Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
11/2012
11/27/2012US8318392 Alignment method and method for manufacturing flat panel display
11/27/2012US8318391 Process window signature patterns for lithography process control
11/27/2012US8318057 Method for replicating optical elements, particularly on a wafer level, and replicas formed thereby
11/22/2012WO2012158025A2 Lithography system for processing at least a part of a target
11/21/2012CN102789144A Adjustment mechanism of lithography aligning system reference plate, and adjustment method thereof
11/21/2012CN102789143A Exposure machine target image alignment device, and exposure machine using exposure machine target image alignment device
11/21/2012CN102789138A Moire fringe inclination angle measuring method
11/21/2012CN102789137A Reflection-type lithography aligning device based on moire fringe
11/20/2012US8313877 Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark
11/14/2012CN202533713U Adjusting device of bias flat plate
11/14/2012CN102782585A Integrated sensor system
11/14/2012CN102782584A Exposure method
11/14/2012CN102778822A Focusing and leveling device
11/14/2012CN101976021B Installation and adjustment device and method for alignment system reference board and detection optical fiber
11/13/2012US8312396 Set of masks, method of generating mask data and method for forming a pattern
11/13/2012US8309282 Apparatus and method for aligning mask
11/08/2012WO2012041458A3 Projection exposure tool for microlithography and method for microlithographic exposure
11/07/2012EP2520978A2 Surface position detection apparatus, exposure apparatus and exposure method
11/07/2012EP2519859A1 Integrated sensor system
11/07/2012EP2519858A1 Exposure method
11/07/2012CN102770810A Lithographic apparatus and device manufacturing method
11/07/2012CN102768477A Focusing and leveling detection apparatus
11/07/2012CN102768469A Focusing and bisecting system and adjustment method thereof
11/07/2012CN102279516B Preparation method of calibration standards and method for calibrating by calibration standards thereof
11/07/2012CN101980085B Exposure apparatus, exposure method, and device manufacturing method
11/07/2012CN101213488B System and method for critical dimension reduction and pitch reduction
10/2012
10/31/2012DE10359200B4 Verfahren zur Reduzierung eines Überdeckungsfehlers A method for reducing an overlay error
10/31/2012CN102759865A Exposure alignment system
10/26/2012WO2012144905A2 Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer
10/26/2012WO2012144904A2 Position determination in a lithography system using a substrate having a partially reflective position mark
10/26/2012WO2012144903A2 Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system
10/24/2012EP2514696A2 Controlling device for preventing snaking of patterns of patterned films
10/24/2012CN102754035A Lithographic apparatus and device manufacturing method
10/24/2012CN102749817A Alignment mark structure of medium substrate zero layer
10/24/2012CN102749816A Focusing and leveling measurer
10/24/2012CN102749814A Exposure alignment method
10/24/2012CN102749808A Focusing and leveling measurer
10/18/2012WO2012140106A1 Lithography process
10/18/2012US20120264067 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/17/2012CN202494862U Focusing leveling device
10/17/2012CN102741754A Substrate processing device
10/17/2012CN102736452A Device and method for near-field alignment of lithography equipment
10/17/2012CN102736445A Aligning method of mask and workpiece
10/17/2012CN102736437A Pattern formation apparatus and pattern formation method
10/17/2012CN102736432A Overlay method for nano-scale components
10/17/2012CN102736430A Measuring method for focusing and leveling system
10/17/2012CN102736428A Focusing and leveling device and method
10/17/2012CN102736425A 掩模对准自适应扫描方法 Adaptive Scanning Method mask alignment
10/17/2012CN102736422A Proximity field exposure device and method
10/16/2012US8288064 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system
10/16/2012US8288063 Defense system in advanced process control
10/11/2012WO2012137866A1 Exposure method, exposure apparatus, and device manufacturing method
10/10/2012CN102725680A Substrate, method for exposure of substrate to light, and photo-alignment treatment method
10/10/2012CN102722093A Plane position detecting apparatus, exposure apparatus and device manufacturing method
