Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
12/2014
12/02/2014US8901737 Integrated circuit arrangement with an auxiliary indentation, particularly with aligning marks
11/2014
11/25/2014US8896817 Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method
11/25/2014US8896808 Lithographic apparatus and method
11/18/2014US8891732 Apparatus and method for detecting marks and semiconductor device processing system
11/11/2014US8886350 Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus
11/11/2014US8885164 Exposure method, exposure apparatus, and method of manufacturing device
11/11/2014US8883380 Film exposure method
10/2014
10/30/2014US20140320833 Optical arrangement of autofocus elements for use with immersion lithography
10/28/2014US8872135 Electroactive polymers for lithography
10/21/2014US8867022 Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
10/21/2014US8867019 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
10/14/2014US8860928 Lithographic apparatus, computer program product and device manufacturing method
10/07/2014US8854693 Image editing apparatus, image editing method, and recording medium
10/07/2014US8854632 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
10/07/2014US8853868 Semiconductor structures including sub-resolution alignment marks
10/07/2014US8850980 Tessellated patterns in imprint lithography
10/02/2014WO2014155830A1 Lithographic device, lithographic exposure device, recording medium having program recorded thereon, and lithographic process
10/02/2014US20140293251 Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method
10/02/2014US20140291516 Methods and Systems for Measuring a Characteristic of a Substrate or Preparing a Substrate for Analysis
09/2014
09/30/2014US8847178 Charged particle beam writing apparatus and charged particle beam writing method
09/30/2014US8845320 Imprint lithography apparatus
09/30/2014US8845318 Imprint apparatus, imprint method, and mold for imprint
09/30/2014US8845317 Alignment method, imprint method, alignment apparatus, and position measurement method
09/25/2014WO2014146906A2 Method and apparatus for measuring asymmetry of a microsutructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
09/23/2014US8842294 Position detection apparatus, imprint apparatus, and position detection method
09/23/2014US8842293 Level sensor arrangement for lithographic apparatus and device manufacturing method
09/23/2014US8842278 Exposure method, exposure apparatus, and device manufacturing method
09/23/2014US8841920 Capacitive sensing system
09/23/2014US8841681 Wide-gap semiconductor substrate and method to fabricate wide-gap semiconductor device using the same
09/18/2014WO2014139855A1 Patterning device, method of producing a marker on a substrate and device manufacturing method
09/18/2014US20140268089 Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method
09/18/2014DE102013109515A1 Methodik der Überlagerungs-Prüfung Methodology of the overlay inspection
09/18/2014DE102013022024A1 Methodik der Überlagerungs-Prüfung Methodology of the overlay inspection
09/16/2014US8836943 Workpiece alignment device
09/16/2014US8836919 Management method and system for exposure apparatus having alarm based on inclination amount and deviation from aligned position
09/16/2014US8834144 Imprinting machine and device manufacturing method
09/12/2014WO2014134888A1 Substrate alignment mark and manufacturing method therefor, and substrate
09/11/2014US20140253899 Substrate processing apparatus, lithography apparatus, and method of manufacturing article
09/09/2014US8828632 Multiple-grid exposure method
08/2014
08/28/2014US20140240705 Semiconductor device, reticle method for checking position misalignment and method for manufacturing position misalignment checking mark
08/28/2014DE102007033814B4 Vorrichtung und Verfahren zum Messen der Position von Marken auf einer Maske Apparatus and method for measuring the position of marks on a mask
08/28/2014DE102004008378B4 Optisches Nähenkorrekturverfahren Optical proximity correction method
08/21/2014WO2014102187A3 Lithography method and lithography device for components and circuits having microscale and nanoscale structural dimensions
08/19/2014US8811665 Processing system
08/19/2014US8810915 Optical arrangement of autofocus elements for use with immersion lithography
08/19/2014US8810774 Exposure apparatus and device fabrication method
08/14/2014US20140226144 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
08/13/2014CN103984208A 掩模版传输系统 Reticle transmission system
08/13/2014CN102778822B 一种调焦调平装置 One kind focusing leveling device
08/13/2014CN102681355B 描画数据修正装置及描画装置 The drawing device and drawing data correction means
08/07/2014WO2014120082A1 A planar positioning system and method of using the same
