| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/12/2000 | EP0971268A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/12/2000 | EP0971267A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/12/2000 | EP0971266A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/12/2000 | EP0970519A1 Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation |
| 01/12/2000 | EP0970515A1 A process for photoresist removal |
| 01/12/2000 | EP0970405A1 Ue |
| 01/12/2000 | EP0970085A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON $g(a)-AMINO ALKENES |
| 01/12/2000 | EP0969918A1 Method for producing structured, self-organized molecular monolayers of individual molecular species |
| 01/12/2000 | EP0944482A4 Apparatus and method for recovering photoresist developers and strippers |
| 01/12/2000 | EP0892823B1 Polymers or 2,7-dioxa-bicyclo 3,2,1]octane derivatives |
| 01/12/2000 | EP0886807B1 Color filter |
| 01/12/2000 | EP0726921B1 Energy-curable cyanate/ethylenically unsaturated compositions |
| 01/12/2000 | EP0465562B2 A near infrared laser absorbing coating and method for using same in color imaging and proofing |
| 01/12/2000 | CN1241017A Apparatus and method for controlling process module of semiconductor wafer spinner system |
| 01/12/2000 | CN1241003A Bit line pattern in DRAM for reducing optical close effect |
| 01/11/2000 | US6014456 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
| 01/11/2000 | US6014455 Projection exposure apparatus and device manufacturing method |
| 01/11/2000 | US6014422 Method for varying x-ray hybrid resist space dimensions |
| 01/11/2000 | US6014421 Radiation reduction exposure apparatus and method of manufacturing semiconductor device |
| 01/11/2000 | US6014398 Mixture containing noble gas, fluorine, buffer and stabilizer |
| 01/11/2000 | US6014252 Reflective optical imaging system |
| 01/11/2000 | US6014200 High throughput electron beam lithography system |
| 01/11/2000 | US6013911 Lamp illumination control system and method |
| 01/11/2000 | US6013749 Mixture comprising polyfunctional acrylate ester compound, reaction product of silica particles coupled to alkoxysilane compound containing thio- or dithiocarbamate moieties, and a silicone polymer; hard protective coatings |
| 01/11/2000 | US6013714 Resin composition and fibrous material forming mold |
| 01/11/2000 | US6013419 Polyimide resin films, coating on the surface with cyclodehydration and photopolymerization |
| 01/11/2000 | US6013418 Radiation of sensitive material on substrates |
| 01/11/2000 | US6013417 Process for fabricating circuitry on substrates having plated through-holes |
| 01/11/2000 | US6013416 Films for photoresists patterns |
| 01/11/2000 | US6013415 Photosensitive composition and color with resin and photopolymerization initiator |
| 01/11/2000 | US6013414 Photosensitive polyimide-precursor formulation |
| 01/11/2000 | US6013413 Photoresists with photoacid initiators |
| 01/11/2000 | US6013412 Negative type image recording material |
| 01/11/2000 | US6013411 Photosensitive composition with homo or copolycarbons, halogenium compounds and sulfonium compounds |
| 01/11/2000 | US6013409 Formation of black images on substrates, adhesives, multilayer, adhesion of photopolymer layer, radiation and stripping |
| 01/11/2000 | US6013408 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer |
| 01/11/2000 | US6013407 Photoresists with phenolic resins, quinonediazide sulfonates, photosensitive agents and phenolic compounds |
| 01/11/2000 | US6013401 Method of controlling illumination field to reduce line width variation |
| 01/11/2000 | US6013398 Semitransparent phase shifting masking |
| 01/11/2000 | US6013396 Fabrication of chrome/phase grating phase shift mask by interferometric lithography |
| 01/11/2000 | US6013317 Coating apparatus and method therefor |
| 01/11/2000 | US6013316 Forming ramped and controlled optically active layer on a spinning disc substrate; curing, solidification |
| 01/11/2000 | US6012858 Apparatus and method for forming liquid film |
| 01/06/2000 | WO2000001001A1 Scanning exposure method, scanning exposure apparatus and method for producing the same, and device and method for manufacturing the same |
| 01/06/2000 | WO2000000869A1 Photopolymerizable thermosetting resin compositions |
| 01/06/2000 | WO2000000868A1 Surfaces with release agent |
| 01/06/2000 | WO2000000546A1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 01/06/2000 | WO2000000302A1 Cross flow centrifugal processor |
| 01/06/2000 | CA2335977A1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 01/06/2000 | CA2333365A1 Photopolymerizable thermosetting resin compositions |
