Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
03/2014
03/26/2014CN102566335B Template image acquisition method
03/26/2014CN102460309B Alignment method, alignment device, and exposure device
03/20/2014WO2013178404A3 A method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system
03/19/2014CN103645616A Automatic film alignment machine
03/19/2014CN103645613A Method for polishing connection edge of angle mirror of photoetching machine
03/18/2014US8675175 Lithographic apparatus and device manufacturing method
03/12/2014CN203482506U Foldable PCB film
03/12/2014CN103633067A Crossed annular aligning mark based on TSV (through silicon via) three-dimensional integration process
03/12/2014CN103631095A Dynamic electronic mask plate system used for preparing monolithic integration capacitive touch screen through collage method
03/12/2014CN103631086A Manufacturing method for micro-nano graphs used for integrated optoelectronic device
03/12/2014CN102636962B Aerial image overlay test method and array base plate
03/12/2014CN102269935B Displacement device, lithographic apparatus and positioning method
03/06/2014WO2014034161A1 Substrate support device and exposure device
03/06/2014WO2014032833A1 Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus
03/06/2014DE102013213785A1 Verfahren und System zur Bestimmung von Überlappungsprozessfenstern in Halbleitern durch Inspektionstechniken Method and system for determining overlapping process windows in semiconductors by inspection techniques
03/05/2014CN103616804A Dynamic mask plate system for preparing monolithic integration capacitive touch screen by collage method
03/05/2014CN103616797A Novel nanoimprinting equipment with rapid alignment function
03/04/2014US8663877 Lithography masks, systems, and manufacturing methods
02/2014
02/27/2014WO2013152878A3 Position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method, optical element
02/27/2014US20140055762 Optical arrangement of autofocus elements for use with immersion lithography
02/26/2014EP2699968A2 Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer
02/26/2014EP2699967A2 Position determination in a lithography system using a substrate having a partially reflective position mark
02/26/2014CN103605264A Method for patterning substrate
02/26/2014CN102520593B Alignment verification method for exposure machine
02/20/2014WO2014027484A1 Drawing device, exposure drawing device, drawing method, and recording medium whereon program is stored
02/20/2014WO2014027483A1 Drawing device, exposure drawing device, drawing method, and recording medium whereon program is stored
02/20/2014WO2014027333A1 Correction in x-ray imaging systems for differential phase contrast imaging
02/20/2014WO2014027289A1 Handling misalignment in differential phase contrast imaging
02/20/2014WO2014026819A2 Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
02/20/2014WO2013132081A4 Lithography system and method for processing a target, such as a wafer
02/19/2014EP2697689A1 Lithography process
02/19/2014CN102486621B Alignment adjusting device and alignment adjusting method
02/19/2014CN102455247B Device and method for detecting optimal focal plane of projection objective
02/19/2014CN102402140B Alignment system
02/18/2014US8652306 Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank
02/12/2014CN203433265U Exposure machine based on CCD (Charge Coupled Device) alignment system
02/12/2014CN103582848A Position determination in a lithography system using a substrate having a partially reflective position mark
02/12/2014CN103576467A Alignment device and alignment method
02/12/2014CN102023494B Actuator, positioning system and lithographic apparatus
02/12/2014CN101946305B Method for making structures with improved edge definition
02/12/2014CN101840159B Lithographic apparatus and device manufacturing method
02/11/2014US8647797 Methos and device for keeping mask dimensions constant
02/06/2014WO2014019846A2 Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
02/05/2014CN103558741A Method for machining detection plate
02/05/2014CN103558740A Double-surface stepping photo-etching method for micro electro mechanical system (MEMS) wafer
02/05/2014CN103558737A Substrate holding device, exposure apparatus having the same and method for producing a device
02/05/2014CN102053490B Impression equipment
02/04/2014CA2490975C A device having a light-absorbing mask and a method for fabricating same
01/2014
01/30/2014WO2014016139A1 Euv light source
01/29/2014CN103543610A Calibration method for focusing and leveling light spot position
