| Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803) |
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| 12/04/2013 | CN103425004A Silicon slice alignment signal processing method |
| 12/04/2013 | CN103424994A Image space marker bearing apparatus and method for manufacturing the bearing apparatus |
| 12/03/2013 | US8599488 Optical arrangement of autofocus elements for use with immersion lithography |
| 11/28/2013 | US20130314708 Method and Apparatus for Maintaining Depth of Focus |
| 11/27/2013 | CN203311160U Screen exposure alignment fixture |
| 11/26/2013 | US8592111 LCD panel photolithography process and mask |
| 11/26/2013 | US8592109 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers |
| 11/21/2013 | WO2013170725A1 Fabrication method for semiconductor device and semiconductor device |
| 11/20/2013 | CN103403624A Alignment device and exposure device provided with same |
| 11/20/2013 | CN103399465A Method for realizing dual-face alignment photoetching by utilization of one-face exposure machine |
| 11/20/2013 | CN101673059B Lithographic apparatus and device manufacturing method |
| 11/19/2013 | US8587782 Optical-component fabricating method and optical-component fabricating apparatus |
| 11/19/2013 | US8586950 Method and system for feature function aware priority printing |
| 11/14/2013 | US20130301017 Lithographic apparatus and device manufacturing method |
| 11/13/2013 | CN103389623A Focusing and leveling device |
| 11/13/2013 | CN103389533A Method for manufacturing color filter and color filter |
| 11/13/2013 | CN102566338B Method for correcting alignment positions in photoetching alignment system |
| 11/13/2013 | CN102486617B Precise adjusting apparatus |
| 11/12/2013 | US8580467 Method for fabricating color filter substrate |
| 11/12/2013 | US8578620 Measurement device for measuring alignment of screen printed images |
| 11/07/2013 | WO2013085389A3 System and method for overlay control |
| 11/07/2013 | DE102013102970A1 Intra-Überlagerungs-Metrologie Intra-overlay metrology |
| 11/07/2013 | DE102012008745A1 Anstrahlmodul für eine Messvorrichtung Anstrahlmodul for a measuring device |
| 11/06/2013 | EP2660656A1 Backside registration apparatus and method |
| 11/06/2013 | CN203275878U Exposure alignment accuracy inspection mechanism |
| 11/06/2013 | CN103383532A Circuit alignment method of semi-automatic exposure machine |
| 11/06/2013 | CN103383531A Mask alignment device and photoetching device using same |
| 11/05/2013 | US8574795 Lithographic CD correction by second exposure |
| 10/31/2013 | WO2013160016A1 Lithography apparatus and device manufacturing method |
| 10/30/2013 | CN103376673A Pre-alignment device and pre-alignment method |
| 10/30/2013 | CN103376672A Aligning signal processing system for photolithographic equipment |
| 10/30/2013 | CN103376667A Mask stage for exposure device |
| 10/30/2013 | CN103376645A General mask and application thereof |
| 10/30/2013 | CN101738882B Alignment mark detecting method |
| 10/29/2013 | US8570515 Periodic patterns and technique to control misalignment between two layers |
| 10/23/2013 | CN103365125A Process base fringing field leveling method |
| 10/23/2013 | CN103365124A 曝光对准方法 Exposure alignment method |
| 10/23/2013 | CN103365123A Adjusting mechanism of diaphragm plate of alignment system |
| 10/23/2013 | CN103365122A Self-reference interference alignment system for photoetching equipment |
| 10/23/2013 | CN103365114A Exposure marking device |
| 10/23/2013 | CN103365107A Matching and calibrating method for multi-off-axis aligning system |
| 10/23/2013 | CN103365105A Method for screening and correcting light intensity sampling points in alignment process |
| 10/23/2013 | CN103365103A Focusing and leveling device and method |
| 10/23/2013 | CN103365099A Focusing and leveling signal processing method |
| 10/23/2013 | CN103365098A Alignment mark for exposure device |
| 10/23/2013 | CN103365097A Focusing and levelling measurement device |
| 10/23/2013 | CN103365096A Focusing and leveling system for photoetching equipment and measurement method |
| 10/23/2013 | CN103365095A Back off-axis alignment system based on array photoelectric sensor, and photoetching device and method |
| 10/22/2013 | US8563202 Single field zero mask for increased alignment accuracy in field stitching |
| 10/22/2013 | US8563198 Device and method for providing wavelength reduction with a photomask |
| 10/17/2013 | US20130271742 Apparatus and method for alignment processing |
| 10/10/2013 | WO2013150007A2 Method and device for measuring distance using a diffractive structure |
