Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
08/2012
08/29/2012CN102117026B Method for detecting and correcting period of alignment signal of lithography tool
08/29/2012CN102081312B Double-sided alignment apparatus and alignment method thereof
08/29/2012CN102033438B Focusing and levelling device with expandable measuring range and focusing and levelling method
08/28/2012US8253934 Method and apparatus for inspecting a pattern formed on a substrate
08/28/2012US8252491 Method of forming a marker, substrate having a marker and device manufacturing method
08/28/2012US8252489 Mask-shift-aware RC extraction for double patterning design
08/28/2012US8252487 Use in lithography; a transparent substrate, a patterned absorber layer to impart projection beam with a pattern in its cross-section
08/22/2012CN102645855A Enhanced global alignment (EGA) mark and photolithograph pattern
08/22/2012CN102645849A Photoetching device and photoetching projection method
08/22/2012CN102645847A Measuring method, measuring device, lithographic device and device manufacturing method
08/22/2012CN102645841A Imprint method and imprint apparatus
08/16/2012WO2012109348A1 Structured illumination for contrast enhancement in overlay metrology
08/15/2012CN102636966A Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method
08/15/2012CN102636962A Aerial image overlay test method and array base plate
08/15/2012CN102033379B 液晶显示器与其制造方法 LCD monitors its manufacturing method
08/08/2012EP2485247A2 Image processing-based lithography system and target object coating method
08/08/2012CN101720449B Image sensor for lithography
08/02/2012DE102011009791A1 Two-dimensional measuring element for determining local positions of two partial elements, has multiple sub-elements, which are arranged firmly arranged along predetermined continuous or discontinuous curve at predetermined position
08/01/2012EP2057506B1 A method and a system for reducing overlay errors within exposure fields by apc control strategies
07/2012
07/31/2012US8232029 Methods of fabricating a photomask and use thereof
07/25/2012CN1983028B Mask blank and method for manufacturing transfer mask
07/25/2012CN102608879A Method for aligning exposure in engineering photoetching by photoetching machine
07/24/2012US8229062 Transmission mask with differential attenuation to improve ISO-dense proximity
07/24/2012US8227774 Method and system for feature function aware priority printing
07/18/2012CN102591158A Method for accurately measuring WEE (wafer edge exclusion) width
07/17/2012US8222636 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
07/17/2012US8222051 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
07/11/2012CN102566340A A digital mask-free photoetching aligning deivce based on phase shift moire fringe
07/11/2012CN102566339A Global alignment mark and global alignment method
07/11/2012CN102566338A Method for correcting alignment positions in photoetching alignment system
07/11/2012CN102566337A Method for determining marked expected position
07/11/2012CN102566336A Fixing device and fixing method for mask plate
07/11/2012CN102566335A Template image acquisition method
07/11/2012CN102566320A Exposure apparatus, exposure method and device manufacturing method
07/11/2012CN102566316A Silicon chip stage aligning mechanism of projection mask aligner
07/11/2012CN102566309A Method for measuring dynamic stability of plate-making lithography equipment
07/11/2012CN102566300A A positioning system, a lithographic apparatus and a method for positional control
07/11/2012CN102566296A Integration assembly method for photoetching exposure system
07/11/2012CN102566295A Lithography device and method for measuring multi-light spot zero offset
07/11/2012CN102566255A Photomask for aligning exposure machine and photomask alignment mark production method
07/11/2012CN101923295B Rotary label and method for monitoring photolithographic quality using same
07/11/2012CN101840166B Level sensor arrangement for lithographic apparatus and device manufacturing method
07/05/2012WO2012089043A1 Backside registration apparatus and method
07/04/2012CN102543956A Multilayer overlay mark
07/04/2012CN102543954A Overlay target
07/04/2012CN102543673A Wafer structure and manufacturing method of alignment mark of same
07/04/2012CN102540784A Method of updating calibration data and a device manufacturing method
07/04/2012CN102540783A Automatic calibration device and method for abbe cosine error of interferometer
07/04/2012CN102540782A Alignment device and method for photoetching equipment
07/04/2012CN102540781A Backside alignment device and method
