask repair
04/11/2012CN1983036B 作为对准标记的二进制正弦子波长格栅 As a binary sine sub-wavelength grating alignment mark
04/11/2012CN102414615A Method and calibration mask for calibrating a position measuring apparatus
04/11/2012CN102411268A 光刻装置及提高光刻机套准精度的方法 The lithographic apparatus and improve registration accuracy lithography method
04/05/2012WO2012044077A2 Light-exposure system
04/04/2012CN102402141A Self-referencing interferometer, alignment system, and lithographic apparatus
04/04/2012CN102402140A Alignment system
04/04/2012CN102402139A 一种确定工件台光电传感器最佳高度的方法 A method for optimal height photoelectric sensors to determine the workpiece table
04/04/2012CN102402129A Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
04/04/2012CN102402127A 一种硅片预对准装置及方法 One kind of a silicon wafer pre-alignment apparatus and method
04/04/2012CN102402124A Method for reducing lithography alignment deviation arising from lens distortion of lithography machine
04/04/2012CN101713912B 光刻光掩模、对准方法和检验对准精确度的方法 Lithography photomask, alignment methods and inspection methods alignment accuracy
03/2012
03/29/2012US20120075609 Optical arrangement of autofocus elements for use with immersion lithography
03/28/2012CN202177779U 一种绿油菲林边对位检测装置 One kind of green oil film edge to position detection device
03/28/2012CN1577080B Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same
03/28/2012CN101556440B Alignment device
03/27/2012US8144972 Manufacturing method of printed circuit board and manufacturing apparatus for the same
03/27/2012US8142966 Substrate matrix to decouple tool and process effects
03/27/2012US8142965 Method and system for measuring in patterned structures
03/27/2012US8142964 Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method
03/27/2012US8142961 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
03/27/2012US8142960 Exposure method, mask data producing method, and semiconductor device manufacturing method
03/22/2012US20120070767 Set of masks, method of generating mask data and method for forming a pattern
03/21/2012EP1483628B1 Full phase shifting mask in damascene process
03/21/2012CN102385263A Method for aligning previous-layer graphs and photomask applicable to method
03/21/2012CN101799640B Device and method for determining optimal focal plane position of lithography machine
03/21/2012CN101228615B Para-position method
03/21/2012CN101079150B Outline definition apparatus and outline definition method, and image processing apparatus
03/20/2012US8139217 Alignment systems and methods for lithographic systems
03/20/2012US8138058 Substrate with marker, manufacturing method thereof, laser irradiation apparatus, laser irradiation method, light exposure apparatus, and manufacturing method of semiconductor device
03/20/2012US8137875 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
03/20/2012US8137871 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
03/15/2012WO2012032904A1 Film exposure device and film exposure method
03/15/2012WO2012032903A1 Film exposure device
03/15/2012DE19960368B4 System zum mikrolithographischen Schreiben mit verbesserter Genauigkeit System for microlithography letter with improved accuracy
03/15/2012DE102010045135A1 Verfahren zur Charakterisierung einer Struktur auf einer Maske und Vorrichtung zur Durchführung des Verfahrens A method of characterizing a pattern on a mask and apparatus for carrying out the method
03/14/2012CN102376610A Integrated circuit module and methods of manufaturing the same
03/14/2012CN102375352A Environmental compensation alignment system
03/14/2012CN102375351A Signal normalization mask alignment system
03/08/2012WO2012029449A1 Exposure apparatus using microlens array therein, and optical member
03/06/2012US8130361 Exposure apparatus, exposure method, and method for producing device
03/01/2012WO2012026927A1 Leveling devices and methods
03/01/2012US20120054695 Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method
02/2012
02/29/2012CN202153294U 一种线路板手动对位菲林 A circuit board manual alignment film
02/29/2012CN102365591A Alignment method and flat panel display manufacture method
02/29/2012CN101802995B Test structure, test structure formation and mask reuse in semiconductor processing
02/28/2012US8124301 Gradated photomask and its fabrication process
02/23/2012US20120047475 Semiconductor device
02/22/2012CN102360167A Exposure apparatus, exposure method, and method for producing device
02/22/2012CN102360162A Imprinting method and imprinting apparatus
02/22/2012CN102012646B 一种光刻机的调平系统 A lithographic machine leveling system
02/22/2012CN101866119B 零标的形成方法 The method for forming the subject of zero
02/21/2012US8119312 Manufacturing method for a semiconductor device
02/21/2012US8119310 Mask-shift-aware RC extraction for double patterning design
02/21/2012US8119309 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
02/15/2012CN202145260U 菲林定位结构 Film positioning structure
02/09/2012US20120032377 Apparatus and method for aligning surfaces
02/08/2012CN202141888U 一种菲林对位台结构 One kind of film on the bit platform structure
02/08/2012CN102346384A Method for regulating optimum focal plane for silicon chip and exposure device thereof
02/08/2012CN102346376A Lithographic apparatus, computer program product and device manufacturing method
02/07/2012US8110325 Substrate treatment method
02/07/2012US8110322 Method of mask forming and method of three-dimensional microfabrication
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