| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 02/27/2013 | CN102944970A Mask alignment method for basal plate |
| 02/26/2013 | US8384900 Exposure apparatus |
| 02/26/2013 | US8384051 Charged particle beam drawing apparatus and article manufacturing method using same |
| 02/20/2013 | EP2560191A1 Semiconductor substrate having dot markings, and method for producing same |
| 02/20/2013 | CN102939565A Method and apparatus for performing pattern alignment |
| 02/14/2013 | WO2013021985A1 Alignment device and alignment mark for optical exposure device |
| 02/14/2013 | WO2013020473A1 Post-development photoresist layer alignment and detection method |
| 02/13/2013 | CN202735677U Device for marking inner layer circuit board of laser direct-writing exposure machine |
| 02/13/2013 | CN102929112A Zero-layer alignment mark structure for photo-etched pattern on medium substrate |
| 02/13/2013 | CN102929111A Developed photoresist layer aligning detection method |
| 02/13/2013 | CN102929108A Method for aligning by combining lenses with multiple magnifications in direct-writing photoetching machine |
| 02/13/2013 | CN102929104A Optical imaging arrangement |
| 02/12/2013 | US8372565 Method for optimizing source and mask to control line width roughness and image log slope |
| 02/07/2013 | WO2013018762A1 Method for correcting alignment of substrate to be exposed, and exposure device |
| 02/07/2013 | WO2013017924A2 Method for correcting misalignment of positions on a first wafer bonded to a second wafer |
| 02/06/2013 | CN102914952A Position adjusting device of reference grating of aligning system and adjusting method thereof |
| 02/06/2013 | CN102914951A Pre-aligning device for photoetching device |
| 02/05/2013 | US8369603 Method for inspecting measurement object |
| 02/05/2013 | US8367284 Exposure device, exposure method, and method for manufacturing semiconductor device |
| 01/31/2013 | US20130027680 Measurement method, measurement apparatus, exposure method, and exposure apparatus |
| 01/30/2013 | CN202710922U Film printing-down locating device for oval decorating machine |
| 01/30/2013 | CN202705027U Calibration device for back alignment photoetching errors |
| 01/30/2013 | CN102906868A Apparatus and method for electrostatic discharge (esd) reduction |
| 01/30/2013 | CN102902165A Device for laminated virtual mask and integration method of silicon photonics integrated chip |
| 01/29/2013 | US8361684 Method for patterning trenches with varying dimension |
| 01/29/2013 | US8361683 Multi-layer chip overlay target and measurement |
| 01/23/2013 | CN202693998U Compound type film alignment work bench |
| 01/23/2013 | CN202693996U Locating tool for reworking circuit board green oil exposure alignment |
| 01/23/2013 | CN102890433A Alignment device and alignment method for lithography equipment |
| 01/23/2013 | CN102890428A Method for aligning exposure patterns on two sides of PCB (printed circuit board) |
| 01/23/2013 | CN102890422A Probe system and method for mask alignment |
| 01/23/2013 | CN101980084B Exposure apparatus, exposure method, and device manufacturing method |
| 01/17/2013 | DE102011078999A1 Verfahren und Vorrichtung zur Positionsbestimmung von Strukturen auf einer Maske für die Mikrolithographie Method and apparatus for determining the position of structures on a mask for microlithography |
| 01/16/2013 | CN102880018A Reference grating space image adjusting device used for alignment system and adjusting method |
| 01/16/2013 | CN102880011A Detection method of registration precision of interlayer graph |
| 01/16/2013 | CN102169294B Method for measuring scanning inclination of mask table in scanning mask aligner |
| 01/16/2013 | CN102081309B Method for improving alignment scanning success rate |
| 01/16/2013 | CN101600993B Imprint method and imprint apparatus |
| 01/15/2013 | US8354209 Lithographic apparatus and device manufacturing method |
| 01/10/2013 | US20130010277 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle |
| 01/09/2013 | EP2542942A1 Pattern generators comprising a calibration system |
| 01/09/2013 | CN202663661U Exposure alignment structure in circuit manufacturing process of printed circuit board |
| 01/09/2013 | CN102866604A Mask plate alignment mark arrangement method |
| 01/09/2013 | CN102866603A Aligning scanning method for lithography machine masking and aligning signal processing method |
| 01/09/2013 | CN102866602A Off-axis signal processing method |
| 01/09/2013 | CN102866592A Photoetching exposure method for improving alignment precision of multi-layer mask process |
| 01/09/2013 | CN102866576A Mask plate group and method for determining alignment precision range by using mask plate group |
| 01/09/2013 | CN102163012B Virtual photomask system and method for superposing virtual photomask |