| 01/05/2000 | EP0969328A2 Position detection apparatus and exposure apparatus |
| 01/05/2000 | EP0969327A2 Multiple exposure method |
| 01/05/2000 | EP0969326A2 Lithographic apparatus |
| 01/05/2000 | EP0969325A2 Lithographic projection apparatus |
| 01/05/2000 | EP0969324A1 One part photoimageable composition for forming solder mask |
| 01/05/2000 | EP0969323A1 Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom |
| 01/05/2000 | EP0968969A2 Process of producing silica glass products used for photolithography and optical members produced by the process |
| 01/05/2000 | EP0968459A1 Ternary photoinitiator system for curing of epoxy resins |
| 01/05/2000 | EP0968458A1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 01/05/2000 | EP0968445A1 Method for creating a color filter layer on a flat panel display screen structure |
| 01/05/2000 | EP0968250A1 Soluble chromophores having improved solubilising groups |
| 01/05/2000 | EP0968202A1 Process for preparing photoactive coumarin derivatives |
| 01/05/2000 | EP0968181A1 Perfluorynated sulphone salts, and their uses as ionic conduction materials |
| 01/05/2000 | DE19900976A1 Cyclic dione polymers useful in thin-film coating composition, photoresist or blend |
| 01/05/2000 | DE19829612A1 Beleuchtungssystem der Mikrolithographie mit Depolarisator Lighting system for microlithography with depolarizer |
| 01/05/2000 | CN1240567A Process and apparatus for the coating of boards |
| 01/05/2000 | CN1048095C Device for producing a screen printing stencil |
| 01/04/2000 | US6011646 Method to adjust multilayer film stress induced deformation of optics |
| 01/04/2000 | US6011612 Processing apparatus using a laser light source |
| 01/04/2000 | US6011611 Method of measuring aberration of projection optics |
| 01/04/2000 | US6011269 Shaped shadow projection for an electron beam column |
| 01/04/2000 | US6011268 Demagnifying projection-optical system for electron beam lithography with aberration control |
| 01/04/2000 | US6011267 Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources |
| 01/04/2000 | US6011180 Acid-stable borates for photopolymerization |
| 01/04/2000 | US6011078 Unsaturated water dispersable polymer; radiation-curable compound that is soluble in water or is dilutable with at least 10% by weight of water |
| 01/04/2000 | US6010832 Photosensitive polyimide-precursor formulation |
| 01/04/2000 | US6010831 Ultra-fine microfabrication method using an energy beam |
| 01/04/2000 | US6010829 Polysilicon linewidth reduction using a BARC-poly etch process |
| 01/04/2000 | US6010828 Method of and device for planarizing a surface of a semiconductor wafer |
| 01/04/2000 | US6010826 Resist composition |
| 01/04/2000 | US6010825 Negatively acting photoresist composition based on polyimide precursors |
| 01/04/2000 | US6010824 Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
| 01/04/2000 | US6010823 Resist compositions for plating |
| 01/04/2000 | US6010822 Process for preparing a nitrocellulose coated polypropylene film |
| 01/04/2000 | US6010820 Compound capable of generting sulfonic acid upon irradiation |
| 01/04/2000 | US6010818 Method for making an offset printing plate according to the silver salt diffusion transfer process |
| 01/04/2000 | US6010747 Process for making optical structures for diffusing light |
| 01/04/2000 | US6010645 Water-soluble electrically conducting polymers, their synthesis and use |
| 01/04/2000 | US6010567 Black-pigmented structured high molecular weight material |
| 01/04/2000 | US6010255 Acoustic wave enhanced developer |
| 01/04/2000 | US6009888 Peroxidisulfate and hcl oxidizer |
| 01/04/2000 | CA2143808C Lithographic printing members for use with laser-discharge imaging apparatus |
| 12/30/1999 | DE19930234A1 Electrostatic deflector used as a subsidiary deflector for an electron beam illumination unit useful for forming fine structure patterns in high density integrated circuits |
| 12/30/1999 | DE19928742A1 New O-acyloximes used as photoinitiator in photopolymerizable composition |
| 12/29/1999 | WO1999067794A1 Uv-curable epoxy formulations, including conductive compositions |
| 12/29/1999 | WO1999067683A2 Optical system, especially a projection light facility for microlithography |
| 12/29/1999 | WO1999067097A2 Thermal lithographic printing plate |
| 12/29/1999 | WO1999060448A8 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 12/29/1999 | WO1999054761A8 Structure for micro-machine optical tooling and method for making and using |
| 12/29/1999 | EP0967537A2 Temperature control apparatus and method with recirculated coolant |