Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1999
12/08/1999CN1047260C Lamp bulb
12/07/1999US5999720 Post exposure bake simulation method
12/07/1999US5999589 Substrate holding device and exposing apparatus using the same
12/07/1999US5999397 Method for preventing electrostatic discharge damage to an insulating article
12/07/1999US5999333 Exposure apparatus having catadioptric projection optical system
12/07/1999US5999325 Optical device and method of manufacturing the same
12/07/1999US5999310 Ultra-broadband UV microscope imaging system with wide range zoom capability
12/07/1999US5999270 Projection exposure apparatus and microdevice manufacturing method using the same
12/07/1999US5999254 Supporting plate for a photomask in an apparatus for making a microchip
12/07/1999US5999247 Exposure method and exposure system
12/07/1999US5999245 Proximity exposure device with distance adjustment device
12/07/1999US5999244 Projection exposure apparatus, method for correcting positional discrepancy of projected image, and method for determining image formation characteristic of projection optical system
12/07/1999US5998889 Electro-magnetic motor cooling system
12/07/1999US5998801 Surface position detecting method, surface position adjusting apparatus and projection exposure apparatus effecting accurate positioning of a substrate
12/07/1999US5998797 Mask for electron beam exposure and electron beam drawing method
12/07/1999US5998766 Apparatus and method for cleaning substrate surface by use of Ozone
12/07/1999US5998567 Radiation-sensitive mixture
12/07/1999US5998563 Photosensitive material for orientation of liquid crystal device and liquid crystal device thereof
12/07/1999US5998557 Chemically amplified resists
12/07/1999US5998496 Photosensitive intramolecular electron transfer compounds
12/07/1999US5998495 Mixture of iodonium salt, visible light sensitizer and electron donor; dental adhesive
12/07/1999US5998104 Downstream ashing method for removing organic resist from a semiconductor wafer; subjecting a gas plasma containing o2 and water vapor to electromagnetic power
12/07/1999US5998103 Adhesion promotion method employing glycol ether acetate as adhesion promoter material
12/07/1999US5998102 Etch inhibitors in developer for lithographic printing plates
12/07/1999US5998100 A thin resist is formed on the antireflective film and the resist is then patterned. the substrate is fabricated using the patterned resist as a mask.
12/07/1999US5998099 Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
12/07/1999US5998095 Negative-working photosensitive material
12/07/1999US5998092 Water soluble negative-working photoresist composition
12/07/1999US5998091 Radiation sensitive colored composition
12/07/1999US5998090 High optical density, i.e., equal to or greater than 3 at 1 micron or less film thickness, black matrix is disclosed having improved stability and shelf life as a consequence of admixing carbon black on a polyimide polymer vehicle.
12/07/1999US5998089 Photosensitive resin composition comprising fullerene
12/07/1999US5998086 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer
12/07/1999US5998085 Process for preparing high resolution emissive arrays and corresponding articles
12/07/1999US5998084 Radiation-sensitive recording material for the production of planographic printing plates
12/07/1999US5998071 Method to monitor lens heating effects
12/07/1999US5998069 Electrically programmable photolithography mask
12/07/1999US5998068 Reticle and pattern formation method
12/07/1999US5998066 Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass
12/07/1999US5997993 Containing a polyphosphate salt deposited over the photosensitive layer having been made by water-depletion of an orthophosphate.