07/04/2012CN102540780A Alignment signal processing system and alignment signal processing method for photoetching equipment
07/04/2012CN102540779A Mask fixing device and mask fixing method used in lithography machine
07/04/2012CN102540778A Measuring system and photoetching device using same
07/04/2012CN102540777A Aligning scan method capable of improving aligning accuracy
07/04/2012CN102540768A Alignment device and alignment method for exposure of PCB (Printed Circuit Board)
07/04/2012CN102540767A Exposure apparatus, movable body drive system, pattern formation apparatus, and exposure method, and device manufacturing method
07/04/2012CN102540765A Device and method for positioning printed circuit board (PCB) of high-accuracy parallel light exposure machine
07/04/2012CN102540753A Pulse optical signal generating device
07/04/2012CN102540751A Method for detecting distortion and curvature of field of projection objective
07/04/2012CN102540744A Mask alignment detecting device and method
07/04/2012CN102540699A Novel photomask reference mark pattern
07/04/2012CN102073220B Phase extracting method of single closed fringes
07/04/2012CN101305320B System and method for mask verification using an individual mask error model
07/04/2012CN101305259B Plane position detection device, exposure device and method for manufacturing elements
06/2012
06/28/2012WO2012087666A1 Infrared direct illumination machine vision for semiconductor processing
06/28/2012WO2012041457A3 Projection exposure tool for microlithography and method for microlithographic imaging
06/27/2012CN102520594A Marker structure used for Alignment or superposition, mask pattern for defining, photolithography projection apparatus using mask pattern
06/27/2012CN102520593A Alignment verification method for exposure machine
06/26/2012US8208120 Lithographic apparatus and device manufacturing method
06/21/2012WO2012044077A3 Light-exposure system
06/21/2012WO2012041461A3 Projection exposure tool for microlithography and method for microlithographic exposure
06/20/2012EP2466384A2 Plane position detecting apparatus, exposure apparatus and device manufacturing method
06/20/2012CN202281902U Novel film aligning platform for circuit board
06/20/2012CN102096347B Alignment scanning method for alignment mark
06/20/2012CN101986209B Exposure apparatus, exposure method and device manufacturing method
06/20/2012CN101326617B Pattern formation method and pattern formation apparatus, and device manufacturing method
06/19/2012US8203223 Overlay target for polarized light lithography
06/19/2012US8202672 Method and system for design of a reticle to be manufactured using variable shaped beam lithography
06/14/2012DE102007024122B4 Belichtungskonfigurator in Maskalignern Exposure configurator Maskalignern
06/13/2012EP2463716A2 Surface position detection apparatus, exposure apparatus, and exposure method
06/13/2012EP2463715A2 Surface position detection apparatus, exposure apparatus, and exposure method
06/13/2012EP1789853B1 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article.
06/13/2012CN202275262U 自动对位机 Automatic alignment machine
06/12/2012US8198118 Method for forming a robust mask with reduced light scattering
06/12/2012US8198105 Monitor for variation of critical dimensions (CDs) of reticles
06/07/2012WO2012073483A1 Mark detection method, light exposure method and light exposure device, and method for manufacturing device
06/07/2012WO2012071748A1 Liquid crystal panel exposure process and mask thereof
06/06/2012CN102486995A Dynamic wafer alignment method and exposure scanner system
06/06/2012CN102486623A Focusing control device and method used for photoetching equipment
06/06/2012CN102486622A Mask prealignment device of photoetching machine and method thereof
06/06/2012CN102486621A Alignment adjusting device and alignment adjusting method
06/06/2012CN102486617A Precise adjusting apparatus
06/06/2012CN101963763B Double-driving double-bridge table changing station-based double-workpiece table high-accuracy exchange device
06/06/2012CN101377624B Exposure device and exposure process
05/2012
05/30/2012CN202257032U Focusing and leveling device with stepped focusing marks
05/30/2012CN202257025U Ultra-violet nanoimprinting soft template fixing and aligning assembly
05/30/2012CN102096349B System for automatic dual-grating alignment in proximity nanometer lithography
05/30/2012CN101258448B Exposure apparatus
05/29/2012US8187778 Method for correcting a position error of lithography apparatus
05/29/2012US8187773 Method for generating mask pattern data and method for manufacturing mask
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