Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Patents for G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
07/2014
07/02/2014CN102944970B 基板掩膜对位方法 Substrate mask alignment method
07/02/2014CN102650819B 掩模板和掩膜板的定位方法 Mask positioning method and the mask plate
07/02/2014CN102460310B 重叠测量的方法、光刻设备、检查设备、处理设备和光刻处理单元 The method of overlapping measurements, the lithographic apparatus, inspection apparatus, lithographic apparatus and a processing unit processing
07/02/2014CN102419520B 一种对准信号模拟发生装置 A method of aligning an analog signal generator
07/01/2014US8767183 Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
07/01/2014US8765496 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
06/2014
06/26/2014WO2014056708A3 Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method
06/26/2014WO2013124131A3 Inspection apparatus and method
06/25/2014CN103885283A 一种掩模对准信号的归一化方法 One kind of mask alignment signal normalization method
06/24/2014US8760626 Focus detection apparatus for projection lithography system
06/24/2014US8760624 System and method for estimating field curvature
06/24/2014US8758961 Mask set for fabricating integrated circuits and method of fabricating integrated circuits
06/19/2014WO2014089895A1 Method and clamp for gluing detection board assembly
06/19/2014US20140168622 Microlens array and scanning exposure device using same
06/18/2014CN203658731U 菲林对位机用ccd视觉对位装置 Film of the crew with visual alignment device ccd
06/18/2014CN203658730U 菲林自动对位机 Film automatic alignment machine
06/18/2014CN203658727U 一种具有快速对准功能的新型纳米压印设备 New nano-imprinting device having a quick alignment function
06/18/2014CN103869638A Photoetching alignment method implemented by penetrating through wafer
06/18/2014CN103869631A Exposure apparatus, controlling method for the same, and alignment method for exposure
06/18/2014CN103869630A Pre-alignment debug method
06/18/2014CN103869628A Self-reference interference alignment signal processing system for photoetching equipment
06/18/2014CN103869627A Focusing and leveling method used for projection photoetching machine
06/18/2014CN103869603A Photolithographic plate assembly and photolithographic alignment accuracy detection method
06/18/2014CN102707588B Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam
06/18/2014CN102692822B Multi-wavelength based aligning system and aligning method
06/18/2014CN102540777B Aligning scan method capable of improving aligning accuracy
06/17/2014US8755034 Maskless exposure apparatus and method to determine exposure start position and orientation in maskless lithography
06/11/2014CN103858208A Alignment device and alignment mark for optical exposure device
06/10/2014US8748066 Method for forming photomasks
06/04/2014CN103838093A Nanolithography alignment method based on tiled-grating moire fringe phase demodulation
06/04/2014CN103838088A Focusing and levelling device and method
05/2014
05/29/2014US20140146299 Alignment correction method for substrate to be exposed, and exposure apparatus
05/28/2014EP2735905A1 Double-surface manufacturing method and exposure apparatus
05/28/2014CN102566340B 一种基于相移莫尔条纹的数字无掩模光刻对准装置 A phase shift moire figures are based maskless lithography alignment means
05/28/2014CN102257437B 预对准装置以及预对准方法 Pre-alignment apparatus and method for pre-alignment
05/27/2014US8736815 Position sensor and lithographic apparatus
05/22/2014WO2014076009A2 Position measurement system, grating for a position measurement system and method
05/22/2014WO2014019846A3 Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
05/22/2014DE102007046850B4 Verfahren zum Bestimmen einer Überlagerungsgenauigkeit A method for determining an overlay accuracy
05/21/2014EP2733535A2 Surface position detection apparatus, exposure apparatus, and exposure method
05/21/2014CN103811298A 测试对准使用芯片的制作方法 Production method of testing the alignment using chips
05/21/2014CN102566337B 一种标记期望位置确定方法 A method for determining the location of the desired mark
05/21/2014CN102253609B 对准标记测量信号处理方法 The signal processing method of measuring the alignment mark
05/21/2014CN102129183B 调焦调平测量装置 Focus leveling measuring device
05/21/2014CN101581889B 用于光刻装置的对准标记、对准系统及其对准方法 Alignment mark for a lithographic apparatus, the alignment system and the alignment method
05/14/2014CN103792801A 薄膜掩模修正装置 Film mask correction device
05/14/2014CN103792800A 快速完成曝光时面板与掩膜精确对位的方法 Rapid completion of the exposure panel when the mask alignment precision approach
05/14/2014CN103792796A 一种光罩支架调平机构 One kind of mask holder leveling mechanism
05/14/2014CN101788770B 组装薄胶膜于光掩模上的方法、设备及其组装体 Assembling a thin film on a photomask method, apparatus and assembly
05/13/2014US8724883 Method for inspecting measurement object
