| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 09/03/2013 | US8524427 Electron beam lithography system and method for improving throughput |
| 09/03/2013 | US8524426 Method of manufacturing a photomask |
| 08/29/2013 | WO2013126153A1 Method for processing semiconductors using a combination of electron beam and optical lithography |
| 08/29/2013 | DE102013202484A1 SOI-Wafer und Verfahren zu seiner Herstellung SOI wafer and process for its preparation |
| 08/28/2013 | CN203164594U PCB (printed circuit board) exposure machine and rectification mechanism thereof |
| 08/28/2013 | CN103270454A Film exposure device and film exposure method |
| 08/22/2013 | WO2013087431A3 Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell |
| 08/21/2013 | CN203149266U Alignment device for inner layer printed circuit board of PCB (Printed Circuit Board) exposure machine |
| 08/14/2013 | DE102004021151B4 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 08/14/2013 | CN103246170A Exposure device and exposure method |
| 08/14/2013 | CN103246169A Apparatus and method for focal plane change measurement |
| 08/14/2013 | CN103246166A Silicon wafer prealignment measuring apparatus |
| 08/14/2013 | CN102298278B Focusing and levelling detection method |
| 08/14/2013 | CN102063025B Measurement method of two-faced registration error and lithographic equipment applying measurement method |
| 08/13/2013 | US8507160 Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium |
| 08/13/2013 | US8507159 Electron beam data storage system and method for high volume manufacturing |
| 08/08/2013 | US20130201466 Lithographic Apparatus and Device Manufacturing Method |
| 08/07/2013 | EP2624286A1 Method of manufacturing semiconductor device |
| 08/07/2013 | CN103235492A PCB and film alignment device |
| 08/07/2013 | CN103235486A Method for correction of exposed pattern |
| 08/07/2013 | CN102132216B Mask holding mechanism |
| 08/06/2013 | US8501376 System and method for test pattern for lithography process |
| 08/06/2013 | US8501374 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 08/01/2013 | WO2013110664A1 Overlay model for aligning and exposing semiconductor wafers |
| 07/31/2013 | CN203103295U Epitaxial mark |
| 07/31/2013 | CN203101813U Exposure machine |
| 07/31/2013 | CN103226284A Imprint apparatus and method of manufacturing article |
| 07/31/2013 | CN102193307B Method for enhancing identifiability of pattern requiring measurement |
| 07/31/2013 | CN102043348B Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate |
| 07/31/2013 | CN101504511B Photo-etching apparatus and calibration method |
| 07/25/2013 | WO2013107698A1 Sample positioning device and method for operation thereof |
| 07/25/2013 | WO2012144904A3 Position determination in a lithography system using a substrate having a partially reflective position mark |
| 07/25/2013 | WO2012144903A3 Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system |
| 07/25/2013 | US20130188165 Lithography apparatus, and method of manufacturing article |
| 07/24/2013 | CN203084413U Mask plate group and mark entity platform |
| 07/24/2013 | CN103217876A Deviation equalization counterpoint method of PCB (printed circuit board) exposure machine |
| 07/24/2013 | CN103217875A PCB (printed circuit board) exposure machine and correction mechanism thereof |
| 07/24/2013 | CN102386322B Method for improving aligning accuracy |
| 07/24/2013 | CN101470360B Immersion lithographic apparatus and device manufacturing method |
| 07/23/2013 | US8492058 Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus |
| 07/18/2013 | WO2013105317A1 Substrate processing device, substrate processing method and cylindrical mask |
| 07/18/2013 | US20130183623 Exposure apparatus and exposure method, and device manufacturing method |
| 07/17/2013 | CN203072258U Exposure positioning tool |
| 07/17/2013 | CN103208483A Overlay mark and application thereof |
| 07/17/2013 | CN102375352B Environmental compensation alignment system |
| 07/17/2013 | CN102109778B 调整机构 Adjustment mechanism |
| 07/17/2013 | CN102109768B Rotary silicon wafer carrying platform and method using same for precise alignment of silicon wafer |
| 07/16/2013 | US8486593 Roll-to-roll digital photolithography |
| 07/11/2013 | WO2013102351A1 Transparent and clamped pre-alignment machine |
| 07/10/2013 | CN203054452U Positioning assembly for exposing ITO (Indium Tin Oxide) thin film of touch screen |