08/06/2014CN103972135A 一种硅片精确定位传输装置及定位方法 Silicon wafers pinpoint transmission device and positioning method
08/06/2014CN103969967A 用于硅片对准级间串绕测试和拟合的信号处理方法 Wafer-level crosstalk between alignment and fit test method for signal processing
08/06/2014CN103969961A 一种调焦调平系统 One kind focusing leveling system
08/06/2014CN103969943A 一种对基板进行标记的方法 One kind of labeled substrate method
08/06/2014CN103969873A 用于将掩膜版和基板对齐的方法及彩膜基板的制造方法 The method for manufacturing the mask and substrate alignment methods and color film substrate
08/06/2014CN102944978B 曝光系统、校准系统、光学引擎、曝光方法和制造方法 The exposure system, the calibration system, the optical engine, the exposure method and the manufacturing method
08/06/2014CN102866576B 一种掩膜板组及应用掩膜板组确定对位精度范围的方法 One kind of mask mask group and application group to determine the scope of the method for positioning accuracy
08/06/2014CN102193346B Led自动曝光机基板非接触式快速预定位方法 Led automatic exposure machine substrate quick pre-positioning of non-contact method
08/06/2014CN101071263B 制造显示面板的设备和方法 And a method of manufacturing a display apparatus panel
08/05/2014US8797503 Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure
07/2014
07/30/2014CN103955124A 一种光学精密系统的对准装置 An optical precision alignment device system
07/29/2014US8792084 Exposure apparatus, exposure method, and device manufacturing method
07/29/2014US8792080 Method and system to predict lithography focus error using simulated or measured topography
07/24/2014US20140204397 Metrology Method and Apparatus, and Device Manufacturing Method
07/24/2014US20140204357 Detection apparatus, measurement apparatus, lithography apparatus, and method of manufacturing article
07/24/2014DE102013100535A1 Object holding and orientation device for holding object e.g. substrate in vacuum chamber, has fixing mechanism that is arranged in spherical contact surfaces to releasably fix microscope slide and object positioning unit to each other
07/23/2014CN102455600B 检测晶片表面形貌的方法 Detection methods wafer surface topography
07/23/2014CN102402141B 自参考干涉仪、对准系统和光刻设备 Since the reference interferometer, the alignment system and lithography equipment
07/23/2014CN102099744B 光刻设备内的收集器装置的对准 Aligning the lithographic apparatus collector device
07/17/2014WO2014076009A3 Position measurement system, grating for a position measurement system and method
07/16/2014CN203720533U 一种标记板的定位系统 A marking plate positioning system
07/16/2014CN203720532U 一种光刻标记结构 A lithographic mark structure
07/16/2014CN103926809A 一种基板的制备方法 Method for preparing a substrate
07/16/2014CN103926808A 氧化铟锡图案曝光装置 Indium tin oxide patterned exposure apparatus
07/16/2014CN103926807A 一种硅片对准方法 One kind of wafer alignment method
07/16/2014CN103926797A 一种用于光刻装置的双面套刻系统及方法 A double-sided overlay system and method for a lithographic apparatus
07/16/2014CN102749808B 一种调焦调平测量装置 One kind focusing leveling measuring device
07/16/2014CN102566296B 一种光刻曝光系统集成装配方法 A lithographic exposure system integration method of assembly
07/16/2014CN102540778B 一种测量系统及使用该测量系统的光刻设备 A measuring system of the measuring system and the use of lithographic apparatus
07/16/2014CN102540744B 掩模对准探测装置及方法 Mask alignment detection device and method
07/15/2014US8781213 Optical alignment systems for forming LEDs having a rough surface
07/15/2014US8780361 Apparatus and method for calibrating laser projection system
07/10/2014WO2014106557A1 Chuck, in particular for use in a mask aligner
07/10/2014US20140192333 Alignment Target Contrast in a Lithographic Double Patterning Process
07/10/2014DE102013210699A1 Verfahren zur Positionsbestimmung eines Luftbildes Method for determining the position of an aerial image
07/09/2014EP2752870A1 Chuck, in particular for use in a mask aligner
07/09/2014CN203705821U 一种光罩支架调平机构 One kind of mask holder leveling mechanism
07/09/2014CN203705819U 一种光罩支架自动调平机构 One kind of mask holder automatic leveling mechanism
07/09/2014CN103917920A 光刻设备和方法 Lithographic apparatus and method
07/09/2014CN103913961A 一种基于光束波前调制的同轴检焦装置 A coaxial device before check-focus beam wave Modulation
07/09/2014CN103913960A 用于光刻对准的系统和方法 Photolithographic alignment system and method for
07/09/2014CN103913954A 一种大芯片曝光方法及芯片 One kind of big chip and chip exposure method
07/08/2014US8773664 Method and system for aligning substrates for direct laser coupling in an energy assisted magnetic recording head
07/08/2014US8773637 Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark
07/02/2014CN203689009U 用于曝光机的对位晒架 Exposure to the position for drying rack
07/02/2014CN203689008U 预对位装置 Pre-registration system
07/02/2014CN203689007U 半自动led曝光机ccd光学监视系统 Semi-automatic exposure machine led ccd optical surveillance system
07/02/2014CN103901740A 光刻对准标记的放置方法 Placement photolithography alignment marks
07/02/2014CN103901733A 曝光装置 Exposure device
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