05/08/2014WO2014070444A1 Heat actuated and projected lithography systems and methods
05/08/2014WO2014068116A1 Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
05/08/2014WO2014067148A1 Method and apparatus for post-printing processing of post-printing transfer or composite sheet cutting
05/08/2014WO2014066997A1 A reverse optical proximity correction method
05/07/2014CN103777478A 一种非接触式光刻机的晶圆校准水平装置及其应用 A non-contact wafer lithography machine calibration device and application level
05/07/2014CN103777477A 用于底片的对准系统 The alignment system for film
05/07/2014CN103777476A 一种离轴对准系统及对准方法 One kind of off-axis alignment system and alignment method
05/07/2014CN103777467A 一种套刻误差测量装置及方法 An overlay error measurement apparatus and method
05/07/2014CN103777364A 一种分划板的制造方法 A method of manufacturing a reticle sub
05/06/2014US8717544 Alignment method, alignment apparatus, and exposure apparatus
05/01/2014WO2014064290A1 Determining a position of a substrate in lithography
05/01/2014US20140118721 Method and system for measuring a stacking overlay error
05/01/2014US20140118712 Measuring system
04/2014
04/29/2014US8711329 Lithographic apparatus and device manufacturing method
04/29/2014US8709687 Substrate and patterning device for use in metrology, metrology method and device manufacturing method
04/24/2014WO2014060149A1 Sensor system for lithography
04/24/2014WO2014059811A1 Off-axis alignment system and alignment method
04/24/2014US20140111788 Detection device, exposure apparatus, and device manufacturing method using same
04/23/2014EP2722714A2 Detection device, exposure apparatus and device manufacturing method using such an exposure apparatus
04/23/2014CN103744214A Exposure method of glass substrate of LCD (Liquid Crystal Display)
04/23/2014CN102231049B Large-area projection lithography system and alignment method thereof
04/22/2014US8705008 Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate
04/22/2014US8703368 Lithography process
04/17/2014WO2014057246A1 Registration system for phototools
04/17/2014WO2014056708A2 Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method
04/17/2014DE102013111192A1 Photolithography mask for use during manufacturing of semiconductor devices, has mask substrate provided with three-dimensional pattern, and wafer arranged on inverted three-dimensional pattern and mask
04/16/2014CN103733138A Method for correcting alignment of substrate to be exposed, and exposure device
04/16/2014CN103728849A Position detection apparatus, exposure apparatus, and exposure method
04/16/2014CN103728848A Position detection apparatus, exposure apparatus, and exposure method
04/16/2014CN102486622B Mask prealignment device of photoetching machine and method thereof
04/16/2014CN102346384B Method for regulating optimum focal plane for silicon chip and exposure device thereof
04/15/2014US8700206 Method for appointing orientation flat, apparatus for detecting orientation flat, and program for appointing orientation flat
04/10/2014WO2014053334A1 Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
04/10/2014WO2014026819A3 Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
04/10/2014US20140099741 Insulating Pattern, Method of Forming the Insulating Pattern, Light-Emitting Device, Method of Manufacturing the Light-Emitting Device, and Lighting Device
04/10/2014US20140096696 Open loop control system and methods for color print registration
04/09/2014CN203535382U Nanoimprint alignment device
04/09/2014CN103713478A Pre-alignment device
04/09/2014CN103713477A Alignment structure and alignment method for dual surface lithography machine
04/08/2014US8691477 Reticle design for the reduction of lens heating phenomenon
04/03/2014WO2014048211A1 Position matching structure and position matching method for two-sided stepper
04/02/2014CN103698982A Colour film black matrix exposure machine and adjustment method for same
03/2014
03/26/2014CN103681426A Large warp silicon wafer pre-alignment device and method
03/26/2014CN103676506A CCD visual para-position method for film para-position machine
03/26/2014CN103676500A Full-automatic exposure machine
03/26/2014CN103676495A Photomask, photomask set, exposure apparatus and exposure method
03/26/2014CN103676494A Field-by-field focusing and leveling method for scanning lithography machine
03/26/2014CN103676485A Photoetching alignment marking structure for thick epitaxy process
03/26/2014CN103676245A Array substrate alignment mark structure and alignment method of array substrate
03/26/2014CN102692831B Counterpoint mark and method for using same to manufacture workpieces in exposure process
1 2 3 4 5 6 7 8 9 10 11 12 13 ... 109