| 07/10/2013 | CN103199084A Substrate align marks and manufacturing method thereof and substrate |
| 07/10/2013 | CN103197519A Offset plate adjusting device |
| 07/10/2013 | CN103197518A Alignment device and method |
| 07/10/2013 | CN103197517A Workbench balancing-mass mass-center measuring and correcting method |
| 07/10/2013 | CN103197505A Mark period level light intensity accumulation based method for determining and searching alignment mark and alignment system |
| 07/10/2013 | CN103197501A Array substrate and preparation method thereof, and display device |
| 07/10/2013 | CN103197418A Alignment 4 F optics system |
| 07/10/2013 | CN102376610B Integrated circuit module and methods of manufacturing the same |
| 07/10/2013 | CN102334070B Exposure apparatus |
| 07/10/2013 | CN101689025B Movable body apparatus |
| 07/03/2013 | CN203040025U Circuit board exposure counterpoint tool |
| 07/03/2013 | CN103189801A Film exposure device |
| 07/03/2013 | CN103186060A Photoetching alignment apparatus, use method thereof and photoetching machine |
| 07/03/2013 | CN103186059A Mask overlay method, mask, and semiconductor device using the same |
| 07/03/2013 | CN103186057A Measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method |
| 07/03/2013 | CN103186054A Carrier device and exposure device |
| 07/03/2013 | CN101986207B 曝光装置以及曝光方法 Exposure apparatus and exposure method |
| 07/03/2013 | CN101969747B Hinge clamp positioning method for printed board processing |
| 07/02/2013 | US8477310 Measurement method, measurement apparatus, exposure method, and exposure apparatus |
| 07/02/2013 | US8475980 Methods of forming semiconductor devices using photolithographic shot grouping |
| 06/26/2013 | CN103176373A Alignment mark and method of manufacturing the same |
| 06/26/2013 | CN101908526B Alignment mark arrangement and alignment mark structure |
| 06/20/2013 | WO2013087431A2 Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell |
| 06/20/2013 | WO2013086913A1 Detection method for space imaging overlay and array substrate |
| 06/19/2013 | CN203015278U Printed circuit board used to determine solder resist film contraposition effect quickly |
| 06/19/2013 | CN103165582A Structure and method for e-beam in-chip overlay mark |
| 06/19/2013 | CN103165417A Multiple-patterning overlay decoupling method |
| 06/19/2013 | CN103163747A Small spot off-axis alignment system based on area lighting |
| 06/19/2013 | CN103163746A Mask alignment detector having temperature detection function, photoetching apparatus and alignment detection method |
| 06/19/2013 | CN103163742A Photolithography device and photolithography method thereof |
| 06/19/2013 | CN103163740A Position measuring device for tilted object |
| 06/19/2013 | CN101689028B Method for processing pattern data and method for manufacturing electronic device |
| 06/18/2013 | US8465907 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/13/2013 | WO2013085389A2 System and method for overlay control |
| 06/12/2013 | EP2602663A1 System and method for overlay control |
| 06/12/2013 | CN103154819A Projection exposure tool for microlithography and method for microlithographic imaging |
| 06/12/2013 | CN103149803A Exposure device and method of manufacturing device |
| 06/12/2013 | CN103149608A Aligning method of unmarked deep-anaglyph micro lens array and detector |
| 06/05/2013 | CN103140805A Projection exposure tool for microlithography and method for microlithographic exposure |
| 06/05/2013 | CN103135371A Small light spot off-axis aligning system based on beam splitting deflection structure |
| 06/05/2013 | CN103135359A Centering device and centering method of optical-mechanical system |
| 06/05/2013 | CN102298266B Method for manufacturing standard wafer |
| 06/05/2013 | CN102222661B Electrical alignment mark set and using method thereof |
| 06/05/2013 | CN101718956B Exposure method and alignment device thereof for substrate manufacturing |
| 06/05/2013 | CN101515116B Mark structure for coarse wafer alignment and method for manufacturing such a mark structure |
| 06/04/2013 | US8455162 Alignment marks for multi-exposure lithography |
| 05/30/2013 | WO2012144905A4 Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer |
| 05/28/2013 | US8453073 Method of mask generation for integrated circuit fabrication |
| 05/28/2013 | US8451426 Exposure method and exposure apparatus |
| 05/23/2013 | WO2013017924A3 Method for correcting misalignment of positions on a first wafer bonded to a second wafer |