12/07/1999US5997963 The process chamber can be used to contain gas reactants for steps such as etching, doping, or growing materials in making integrated electronic, optical or micromechanical devices on the wafer substrate
12/07/1999US5997658 Aqueous stripping and cleaning compositions
12/07/1999US5996793 Microcapsules
12/07/1999US5996498 Method of lithographic imaging with reduced debris-generated performance degradation and related constructions
12/07/1999US5996437 Precision motion stage with single guide beam and follower stage
12/07/1999CA2111795C Methods of meniscus coating
12/07/1999CA2082834C Radiation curable compositions
12/02/1999WO1999062094A1 Method for obtaining self-aligned openings, in particular for microtip flat display focusing electrode
12/02/1999WO1999061956A1 Compounds for photoresist and resin composition for photoresist
12/02/1999WO1999061954A1 Enhanced adhesion for liga microfabrication by using a buffer layer
12/02/1999WO1999061653A2 Light-mediated regional analysis of biologic material
12/02/1999WO1999061497A1 Water soluble negative-working photoresist composition
12/02/1999WO1999061404A1 Acid-sensitive compound and resin composition for photoresist
12/02/1999WO1999061261A1 Method and apparatus for manufacturing cylindrical articles
12/02/1999WO1999053380A8 Scanning of non-circular image field formed by asymmetric lens of photolithographic reduction system
12/02/1999DE19924182A1 Carrier for wafers or magnetic disks of high functional density, used during manufacture and transport
12/02/1999DE19923609A1 Reduction objective useful in projector for deep ultraviolet microlithography in chip manufacture
12/02/1999DE19824030A1 Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren A catadioptric projection objective with adaptive mirror and projection exposure method
12/02/1999CA2330668A1 Method and apparatus for manufacturing cylindrical articles
12/01/1999EP0961174A2 Compositions and methods involving direct write optical lithography
12/01/1999EP0961173A1 Photoresist layer supporting film
12/01/1999EP0961172A1 Photolithographic processing for polymer leds with reactive metal cathodes
12/01/1999EP0961171A1 Photoimageable composition having improved flexibility
12/01/1999EP0961170A1 Aqueous developable photoimageable composition having improved adhesion and stripping characteristics
12/01/1999EP0961169A1 Photosensitive polymer composition, method for forming relief patterns, and electronic parts
12/01/1999EP0961149A2 Catadioptric objective for projection with adaptive mirror and projection exposure method
12/01/1999EP0960728A1 A heat mode sensitive imaging element for making positive working printing plates.
12/01/1999EP0960356A1 Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns
12/01/1999EP0960355A1 Photocurable resin composition
12/01/1999EP0960354A1 High temperature performance polymers for stereolithography
12/01/1999EP0960347A1 Phase mask with spatially variable diffraction efficiency
12/01/1999EP0960074A1 Method for determining laser-induced compaction in fused silica
12/01/1999EP0850253B1 Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same
12/01/1999EP0602200B1 Method for forming an immage of a mask pattern
12/01/1999CN2351772Y Ring optical grid off-axis illuminating optical system for photoetching machine
12/01/1999CN1236988A System and method of manufacturing semicustom integrated circuits using reticle primitives
12/01/1999CN1236973A Patterning method in semiconductor device fabricating process
11/1999
11/30/1999US5995878 Method and apparatus for generating exposure data of semiconductor integrated circuit
11/30/1999US5995582 X-ray reduction exposure apparatus and device manufacturing method using the same
11/30/1999US5995285 Multilevel optical diffraction device with antireflection film and exposure apparatus
11/30/1999US5995263 Projection exposure apparatus
11/30/1999US5995225 Method for measuring orthogonality in a stage of an exposure apparatus
11/30/1999US5995205 Light exposure installation of a double-sided printed circuit plate through artworks
11/30/1999US5995203 Scanning exposure apparatus in which light exposure is a function of the speed of the mask or substrate stage
11/30/1999US5995200 Multiple image reticle for forming layers
11/30/1999US5995199 Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask
11/30/1999US5995198 Exposure apparatus
11/30/1999US5994709 Charged-particle-beam exposure apparatus exhibiting aberration control
11/30/1999US5994708 Demagnifying charged-particle lithography apparatus
11/30/1999US5994430 Antireflective coating compositions for photoresist compositions and use thereof
11/30/1999US5994425 Curable compositions containing photosensitive high performance aromatic ether polymers
11/30/1999US5994225 Method of etching metal with increased etching selectivity
11/30/1999US5994052 Redox system
11/30/1999US5994036 Storage of semiconductors; controlling temperature and humidity
11/30/1999US5994034 Coating adhesive on dielectric; preferential exposure; development
11/30/1999US5994033 Graft polymer
11/30/1999US5994032 Preparation of photopolymeric gravure printing plates
11/30/1999US5994031 Method of processing presensitized planographic printing plate
11/30/1999US5994030 Pattern-forming method and lithographic system
11/30/1999US5994029 Dulled radiation-sensitive recording material and process for its production
11/30/1999US5994027 Photoresist layer supporting film and photoresist film laminate
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