01/29/2014CN102411268B Photoetching apparatus and method for improving photoetching machine overlay accuracy
01/28/2014US8637211 Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns
01/23/2014US20140022563 Periodic Patterns and Technique to Control Misalignment Between Two Layers
01/23/2014US20140022377 Mark detection method, exposure method and exposure apparatus, and device manufacturing method
01/22/2014CN203405669U Film capable of achieving black wafer direct alignment
01/22/2014CN103531510A Transfer and alignment photoetching method of P+ epitaxy pattern of semiconductor circuit
01/22/2014CN103529661A Nano-imprinting alignment device
01/22/2014CN103529660A Internal layer alignment apparatus for multi-optical path exposure equipment
01/22/2014CN103529659A Alignment precision detection method and system
01/22/2014CN103529658A Method for aligning square wafer in primary photolithography technique
01/22/2014CN103529654A Alignment method for internal layers in direct writing type photoetching system
01/22/2014CN102402127B Silicon chip prealignment device and silicon chip prealignment method
01/21/2014DE202013105600U1 Objekt-Halte-und-Ausricht-Vorrichtung, Vorrichtung zum Ausrichten eines Objekts und einer Maske zueinander sowie Vakuumkammer mit einer dieser beiden Vorrichtungen Object-holding-and-alignment apparatus, apparatus for aligning a mask of an object and to each other and vacuum chamber with one of these two devices
01/16/2014WO2014010593A1 Mark, method for forming same, and exposure apparatus
01/16/2014WO2014010233A1 Drive system and drive method, and exposure device and exposure method
01/15/2014CN203397081U Novel positioning mechanism
01/15/2014CN103513505A Photo mask, photo mask manufacturing method, pattern transfer method and flat panel display manufacturing method
01/08/2014CN203385994U Automatic alignment machine
01/08/2014CN203385993U Four-exposure-head optical exposure machine with automatic aligning system
01/07/2014US8625109 Method of determining an overlap distance of an optical head and digital exposure device using the method
01/07/2014US8625096 Method and system for increasing alignment target contrast
01/07/2014US8625074 Exposure apparatus and device fabrication method
01/03/2014WO2014002794A1 Method for manufacturing thin film laminated element
01/01/2014CN103488064A Back side alignment apparatus and back side alignment substrate pasting method
01/01/2014CN103488063A Align marker and manufacturing method thereof
01/01/2014CN103488057A Self-counterpoint exposure orientation equipment and process method for manufacturing phase difference plate
12/2013
12/31/2013US8618515 Lithography apparatus and device manufacturing method
12/31/2013US8617774 Method and calibration mask for calibrating a position measuring apparatus
12/26/2013US20130342843 Reflection Shadow Mask Alignment Using Coded Apertures
12/25/2013CN203365923U Positioning mechanism
12/25/2013CN203365918U Self-alignment exposure orientation equipment
12/25/2013CN203365917U Exposure device
12/25/2013CN103477433A Semiconductor substrate having dot markings, and method for producing same
12/25/2013CN103472680A Silicon wafer pre-alignment apparatus
12/19/2013WO2013185605A1 Alignment mark and fabrication method thereof
12/19/2013WO2013132081A3 Lithography system and method for processing a target, such as a wafer
12/18/2013CN203350609U Mask template location and conveying device
12/18/2013CN103454852A Mask and overlay precision measuring method
12/17/2013US8610944 Method and apparatus for slow scan magnification adjustment using non-redundant overwriting
12/17/2013US8610096 Charged particle beam writing apparatus and method
12/17/2013US8609308 Smart subfield method for E-beam lithography
12/17/2013US8609306 Method for forming circular patterns on a surface
12/17/2013US8609301 Mask, exposure apparatus and device manufacturing method
12/12/2013WO2013182562A1 Optical writer for flexible foils
12/12/2013US20130329209 Mask, exposure apparatus and device manufacturing method
12/05/2013WO2013177874A1 Alignment identifier and method using alignment identifier to manufacture workpiece in exposure process
12/04/2013EP2669739A2 Measuring method, and exposure method and apparatus
12/04/2013CN203324648U Two-side alignment exposure device for semiconductor chip
12/04/2013CN103425006A Aligning signal processing device used for photolithographic equipment, and aligning device used for photolithographic equipment
12/04/2013CN103425005A Light-source-modulation-based mask pre-aligning system and pre-aligning method
1 2 3 4 5 6 7 8 9 10 11 12 13 14 ... 109