| 01/09/2013 | CN101852992B Apparatus and method for optical position assessment |
| 01/02/2013 | EP2539778A1 Method and apparatus for alignment optimization with respect to plurality of layers |
| 01/02/2013 | EP2539777A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539776A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539775A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539774A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | EP2539773A1 Method and apparatus for performing pattern alignment |
| 01/02/2013 | CN102856164A Method for improving clearness of alignment marks |
| 01/02/2013 | CN102854751A Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine |
| 01/02/2013 | CN102096348B Digital Moire fringe method for improving quality of Moire fringe images in imprinting alignment process |
| 01/01/2013 | US8345244 Exposure apparatus |
| 01/01/2013 | US8344341 Lithographic apparatus and device manufacturing method |
| 01/01/2013 | US8343695 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
| 01/01/2013 | US8343694 Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/27/2012 | DE102006021507B4 Übertragungsvorrichtung und Verfahren zum Übertragen eines Musters Transmission apparatus and method for transferring a pattern |
| 12/26/2012 | EP2538267A2 A method and a device for titling |
| 12/26/2012 | EP2537069A1 Lithographic apparatus and device manufacturing method |
| 12/26/2012 | CN102842485A Silicon wafer processing device and the processing method thereof |
| 12/26/2012 | CN102841516A Silicon wafer alignment system focal plane calibration method |
| 12/26/2012 | CN102841515A Alignment method and apparatus based on multi-cycle marker |
| 12/26/2012 | CN102841505A Substrate-precise-positioning workpiece stage |
| 12/26/2012 | CN101075584B Method of manufacturing LCD apparatus by using halftone exposure method |
| 12/25/2012 | US8338063 Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus |
| 12/20/2012 | DE10233491B4 Kompakte Einrichtung zur Bebilderung einer Druckform Compact device for imaging a printing forme |
| 12/19/2012 | CN202615116U Para-position exposure auxiliary mechanism |
| 12/19/2012 | CN202615113U Exposure system, calibration system and optical engines |
| 12/19/2012 | CN102834780A Exposure method and exposure apparatus |
| 12/19/2012 | CN102830593A Clamping device, assembly and lithographic projection apparatus |
| 12/19/2012 | CN102236270B Focus detection device applicable to double workpiece table projection lithography machine |
| 12/19/2012 | CN102117027B Method for positioning pellicle mounted for photomask |
| 12/19/2012 | CN101938884B Explosion positioning method of manually made PCB (Printed Circuit Board) |
| 12/19/2012 | CN101802719B Method and apparatus for measurement and control of photomask to substrate alignment |
| 12/19/2012 | CN101248392B Optical imaging arrangement |
| 12/13/2012 | DE102011077296A1 Verfahren und Vorrichtung zur Bestimmung der relativen Lage einer ersten Struktur zu einer zweiten Struktur oder eines Teiles davon Method and apparatus for determining the relative position of a first structure to a second structure, or a part thereof |
| 12/12/2012 | EP2531893A2 Improved printing plate registration |
| 12/12/2012 | CN202600360U Dual surface lithography device |
| 12/12/2012 | CN101688794B Systems and methods for fabricating displacement scales |
| 12/11/2012 | US8332784 Semiconductor device |
| 12/11/2012 | US8329366 Apparatus and method for providing resist alignment marks in a double patterning lithographic process |
| 12/05/2012 | CN202583693U Film convenient for alignment in exposure of printed circuit boards |
| 12/05/2012 | CN102809903A Secondary pre-alignment device and pre-alignment method |
| 12/05/2012 | CN101932976B Method of producing a microstructured product |
| 12/05/2012 | CN101689024B Movable body apparatus |
| 12/04/2012 | US8323860 Solid-state imaging device producing method and exposure mask |
| 11/29/2012 | WO2012160928A1 Alignment device for exposure apparatus |
| 11/28/2012 | CN102804075A Alignment method, alignment device, and exposure device |
| 11/28/2012 | CN102800652A Overlay mark and method for fabricating the same |
| 11/28/2012 | CN102800566A Method for protecting alignment mark through contact area lead wire process in semiconductor device |
| 11/28/2012 | CN102799080A Method for eliminating inclined imaging of mask grating alignment marks |
| 11/28/2012 | CN102799062A Mask, wafer and monitor method |
| 11/28/2012 | CN101989050B Positioning system, lithographic apparatus and method |
| 11/27/2012 | US8318393 Optical-image-intensity calculating method, pattern generating method, and manufacturing method of semiconductor device |