| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 05/23/2013 | US20130128256 Lithographic apparatus and device manufacturing method |
| 05/22/2013 | CN202948248U Jig for pasting film to screen printing plate |
| 05/22/2013 | CN202948247U Detection plate group gluing fixture for photoetching machine |
| 05/22/2013 | CN103119519A Light-exposure system |
| 05/22/2013 | CN102375351B Signal normalization mask alignment system |
| 05/22/2013 | CN102253603B Alignment detection device for photoetching equipment |
| 05/22/2013 | CN102207683B Mask alignment surface shape detection device for DUV (deep ultra violet) photolithographic device |
| 05/21/2013 | US8446570 System and method for using a two part cover and a box for protecting a reticle |
| 05/21/2013 | US8446568 Lithographic apparatus and device manufacturing method |
| 05/16/2013 | WO2012158025A3 Lithographic apparatus |
| 05/15/2013 | CN103105741A Alignment compensation device and exposure device |
| 05/15/2013 | CN101957567B Position calibration of alignment heads in a multi-head alignment system |
| 05/15/2013 | CN101713929B Lithographic apparatus and device manufacturing method |
| 05/14/2013 | US8440376 Exposure determining method, method of manufacturing semiconductor device, and computer program product |
| 05/14/2013 | US8440375 Exposure method and electronic device manufacturing method |
| 05/08/2013 | CN103097956A Method and apparatus for performing pattern alignment |
| 05/08/2013 | CN103092011A Aligning device used in photolithographic system |
| 05/08/2013 | CN103092005A Exposure alignment method for glass substrate |
| 05/08/2013 | CN103091992A Workpiece position correction device and correction method |
| 05/08/2013 | CN103091990A Mechanism and method for adjusting light spot horizontal position in focusing and leveling system |
| 05/08/2013 | CN102087488B Apparatus including an overlay mark and method of producing semiconductor assembly |
| 05/08/2013 | CN102007456B Diffraction elements for alignment targets |
| 05/08/2013 | CN101995776B Lithographic apparatus and device manufacturing method |
| 05/01/2013 | CN103081060A Exposure apparatus using microlens array therein, and optical member |
| 05/01/2013 | CN102004393B Composite patterning devices for soft lithography |
| 04/25/2013 | WO2013056941A1 Lithographic apparatus and method |
| 04/25/2013 | US20130100431 Method and apparatus for alignment processing |
| 04/24/2013 | EP2584408A2 Imprint method and imprint apparatus |
| 04/24/2013 | CN202904224U Double-sided light-sensitive circuit board alignment device for exposure machine |
| 04/24/2013 | CN103065929A Manufacture method of alignment mark protective layer |
| 04/24/2013 | CN103064265A Method for exposing Indium tin oxide (ITO) film of touch screen and locating component adopted by method |
| 04/24/2013 | CN103064264A Focusing and leveling device |
| 04/24/2013 | CN103064255A Approximate exposure device, method for positioning substrate of approximate exposure device, and method for manufacturing substrate of display panel |
| 04/18/2013 | WO2012144905A3 Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer |
| 04/17/2013 | CN202886845U Film positioning fixture |
| 04/17/2013 | CN202886840U Device for making mask plate |
| 04/17/2013 | CN202886839U XYY mechanism of alignment system of exposure machine |
| 04/17/2013 | CN103048896A Macro/micro-motion mechanism for aligning manual photoetching machine to Z-direction of workbench |
| 04/17/2013 | CN103048890A PIN alignment system and method for outer manual exposure machine |
| 04/17/2013 | CN103048886A Spherical pneumatic balancing mechanism |
| 04/17/2013 | CN102073222B Method for improving alignment signals accuracy of step-projection photoetching machine |
| 04/17/2013 | CN101893825B Tunable wavelength illumination system |
| 04/16/2013 | US8422623 Exposure apparatus and device manufacturing method |
| 04/10/2013 | CN202870461U Film counterpoint machine |
| 04/10/2013 | CN202870460U Film with aligning nails |
| 04/10/2013 | CN103038707A Pattern generators comprising a calibration system |
| 04/10/2013 | CN103034072A Contraposition method for substrate to be exposed and negative film and image detection contraposition system |
| 04/10/2013 | CN103034071A Exposure machine alignment method and control equipment |
| 04/10/2013 | CN102375329B Test mask and method for measuring exposure system parameters therewith |
| 04/10/2013 | CN102193340B Image processing method by projection photo-etching focusing |
| 04/10/2013 | CN102193320B Alignment device for photoetching machines and alignment method thereof |
| 04/04/2013 | US20130083397 Optical elements, method of replicating optical elements, particularly on a wafer level, and optical devices |