| 10/10/2013 | US20130265589 Pattern generators, calibration systems and methods for patterning workpieces |
| 10/10/2013 | DE102012103008B3 Verfahren und Vorrichtung zur Abstandsmessung mit einer diffraktiven Struktur Method and apparatus for distance measurement with a diffractive structure |
| 10/09/2013 | EP2648044A2 Measurement apparatus and measurement method |
| 10/09/2013 | CN103345132A Method for aligning outer layer film PIN nails |
| 10/09/2013 | CN103345131A Film fixing device for exposure machine |
| 10/08/2013 | US8555208 Systems and methods for implementing and manufacturing reticles for use in photolithography tools |
| 10/08/2013 | US8551677 Lithographic CD correction by second exposure |
| 10/08/2013 | US8551675 Mounting a pellicle to a frame |
| 10/03/2013 | WO2013146184A1 Substrate processing device, processing device, and method for manufacturing device |
| 10/03/2013 | WO2013145986A1 Exposure writing device and exposure writing method |
| 10/03/2013 | WO2013145798A1 Exposure writing device and exposure writing method |
| 10/03/2013 | US20130258415 Image editing apparatus, image editing method, and recording medium |
| 10/03/2013 | US20130258310 Metrology Method and Apparatus, Lithographic System and Device Manufacturing Method |
| 10/03/2013 | US20130258306 Mask pattern alignment method and system |
| 10/02/2013 | DE102012110632A1 Schema zur Waferausrichtungsmarkierung Scheme for wafer alignment mark |
| 10/02/2013 | DE102007000973B4 Maske, Verwendung der Maske in einer Koordinaten-Messmaschine und Verfahren zur Bestimmung der Drehlage der Maske Mask, using the mask in a coordinate measuring machine and method for determining the rotational position of the mask |
| 10/01/2013 | US8548224 Method for inspecting measurement object |
| 09/26/2013 | DE102012005587A1 Automatische Kalibrierung eines Mikroskop-Scanningsystems Automatic calibration of a microscope Scanning System |
| 09/25/2013 | CN103324040A Method for raising contraposition precision between printed circuit board and film |
| 09/24/2013 | US8543352 System for measuring a shape, method for measuring a shape, and computer program product |
| 09/19/2013 | WO2013137358A1 Mask for calibration and method for calibration |
| 09/19/2013 | DE10297658B4 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |
| 09/18/2013 | CN203204302U Alignment mechanism of semi-automatic exposure machine |
| 09/18/2013 | CN103314328A Film exposure method |
| 09/18/2013 | CN103309178A Double-face alignment exposure device for semiconductor wafer |
| 09/18/2013 | CN103309169A Detection apparatus, exposure apparatus, and method of manufacturing device |
| 09/18/2013 | CN103309163A External reference interference silicon chip aligning system |
| 09/17/2013 | US8535858 Photomask and method for forming overlay mark using the same |
| 09/12/2013 | WO2012144904A4 Position determination in a lithography system using a substrate having a partially reflective position mark |
| 09/12/2013 | US20130235358 Lithographic apparatus and device manufacturing method |
| 09/11/2013 | EP2637061A1 Exposure apparatus, exposure method and method for producing a device |
| 09/11/2013 | CN203192777U Silicon wafer bench installation positioning system |
| 09/11/2013 | CN203191682U PCB (printed circuit board) and film aligning device |
| 09/11/2013 | CN103293884A Off-axis alignment system and method for photolithographic equipment |
| 09/11/2013 | CN103293880A Two-stage type correction device and exposure machine base |
| 09/11/2013 | CN103293869A System and method for lithography patterning |
| 09/11/2013 | CN103293867A Pre-alignment device and method of square substrates |
| 09/11/2013 | CN103293865A Workpiece platform position error measurement and pre-compensation method |
| 09/11/2013 | CN102402124B Method for reducing lithography alignment deviation arising from lens distortion of lithography machine |
| 09/11/2013 | CN102315198B Structure with alignment mark and manufacture method for stacking device |
| 09/11/2013 | CN102200701B Fixing device for mask |
| 09/11/2013 | CN102012640B Pre-alignment method and device for being compatible with broken silicon wafers |
| 09/10/2013 | US8530145 Method for manufacturing a semiconductor device |
| 09/10/2013 | US8530121 Multiple-grid exposure method |
| 09/10/2013 | US8530120 Method and apparatus for performing pattern reconnection after individual or multipart alignment |
| 09/04/2013 | CN103282832A Exposure apparatus |
| 09/04/2013 | CN103279016A Method for improving overlay measurement precision |
| 09/03/2013 | US8525994 Periodic patterns and technique to control misaligment between two layers |