10/10/2012CN102722082A Mask and overlay measuring method
10/10/2012CN102103335B Method for inspecting wafer alignment
10/10/2012CN101561642B Positioning system, lithographic apparatus and device manufacturing method
10/09/2012US8283094 Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
10/04/2012WO2012133903A1 Alignment device for exposure device
10/04/2012DE102011111372A1 Measuring device for detecting position of lithography mask support structure, has two distance sensor devices among which second device has measuring surfaces whose extension is smaller than movement distance of support structure
10/03/2012CN202472239U PCB (Printed Circuit Board) locator of high-precision parallel light exposure machine
10/03/2012CN102707588A Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam
10/03/2012CN102707575A Mask plate and method for manufacturing array substrate
10/03/2012CN102707566A Photo-etching method
10/03/2012CN102156393B Plate printing method for mask plate in lithography machine
10/03/2012CN102043341B Alignment signal acquisition system for photo-etching equipment and alignment method
10/03/2012CN101943865B Alignment marks for photoetching equipment and alignment method
10/02/2012US8278014 Photomask and pattern formation method using the same
09/2012
09/27/2012US20120244459 Method for evaluating overlay error and mask for the same
09/26/2012CN102692831A Counterpoint mark and method for using same to manufacture workpieces in exposure process
09/26/2012CN102692830A Method for evaluating overlay error and mask for the same
09/26/2012CN102692829A Aligning method based on double-light source multicycle marker and aligning system
09/26/2012CN102692828A Lithography equipment aligning method
09/26/2012CN102692827A Aligning device for photolithography equipment
09/26/2012CN102692826A Device and method for performing alignment by automatically adopting optimal image
09/26/2012CN102692822A Multi-wavelength based aligning system and aligning method
09/26/2012CN101918898B Lithographic apparatus, method for levelling an object, and lithographic projection method
09/26/2012CN101650528B System and method for using a two part cover for protecting a reticle
09/20/2012WO2012124517A1 Alignment device and exposure device provided with same
09/19/2012CN202443245U Mask plate and detection system thereof
09/19/2012CN102683238A Method for improving line width measurement accuracy alignment of picture
09/19/2012CN102683181A Method for improving photoetching registration accuracy in germanium silicon technology
09/19/2012CN102681370A Photo-etching overlay method and method for improving breakdown stability of laterally diffused metal oxide semiconductor (LDMOS)
09/19/2012CN102681369A Aligning method suitable for maskless photo-etching machine
09/19/2012CN102681368A Pattern formation method, pattern formation device, and device fabrication method
09/19/2012CN102681360A Alignment method for realizing circuit board double-sided figure alignment in laser imaging system
09/19/2012CN102681355A Scanning data correcting device and drawing device
09/19/2012CN102681330A Photomask and method for forming overlay mark using the same and precision improvement method for counterpoint of secondary pattern technology
09/19/2012CN102681167A Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method
09/19/2012CN102141738B Nanometer-level automatic focusing system for projection lithography
09/12/2012EP2496989A1 Method and device for nanoimprint lithography
09/12/2012CN102662313A Photoetching alignment parameter prediction method and photoetching method
09/12/2012CN102662308A Automatic aligning image processing method of lithography machine
09/05/2012EP2495613A1 Lithographic apparatus
09/05/2012CN202421716U Integrated sensor structure
09/05/2012CN102096337B Device for detecting eccentricity and focal surface position of spherical surface or curved surface in projection photoetching
09/05/2012CN102053509B Method for manufacturing raised grating alignment mark in imprinting lithography
09/05/2012CN101916040B Focal plane detection system suitable for projection lithography system
09/04/2012US8257888 Particle beam writing method, particle beam writing apparatus and maintenance method for same
08/2012
08/29/2012CN102650819A Photo mask and positioning method of photo mask
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