| 04/03/2013 | CN103026299A Method and apparatus for performing pattern alignment |
| 04/03/2013 | CN103021803A Method for protecting thick metal layer photoetching alignment mark |
| 04/03/2013 | CN103020925A Template image acquisition method |
| 04/03/2013 | CN103019052A Lithography alignment mark, and mask plate and semiconductor chip containing the same |
| 04/03/2013 | CN102087483B Optical system for focal plane detection in projection lithography |
| 04/02/2013 | US8411271 Pattern forming method, pattern forming apparatus, and device manufacturing method |
| 03/28/2013 | US20130077079 Level sensor, lithographic apparatus, and substrate surface positioning method |
| 03/28/2013 | US20130077075 Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film |
| 03/27/2013 | CN202837810U Exposure alignment system |
| 03/27/2013 | CN202837809U Device for alignment of inner layer of laser direct writing exposure machine |
| 03/27/2013 | CN102998907A Aligning signal acquisition system and aligning method used in mask aligning |
| 03/27/2013 | CN101533229B Reticle for projection exposure apparatus and exposure method using the same |
| 03/27/2013 | CN101458464B Alignment method, alignment system and product with alignment mark |
| 03/26/2013 | US8407627 Method and system for context-specific mask inspection |
| 03/26/2013 | US8404410 Method of aligning photomask with base material and method of manufacturing printed circuit board |
| 03/21/2013 | WO2013039100A1 Film exposure device |
| 03/21/2013 | US20130070226 Marker structure and method of forming the same |
| 03/20/2013 | CN202815413U Device for exposure and alignment of dry films |
| 03/20/2013 | CN202815412U Pre-alignment mechanism of photoetching machine |
| 03/20/2013 | CN102985878A Method and apparatus for performing pattern alignment |
| 03/20/2013 | CN102983119A Recessed type alignment mark used for electron beam alignment on SOI (Silicon On Insulator) and manufacturing method thereof |
| 03/20/2013 | CN102981380A Pre-aligning device and pre-aligning method for photoetching device |
| 03/20/2013 | CN102981374A Detection plate group gluing method and clamp |
| 03/20/2013 | CN101427185B Align method, imprinting method, align device and imprinting device |
| 03/19/2013 | US8399163 Method of detecting alignment mark and method of manufacturing printed circuit board |
| 03/14/2013 | DE102011082414A1 Autofokuseinrichtung und Autofokussierverfahren für eine Abbildungsvorrichtung Autofocus device and autofocusing method for an imaging device |
| 03/13/2013 | CN202794848U Film exposure device |
| 03/13/2013 | CN202794846U Negative film contraposition system |
| 03/13/2013 | CN202794845U Copper-clad plate aligning system for exposure machine |
| 03/13/2013 | CN202794843U Novel alignment film |
| 03/13/2013 | CN102971674A Method and apparatus for performing pattern alignment |
| 03/13/2013 | CN102969302A Electron beam aligning mark based on hafnium oxide and manufacturing method of mark |
| 03/13/2013 | CN102968000A Dual-sided processing method and exposure device |
| 03/13/2013 | CN102967996A Method for improving alignment accuracy of lithography machine |
| 03/13/2013 | CN102207689B Alignment system and align mark precision extraction method of write-through lithography machine |
| 03/12/2013 | US8395755 Lithographic apparatus and device manufacturing method |
| 03/12/2013 | US8394574 Metrology systems and methods for lithography processes |
| 03/07/2013 | DE102006040275B4 Ausrichtmarken für Lithografie mit polarisiertem Licht und Verfahren zur Verwendung derselben Alignment marks for lithography with polarized light and method of using same |
| 03/06/2013 | EP2564270A1 Force curve analysis method for planar object leveling |
| 03/06/2013 | CN102959469A Method and apparatus for alignment optimization with respect to plurality of layers |
| 03/06/2013 | CN102956477A Method for optimizing photoetching registration accuracy of emitting electrode of silicon germanium HBT (heterojunction bipolar transistor) |
| 03/06/2013 | CN102955379A Method for compensating overlay error caused by lens distortion |
| 03/06/2013 | CN102955377A Lithographic apparatus, device manufacturing method, and method of calibrating displacement measuring system |
| 03/06/2013 | CN102955369A Lithographic apparatus, substrate table and device manufacturing method |
| 03/06/2013 | CN102955365A Interference exposure device and method thereof |
| 03/05/2013 | US8387482 Method and system to control movement of a body for nano-scale manufacturing |
| 02/28/2013 | WO2013026361A1 Step photolithography device and photolithography exposure method |
| 02/27/2013 | CN102944978A Exposure system, calibration system, optical engines, exposure method, and production method |